TY - JOUR A1 - Krysztof, Michał A1 - Miera, Paweł A1 - Urbański, Paweł A1 - Grzebyk, Tomasz A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Integrated silicon electron source for high vacuum microelectromechanical system devices JF - Journal of Vacuum Science & Technology B N2 - The article presents the process of developing a silicon electron source designed for high-vacuum microelectromechanical system (HV MEMS) devices, i.e., MEMS electron microscope and MEMS x-ray source. Technological constraints and issues of such an electron source are explained. The transition from emitters made of carbon nanotubes to emitters made of pure silicon is described. Overall, the final electron source consists of a silicon tip emitter and a silicon gate electrode integrated on the same glass substrate. The source generates an electron beam without any carbon nanotube coverage. It generates a high and stable electron current and works after the final bonding process of an HV MEMS device. KW - Materials Chemistry KW - Electrical and Electronic Engineering KW - Surfaces, Coatings and Films KW - Process Chemistry and Technology KW - Instrumentation KW - Electronic, Optical and Magnetic Materials Y1 - 2024 U6 - https://doi.org/10.1116/6.0003385 SN - 2166-2746 VL - 42 IS - 2 PB - AIP Publishing ER -