TY - CHAP A1 - Hecht, Fabian A1 - Bauereiβ, Florian A1 - Sellmair, Josef A1 - Buchner, Philipp A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Electron Beam Induced Growth of Carbon Nanotips on Tungsten and Silicon Fieldemitters T2 - 2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA N2 - In our experiments we grew electron emitting carbon nanostructures on tungsten tips. Subsequently, we transferred the growth process to pre-structured phosphorus-doped n-type silicon and obtained emitting carbon nanostructures directly grown on silicon. After growth of the nanostructures, the silicon field emitters showed increased emission currents of 76 nA at 1.1 kV (compared to 6 nA under the same conditions before growth). KW - Behavioral sciences KW - Nanostructures KW - Silicon KW - Carbon dioxide KW - Current measurement KW - Electron beams KW - Tungsten Y1 - 2023 SN - 979-8-3503-0143-4 U6 - https://doi.org/10.1109/IVNC57695.2023.10188960 SP - 160 EP - 162 PB - IEEE ER - TY - JOUR A1 - Kammler, Martin A1 - Horn-von Hoegen, Michael T1 - Low energy electron diffraction of epitaxial growth of bismuth on Si(111) JF - Surface Science N2 - The epitaxial growth of Bi on Si(1 1 1) studied by spot profile analyzing low energy electron diffraction shows for low coverage rotationally disordered Bi cluster with preferred orientations following the threefold symmetry of the Si substrate. With further deposition the Bi cluster coalesces and the surface orientation changes from the pseudo cubic Bi(1 1 0) surface orientation of the Bi cluster into the hexagonal Bi(1 1 1) surface of the resulting Bi film. KW - Bismuth KW - Epitaxial growth KW - LEED KW - low energy electron diffraction KW - Silicon KW - Structural transition Y1 - 2005 U6 - https://doi.org/10.1016/j.susc.2004.11.033 VL - 576 IS - 1-3 SP - 56 EP - 60 PB - Elsevier ER - TY - JOUR A1 - Hild, R. A1 - Seifert, C. A1 - Kammler, Martin A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Horn-von Hoegen, Michael A1 - Zhachuk, R.A A1 - Olshanetsky, B.Z T1 - Kinetics of Au induced faceting of vicinal Si(111) JF - Surface Science N2 - Au induced faceting of vicinal Si(1 1 1) has been studied during adsorption at elevated temperature by spot profile analyzing of low energy electron diffraction and after quenching to room temperature by scanning tunneling microscopy. On the surfaces inclined towards five different types of facets form with increasing Au coverage at adsorption temperatures Tads below 800 °C. They are (4 4 3), (7 7 5), (5 5 3), a stepped (2 2 1), and the (3 3 1) facets. Atomic models for the (5 5 3) and (7 7 5) facet planes are proposed on the basis of high resolution STM images. At C we found the formation of an ordered step train which covers the entire surface. With further increasing Au coverage the stepped surface decomposes again into (1 1 1) terraces and step bunches. Driving force is the formation of the Si(1 1 1)-(5×2)–Au reconstruction. KW - Low energy electron diffraction (LEED) KW - Scanning tunneling microscopy KW - Silicon KW - Gold KW - Faceting KW - Adsorption kinetics KW - Step formation and bunching Y1 - 2002 U6 - https://doi.org/10.1016/S0039-6028(02)01666-7 VL - 512 IS - 1-2 SP - 117 EP - 127 PB - Elsevier ER - TY - JOUR A1 - Horn-von Hoegen, Michael A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Kammler, Martin A1 - Schaeffer, C. A1 - Reinking, D. A1 - Hofmann, K. R. T1 - Bi surfactant mediated epitaxy of Ge on Si(111) JF - Thin Solid Films N2 - We have tested Bi for the surfactant mediated epitaxy of Ge on Si(111). Islanding of Ge is prevented and a 2D layer growth of smooth and continuous Ge films is observed. The lattice mismatch is accommodated by a periodic array of dislocations confined to the Si/Ge interface. The large covalent radius of Bi reduces the binding energy, allowing Very efficient segregation and low doping levels even