TY - JOUR A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Investigations on the long-term performance of gated p-type silicon tip arrays with reproducible and stable field emission behavior JF - Journal of Vacuum Science & Technology B N2 - The authors report on the fabrication and characterization of p-type Si tip arrays with an integrated gate electrode for applications as field emission electron sources. After the reactive ion etching of the emitters, the combined thermal dry and wet oxidation was used for both the sharpening of the emitters and for the realization of an enhanced insulation layer. Au was evaporated in a self-aligned process as gate electrode. Arrays of 16 Si tips were fabricated with tip heights of about 3 μm and tip radii of about 20 nm with integrated gate electrode concentrically positioned ≈2 μm below the tip apex. Integral measurements with an additional anode showed improved field emission properties with a reproducible and stable emission behavior. A fast activation of the tips, low onset voltages of about 30 V, and moderate field emission currents up to 0.55 μA were noticed. The field emission parameters were calculated using the Fowler–Nordheim characteristics. A pronounced saturation regime was observed, and current fluctuations of less than ±1% were investigated for 30 min. Long-term measurements were carried out for a period of more than 8 h. In the first 6 h of operation, the authors observed a drift of the emission current from 0.35 to 0.55 μA caused by an increased emission surface. Y1 - 2017 U6 - https://doi.org/10.1116/1.4972519 VL - 35 IS - 1 ER - TY - CHAP A1 - Bieker, Johannes A1 - Roustaie, Farough A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Schlaak, Helmut F. T1 - Innovatives Verfahren zur Herstellung und Integration metallischer Nanokonen für die Feldemission T2 - MikroSystemTechnik Kongress 2017 : MEMS, Mikroelektronik, Systeme 23.-25. Oktober 2017 in München N2 - In den letzten Jahren wurde am Institut für Elektromechanische Konstruktionen die Fabrikation und Integration von metallischen Nanodrähten und Nanokonen mittels Template-basierter Abscheidung erforscht. Diese Variante der in-situ Abscheidung von metallischen Nanostrukturen bietet eine Vielzahl von Anwendungsmöglichkeiten. Im Rahmen dieses Beitrags werden das Herstellungsverfahren zur Herstellung metallischer Nanokonen vorgestellt. Dies beinhaltet sowohl die Templatepräparation mittels asymmetrischen Ätzens als auch die anschließende Integration mittels galvanischer Abscheidung. Eine Anwendung der metallischen Nanokonen stellt die Verwendung als Feldemitter in der Vakuumelektronik dar. Es werden erste Messungen der Langzeitstabilität des Feldemissionsstromes der metallischen Konen präsentiert. N2 - Recently the fabrication and integration of metallic nanowires and nanocones based on ion-track etched templates has been in the focus of research at the Institute for Electromechanical Design at the TU Darmstadt. Using the method for the in-situ deposition various applications are feasible. In this paper we present the fabrication method for in-situ deposition of metallic nanocones, including the preparation of the polymer templates based on asymmetric etching and the process description for integration via electrodeposition. Giving one example for an application, the metallic nanocones can be used as field emitters in vacuum electronics. The field emission properties will be presented briefly. T2 - Innovative fabrication method for in-situ deposition of metallic nanocones for field emission KW - Ätzen KW - Feldemission KW - galvanische Abscheidung KW - Herstellverfahren KW - Langzeitstabilität KW - Nanodraht KW - Nanostruktur KW - Polymer KW - Prozessbeschreibung KW - Vakuum Y1 - 2017 SN - 978-3-8007-4491-6 IS - CD-ROM SP - 797 EP - 800 PB - VDE-Verlag CY - München ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Fabrication and simulation of silicon structures with high aspect ratio for field emission devices T2 - 2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland N2 - To obtain higher field enhancement factors of Si-tip structures, we present an improved fabrication process utilizing reactive-ion etching (RIE) with an inductively coupled plasma (ICP). In our design, a pillar under the tips is realized by a combination of RIE with ICP. With adjusted power settings (≈ 240 W) and step times (<; 5 s), vertical slopes with a low roughness of approximately 10 nm to 20 nm are possible. The remaining silicon is oxidized thermally to sharpen the emitters. A final tip radius of R <; 20 nm is obtained for the tips of the emitters. The pillar height HP can be mainly adjusted by the duration of the ICP-etching step. A total emitter height of H ≈ 6 μm with a pillar height of HP ≈ 5 μm is achieved. Simulations with COMSOL Multiphysics® are applied to calculate the field enhancement factor β. A two-dimensional model is used in rotational symmetry. In addition to the previous model, a pillar with a varying diameter ØP and height HP is added. A conventional emitter (H = 1 μm and R = 20 nm) placed on a pillar of the height HP ≈ 5 μm approximately results in a three times higher β-factor (β≈ 105). By decreasing the diameter ØP a slight increase of the β-factor is observed. However, the aspect ratio of the emitter mainly influences on the β-factor. KW - Anodes KW - CATHODES KW - FABRICATION KW - field emission KW - field emitter array KW - field enhancement factor KW - Iterative closest point algorithm KW - Lead KW - silicon tips Y1 - 2014 U6 - https://doi.org/10.1109/IVNC.2014.6894805 SP - 193 EP - 194 PB - IEEE ER - TY - JOUR A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Langer, Christoph A1 - Herdl, Florian A1 - Bergbreiter, Lukas A1 - Dams, Florian A1 - Miyakawa, Natuski A1 - Eggert, Tobias A1 - Pahlke, Andreas A1 - Edler, Simon A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Hausladen, Matthias A1 - Schreiner, Rupert T1 - Vacuum-sealed field emission electron gun JF - Journal of Vacuum Science & Technology B N2 - A compact vacuum-sealed field emission electron gun with an operation voltage below 5 kV is presented. With a 150 nm thick pyrolytic carbon membrane, a transmission of 40% at 5 kV is obtained. For more than 2500 h of continuous operation at an emission current of 100 nA, no significant increase (<50V ) and almost no degradation were found. From this measurement, a lifetime of more than 10 000 h at continuous operation with approximately a linear increase of the extraction voltage from about 545 V to about 730 V is predicted. This electron source enables application of field emitter arrays in poor vacuum or even ambient pressure. ACKNOWLEDGMENT This work was supported by the German Federal Ministry for Economic Affairs and Energy under Project No. ZF4081502GM8. C.P., R.L., M.H., and R.S. were supported by Grant No. ZF4562901GM8. Y1 - 2020 U6 - https://doi.org/10.1116/1.5139316 VL - 38 IS - 2 PB - AIP Publishing ER - TY - JOUR A1 - Edler, Simon A1 - Bachmann, Michael A1 - Breuer, Janis A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Jakšič, Jasna A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Influence of adsorbates on the performance of a field emitter array in a high voltage triode setup JF - Journal of Applied Physics N2 - In the present work, black-silicon field emitter arrays (FEAs) are investigated regarding the influence of residual gas pressure on the characteristics and lifetime in the high voltage triode setup. Current-voltage-characteristics at different pressure levels are recorded and show a decreasing emission current with rising pressure. This decrease can be explained by an increase of the work function and charging of the emitter surface caused by adsorbates. The emission current can be restored to its initial value by heating of the FEA up to 110 °C during active emission. With this regeneration procedure, an extended lifetime from about 20 h to 440 h at a residual gas pressure of 10−5 mbar is achieved. Y1 - 2017 U6 - https://doi.org/10.1063/1.4987134 VL - 122 ER - TY - JOUR A1 - Kleshch, Victor I. A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Orekhov, Anton S. A1 - Ivanov, Victor E. A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Obraztsov, Alexander N. T1 - A Comparative Study of Field Emission from Pristine, Ion-treated and Tungsten Nanoparticle-decorated p-type Silicon Tips JF - Physica Status Solidi B N2 - The field electron emission characteristics of individual tips of a silicon field emitter array are analyzed. The array of conical‐shaped tips is fabricated on a p‐type silicon wafer by using reactive ion etching and sharpening oxidation. The tips are decorated with single tungsten nanoparticles at their apexes. Furthermore, the focused ion beam is also used to increase surface conductivity of some of the tips. Comparative measurements of field emission are performed by using the scanning anode probe field emission microscopy technique. All types of tips demonstrated emission activation consisting of a sudden current increase at a certain value of the applied voltage. Compared to the pristine tips, a noticeable reduction of the saturation effect in the current–voltage characteristics and a smaller light sensitivity for the decorated tips is found. For ion‐treated tips, saturation effects and light sensitivity are completely suppressed. Scanning electron microscopy observations reveal the formation of single nanoscale protrusions extending from the metal particles and from the apexes of bare ion‐treated tips after exposure under strong electric fields during the field emission measurements. The influence of protrusions growth on characteristics of silicon field emitter arrays is discussed. Y1 - 2019 U6 - https://doi.org/10.1002/pssb.201800646 VL - 256 IS - 9 PB - Wiley ER - TY - JOUR A1 - Langer, Christoph A1 - Bomke, Vitali A1 - Hausladen, Matthias A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Bachmann, Michael A1 - Schreiner, Rupert T1 - Silicon Chip Field Emission Electron Source Fabricated by Laser Micromachining JF - Journal of Vacuum Science & Technology B N2 - The components for a silicon chip electron source were fabricated by laser micromachining using pulsed laser ablation and wet chemical cleaning and etching dips. The field emission electron source consists of a silicon field emission cathode with 4 × 4 conical shaped emitters with a height of 250 μm and a tip radius of about 50 nm, a 50 μm thick laser-structured mica spacer, and a silicon grid electrode with a grid periodicity of 200 μm and a bar width of 50 μm. These three components are combined to a single chip with the size of 14 × 10 mm2 and the thickness of 1 mm to form the electron source. Several of these devices were characterized in ultrahigh vacuum. Onset voltages of about 165 V and cathode currents of about 15 μA for voltages lower than 350 V were observed. Operating the electron source with an anode voltage of 500 V and an extraction grid voltage of 300 V yielded a cathode current of 4.5 μA ± 8.9%, an anode current of 4.0 μA ± 9.6%, and a corresponding grid transmittance of 89%. Regulating the anode current by the extraction grid voltage, an extremely stable anode current of 5.0 μA ± 0.017% was observed. A long-term measurement over 120 h was performed, and no significant degradation or failure was observed. KW - Ultra-high vacuum KW - Field emitter arrays KW - Etching KW - Electrical properties and parameters KW - Electron sources KW - Laser ablation KW - Laser micromachining KW - Silicon chip KW - Triodes Y1 - 2020 U6 - https://doi.org/10.1116/1.5134872 VL - 38 IS - 1 PB - AIP Publishing ER - TY - JOUR A1 - Breuer, Janis A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Pahlke, Andreas A1 - Edler, Simon A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk T1 - Extraction of the current distribution out of saturated integral measurement data of p-type silicon field emitter arrays JF - Journal of Vacuum Science and Technology B N2 - At the moment, only complicated techniques are known for the determination