TY - JOUR A1 - Portavoce, A. A1 - Kammler, Martin A1 - Hull, Robert A1 - Reuter, Mark C. A1 - Copel, M. A1 - Ross, Frances M. T1 - Growth of nanostructures by locally modified surface reactivity JF - Materials Science in Semiconductor Processing N2 - The chemical vapor deposition (CVD) of Si and Ge on Si(0 0 1) substrates covered by 1 monolayer of Ga has been studied. Ga modifies surface reactivity and surface atom mobility. We show that islanding occurs during Ga-mediated CVD even in the absence of strain, allowing for the formation of islands without a wetting layer or with a thinner wetting layer. The morphology of the grown layer is highly dependent on kinetic parameters, i.e. growth temperature and growth pressure, that control Si and Ge deposition and Ga desorption. Si Ga-mediated CVD promotes the formation of self-assembled epitaxial Si islands exhibiting {1 1 3} facets. Ge islands grown by Ga-mediated CVD present reduced lateral sizes and an increased surface density compared to non Ga-mediated CVD. The growth morphology (particularly island size and density) can be understood by considering a qualitative model in which atoms are deposited only on sites whose dangling bonds are not passivated by Ga. We suggest that modification of surface reactivity during surfactant-mediated CVD can thus provide a new degree of freedom for quantum dot fabrication. KW - UHV TEM KW - UHV CVD KW - Epitaxial growth KW - Si KW - Ge KW - Surfactant Ga Y1 - 2009 U6 - https://doi.org/10.1016/j.mssp.2009.07.001 VL - 12 IS - 1-2 SP - 25 EP - 30 PB - Elsevier ER - TY - JOUR A1 - Portavoce, A. A1 - Kammler, Martin A1 - Hull, Robert A1 - Reuter, Mark C. A1 - Ross, Frances M. T1 - Mechanism of the nanoscale localization of Ge quantum dot nucleation on focused ion beam templated Si(001) surfaces JF - Nanotechnology N2 - We investigate the fundamental mechanism by which self-assembled Ge islands can be nucleated at specific sites on Si(001) using ultra-low-dose focused ion beam (FIB) pre-patterning. Island nucleation is controlled by a nanotopography that forms after the implantation of Ga ions during subsequent thermal annealing of the substrate. This nanotopography evolves during the annealing stage, changing from a nanoscale annular depression associated with each focused ion beam spot to a nanoscale pit, and eventually disappearing (planarizing). The correspondence of Ge quantum dot nucleation sites to the focused ion beam features requires a growth surface upon which the nanotopography is preserved. A further key observation is that the Ge wetting layer thickness is reduced in patterned regions, allowing the formation of islands on the templated regions without nucleation elsewhere. These results provide routes to the greatly enhanced design and control of quantum dot distributions and dimensions. Y1 - 2006 U6 - https://doi.org/10.1088/0957-4484/17/17/028 VL - 17 IS - 17 SP - 4451 EP - 4455 PB - IOP ER - TY - JOUR A1 - Kammler, Martin A1 - Hull, Robert A1 - Portavoce, A. A1 - Reuter, Mark C. A1 - Ross, Frances M. T1 - In-Situ Focused Ion Beam Micropatterning of Ge Islands JF - Microscopy and Microanalysis Y1 - 2003 U6 - https://doi.org/10.1017/S1431927603441214 VL - 9 IS - S02 SP - 132 EP - 134 PB - Microscopy Society of America ER -