at low growth temperatures. Unfortunately, this results also in a high Bi desorption flux limiting the possible growth temperatures below 600 degrees C. Consequently the Ge films show a high defect density in the order of 10(8) cm(-2) for stacking faults and 10(9) cm(-2) for dislocations which limit electron Hall mobility to values below 700 cm(2)/V s at room temperature. KW - Hall mobility KW - Heteroepitaxial growth KW - Surfactants KW - Doping KW - Molecular beam epitaxy KW - Silicon KW - Germanium KW - Bismuth KW - Low energy electron diffraction KW - Scanning electron microscopy Y1 - 1999 U6 - https://doi.org/10.1016/S0040-6090(98)01659-9 VL - 343-344 SP - 579 EP - 582 PB - Elsevier ER - TY - JOUR A1 - Payer, Thomas A1 - Klein, C. A1 - Acet, M. A1 - Ney, V. A1 - Kammler, Martin A1 - Meyer zu Heringdorf, Frank-Joachim A1 - Horn-von Hoegen, Michael T1 - High-quality epitaxial Bi(111) films on Si(111) by isochronal annealing JF - Thin Solid Films N2 - Bi(111) films grown on Si(111) at room temperature show a significantly higher roughness compared to Bi films grown on Si(100) utilizing a kinetic pathway based on a low-temperature process. Isochronal annealing steps of 3 min duration each with temperatures up to 200 °C cause a relaxation of the Bi films' lattice parameter toward the Bi bulk value and yield an atomically flat Bi surface. Driving force for the relaxation and surface reordering is the magic mismatch of 11 Bi atoms to 13 Si atoms that emerges at annealing temperatures above 150 °C and reduces the remaining strain to less than 0.2%. KW - Epitaxy KW - Strain KW - Annealing KW - Bismuth KW - Silicon Y1 - 2012 U6 - https://doi.org/10.1016/j.tsf.2012.06.004 VL - 520 IS - 23 SP - 6905 EP - 6908 PB - Elsevier ER - TY - CHAP A1 - Hausladen, Matthias A1 - Buchner, Philipp A1 - Schels, Andreas A1 - Edler, Simon A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - An Integrated Field Emission Electron Source on a Chip Fabricated by Laser-Micromachining and Mems Technology T2 - 2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA N2 - A silicon field emission electron source consisting of a cathode and a grid electrode has been fabricated by laser micromachining. The cathode features 21×21 tips on an area of 4×4 mm 2 , With a self-aligning MEMS technology for the aperture grid, a high electron transmission (99 %) was achieved. Onset voltages of 50…70 V were observed for an emission current of 1 nA. A stable emission current of 1 mA ± 1.3 % at an extraction voltage of 250 V was observed during a 30-min operation. KW - Apertures KW - Field Emission KW - Field Emission Array KW - Ions KW - Laser-Micromachining KW - Lasers KW - Micromechanical devices KW - Silicon KW - Silicon Field Emission Array KW - Steady-state KW - Vacuum systems Y1 - 2023 SN - 979-8-3503-0143-4 U6 - https://doi.org/10.1109/IVNC57695.2023.10189001 SP - 115 EP - 116 PB - IEEE ER - TY - CHAP A1 - Bartl, Mathias A1 - Hausladen, Matthias A1 - Asgharzade, Ali A1 - Buchner, Philipp A1 - Krysztof, Michal A1 - Knápek, Alexandr A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Experimental method for investigation of the emission pattern characteristics of individual field emission tips using a CMOS image sensor T2 - 38th International Vacuum Nanoelectronics Conference (IVNC) N2 - The emission pattern characteristics of individual silicon field emission tips were investigated using a CMOS image sensor. The quality of the image was improved by spatial and temporal averaging, so that individual emission centers could be identified and their temporal changes investigated. By mapping the emission current onto the image, the distribution of the current density on the image sensor could be calculated. KW - CMOS image sensors KW - Silicon KW - Current density KW - Nanoelectronics Y1 - 2025 U6 - https://doi.org/10.1109/IVNC65669.2025.11121040 PB - IEEE ER -