of array properties of field emitter arrays such as the number of active tips, the current distribution, or the individual tip radii. In this work, a method for extracting these parameters from integral measurement data is presented. A model describing the characteristics of a single emitter, including the saturation as a function of the applied voltage and the emitter radius, is developed. It is shown that experimental data of field emitter arrays can be represented as the sum of these functions and the characteristic parameters can be fitted to field emission data of an array. Using this method, the values of the radii as well as the parameters of distribution models can be determined directly. Analysis of experimental data from p-type Si emitter arrays shows that only 1–2% of the tips contribute significantly. Y1 - 2018 U6 - https://doi.org/10.1116/1.5035189 VL - 36 IS - 5 PB - AIP Publishing ER - TY - JOUR A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter T1 - Extraction of the characteristics of current-limiting elements from field emission measurement data JF - Journal of Vacuum Science & Technology B N2 - In this contribution, the authors will present an algorithm to extract the characteristics of nonideal field emission circuit elements from saturation-limited field emission measurement data. The method for calculating the voltage drop on current-limiting circuit elements is based on circuit theory as well as Newton's method. Since the only assumption the authors make on the current-limiting circuit is a connection in series, this method is applicable to most field emission data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters as well as the parameter correlations are fully taken into account throughout the algorithm. N-type silicon samples with varying external serial resistors are analyzed. All results show a good agreement to the nominal resistor values. Additionally, several p-type samples are analyzed, showing a diodelike behavior. The extracted current-limiting characteristics of the p-type samples are in good agreement with a pn-junction model. The stability of the emission current of the p-type samples is measured by constant voltage measurements and compared to the extracted current-limiting characteristics. The application of the algorithm to measurement data shows that the given algorithm is a valuable tool to analyze field emission measurement data influenced by nonemissive processes. Y1 - 2017 U6 - https://doi.org/10.1116/1.4971768 VL - 35 IS - 2 ER - TY - JOUR A1 - Prommesberger, Christian A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Schreiner, Rupert T1 - Regulation of the Transmitted Electron Flux in a Field-Emission Electron Source Demonstrated on Si Nanowhisker Cathodes JF - IEEE Transactions on Electron Devices N2 - We report on a method to stabilize the transmitted electron flux in a field-emission electron source using an external regulation circuit. The electron source was realized with an array of silicon (Si) nanowhiskers on the top of elongated pillar structures, a mica spacer, and an extraction grid made of Si. As for most applications, the emitted electron current from the cathode is not as crucial as the transmitted electron flux through the extraction grid toward the anode. We investigated a method which allows the regulation directly by the emitted electron flux and not merely on the cathode current. By using this method, we were able to stabilize the emitted electron flux of our electron source down to values below 1%. Simultaneously, it was shown that there is the possibility to stabilize the influencing value in the real application as well. The effectiveness of this method was demonstrated successfully with an X-ray source setup. The measured X-ray photon count rate was stabilized to a standard deviation of 0.30% at a pressure of 1 × 10 -7 mbar. Even in harsh environment of 2 × 10 -5 mbar, a stabilization of the X-ray photon count rate down to a value of 0.63% was achieved. KW - Cathodes KW - Nanostructured devices KW - Current measurement KW - Photonics KW - Electron sources KW - Emissions KW - Voltage measurement Y1 - 2017 U6 - https://doi.org/10.1109/TED.2017.2763239 SN - 5128-5133 VL - 64 IS - 12 ER - TY - JOUR A1 - Mingels, S. A1 - Porshyn, V. A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter T1 - Photosensitivity of p-type black Si field emitter arrays JF - Journal of Applied Physics N2 - We have investigated the properties of black Si field emitter arrays under strong electric fields and laser illumination. A low onset field of 1.8 MV/m for an emission current of 1 nA was obtained. A pronounced saturation region of the dark and photo-enhanced current was observed, which provided a short-term stability of 0.1% at 0.4 μA and 0.7% at 1.0 μA, respectively. As maximum value for the photosensitivity, an on-off current switching ratio of 43 reaching about 13 μA was achieved at a laser power of 15 mW. Electron spectra in the dark and under laser illumination are presented, showing a current and light-sensitive voltage drop across the emitters as well as hints for hot electron emission. Y1 - 2016 U6 - https://doi.org/10.1063/1.4948328 VL - 119 IS - 16 ER - TY - GEN A1 - Düsberg, Felix A1 - Bachmann, Michael A1 - Edler, Simon A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert A1 - Bunert, Erik A1 - Wendt, Cornelius A1 - Zimmermann, Stefan T1 - Novel Non-Radiative Electron Source T2 - 43rd International Symposium of Capillary Chromatography & 16h GC x GC Symposium 2019 N2 - Recently a non-radioactive electron capture detector based on a thermionic electron emitter has been demonstrated [1]. Using field emitter arrays (FEAs) would yield non-radioactive portable low power devices with fast switching capability. By combining FEAs with a vacuum-sealed housing and an electron transparent membrane window, such electron sources can be operated in an ambient pressure environment. Y1 - 2019 ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Improvement of Homogenity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching JF - Advances in materials science and engineering N2 - The homogeneity of emitters is very important for the performance of field emission (FE) devices. Reactive-ion etching (RIE) and oxidation have significant influences on the geometry of silicon tips. The RIE influences mainly the anisotropy of the emitters. Pressure has a strong impact on the anisotropic factor. Reducing the pressure results in a higher anisotropy, but the etch rate is also lower. A longer time of etching compensates this effect. Furthermore an improvement of homogeneity was observed. The impact of uprating is quite low for the anisotropic factor, but significant for the homogeneity. At low power the height and undercut of the emitters are more constant over the whole wafer. The oxidation itself is very homogeneous and has no observable effect on further variation of the homogeneity. This modified fabrication process allows solving the problem of inhomogeneity of previous field emission arrays. Y1 - 2014 U6 - https://doi.org/10.1155/2014/948708 VL - 2014 PB - Hindawi ER - TY - CHAP A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bachmann, Michael A1 - Müller, Günter A1 - Schreiner, Rupert T1 - High aspect ratio silicon tip cathodes for application in field emission electron sources T2 - 2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland N2 - Precisely aligned arrays of sharp tip structures on top of elongated pillars were realized by using an improved fabrication process including an additional inductively-coupled-plasma reactive-ion etching step. Arrays of n-type and p-type silicon with 271 tips have been fabricated and investigated. Those structures have a total height of 5–6 µm and apex radii less than 20nm. Integral field emission measurements of the arrays yielded low onset-fields in the range of 8–12V=µm and field enhancement factors between 300 and 700. The I-E curves of n-type structures showed the usual Fowler-Nordheim behaviour, whereas p-type structures revealed a significant saturation region due to the limited number of electrons in the conduction band and a further carrier depletion effect caused by the pillar. The maximum integral current in the saturation region was 150 nA at fields above 30V=µm. An excellent stability of the emission current of less than ± 2% fluctuation was observed in the saturation region. For n-type Si a maximum integral current of 10 µA at 24V=µm and an average current stability with a fluctuation of ± 50% were measured. KW - Current measurement KW - Etching KW - FABRICATION KW - field emission KW - field emitter array KW - GEOMETRY KW - Iron KW - Sensor arrays KW - silicon KW - silicon tip Y1 - 2014 U6 - https://doi.org/10.1109/IVNC.2014.6894824 SP - 222 EP - 223 PB - IEEE ER - TY - CHAP A1 - Mingels, S. A1 - Porshyn, V. A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Günter A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Lutzenkirchen-Hecht, Dirk T1 - Photo-enhanced field emission properties of p-doped black Si arrays T2 - 2016 29th International Vacuum Nanoelectronics Conference (IVNC), 11-15 July 2016, Vancouver, BC, Canada N2 - We have carried out systematic investigations of p-type black Si field emitter arrays under laser illumination. As expected the current-voltage characteristic revealed a strong saturation providing a high photosensitivity, which had a maximum on-off ratio of 43 at a maximum current of 13 μA. The saturation current was stable in the dark as well as under illumination with fluctuations <;0.7%. Results from time-resolved measurements of the photo-sensitivity showed a rather fast response but a long decay time. Electron spectra in the dark and under laser illumination revealed the origin of the emission. KW - black Si KW - Decision support systems KW - photo-enhanced field emission Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551447 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Bieker, Johannes A1 - Roustaie, Farough A1 - Schlaak, H. F. A1 - Langer, Christoph A1 - Schreiner, Rupert T1 - Field emission characterization of in-situ deposited metallic nanocones T2 - 2017 30th International Vacuum Nanoelectronics Conference (IVNC), 10-14 July 2017, Regensburg, Germany N2 - An in-situ fabrication technique based on ion track etched template electrodeposition of metallic nanocones was used for the production of field emitter cathodes. Gold nanocones with a height of 24 microns, a base diameter between 3 to 4 microns and a tip diameter below 300 nanometers were deposited on a circular electrode with a diameter of 2.5 mm. The integral field emission (FE) measurements of samples with cone densities of 6 · 104 cones/cm2 (sample A) and 1 · 106 cones/cm2 (sample B) yielded in a maximum current of 37.5 μA at an applied field of 12.5 V/μm for sample A and 29.1 μA at 9.4 V/μm for sample B. The stability of emission current was investigated for over 48 hours and no degradation was observed. KW - CATHODES KW - Current measurement KW - FABRICATION KW - field emission KW - ion track template KW - Ions KW - Iron KW - nanocones KW - Vacuum technology KW - Voltage measurement Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051571 SP - 120 EP - 121 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Muller, F. A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter T1 - Comparison of integral and local field-emission properties of Mo-coated p-Si tip arrays T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Silicon tip arrays were fabricated by means of reactive ion etching followed by oxidation for final sharpening and molybdenum thin film coating. The field-emission (FE) properties of these Mo-coated p-Si tip arrays were systemically investigated by different measurement techniques. Integral measurements in diode configuration yielded a turn-on field (for 1 nA) of 22 V/μm and nearly stable FE currents up to 6.6 μA at 38 V/μm. The effective field enhancements factor extracted from the FN plots is about 180. Detailed investigations