TY - JOUR A1 - Chee, See Wee A1 - Kammler, Martin A1 - Graham, Jeremy A1 - Gignac, Lynne A1 - Reuter, Mark C. A1 - Hull, Robert A1 - Ross, Frances M. T1 - Directed Self-Assembly of Ge Quantum Dots Using Focused Si2+ Ion Beam Patterning JF - scientific reports N2 - We show that templating a Si surface with a focused beam of Si2+ or Si+ ions can create suitable nucleation sites for the subsequent growth of self-assembled Ge quantum dots by chemical vapor deposition. To determine the mechanism of patterning we use atomic force microscopy to show that, similar to Ga+ patterning, the formation of a surface pit is required to enable control over Ge quantum dot locations. We find that relatively high implantation doses are required to achieve patterning, and these doses lead to amorphization of the substrate. We assess the degree to which the substrate crystallinity can be recovered by subsequent processing. Using in situ transmission electron microscopy heating experiments we find that recrystallization is possible at the growth temperature of the Ge quantum dots, but defects remain that follow the pattern of the initial implantation. We discuss the formation mechanism of the defects and the benefits of using Si ions for patterning both defects and quantum dots on Si substrates. KW - ARRAYS KW - AU KW - DAMAGE KW - GROWTH KW - IMPLANTATION KW - NUCLEATION KW - RECOVERY KW - silicon KW - TECHNOLOGY Y1 - 2018 U6 - https://doi.org/10.1038/s41598-018-27512-z VL - 8 SP - 1 EP - 10 PB - Nature ER - TY - JOUR A1 - Chee, See Wee A1 - Kammler, Martin A1 - Balasubramanian, Prabhu A1 - Reuter, Mark C. A1 - Hull, Robert A1 - Ross, Frances M. T1 - Microstructural changes in silicon induced by patterning with focused ion beams of Ga, Si and Au JF - Ultramicroscopy N2 - We use focused beams of Ga(+), Au(+) and Si(++) ions to induce local microstructural changes in single crystal silicon. The ions were delivered as single spot pulses into thin Si membranes that could subsequently be imaged and annealed in situ in a transmission electron microscope. For each ion, the focused ion beam implantation created an array of amorphous regions in the crystalline membrane. Annealing causes solid phase epitaxial regrowth to take place, but we show that the resulting microstructure depends on the ion species. For Ga(+) and Au(+), precipitates remain after recrystallization, while for Si(++), dislocation loops form around the periphery of each implanted spot. We attribute these loops to defects formed during solid phase epitaxial regrowth, with controlled placement of the loops possible. KW - dislocation engineering KW - focused ion beam KW - In situ electron microscopy KW - solid phase epitaxial regrowth Y1 - 2013 U6 - https://doi.org/10.1016/j.ultramic.2012.07.004 VL - 127 SP - 126 EP - 131 PB - Elsevier ER - TY - JOUR A1 - Portavoce, A. A1 - Kammler, Martin A1 - Hull, Robert A1 - Reuter, Mark C. A1 - Copel, M. A1 - Ross, Frances M. T1 - Growth of nanostructures by locally modified surface reactivity JF - Materials Science in Semiconductor Processing N2 - The chemical vapor deposition (CVD) of Si and Ge on Si(0 0 1) substrates covered by 1 monolayer of Ga has been studied. Ga modifies surface reactivity and surface atom mobility. We show that islanding occurs during Ga-mediated CVD even in the absence of strain, allowing for the formation of islands without a wetting layer or with a thinner wetting layer. The morphology of the grown layer is highly dependent on kinetic parameters, i.e. growth temperature and growth pressure, that control Si and Ge deposition and Ga desorption. Si Ga-mediated CVD promotes the formation of self-assembled epitaxial Si islands exhibiting {1 1 3} facets. Ge islands grown by Ga-mediated CVD present reduced lateral sizes and an increased surface density compared to non Ga-mediated CVD. The growth morphology (particularly island size and density) can be understood by considering a qualitative model in which atoms are deposited only on sites whose