TY - JOUR A1 - Bauhuber, Michael A1 - Mikrievskij, Andreas A1 - Lechner, Alfred T1 - Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions JF - Materials Science in Semiconductor Processing N2 - Online trace analysis based on UV/Vis spectroscopy requires long detection paths. Therefore an isotropic wet etch process in silicon is developed to fabricate a 300 µm deep channel with low channel wall roughness for desired light guidance application. Four etchant compositions were compared in terms of etching rate, surface roughness and selectivity in a beaker process. The best fitting mixture was selected. To further increase the surface quality (bubble issue) a spin etcher tool is used for producing the channels. The dependence of homogeneity and defect density on media flux, and rotation velocity was investigated. Results show that high rotation velocity and high media flux lead to great defects in the channel wall. Through rotation of the wafer during etching, the etching rate of silicon rises compared to the beaker process due to the rapid removal of etch products and simultaneous supply of fresh etchant. After 38 min of etching, 300 µm deep semi-circular channels with high optical quality (Rq=10 nm±2 nm) over 3 m were produced. Y1 - 2013 UR - https://www.scopus.com/authid/detail.uri?authorId=22980567700#disabled U6 - https://doi.org/10.1016/j.mssp.2013.05.017 VL - 16 IS - 6 SP - 1428 EP - 1433 PB - Elsevier ER - TY - JOUR A1 - Hutterer, Albert A1 - Bauhuber, Michael A1 - Hummel, Helmut A1 - Lechner, Alfred T1 - Real-time analyses of metal contaminations in the ppb-range JF - Solid State Phenomena N2 - In high-tech processing even smallest concentrations of metal ions in process media are of the utmost significance because they cause expensive production failures. Currently, cost-intensive equipment, special trained staff and time consuming analyses are necessary to detect these contaminations in order to avoid failures. The Centers of Excellence Nanochem and Sensorics at the University of Applied Sciences Regensburg (owner of patent PCT/EP2010/064833) and their industrial partner Micro-Epsilon GmbH are developing a new miniaturized measurement device which allows cost-effective real-time analysis of fluidic media for the first time. The system is fully automated and can be directly connected to wet-etch benches. Hence it allows continuous real-time surveillance of metal contaminations in the ppb-range through absorption spectroscopy in process media. For this purpose a very small sample amount of the process medium and a specific complexing agent are mixed together. This leads to an increase in the molar extinction coefficients and though even smallest contaminations become visible. The main parts of our development are the simulation of the different system components, their production and chemical analyses with the evaluation model. KW - Absorption KW - Analysis KW - Complexing Agent KW - Light Guidance KW - Liquid-Core Waveguide KW - Metal Ions KW - Online Measurement KW - Real-Time KW - Total Internal Reflection Y1 - 2013 U6 - https://doi.org/10.4028/www.scientific.net/SSP.195 VL - 195 SP - 269 EP - 273 PB - Trans Tech Publications ER - TY - JOUR A1 - Beimler, Josef A1 - Leißl, Caroline A1 - Ebner, Lena A1 - Elsner, Michael A1 - Mühlbauer, Gerhard A1 - Kohlert, Dieter A1 - Schubert, Martin J. W. A1 - Weiß, Andreas P. A1 - Sterner, Michael A1 - Raith, Thomas A1 - Afranseder, Martin A1 - Krapf, Tobias A1 - Mottok, Jürgen A1 - Siemers, Christian A1 - Großmann, Benjamin A1 - Höcherl, Johannes A1 - Schlegl, Thomas A1 - Schneider, Ralph A1 - Milaev, Johannes A1 - Rampelt, Christina A1 - Roduner, Christian A1 - Glowa, Christoph A1 - Bachl, Christoph A1 - Schliekmann, Claus A1 - Gnan, Alfons A1 - Grill, Martin A1 - Ruhland, Karl A1 - Piehler, Thomas A1 - Friers, Daniel A1 - Wels, Harald A1 - Pflug, Kenny A1 - Kucera, Markus A1 - Waas, Thomas A1 - Schlachetzki, Felix A1 - Boy, Sandra A1 - Pemmerl, Josef A1 - Leis, Alexander A1 - Welsch, Andreas F.X. A1 - Graf, Franz A1 - Zenger, Gerhard A1 - Volbert, Klaus A1 - Waas, Thomas A1 - Scherzinger, Stefanie A1 - Klettke, Meike A1 - Störl, Uta A1 - Heyl, C. A1 - Boldenko, A. A1 - Monkman, Gareth J. A1 - Kujat, Richard A1 - Briem, Ulrich A1 - Hierl, Stefan A1 - Talbot, Sebastian A1 - Schmailzl, Anton A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Valentino, Piergiorgio A1 - Romano, Marco A1 - Ehrlich, Ingo A1 - Furgiuele, Franco A1 - Gebbeken, Norbert A1 - Eisenried, Michael A1 - Jungbauer, Bastian A1 - Hutterer, Albert A1 - Bauhuber, Michael A1 - Mikrievskij, Andreas A1 - Argauer, Monika A1 - Hummel, Helmut A1 - Lechner, Alfred A1 - Liebetruth, Thomas A1 - Schumm, Michael A1 - Joseph, Saskia A1 - Reschke, Michael A1 - Soska, Alexander A1 - Schroll-Decker, Irmgard A1 - Putzer, Michael A1 - Rasmussen, John A1 - Dendorfer, Sebastian A1 - Weber, Tim A1 - Al-Munajjed, Amir Andreas A1 - Verkerke, Gijsbertus Jacob A1 - Renkawitz, Tobias A1 - Haug, Sonja A1 - Rudolph, Clarissa A1 - Zeitler, Annika A1 - Schaubeck, Simon A1 - Steffens, Oliver A1 - Rechenauer, Christian A1 - Schulz-Brize, Thekla A1 - Fleischmann, Florian A1 - Kusterle, Wolfgang A1 - Beer, Anne A1 - Wagner, Bernd A1 - Neidhart, Thomas ED - Baier, Wolfgang T1 - Forschungsbericht 2013 T3 - Forschungsberichte der OTH Regensburg - 2013 Y1 - 2014 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-7990 CY - Regensburg ER -