of these FE arrays were also performed by means of field emission scanning microscopy combined with electron microscopy. A rather limited efficiency of the tips (50% at 1500 V) and FE homogeneity (180 nA at 700 V) might be correlated with the varying morphology of the tips and the presence of oxides. Local I-V measurements of selected single tips revealed both activation and deactivation effects, which finally resulted in nearly reproducible I-V curves. Current stability measurements at a constant voltage showed rather large fluctuations (0.1-1 μA) of the FE current, which could be reduced up to 1.7% by using of a PID-regulated voltage source. SEM images showed unchanged tip shape after the current processing. KW - CATHODES KW - Coatings KW - Current measurement KW - field emission KW - Iron KW - Mo-coated KW - p-Si tip KW - Scanning electron microscopy KW - silicon KW - tip arrays KW - Vacuum technology Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225579 SP - 192 EP - 193 PB - IEEE ER - TY - JOUR A1 - Serbun, Pavel A1 - Bornmann, Benjamin A1 - Navitski, Aliaksandr A1 - Müller, Günter A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Stable field emission of single B-doped Si tips and linear current scaling of uniform tip arrays for integrated vacuum microelectronic devices JF - Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics N2 - Advanced Si-based semiconductor technology is most suitable to fabricate uniform nanostructures as integrated field emitter arrays for novel vacuum electronic devices. In order to improve the field emission homogeneity and stability of p-type silicon tip arrays for pulsed sensor applications, the authors have systematically studied the influence of the fabrication parameters on the tip shape and on the specific operating conditions. Based on detailed design calculations of the field enhancement, they have fabricated two series of hexagonal arrays of B-doped Si-tips in a triangular arrangement. The first (second) type contains three (four) patches with different number of tips (1, 91, 547 and 1, 19, 1027, 4447 for the first and second type, respectively) of about 1 (2.5) μm height, ∼20 (20) nm apex radius, and 20 (10) μm pitch. The field emission properties of both individual tips and complete arrays were investigated with a field emission scanning microscope at a pressure of 10−9 mbar. The current plateau of these tips typically occurs at about 10 (3) nA and around 65 (25) V/μm field level. In this carrier saturation range, single tips provide the highest current stability (<5%) and optical current switching ratio (∼2.5). Fairly homogeneous emission of the tip arrays leads to an undershooting of the expected linear scaling of the mean plateau current as well as to a much improved current stability (<1%). Y1 - 2013 U6 - https://doi.org/10.1116/1.4765088 VL - 31 IS - 2 PB - AIP Publishing ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert A1 - Mingels, S. A1 - Porshyn, V. A1 - Serbun, Pavel A1 - Müller, Günter T1 - Field emission from surface textured GaN with buried double-heterostructures T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - In this contribution we report on field emission (FE) cathodes based on thin-film LED-technology and surface texturing. The FE cathode can be used both as an n-GaN cathode with an electrical contact at the top side metallization as well as a pn-GaN diode contacting only the p-GaN layer at the bottom side of the structure. The local and integral FE properties of the textured surface of the LED structure were investigated. For n-GaN an integral emission current up to 1.0 μA at an electric field of 19 V/μm was achieved. The pn-GaN diode measurements showed an integral current saturation behavior with two orders of magnitude lower FE currents. Regulated voltage scans obtained by FE scanning microscopy revealed a well-distributed emission over the whole cathode area. Measurements under pulsed tunable laser illumination and moderate electric fields indicated charge carrier generation in the buried double-heterostructures at photon energies below 3.5 eV besides normal photoemission above 4.1 eV. KW - CATHODES KW - Current measurement KW - Electric fields KW - field emission KW - Gallium nitride KW - GaN KW - Iron KW - Light emitting diodes KW - photoemission KW - Surface texture Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225548 SP - 106 EP - 107 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Müller, F. A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter T1 - Enhanced field emission from p-doped black silicon on pillar structures T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Aligned square arrays of black silicon (b-Si) on top of pillars were fabricated on p-type silicon substrate by a deep-etching step combined with a b-Si process. Two 10×10 arrays with pillar heights of 8 μm and 20 μm and one b-Si reference sample without pillars were investigated. Integral field emission (FE) measurements of the arrays yielded rather low onset-fields between 6.4 V/μm and 13.5 V/μm and field enhancement factors between 430 and 800. The I-V curves showed typical Fowler-Nordheim behavior for low fields, whereas a saturation region was observed at higher fields. The maximum integral current in the saturation region was 8 μA at a field of 20 V/μm. The stability of the emission current was investigated over 3 hours and revealed moderate fluctuations of ± 8% in the saturation region. Voltage scans showed well-aligned FE from nearly all pillars. KW - black silicon KW - CATHODES KW - Current measurement KW - Etching KW - FABRICATION KW - field emission KW - field emitter array KW - Iron KW - silicon KW - Vacuum technology Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225547 SP - 104 EP - 105 PB - IEEE ER - TY - CHAP A1 - Kleshch, Victor I. A1 - Serbun, Pavel A1 - Orekhov, Anton A1 - Lützenkirchen-Hecht, Dirk A1 - Obraztsov, Alexander N. A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Lutzenkirchen-Hecht, Dirk T1 - Field emission properties of p-type silicon tips decorated with tungsten nanoparticles T2 - 2017 30th International Vacuum Nanoelectronics Conference (IVNC), 10-14 July 2017, Regensburg, Germany N2 - An array of conical-shaped p-type silicon tips was fabricated by using reactive ion etching and sharpening oxidation. The apex of each tip was decorated by a tungsten hemispherical nanoparticle. Field emission properties of the tips were measured by a tungsten-needle anode positioned above the tip apex. Tips decorated with tungsten nanoparticles demonstrated a smaller saturation region in current-voltage characteristics compared to the pristine tips. An emission activation process, which consisted in sudden current increase at certain value of applied voltage, was observed for the decorated silicon tips. This behavior was explained by the formation of vertical protrusions extending from the metal particles revealed by scanning electron microscopy after field emission experiments. KW - Current measurement KW - field emission KW - Ions KW - Iron KW - metal nanoparticles KW - nanoparticles KW - p-type silicon KW - Scanning electron microscopy KW - silicon KW - Tungsten Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051580 SP - 138 EP - 139 PB - IEEE ER - TY - JOUR A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Simulation and Fabrication of Silicon Field Emission Cathodes for Cold Electron Sources JF - Advanced Materials Research N2 - We report on the simulation and fabrication of nanostructured silicon surfaces for field emission (FE) applications, e.g. ionization sensors and x-ray tubes. For the design and optimization of field-emitting silicon structures, the influence of the geometric parameters like tip height, apex radius, aperture angle and curvature shape on the field enhancement factor was investigated by simulation using finite element method. A universal geometric model which describes the real geometry of our silicon structures sufficiently accurate was taken for modeling a variety of different silicon tip structures as well as ridge structures. While a high dependency of the field enhancement on the aspect ratio and the aperture angle was found, the simulations show that the elliptic curvature affects the field enhancement only marginally. Finally, an improved process for fabrication of such silicon structures on n-type as well as p-type substrate is described, using reactive ion etching with adjustable anisotropy, wet thermal oxidation and wet etching. KW - field emission cathodes KW - field enhancement factor KW - silicon field emitter Y1 - 2014 U6 - https://doi.org/10.4028/www.scientific.net/amr.1024.48 VL - 1024 SP - 48 EP - 51 ER - TY - CHAP A1 - Mingels, Stephan A1 - Bornmann, Benjamin A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Güntner A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert ED - Scholl, Caitlin ED - Schaa, Volker R.W. T1 - Electric Field Dependence of Photoemission from n- and p-type Si Crystals T2 - Proceedings, 35th International Free Electron Laser Conference (FEL 2013) : New York, NY, USA, August 26-19, 2013 N2 - The performance of free electron lasers depends on the brilliance of the electron source. Nowadays photo-cathodes (e.g. Cs2Te) are used despite of their high emittance. To develop robust and more brilliant cathodes we have built up an UHV system which enables systematic photoemission (PE) measurements with a tunable pulsed laser (hv) at high electric fields (E). First results on Au and Ag crystals revealed only low quantum efficiency (QE) due to fast electron relaxation. Hence, we have started QE(hv,E) investigations on n- and p-Si wafers. Resonant PE was observed above as well as below the work function O, which can be assigned to optical transitions in the electronic band structure or explained by thermally excited states at the bottom of the conduction band. As expected, only low QE values were achieved even for n-Si probably due to surface oxide. Moreover, a significant rise of the QE peaks above O were obtained for n-Si at E >8 MV/m but limited by the occurrence of parasitic field emission from dust particles. Y1 - 2013 SN - 9783954501267 SP - 339 EP - 343 PB - Curran CY - Red Hook, NY ER - TY - JOUR A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Improvement of Homogeneity and Aspect Ratio of Silicon Tips for Field Emission by Reactive-Ion Etching JF - Advances in Materials Science and Engineering. Special issue: Advances in Smart Materials and Applications N2 - The homogeneity of emitters is very important for the performance of field emission (FE) devices. Reactive-ion etching (RIE) and oxidation have significant influences on the geometry of silicon tips. The RIE influences mainly the anisotropy of the emitters. Pressure has a strong impact on the anisotropic factor. Reducing the pressure results in a higher anisotropy, but the etch rate is also lower. A longer time of etching compensates this effect. Furthermore an improvement of homogeneity was observed. The impact of uprating is quite low for the anisotropic factor, but significant for the homogeneity. At low power the height and undercut of the emitters are more constant over the whole wafer. The oxidation itself is very homogeneous and has no observable effect on further variation of the homogeneity. This modified fabrication process allows solving the problem of inhomogeneity of previous field emission arrays. Y1 - 2014 U6 - https://doi.org/10.1155/2014/948708 SN - 1687-8442 SN - 1687-8434 VL - 2014 SP - 1 EP - 6 PB - Hindawi ER - TY - CHAP A1 - Schreiner, Rupert A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Mingels, S. A1 - Serbun, Pavel A1 - Müller, Güntner T1 - Field emission from surface textured extraction facets of GaN light emitting diodes T2 - 26th International Vacuum Nanoelectronics Conference (IVNC), 8-12 July 2013, Roanoke, VA, USA N2 - We report on the field emission properties of GaN LED surfaces. The textured extraction facet acts both as light scattering layer in order to increase the light extraction efficiency