TY - JOUR A1 - Schmidt, Thomas A1 - Kröger, Roland A1 - Clausen, T. A1 - Falta, J. A1 - Janzen, Andreas A1 - Kammler, Martin A1 - Kury, P. A1 - Zahl, P. A1 - Horn-von Hoegen, Michael T1 - Surfactant-mediated epitaxy of Ge on Si(111): Beyond the surface JF - Applied Physics Letters N2 - For a characterization of interface and “bulk” properties of Ge films grown on Si(111) by Sb surfactant-mediated epitaxy, grazing incidence x-ray diffraction and transmission electron microscopy have been used. The interface roughness, defect structure, and strain state have been investigated in dependence of film thickness and growth temperature. For all growth parameters, atomically smooth interfaces are observed. For thin Ge layers, about 75% of the strain induced by the lattice mismatch is relaxed by misfit dislocations at the Ge/Si interface. Only a slight increase of the degree of relaxation is found for thicker films. At growth temperatures below about 600 °C, the formation of twins is observed, which can be avoided at higher temperatures. Y1 - 2005 U6 - https://doi.org/10.1063/1.1882760 VL - 86 IS - 11 PB - AIP ER -