dangling bonds are not passivated by Ga. We suggest that modification of surface reactivity during surfactant-mediated CVD can thus provide a new degree of freedom for quantum dot fabrication. KW - UHV TEM KW - UHV CVD KW - Epitaxial growth KW - Si KW - Ge KW - Surfactant Ga Y1 - 2009 U6 - https://doi.org/10.1016/j.mssp.2009.07.001 VL - 12 IS - 1-2 SP - 25 EP - 30 PB - Elsevier ER - TY - JOUR A1 - Portavoce, A. A1 - Kammler, Martin A1 - Hull, Robert A1 - Reuter, Mark C. A1 - Ross, Frances M. T1 - Mechanism of the nanoscale localization of Ge quantum dot nucleation on focused ion beam templated Si(001) surfaces JF - Nanotechnology N2 - We investigate the fundamental mechanism by which self-assembled Ge islands can be nucleated at specific sites on Si(001) using ultra-low-dose focused ion beam (FIB) pre-patterning. Island nucleation is controlled by a nanotopography that forms after the implantation of Ga ions during subsequent thermal annealing of the substrate. This nanotopography evolves during the annealing stage, changing from a nanoscale annular depression associated with each focused ion beam spot to a nanoscale pit, and eventually disappearing (planarizing). The correspondence of Ge quantum dot nucleation sites to the focused ion beam features requires a growth surface upon which the nanotopography is preserved. A further key observation is that the Ge wetting layer thickness is reduced in patterned regions, allowing the formation of islands on the templated regions without nucleation elsewhere. These results provide routes to the greatly enhanced design and control of quantum dot distributions and dimensions. Y1 - 2006 U6 - https://doi.org/10.1088/0957-4484/17/17/028 VL - 17 IS - 17 SP - 4451 EP - 4455 PB - IOP ER - TY - JOUR A1 - Ross, Frances M. A1 - Kammler, Martin A1 - Reuter, Mark C. A1 - Hull, Robert T1 - In-situ observations of self-assembled island nucleation on patterned substrates JF - Philosophical Magazine N2 - We compare in-situ electron microscopy observations of Ge island growth on Si surfaces modulated by different techniques. Si(001) substrates were patterned either using a focused Ga ion beam or lithographically to produce similar feature sizes. In the case of the focused-ion-beam patterned substrates, chemical or strain effects caused by low Ga doses control the positions at which islands nucleate. Nucleation on topographically modulated substrates, with the pattern produced either by high-dose sputtering or lithographically, is controlled by the nature of the side walls of topographic features. The two patterning approaches have different benefits in creating arrays of islands for device applications. Y1 - 2004 U6 - https://doi.org/10.1080/14786430410001671430 VL - 84 IS - 25-26 SP - 2687 EP - 2702 PB - Taylor & Francis ER - TY - JOUR A1 - Kammler, Martin A1 - Hull, Robert A1 - Reuter, Mark C. A1 - Ross, Frances M. T1 - Lateral control of self-assembled island nucleation by focused-ion-beam micropatterning JF - Applied Physics Letters N2 - We demonstrate that the nucleation sites of nanoscale, self-assembled Ge islands on Si(001) can be controlled by patterning the Si surface in situ with a focused ion beam. At low doses of 6000 Ga+ ions per <100 nm spot, the selective growth is achieved without modifying the initial surface topography. At larger doses, topographic effects produced by sputtering and redeposition control the selective nucleation sites. Islands grown on irradiated spots are smaller with higher aspect ratio than islands grown on clean Si(001), suggesting a strong surfactant effect of Ga. Y1 - 2003 U6 - https://doi.org/10.1063/1.1542680 VL - 82 IS - 7 SP - 1093 EP - 1095 ER - TY - JOUR A1 - Kammler, Martin A1 - Hull, Robert A1 - Portavoce, A. A1 - Reuter, Mark C. A1 - Ross, Frances M. T1 - In-Situ Focused Ion Beam Micropatterning of Ge Islands JF - Microscopy and Microanalysis Y1 - 2003 U6 - https://doi.org/10.1017/S1431927603441214 VL - 9 IS - S02 SP - 132 EP - 134 PB - Microscopy Society of America ER -