of the LED as well as nanostructured cathode surface for the field emission (FE) of electrons. The LED emits blue light with a peak wavelength of around 450 nm. The FE properties were investigated by a scanning microscope. Integral measurements as well as regulated voltage scans for 1 nA FE current over an area of 400 * 400 µm2were used to investigate both overall and local FE properties. A high number of well-distributed emitters with an average field enhancement factor ß of 85 and stable integral emission currents up to 100 µA at an electric field of   80 V/µm (Øanode= 880 µm) were found. Photo-field-emission spectroscopy (PFES) using a tunable pulsed laser revealed an enhanced photo absorption of the InGaN/GaN quantum well structures near the emission wavelength of the LED (<3.5 eV), whereas at high photon energies (>4.1 eV) photoemission from the GaN surface was observed. KW - Gallium nitride KW - Iron KW - Light emitting diodes KW - Cathodes KW - Surface texture KW - Surface waves KW - Photonics Y1 - 2013 U6 - https://doi.org/10.1109/ivnc.2013.6624721 PB - IEEE ER - TY - JOUR A1 - Dams, Florian A1 - Navitski, Aliaksandr A1 - Prommesberger, Christian A1 - Serbun, Pavel A1 - Langer, Christoph A1 - Müller, Günter A1 - Schreiner, Rupert T1 - Homogeneous Field Emission Cathodes With Precisely Adjustable Geometry Fabricated by Silicon Technology JF - IEEE Transactions on Electron Devices N2 - Silicon-based cathodes with precisely aligned field emitter arrays of sharp tips applicable for miniaturized electron sources were successfully fabricated and characterized. This was made possible by an improved fabrication process using wet thermal oxidation, wet etching, and reactive-ion etching steps with adjustable anisotropy. As substrate materials, both p-doped silicon and n-doped silicon were used. The cathode chips contain about 3 × 10 5 Si tips/cm 2 in a triangular array with tip heights of 2.5 μm, tip radii of less than 30 nm, and spacing of 20 μm. Well-aligned field emission (FE) and excellent homogeneity from all tips (i.e., 100% efficiency) and maximum stable currents of typically 0.1 μA (0.6 μA) for p (n)-type Si were reproducibly achieved. The current-voltage characteristics of the p-Si tips exhibit the expected saturation at around 10 nA with around ten times better current stability, whereas the n-Si tips show the usual Fowler-Nordheim behavior. Additional coating of the Si tips with 5-nm Cr and 10-nm Au layers resulted in improved stability and at least five times higher average FE current limits (about 3 μA) at about 30% higher operation voltage. KW - cathodes KW - electron field emission KW - elemental semiconductors KW - Field emission (FE) cathodes KW - field emitter array (FEA) KW - miniaturized electron sources KW - oxidation KW - silicon KW - silicon tips KW - sputter etching Y1 - 2012 U6 - https://doi.org/10.1109/TED.2012.2206598 SN - 0018-9383 SN - 1557-9646 VL - 59 IS - 10 SP - 2832 EP - 2837 PB - IEEE ER - TY - CHAP A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Serbun, Pavel A1 - Lützenkirchen-Hecht, Dirk A1 - Müller, Güntner A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Photosensitivity of electron field emission from B-doped Si-tip arrays T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) ; Jeju, Korea (South), 09.07.2012 - 13.07.2012 N2 - The electron current from field-emitting B-doped Si-tip arrays under illumination was studied. An improved cathode design with a patch of 271 tips yielded a reproducible cathode current between 0.2-2000 nA in the electric field range of 3.8-6.6 V/μm. The plateau in the Fowler-Nordheim plot shows the actual carrier depletion and leads to a very stable emission at ~1 μA with a current noise of less than 3.3 %. Color-filtered halogen lamp illumination was used to investigate the photo-sensitivity of the saturation current. The intensity-normalized current switching ratio increases nonlinearly with the photon energy. This hints either for secondary generation in the conduction band or deeper valence band excitation. The first is supported by a rough estimation of the quantum efficiency. Further experiments with a tunable laser and electron spectroscopy are planned. KW - boron KW - electron field emission KW - electron spectroscopy KW - elemental semiconductors KW - field emitter arrays KW - halogens KW - lamps KW - lighting KW - p-doped Si tips KW - photosensitivity KW - silicon KW - valence bands Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316980 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Theoretical investigations into the field enhancement factor of silicon structures T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) - Jeju, Korea (South), 09.- 13.07.2012 N2 - In order to optimize our field-emitting silicon structures, the influence of geometric parameters like aspect ratio, aperture angle and curvature on the field enhancement factor was investigated by finite element simulations. A universal geometric model consisting of a rounded triangle and elliptic curvatures was taken for modeling a variety of different silicon tip as well as ridge structures. Whereas, a high dependency of the field enhancement on the aperture angle was found, the simulations show that the elliptic curvature affects the field enhancement only marginal. KW - elemental semiconductors KW - field emitter arrays KW - field enhancement factor KW - finite element analysis KW - silicon KW - silicon field emitter Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316886 SN - 2380-6311 SN - 2164-2370 PB - IEEE CY - Piscataway, N.J. ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Influence of reactive ion etching parameters on the geometry of silicon tip cathodes for field emission T2 - Applied Research Conference 2013, ARC 2013 : 17th and 18th October 2013, Deggendorf Y1 - 2013 SN - 978-3-8440-2274-2 SP - 67 EP - 69 PB - Shaker CY - Aachen ER - TY - CHAP A1 - Schreiner, Rupert A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bornmann, Benjamin A1 - Navitski, Aliaksandr A1 - Müller, Güntner T1 - Highly uniform and stable electron field emission from B-doped Si-tip arrays for applications in integrated vacuum microelectronic devices T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) - Jeju, Korea (South), 09.07. - 13.07.2012 N2 - In order to improve the uniformity and field emission stability of p-type silicon tip arrays for pulsed sensor applications, we have systematically studied the influence of the fabrication parameters on the tip shape and the specific operating conditions. Based on detailed design calculations of the field enhancement, we have fabricated a series of hexagonal arrays of B-doped Si-tips in a triangular arrangement, each containing a different number of tips (91, 575 and 1300) of 1 μm height, 20 nm apex radius, and 20 μm pitch. The field emission properties of both individual tips and complete arrays were investigated with by field emission scanning microscopy. The current plateaus of these tips typically occur at about 10 nA and 60 V/μm field level. In this carrier depletion range, single tips provide the highest current stability (<; 4%) and optical current switching ratios of ~2.5. Rather homogeneous emission of the tip arrays leads to an almost linear scaling of the saturation current (2 nA/tip) and to a much improved current stability (<; 1%) measured over 1 hour. KW - boron KW - circuit stability KW - elemental semiconductors KW - field emission ion microscopy KW - field emitter arrays KW - integrated optoelectronics KW - microfabrication KW - microsensors KW - optical switches KW - silicon tips Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316857 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE CY - Piscataway, NJ. ER - TY - CHAP A1 - Serbun, Pavel A1 - Navitski, Aliaksandr A1 - Müller, Güntner A1 - Schreiner, Rupert A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian T1 - Scaling of the field emission current from B-doped Si-tip arrays T2 - 25th International Vacuum Nanoelectronics Conference (IVNC) ; Jeju, Korea (South), 09.07.2012 - 13.07.2012 N2 - We have fabricated a test chip with various hexagonal arrays of B-doped Si tips (height ~ 3 μm, apex radius <; 30 nm, number 1-4447, resistivity 4 Ωcm, 100 orientation) in triangular arrangement (pitch 10 μm, density 1.16×10 6 cm -2 ) in order to systematically investigate the field emission current scaling with the number N of tips. Regulated voltage scans for 1 nA revealed rather efficient emission from nearly all tips of the arrays at an average field of 15 V/μm. The expected current plateau was always obtained at fields around 20 V/μm, but its width strongly increased with N. In this carrier depletion range, the single tip provided a much higher stability (<; 5%) of the current (2-3 nA) than at lower (>; 50 %) and higher currents (>; 30%). Integral current measurements of the hexagonal arrays resulted in a statistically improved current stability (<; 1%) but only a weak increase of the total current with N 0.28 yet. These results will be discussed with respect to the remaining inhomogeneity of the tips. KW - Anodes KW - B-doped KW - boron KW - Current measurement KW - current scaling KW - electron field emission KW - elemental semiconductors KW - field emitter arrays KW - Iron KW - Nonhomogeneous media KW - silicon KW - Voltage control Y1 - 2012 SN - 978-1-4673-1984-3 SN - 978-1-4673-1983-6 SN - 978-1-4673-1982-9 U6 - https://doi.org/10.1109/IVNC.2012.6316965 SN - 2380-6311 SN - 2164-2370 SP - 1 EP - 2 PB - IEEE CY - Piscataway, N.J. ER - TY - CHAP A1 - Serbun, Pavel A1 - Porshyn, V. A1 - Müller, Günter A1 - Lützenkirchen-Hecht, Dirk A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Field emission behavior of single n- and p-type black Si pillar structures T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - We have investigated the properties of single n- and p-type black silicon (b-Si) pillars with a height of 20 μ m under strong electric field and halogen lamp or laser illumination. For both type of b-Si pillar structures, I-V measurements revealed strong activation effects, which consisted in sudden current increases during the first up/down voltage sweeps. The maximum reproducible emission current from a single n-type b-Si pillar structure was about 15 μ A. A pronounced saturation region at 240 nA was observed for a single p-type b-Si pillar. The current fluctuation over time showed a standard deviation of 28% and 2.5% for n- and p-type single b-Si pillar structures, respectively. Optical switching under halogen lamp illumination resulted in at least 3 times higher saturation currents and showed a linear dependence of the FE current on the laser power. KW - field emission KW - black silicon KW - photoemission Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520292 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Microrods and microlines by three-dimensional epitaxially grown GaN for field emission cathodes T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - The three-dimensional epitaxial technique allows the realization of gallium nitride lines in addition to the rods. To optimize the properties of GaN-based field emission cathodes further investigations and an improvement of the epitaxial process were performed. The microrods and microlines consist of a one-order higher n-doped gallium nitride in comparison to the gallium nitride layer on the sapphire substrate. The typical height of the microrods and -lines is about 5 μm. The field emission properties of these structures were investigated in diode configuration by integral field emission measurements at pressures below 10 -9 mbar. For the microrods (microlines) a voltage of 1100 V (2000 V) was measured for a field emission current of about 0.5 μA with an onset field of about 12 MV/m (24 MV/m). Furthermore, the field enhancement factors for microrods and -lines are in the range of 300 and 200, respectively. KW - field emission KW - GaN KW - LED KW - Gallium nitride KW - Epitaxial growth Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051576 SP - 130 EP - 131 PB - IEEE ER - TY - CHAP A1 - Serbun, Pavel A1 - Porshyn, V. A1 - Lützenkirchen-Hecht, Dirk A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Photosensitivity of single silicon high-aspect-ratio tips with different doping levels T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - Photosensitivity of single lightly p-doped, highly p-doped, with an integrated p/n junction and intrinsic high-aspect-ratio (HAR) silicon tips was investigated in an ultra-high vacuum environment. The current-voltage characteristics (I-V) of the lightly doped p-type HAR tips showed a characteristic current saturation at around 10-12 nA, whereas the HAR Si tips with p/n junction showed similar saturation phenomena, however, at much smaller current values starting at ~20-30 pA. Optical switching under a halogen lamp illumination resulted in at least 2-4 times higher saturation currents and showed a linear dependence between the illumination power and the FE current, for both types of structures. In case of the highly p-doped HAR tips optical current switching effects, i. e. current saturation, were observed at rather low current levels 1-2 pA. Intrinsic HAR Si-tips showed relative unstable field emission behavior without a clear evidence of the photosensitivity. KW - field emission KW - Si p/n junction KW - p-type Si KW - photosensitivity Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520288 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Hausladen, Matthias A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Pahlke, Andreas A1 - Shamonin (Chamonine), Mikhail A1 - Schreiner, Rupert T1 - Field emission current investigation of p-type and metallized silicon emitters in the frequency domain T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - We investigated two different field emitter arrays consisting of 10×10 p-type and 10×10 undoped Au-coated high aspect ratio silicon tips. The I-V characterization of the p-type sample showed a pronounced saturation for voltages higher than 500 V and a maximum emission current of 39 nA. The metallized sample revealed a FN-like emission up to several μA. The metallized and the p-type sample operating below the saturation region showed high current fluctuations of ±16%. Whereas, the metallized sample with current regulation and the p-type sample in the saturation yielded a current stability of ±0.4% and ±0.3%, respectively. Investigations in the frequency domain revealed the for field emission typical 1/f-noise. By operating in the saturation region (p-type sample) or using an emission current regulation (metallized sample) the noise level was reduced by at least 20 dB. Finally, the p-type sample was illuminated by a light emitting diode to increase and modulate the emission current in the saturation region. The emission current was increased by a factor of 3.7 to 145 nA. With this configuration we emulated an unstable emission behavior and evaluated the performance of our emission current regulation circuit. KW - field emission KW - field emitter array KW - silicon tip KW - current fluctuation KW - current stability KW - field emission noise Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520127 PB - IEEE ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Extraction of the characteristics of limiting elements from field emission measurement data T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - In this contribution we will present an algorithm to extract the characteristics of non-Fowler-Nordheim (FN) circuit elements from saturation limited field emission (FE) measurement data. The method for calculating the voltage drop on limiting circuit elements is based on circuit theory as well as Newton's method. Since no assumption on the limiting circuit is made, this method is applicable to any FE data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters are fully taken into account throughout the algorithm. External serial resistors and a limiting p-doped substrate are analyzed, where the latter shows a diode-like behavior. Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551474 SN - 2380-6311 SP - 81 EP - 82 PB - IEEE ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Control of the electron source current T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - A control circuit to stabilize the flux of electrons transmitted through an extractor electrode is presented. By controlling the emission current a fluctuation with a standard deviation of 0.015% is observed. However, the achievable stability of the transmitted electron current is limited due to a variation of the extraction grid current ratio showing a standard deviation of 4.33%. By regulating the difference of the emission current and the extraction grid current an improved stability of the transmitted electron current down to a standard deviation of 0.280% is observed. Even with operation at 2 × 10 -5 mbar a standard deviation of 0.558% is achieved. KW - Standards KW - Circuit stability KW - Power system stability KW - Current measurement KW - Voltage measurement KW - Electron sources KW - Stability analysis Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051550 SP - 66 EP - 67 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Realisierung von Siliziumspitzenarrays mit integrierter Gate-Elektrode für Anwendungen in der Vakuumsensorik T2 - 4. Landshuter Symposium Mikrosystemtechnik, Mikrosystemtechnik als Schlüsseltechnologie der Systemintegration, Tagungsband zum Symposium 12./13. März 2014, Hochschule Landshut N2 - Bei der Feldemission (kalte Emission) können Elektronen durch ein starkes elektrisches Feld eine glatte und leitende Oberfläche verlassen. Die Elektronen tunneln dabei durch eine Potentialbarriere, deren Breite durch ein äußeres elektrisches Feld verkleinert wird. Durch das Hinzufügen einer integrierten Gate-Elektrode um eine Siliziumspitze kann die notwendige Einsatzspannung für Feldemission deutlich gesenkt werden. Zwischen Si-Kathode und Gate-Elektrode befindet sich dabei eine Isolationsschicht, die höchste Anforderungen bezüglich der elektrischen Durchbruchsfestigkeit erfüllen muss. Mit einer Kombination aus Trocken- (Schichtdicke 50 nm) und Feuchtoxid (Schichtdicke 950 nm) konnte eine Isolationsschicht entwickelt werden, die im integrierten Aufbau eine minimale Durchbruchsfeldstärke von 3,2 MV/cm aufweist. Für die Realisierung von Siliziumkathoden mit integrierter Gate-Elektrode wurde ein bereits bestehender Herstellungsprozess um zusätzliche Prozessschritte erweitert. Die Übertragung der lateralen Position der Spitze erfolgt durch Strukturierung des Umkehrlacks AZ5214 und einer RIE-Ätzung der zuvor hergestellten SiO2-Schicht. Nach dem Entfernen der Lackschicht wird die vertikale Struktur der Siliziumspitzen durch einen RIE-Ätzprozess mit den Prozessgasen SF6 und O)2 realisiert. Aus einer thermischen Oxidation bei 940 °C resultiert anschließend die Isolationsschicht zwischen Si-Kathode und Gate-Elektrode . Gleichzeitig wird diese Anschärfeoxidation auch zur Realisierung der endgültigen Spitzengeometrie verwendet. Durch die lithographische Strukturierung des Photolacks AZ5214 kann dabei die Fläche der aufgedampften Gate-Elektrode festgelegt werden. Die Gate-Elektrode wird in einem selbstjustierenden Prozessschritt exakt konzentrisch um die Si-Spitze aufgedampft. Der gerichtete Aufdampfprozess bewirkt eine Abschattung, so dass das Oxidplättchen nicht komplett von Metall ummantelt wird. Die Opferschicht aus Photolack wird mit den nicht benötigten Metallflächen in einem Lift-off-Prozess entfernt. KW - elektrischer Durchbruch KW - Feldelektronenemission KW - Halbleiterschicht KW - Isolierschicht KW - Kathode KW - Silicium KW - Vakuumsensor Y1 - 2014 SN - 978-3-9812696-5-9 SP - 36 EP - 41 CY - Landshut ER - TY - CHAP A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Mecani, Mirgen A1 - Huang, Yifeng A1 - She, Juncong A1 - Schreiner, Rupert ED - Tiginyanu (Ed.), Ion M. T1 - Field emission properties of ring-shaped Si ridges with DLC coating T2 - Proc. SPIE 10248, Nanotechnology VIII, 102480H (30 May 2017) N2 - We report on the fabrication and the emission characterization of single ring-shaped Si ridges with a coating of diamond-like carbon (DLC). The reactive ion etching and the subsequent inductively coupled plasma step were adjusted to realize ring-shaped Si ridges with a height of 7.5 μm respectively 15 μm and an apex radius of 20 – 25 nm. The samples were coated with a DLC layer (thickness ≈ 2 – 5 nm) by a filtered cathodic vacuum arc deposition system in order to lower the work function of the emitter and to improve the field emission characteristics. The field emission characterizations were done in diode configuration with cathode and anode separated by a 50 μm thick mica spacer. A higher emission current was carried out for the ring-shaped Si ridge in comparison to the point-shaped Si tips due to the increased emission area. The highest emission current of 0.22 μA at 1000 V was measured on a DLC-coated sample with the highest aspect ratio. No degradation of the emission current was observed in the plateau regime during a measurement period of 6 h. Finally, no decreasing performance of the field emission properties was found due to changes in the geometry or destructions. KW - Etching KW - Scanning electron microscopy KW - Silicon carbide KW - Carbon KW - Mica KW - Oxides Y1 - 2017 U6 - https://doi.org/10.1117/12.2265627 VL - 102480H PB - Society of Photo-Optical Instrumentation Engineers (SPIE) ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Sellmair, J. T1 - Nano Emitters on Silicon Pillar Structures generated by a Focused Electron Beam Induced Deposition T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - Nano emitters were deposited by focused electron beam induced deposition of Trimethyl-(methylcyclopentadienyl)platinum(IV) on top of silicon pillars. The nano emitters were exactly positioned in the center on the top of up to four pillars of a quadratic arranged array of sixteen pillars with a pitch of 50 μm. Integral field emission measurements were performed in a diode configuration with a 50 μm mica spacer in a vacuum chamber at pressures of about 10 -9 mbar. The Fowler-Nordheim plots show a linear behavior, like expected for an n-type silicon material and a metal needle. The I-V measurement of the most promising sample shows an integral emission current up to 2 μm at a voltage of 600 V (12 MV/m) and an onset voltage for a current of 1 nA of about 300 V. KW - field emission KW - nano emitter KW - focused electron beam induced deposition KW - MeCpPtMe3 Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520059 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Light emitting diodes based on three-dimensional epitaxial grown crystalline GaN rods T2 - 7. MikroSystemTechnik Kongress "MEMS, Mikroelektronik, Systeme", 23.-25. Oktober 2017, München Y1 - 2017 SN - 978-3-8007-4491-6 SP - 131 EP - 134 PB - VDE-Verlag CY - München ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Field emission from three-dimensional epitaxial grown GaN-microrods T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - A novel three-dimensional epitaxial technique allows on patterned substrates the realization of gallium nitride pillars, also known as nano- and microrods. The typical dimensions of the microrods are in the range of one micron for the radius of the hexagonal footprint and about 10 μm in height. The microrods consist of a semiconductor heterostructure with an n GaN core, a n-GaN shell, a p GaN shell and an intermediate quantum well layer. The field emission properties were investigated in diode configuration by integral field emission measurements in a vacuum chamber at pressures around 10 -9 mbar. The spacer was mica with a thickness of 50 μm. A metallized fine-meshed nitride grid (or a metallized Si-grid) was used as anode. A current of about 1 μA at a voltage of 1250 V (1750 V) was measured. An onset field of about 12.5 MV/m (20 MV/m) and field enhancement factors in the range of 200 to 500 (150 to 300) were found. The investigation with the fine-meshed grid showed an expected pronounced saturation region. KW - field emission KW - GaN KW - LED Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551477 SN - 2380-6311 SP - 87 EP - 88 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert T1 - Stable and low noise field emission from single p-type Si-tips T2 - International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan N2 - Single gated p-type Si-tips with two different tip radii were fabricated. An emission current of 2.40 μA was measured for the sharp-edged tip at a voltage of 170 V. In contrast, a stable and reproducible emission behavior was observed with an increased tip radius resulting in a pronounced saturation region between 90 V and 150 V, but merely an emission current of 0.55 μA at 150 V. More remarkable is the stable emission behavior with fluctuation of ± 4 % during a measurement period of 30 minutes. The integral emission current in a homogeneous tip array (16 emitters) showed nearly the same I-V characteristics compared to the single tip and is therefore, most dominated by only a stable single tip in the array. KW - field emission KW - p-type Si-tips KW - gate-electrode KW - emission stability KW - low current fluctuations Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520018 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Field emission from black silicon structures with integrated gate electrode T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - Black silicon structures with integrated gate electrode were realized by using an improved fabrication process. An enhanced insulation layer was achieved by a combination of dry and wet oxidation, and a gold layer was evaporated as gate electrode. The black silicon structures were prepared with a RIE/ICP etching process at room temperature. Arrays of 16 and 100 apertures with buried p-doped black silicon whiskers have been fabricated. These structures have an emitter height of approximately 1.5 μm with tip radii between 5 nm and 30 nm. The whiskers are surrounded by the gate electrode in a distance of 1.5 μm. Integral field emission measurements yielded an onset voltage of 92 V for 16 apertures and 60 V for 100 apertures for an emission current of 1 nA. Maximum emission currents up to 0.2 μA were observed for the array with 100 apertures at a cathode voltage of 200 V. Stability measurements showed a current fluctuation of ± 21% at a mean value of the emission current of 12 nA over a period of 30 minutes for 16 apertures with b-Si whiskers. KW - field emission KW - black silicon KW - integrated gate electrode Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551532 SN - 2380-6311 SP - 219 EP - 220 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Huang, Yifeng A1 - She, Juncong T1 - Gated p-Si field emission cathode applied in an ionization vacuum gauge T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - A commercial Bayard-Alpert ionization vacuum gauge was equipped with a field emission electron source based on a cathode consisting of an array of 16 gated, p-doped, and DLC-coated Si-tips and characterized. An anode current of about 1.3 μA led to an ion current of 7 fA at 3×10 -7 mbar and 0.8 pA at 4×10 -5 mbar. Whereas at pressures higher than 4×10 -5 mbar the emission current of the electron source decreased, the ratio of ion and anode current remained linear. A nearly constant sensitivity of ~ 17 mbar -1 of the ionization vacuum gauge within the investigated pressure range was depicted. KW - field emission KW - field emitter array KW - Si KW - DLC KW - electron source KW - ionization vacuum gauge Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551500 SN - 2380-6311 SP - 145 EP - 146 PB - IEEE ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Benzocyclobutene as a novel integrated spacer material in a field emission electron source T2 - International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg N2 - For the realization of a miniaturized field emission electron source we tested benzocyclobutene (BCB) as a new spacer material between cathode and anode. We fabricated black silicon emitters and characterized the emission behavior with an integrated 5 μm thin and large-area spacer of BCB. The integrated BCB layer allows the realization of a compact electron source with only two components consisting of a cathode with BCB and a grid. The comparison with other spacer materials like polyimide (25 μm thickness) or mica (50 μm thickness) revealed for the cathode with BCB a significantly reduced operational voltage of 240 V for a field emission current of 1 μA. KW - field emission KW - benzocyclobutene KW - integrated spacer KW - electron source KW - black silicon Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051605 SP - 192 EP - 193 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Müller, Günter A1 - Schreiner, Rupert T1 - Spitzen- und Kantenemitter aus Silizium mit einem hohen Aspektverhältnis für Ionisationsgassensoren T2 - Mikrosystemtechnik als Schlüsseltechnologie der Systemintegration : 4. Landshuter Symposium Mikrosystemtechnik ; Tagungsband zum Symposium ; 12./13. März 2014, Hochschule Landshut N2 - Durch die Optimierung von reaktivem Ionenätzen mit induktiv gekoppeltem Plasma ist die Herstellung von verschiedenen Siliziumkathoden mit hoher Anisotropie und hohem Aspektverhältnis für Feldemissionsanwendungen möglich. Simulationen mit COMSOL Multiphysics untermauern das Potential von solchen Spitzen- und Kantenfeldemittern. Die Ergebnisse der Simulation zeigen einen zwei- bis sechsfach höheren Feldüberhöhungsfaktor der tiefgeätzten Strukturen im Vergleich zu identischen Emittern ohne zusätzliche Tiefenätzung. Feldemissionsmessungen bestätigen die Simulationsergebnisse. Der modifizierte Herstellungsprozess der Feldemitter ermöglicht somit einen zuverlässigen Betrieb von Feldemissionselektronenquellen bei kleineren makroskopischen Feldstärken. Außerdem weisen die Messungen des Emissionsstroms im Sättigungsbereich eine weitgehende Unabhängigkeit vom elektrischen Feld auf. Lokale Feldemissionsmessungen ergeben dadurch eine deutliche Stromstabilisierung, welche über große Feldstärkenbereiche konstant bleibt. Die Nutzung der HAR-Emitter (high aspect ratio) ist damit eine gute Voraussetzung für einen zuverlässigen Betrieb der Emissionskathoden bei kleinen Feldstärken für die Anwendung in Ionisationsgassensoren. KW - Emitter KW - Feldelektronenemission KW - Gassensor KW - Herstellung KW - Ionenemission KW - Silicium Y1 - 2014 SN - 978-3-9812696-5-9 SP - 28 EP - 35 PB - Cluster Mikrosystemtechnik CY - Landshut ER - TY - CHAP A1 - Schreiner, Rupert A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Bachmann, Michael A1 - Düsberg, F. A1 - Hofmann, M. A1 - Pahlke, A. A1 - Serbun, Pavel A1 - Mingels, S. A1 - Müller, Günter T1 - Semiconductor field emission electron sources using a modular system concept for application in sensors and x-ray-sources T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Semiconductor field emitters are suitable candidates for applications, which require a very stable field emission (FE) current and a high emission uniformity over the entire emission area. By using different materials and geometries, we are able to vary the FE characteristics within a wide range. Each specific application requires its own optimized design for the cathode as well as for the other parts of the FE electron source. To meet as many of these requirements as possible while using only a limited number of different prefabricated components, we established a modular system concept for our FE electron source. This allows the implementation of almost every cathode material. For first characterizations, we used gated p-type Si cathodes with 16 tips. We obtained stable FE currents of 0.4 μA for a grid-potential of 400 V and a gate potential of 100 V. Almost 100% of the electrons are emitted towards the grid-electrode. Parasitic leakage paths, as well as the electron emission towards the gate-electrode can be neglected. Approximately 10% of the electrons are transmitted through the grid and reach the external anode. This is in good agreement with the optical transmission through the grid-mesh. KW - Anodes KW - CATHODES KW - electron sources KW - GEOMETRY KW - Iron KW - Logic gates KW - semiconductor field emission KW - silicon Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225572 SP - 178 EP - 179 PB - IEEE ER - TY - CHAP A1 - Bachmann, Michael A1 - Dams, Florian A1 - Düsberg, F. A1 - Hofmann, M. A1 - Pahlke, A. A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Schreiner, Rupert T1 - Stability investigation of high aspect ratio n-type silicon field emitter arrays T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China N2 - Electron sources based on silicon field emitter arrays, produced in processes based on semiconductor technology, are good candidates for a miniaturized X-ray source. A key parameter for this application is the stability of the X-ray photon flux and, thus, the emission current. In the present work we have investigated the influence of the residual gas pressure and a resistor in series on the emission stability of a high aspect ratio n-type silicon emitter array with hybrid extraction electrode. An increase of current fluctuations was found for pressures above 10-6 mbar. High resistances in series to the emitter array alter the emission characteristics, but greatly suppress spikes in the emission current and improve its stability. This, however, strongly depends on the bias point. The field enhancement factor is not affected by the resistance. In a long term measurement the emission current was found to be constant after an initial phase of degradation. KW - Current measurement KW - emission current stability KW - field emitter array KW - Field emitter arrays KW - RESISTANCE KW - Resistors KW - semiconductor field emission KW - silicon KW - silicon tips KW - Stability analysis KW - Thermal stability KW - XRF spectroscopy Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225584 SP - 204 EP - 205 PB - IEEE ER - TY - CHAP A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Serbun, Pavel A1 - Bornmann, Benjamin A1 - Mingels, Stephan A1 - Müller, Güntner A1 - Schreiner, Rupert T1 - Si-Feldemissionskathoden für Anwendungen in miniaturisierten Ionisationsvakuumsensoren T2 - Verhandlungen der Deutschen Physikalischen Gesellschaft e.V. (DPG), Regensburg, 10. - 15. März 2013 N2 - Feldemissionselektronenquellen sind aufgrund ihrer prinzipiellen Vorteile gegenüber Glühkathoden bereits seit längerer Zeit Gegenstand der Forschung und werden bisher nur in einigen Spezialanwendungen erfolgreich eingesetzt. Hierbei werden Einzelspitzen mit Spannungen im kV-Bereich und Strömen im nA-Bereich betrieben. Dagegen werden für miniaturisierte Sensorsysteme eher Spannungen von ca. 100 V und Ströme von ca. 1 mA benötigt. Dazu wurden bisher meist Feldemissionskathoden mit CNTs vorgeschlagen, welche für Anwendungen in der Halbleiterindustrie aufgrund des Kohlenstoffanteils nicht erwünscht sind. Ziel unserer Arbeit ist es, Si-basierte Elektronenquellen zu realisieren, die mit anderen miniaturisierten Vakuumsensoren auf einem Chip integrierbar sind. Mithilfe eines optimierten Herstellungsprozesses konnten wir p-Si-Spitzenarrays mit Spitzenradien von wenigen nm realisieren [1]. Messungen an diesen Strukturen zeigen ein sehr homogenes Emissionsverhalten, das vor allem im Sättigungsbereich bei Emissionsströmen von ca. 10 nA pro Spitze zeitlich stabil (Schwankungen < 5 %) und optisch schaltbar (Faktor > 2.5) ist [2]. Y1 - 2013 UR - https://www.researchgate.net/publication/281373011_Si-Feldemissionskathoden_fur_Anwendungen_in_miniaturisierten_Ionisationsvakuumsensoren PB - Deutsche Physikalische Gesellschaft e.V. ER - TY - JOUR A1 - Bieker, Johannes A1 - Roustaie, Farough A1 - Schlaak, Helmut F. A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Lotz, Marcel A1 - Wilfert, Stefan T1 - Field emission characterization of in situ deposited gold nanocones with variable cone densities JF - Journal of Vacuum Science and Technology B N2 - For the fabrication of field emitter cathodes with metallic nanocones, an in situ fabrication technique based on electrodeposition in an ion track etched polymer template was used. Three samples with nanocones made of gold and different cone densities were deposited on a circular electrode with a diameter of 2.5 mm, using templates with pore density of 6 × 104, 4 × 105, and 1 × 106 cones/cm2. The cones had a height of 24 μm, a base diameter between 3 and 3.75 μm, and a tip diameter below 500 nm. Integral field emission measurements revealed onset fields of down to 3.1 V/μm and average field enhancement factors of up to 1240. For one sample, the maximum emission current from the cathode reached 142.2 μA at an applied voltage of 338 V between cathode and extraction grid, which had a distance of 50 μm. To investigate the stability of the field emission current, cumulative long-term measurements were performed for over 50 h. A stable emission current of (31.0 ± 1.3) μA at an average applied voltage of 290 V (E = 5.8 V/μm) was observed. For currents above 100 μA, a decrease of the current and therefore a degradation of the emitter structures occurred. Y1 - 2018 U6 - https://doi.org/10.1116/1.5009504 VL - 36 IS - 2 PB - AIP Publishing ER - TY - CHAP A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Ławrowski, Robert Damian T1 - Gated p-Si field emitter arrays for sensor applications T2 - 2015 28th International Vacuum Nanoelectronics Conference (IVNC) N2 - We report on gated p-type Si-tip array cathodes for implementation into field emission electron sources for sensor applications. Arrays of 16 and 100 tips with tip heights of 3 μm and tip radii below 30 nm with integrated gate electrodes concentrically positioned 2 μm below the tip apexes were fabricated using an improved process, which leads to an enhanced isolation layer quality with sufficient breakdown field strengths and low leakage currents. Integral measurements with a fixed grid potential of 400 V showed emission currents up to 35 μA for 100 tips at a cathode voltage of 150 V and an almost negligible parasitic gate current. The array with 16 p-type Si-tips showed a significant stabilization of the emission current in the range of 0.3 - 0.4 μA, for cathode voltages between 90 V and 150 V. The current fluctuation in this saturation regime was measured for 10 minutes and a value of less than ± 1% was observed. No degradation of the cathode was found after 6 hours of operation at a constant cathode voltage of 100 V and a constant grid voltage of 400 V. KW - CATHODES KW - Current measurement KW - Current stabilization KW - field emission KW - integrated gate-electrode KW - Iron KW - Logic gates KW - semiconductor KW - Semiconductor device measurement KW - silicon KW - silicon tip array Y1 - 2015 U6 - https://doi.org/10.1109/IVNC.2015.7225567 SP - 164 EP - 165 PB - IEEE ER - TY - CHAP A1 - Knapp, Wolfram A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Lindner, Matthias A1 - Schreiner, Rupert T1 - Investigations of the transition from field electron emission to stable plasma discharge in a micro electron source at vacuum pressure T2 - 2017 30th International Vacuum Nanoelectronics Conference (IVNC), 10-14 July 2017, Regensburg, Germany N2 - We report on the transition from field electron emission to plasma discharges. During an experiment with a miniaturized field emission electron source a plasma discharge accompanied by a luminous effect was observed. A novel graphical evaluation method was used to interpret and to compare the observed phenomenon. KW - CATHODES KW - Discharges (electric) KW - electron source KW - electron sources KW - Fault location KW - field emission KW - field emission measurement KW - glow discharge KW - Glow discharges KW - micro arc KW - plasma discharge KW - Plasmas KW - Si-tip cathode Y1 - 2017 U6 - https://doi.org/10.1109/IVNC.2017.8051594 SP - 166 EP - 167 PB - IEEE ER - TY - CHAP A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert T1 - Feldemissionselektronenquellen basierend auf Siliziumemittern mit hohen Aspektverhältnis T2 - Forschungsbericht der OTH Regensburg 2013 Y1 - 2013 UR - https://doi.org/10.35096/othr/pub-799 SP - 47 EP - 48 CY - Regensburg ER - TY - CHAP A1 - Prommesberger, Christian A1 - Dams, Florian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Rutkowski, S. A1 - Bornmann, Benjamin A1 - Müller, Güntner T1 - Simulation of electron trajectories of a field emission electron source in triode configuration by using finite element methods T2 - 24th International Vacuum Nanoelectronics Conference (IVNC), 2011 : 18 - 22 July 2011, Historische Stadthalle Wuppertal, Germany N2 - The finite element simulation program COMSOL Multiphysics® was used to simulate the emission efficiency of a silicon tip electron source in triode configuration for different geometries and electrode potentials. The simulation predicts a maximum emission efficiency of 84% for an optimized structure. In a second simulation a gate electrode was concentrically arranged above a single CNT column. Here, the efficiency was simulated as a function of gate hole geometry, electrode potentials and distances between the electrodes. The simulation shows that a conical shape of the gate hole results in an efficiency up to nearly 100%. KW - carbon nanotubes KW - electron field emission KW - electron source simulation KW - finite element analysis KW - simulation of electron trajectories KW - triodes Y1 - 2011 UR - https://ieeexplore.ieee.org/document/6004589 SN - 978-3-00-035081-8 SN - 978-1-4577-1243-2 SN - 2380-6311 SN - 2164-2370 SP - 144 EP - 145 PB - IEEE CY - Piscataway, NJ ER - TY - JOUR A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert A1 - Serbun, Pavel A1 - Müller, Günter A1 - Düsberg, Felix A1 - Hofmann, Martin A1 - Bachmann, Michael A1 - Pahlke, Andreas T1 - Field emission properties of p-type black silicon on pillar structures JF - Journal of Vacuum Science & Technology B N2 - Arrays of black silicon field emission pillar structures were fabricated on p-type silicon substrates. Two types of samples with the same number of pillars (arrays of 10 × 10) but different pillar heights (8 and 20 μm) were prepared as well as a black silicon reference sample without pillars. The field emission properties of these cathodes were investigated both by means of integral current-voltage measurements and by field emission scanning microscopy. Samples with a pillar height of 20 μm revealed onset fields as low as 6.4 V/μm, field enhancement factors up to 800, and emission currents up to 8 μA at an applied field of 20 V/μm. Due to the p-type material, a saturation of the emission current for fields above 11 V/μm was observed. This saturation leads to a stable operation with a current fluctuation of less than ±8%. It was found that samples with a pillar height of 20 μm showed improved emission characteristics compared to samples with a pillar height of 8 μm or without pillars. The voltage maps revealed an increased emission homogeneity after a “burn-in” sequence of the sample. The current map showed that a few of the pillars dominate the emission. Integral current stability measurements were performed under different vacuum pressures, in order to investigate altered emission behavior and a potential degradation of the emitters. At pressures above 10−6 mbar, the sample starts to degrade irreversibly. Nevertheless, even after a harsh treatment over 30 min at 5 × 10−5 mbar and at an applied field of 23 V/μm, the cathode was still operating, and did not fail during further operation over 20 h at 5 × 10−8 mbar and at an applied field of 28 V/μm. Y1 - 2016 U6 - https://doi.org/10.1116/1.4943919 VL - 34 IS - 2 ER - TY - JOUR A1 - Schreiner, Rupert A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Dams, Florian T1 - Compact and Energy-Efficient Field Emission Cathodes for Sensor Applications JF - Advanced Materials Research N2 - We report on miniaturized silicon field emitter arrays for the application in compact and energy-saving vacuum-microelectronic devices, e.g. sensors or x-ray tubes. Since standard silicon semiconductor technology has been used for the fabrication, they may be easily integrated with other silicon based circuits and devices on the same chip. The silicon tip geometry and the operating conditions were optimized in order to obtain highly uniform and stable electron field emission from large area cathode arrays. A series of uniform hexagonal tip arrays containing each 547 tips were fabricated and characterized. The electron emission properties of both individual tips as well as of complete emitter arrays were investigated. A saturation level in the voltage-current characteristics was found, which can be explained by the limitation of the supply of electrons due to the p-type silicon wafer material. When operating the arrays in the current saturation regime at an emission current of ~ 1 nA per tip, a highly stable and low noise emission can be observed. KW - field emission KW - Si-Tip Cathodes KW - Vacuum Sensors Y1 - 2014 U6 - https://doi.org/10.4028/www.scientific.net/amr.1024.372 VL - 1024 SP - 372 EP - 375 PB - Scientific.net ER - TY - JOUR A1 - Scharfenberg, Georg A1 - Mottok, Jürgen A1 - Artmann, Christina A1 - Hobelsberger, Martin A1 - Paric, Ivan A1 - Großmann, Benjamin A1 - Pohlt, Clemens A1 - Wackerbarth, Alena A1 - Pausch, Uli A1 - Heidrich, Christiane A1 - Fadanelli, Martin A1 - Elsner, Michael A1 - Pöcher, Daniel A1 - Pittroff, Lenz A1 - Beer, Stefan A1 - Brückl, Oliver A1 - Haslbeck, Matthias A1 - Sterner, Michael A1 - Thema, Martin A1 - Muggenthaler, Nicole A1 - Lenck, Thorsten A1 - Götz, Philipp A1 - Eckert, Fabian A1 - Deubzer, Michael A1 - Stingl, Armin A1 - Simsek, Erol A1 - Krämer, Stefan A1 - Großmann, Benjamin A1 - Schlegl, Thomas A1 - Niedersteiner, Sascha A1 - Berlehner, Thomas A1 - Joblin, Mitchell A1 - Mauerer, Wolfgang A1 - Apel, Sven A1 - Siegmund, Janet A1 - Riehle, Dirk A1 - Weber, Joachim A1 - Palm, Christoph A1 - Zobel, Martin A1 - Al-Falouji, Ghassan A1 - Prestel, Dietmar A1 - Scharfenberg, Georg A1 - Mandl, Roland A1 - Deinzer, Arnulf A1 - Halang, W. A1 - Margraf-Stiksrud, Jutta A1 - Sick, Bernhard A1 - Deinzer, Renate A1 - Scherzinger, Stefanie A1 - Klettke, Meike A1 - Störl, Uta A1 - Wiech, Katharina A1 - Kubata, Christoph A1 - Sindersberger, Dirk A1 - Monkman, Gareth J. A1 - Dollinger, Markus A1 - Dembianny, Sven A1 - Kölbl, Andreas A1 - Welker, Franz A1 - Meier, Matthias A1 - Thumann, Philipp A1 - Swidergal, Krzysztof A1 - Wagner, Marcus A1 - Haug, Sonja A1 - Vernim, Matthias A1 - Seidenstücker, Barbara A1 - Weber, Karsten A1 - Arsan, Christian A1 - Schone, Reinhold A1 - Münder, Johannes A1 - Schroll-Decker, Irmgard A1 - Dillinger, Andrea Elisabeth A1 - Fuchshofer, Rudolf A1 - Monkman, Gareth J. A1 - Shamonin (Chamonine), Mikhail A1 - Geith, Markus A. A1 - Koch, Fabian A1 - Ühlin, Christian A1 - Schratzenstaller, Thomas A1 - Saßmannshausen, Sean Patrick A1 - Auchter, Eberhard A1 - Kriz, Willy A1 - Springer, Othmar A1 - Thumann, Maria A1 - Kusterle, Wolfgang A1 - Obermeier, Andreas A1 - Udalzow, Anton A1 - Schmailzl, Anton A1 - Hierl, Stefan A1 - Langer, Christoph A1 - Schreiner, Rupert ED - Baier, Wolfgang T1 - Forschungsbericht / Ostbayerische Technische Hochschule Regensburg T3 - Forschungsberichte der OTH Regensburg - 2015 Y1 - 2015 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-13867 SN - 978-3-00-048589-3 CY - Regensburg ER - TY - JOUR A1 - Beimler, Josef A1 - Leißl, Caroline A1 - Ebner, Lena A1 - Elsner, Michael A1 - Mühlbauer, Gerhard A1 - Kohlert, Dieter A1 - Schubert, Martin J. W. A1 - Weiß, Andreas P. A1 - Sterner, Michael A1 - Raith, Thomas A1 - Afranseder, Martin A1 - Krapf, Tobias A1 - Mottok, Jürgen A1 - Siemers, Christian A1 - Großmann, Benjamin A1 - Höcherl, Johannes A1 - Schlegl, Thomas A1 - Schneider, Ralph A1 - Milaev, Johannes A1 - Rampelt, Christina A1 - Roduner, Christian A1 - Glowa, Christoph A1 - Bachl, Christoph A1 - Schliekmann, Claus A1 - Gnan, Alfons A1 - Grill, Martin A1 - Ruhland, Karl A1 - Piehler, Thomas A1 - Friers, Daniel A1 - Wels, Harald A1 - Pflug, Kenny A1 - Kucera, Markus A1 - Waas, Thomas A1 - Schlachetzki, Felix A1 - Boy, Sandra A1 - Pemmerl, Josef A1 - Leis, Alexander A1 - Welsch, Andreas F.X. A1 - Graf, Franz A1 - Zenger, Gerhard A1 - Volbert, Klaus A1 - Waas, Thomas A1 - Scherzinger, Stefanie A1 - Klettke, Meike A1 - Störl, Uta A1 - Heyl, C. A1 - Boldenko, A. A1 - Monkman, Gareth J. A1 - Kujat, Richard A1 - Briem, Ulrich A1 - Hierl, Stefan A1 - Talbot, Sebastian A1 - Schmailzl, Anton A1 - Ławrowski, Robert Damian A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Valentino, Piergiorgio A1 - Romano, Marco A1 - Ehrlich, Ingo A1 - Furgiuele, Franco A1 - Gebbeken, Norbert A1 - Eisenried, Michael A1 - Jungbauer, Bastian A1 - Hutterer, Albert A1 - Bauhuber, Michael A1 - Mikrievskij, Andreas A1 - Argauer, Monika A1 - Hummel, Helmut A1 - Lechner, Alfred A1 - Liebetruth, Thomas A1 - Schumm, Michael A1 - Joseph, Saskia A1 - Reschke, Michael A1 - Soska, Alexander A1 - Schroll-Decker, Irmgard A1 - Putzer, Michael A1 - Rasmussen, John A1 - Dendorfer, Sebastian A1 - Weber, Tim A1 - Al-Munajjed, Amir Andreas A1 - Verkerke, Gijsbertus Jacob A1 - Renkawitz, Tobias A1 - Haug, Sonja A1 - Rudolph, Clarissa A1 - Zeitler, Annika A1 - Schaubeck, Simon A1 - Steffens, Oliver A1 - Rechenauer, Christian A1 - Schulz-Brize, Thekla A1 - Fleischmann, Florian A1 - Kusterle, Wolfgang A1 - Beer, Anne A1 - Wagner, Bernd A1 - Neidhart, Thomas ED - Baier, Wolfgang T1 - Forschungsbericht 2013 T3 - Forschungsberichte der OTH Regensburg - 2013 Y1 - 2014 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-7990 CY - Regensburg ER - TY - JOUR A1 - Mauerer, Wolfgang A1 - Rexhepaj, Tanja A1 - Monkman, Gareth J. A1 - Sindersberger, Dirk A1 - Diermeier, Andreas A1 - Neidhart, Thomas A1 - Wolfrum, Dominik A1 - Sterner, Michael A1 - Heberl, Michael A1 - Nusko, Robert A1 - Maier, Georg A1 - Nagl, Klaus A1 - Reuter, Monika A1 - Hofrichter, Andreas A1 - Lex, Thomas A1 - Lesch, Florian A1 - Kieninger, Bärbel A1 - Szalo, Alexander Eduard A1 - Zehner, Alexander A1 - Palm, Christoph A1 - Joblin, Mitchell A1 - Apel, Sven A1 - Ramsauer, Ralf A1 - Lohmann, Daniel A1 - Westner, Markus A1 - Strasser, Artur A1 - Munndi, Maximilian A1 - Ebner, Lena A1 - Elsner, Michael A1 - Weiß, Nils A1 - Segerer, Matthias A1 - Hackenberg, Rudolf A1 - Steger, Sebastian A1 - Schmailzl, Anton A1 - Dostalek, Michael A1 - Armbruster, Dominik A1 - Koch, Fabian A1 - Hierl, Stefan A1 - Thumann, Philipp A1 - Swidergal, Krzysztof A1 - Wagner, Marcus A1 - Briem, Ulrich A1 - Diermeier, Andreas A1 - Spreitzer, Stefan A1 - Beiderbeck, Sabrina A1 - Hook, Christian A1 - Zobel, Martin A1 - Weber, Tim A1 - Groß, Simon A1 - Penzkofer, Rainer A1 - Dendorfer, Sebastian A1 - Schillitz, Ingo A1 - Bauer, Thomas A1 - Rudolph, Clarissa A1 - Schmidt, Katja A1 - Liebetruth, Thomas A1 - Hamer, Markus A1 - Haug, Sonja A1 - Vernim, Matthias A1 - Weber, Karsten A1 - Saßmannshausen, Sean Patrick A1 - Books, Sebastian A1 - Neuleitner, Nikolaus A1 - Rechenauer, Christian A1 - Steffens, Oliver A1 - Kusterle, Wolfgang A1 - Gömmel, Roland A1 - Wellnitz, Felix A1 - Stierstorfer, Johannes A1 - Stadler, Dominik A1 - Hofmann, Matthias J. A1 - Motschmann, Hubert A1 - Shamonin (Chamonine), Mikhail A1 - Bleicher, Veronika A1 - Fischer, Sebastian A1 - Hackenberg, Rudolf A1 - Horn, Anton A1 - Kawasch, Raphael A1 - Petzenhauser, Michael A1 - Probst, Tobias A1 - Udalzow, Anton A1 - Dams, Florian A1 - Schreiner, Rupert A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian ED - Baier, Wolfgang T1 - Forschungsbericht 2016 T3 - Forschungsberichte der OTH Regensburg - 2016 Y1 - 2016 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-13840 CY - Regensburg ER - TY - JOUR A1 - Weber, Karsten A1 - Dendorfer, Sebastian A1 - Süß, Franz A1 - Kubowitsch, Simone A1 - Schratzenstaller, Thomas A1 - Haug, Sonja A1 - Mohr, Christa A1 - Kiesl, Hans A1 - Drechsler, Jörg A1 - Westner, Markus A1 - Kobus, Jörn A1 - Schubert, Martin J. W. A1 - Zenger, Stefan A1 - Pietsch, Alexander A1 - Weiß, Josef A1 - Hinterseer, Sebastian A1 - Schieck, Roland A1 - Scherzinger, Stefanie A1 - Klettke, Meike A1 - Ringlstetter, Andreas A1 - Störl, Uta A1 - Bissyandé, Tegawendé F. A1 - Seeburger, Achim A1 - Schindler, Timo A1 - Ramsauer, Ralf A1 - Kiszka, Jan A1 - Kölbl, Andreas A1 - Lohmann, Daniel A1 - Mauerer, Wolfgang A1 - Maier, Johannes A1 - Scorna, Ulrike A1 - Palm, Christoph A1 - Soska, Alexander A1 - Mottok, Jürgen A1 - Ellermeier, Andreas A1 - Vögele, Daniel A1 - Hierl, Stefan A1 - Briem, Ulrich A1 - Buschmann, Knut A1 - Ehrlich, Ingo A1 - Pongratz, Christian A1 - Pielmeier, Benjamin A1 - Tyroller, Quirin A1 - Monkman, Gareth J. A1 - Gut, Franz A1 - Roth, Carina A1 - Hausler, Peter A1 - Bierl, Rudolf A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Huang, Yifeng A1 - She, Juncong A1 - Ottl, Andreas A1 - Rieger, Walter A1 - Kraml, Agnes A1 - Poxleitner, Thomas A1 - Hofer, Simon A1 - Heisterkamp, Benjamin A1 - Lerch, Maximilian A1 - Sammer, Nike A1 - Golde, Olivia A1 - Wellnitz, Felix A1 - Schmid, Sandra A1 - Muntschick, Claudia A1 - Kusterle, Wolfgang A1 - Paric, Ivan A1 - Brückl, Oliver A1 - Haslbeck, Matthias A1 - Schmidt, Ottfried A1 - Schwanzer, Peter A1 - Rabl, Hans-Peter A1 - Sterner, Michael A1 - Bauer, Franz A1 - Steinmann, Sven A1 - Eckert, Fabian A1 - Hofrichter, Andreas ED - Baier, Wolfgang T1 - Forschungsbericht 2017 T3 - Forschungsberichte der OTH Regensburg - 2017 KW - Forschung KW - Forschungsbericht Y1 - 2017 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-13835 SN - 978-3-9818209-3-5 CY - Regensburg ER - TY - JOUR A1 - Lautenschläger, Toni A1 - Leis, Alexander A1 - Dendorfer, Sebastian A1 - Palm, Christoph A1 - Schreiner, Rupert A1 - Langer, Christoph A1 - Prommesberger, Christian A1 - Ławrowski, Robert Damian A1 - Dams, Florian A1 - Bornmann, Benjamin A1 - Navitski, Aliaksandr A1 - Serbun, Pavel A1 - Müller, Günter A1 - Liebetruth, Thomas A1 - Kohlert, Dieter A1 - Pernsteiner, Jochen A1 - Schreier, Franz A1 - Heerklotz, Sabrina A1 - Heerklotz, Allwin A1 - Boos, Alexander A1 - Herwald, Dominik A1 - Monkman, Gareth J. A1 - Treiber, Daniel A1 - Mayer, Matthias A1 - Hörner, Eva A1 - Bentz, Alexander A1 - Shamonin (Chamonine), Mikhail A1 - Johansen, Søren Peter A1 - Reichel, Marco A1 - Stoll, Andrea A1 - Briem, Ulrich A1 - Dullien, Silvia A1 - Renkawitz, Tobias A1 - Weber, Tim A1 - Dendorfer, Sebastian A1 - Grifka, Joachim A1 - Penzkofer, Rainer A1 - Barnsteiner, K. A1 - Jovanovik, M. A1 - Wernecke, P. A1 - Vögele, A. A1 - Bachmann, T. A1 - Plötz, Martin A1 - Schliekmann, Claus A1 - Wels, Harald A1 - Helmberger, Paul A1 - Kaspar, M. A1 - Hönicka, M. A1 - Schrammel, Siegfried A1 - Enser, Markus A1 - Schmidmeier, Monika A1 - Schroll-Decker, Irmgard A1 - Haug, Sonja A1 - Gelfert, Verena A1 - Vernim, Matthias ED - Baier, Wolfgang T1 - Forschungsbericht 2012 T3 - Forschungsberichte der OTH Regensburg - 2012 Y1 - 2012 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-7834 CY - Regensburg ER - TY - JOUR A1 - Berndt, Dominik A1 - Muggli, Josef A1 - Wittwer, Franz A1 - Langer, Christoph A1 - Heinrich, Stephan A1 - Knittel, Thorsten A1 - Schreiner, Rupert T1 - MEMS-based thermal conductivity sensor for hydrogen gas detection in automotive applications JF - Sensors and Actuators A: Physical N2 - Accurate detection of hydrogen gas in vehicle interiors is very important for the future of a fuel cell car. Since this type of gas is highly volatile and flammable, the measurement methods have to be very reliable and precise due to safety reasons. In this paper a thermal conductivity sensor for hydrogen gas detection is presented, exhibiting a lower detection limit of 2000 ppm hydrogen in laboratory air. The sensor element is realized by micro-fabrication techniques on silicon wafers. The heated filament is exposed by a selective wet etching process creating a micro-hotplate on a thin membrane. In order to minimize power consumption, the sensor is operated in pulsed mode. Hydrogen gas detection was carried out using a synthetic gas testbench. Measurements of hydrogen contents ranging from 0% to 4% with an increment of 0.5% were successfully performed for ambient gas temperatures between -15°C and 84°C. Including humidity, high moisture contents have the greatest influence on thermal conductivity. This was predicted in theoretical investigations and confirmed in experiments. For evaluation, both the change in resistance ΔR as well as the time constant τ were taken as sensor output. For both quantities, the previously established theoretical relationship with thermal conductivity could be confirmed. Y1 - 2020 U6 - https://doi.org/10.1016/j.sna.2019.111670 VL - 305 IS - April PB - Elsevier ER - TY - CHAP A1 - Lindner, Matthias A1 - Berndt, Dominik A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Schreiner, Rupert T1 - Field emission assisted micro plasma discharges at vacuum and atmospheric pressures T2 - 31st International Vacuum Nanoelectronics Conference (IVNC), 2018, Kyoto, Japan N2 - Spatially confined non-equilibrium plasmas at vacuum and atmospheric pressure in the dimensions from a few microns to one millimeter are a promising approach to the generation and maintenance of stable glow discharges. The realization of these micro-discharges or micro-plasmas enable more accurate investigations in the field of micro plasma research. We report on field emission assisted micro plasmas excited by an alternating current with frequencies up to 1 kHz. Due to the field enhancement caused by an array of Si nano-tip structures the ignition voltage of stable plasma discharges can be reduced by 30%. Y1 - 2018 U6 - https://doi.org/10.1109/IVNC.2018.8520181 ER - TY - CHAP A1 - Berndt, Dominik A1 - Lindner, Matthias A1 - Tschurtschenthaler, Karl A1 - Langer, Christoph A1 - Schreiner, Rupert T1 - Miniaturized Plasma Actuator Flow Measurements by MEMS-Based Thermal Conductivity Sensors T2 - MDPI Proceedings of Eurosensors 2018, 9-12 September, Graz N2 - The gasflow created by a minaturized dielectric barrier discharge (DBD) plasma actuator is measured by a MEMS-based thermal conductivity gas sensor giving an indication of flow velocity and flow direction. The possiblity of several sensors in a small area gives a far better accuracy of local flow phenomena compared to conventional sensors. This is important for a better understanding of plasma- induced flow characteristics. KW - thermal conductivity sensors; plasma actuators; surface hotfilms; sensors for aerospace Y1 - 2018 U6 - https://doi.org/10.3390/proceedings2130939 VL - Vol.13 IS - 2 ER - TY - JOUR A1 - Langer, Christoph A1 - Berndt, Dominik A1 - Schreiner, Rupert T1 - Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation JF - Journal of Vacuum Science and Technology B: Nanotechnology and Microelectronics N2 - To optimize the measurement range of thermal conductivity vacuum gauges, an expression for the sensitivity is required that takes into account all geometrical, material-specific, and operating parameters. Therefore, equations of the sensor output signal as a function of the pressure for the constant current and the constant temperature mode have been developed analytically. Based on these equations, the sensitivity of the vacuum gauge and its influencing parameters was investigated and discussed. For comparable conditions, the constant temperature operation shows a significantly higher sensitivity for high pressures, while the constant current operation shows higher sensitivity at low pressures. The sensitivity in both the constant current and the constant temperature mode depends on the ratio of the filament surface area and the parasitic thermal conductance. In addition, for the constant current operation, the sensitivity also depends on the current value and the temperature coefficient of the filament resistor. For the constant temperature operation, the sensitivity additionally depends on the distance of the filament and the reference plane. However, to extend the measurement range of a thermal conductivity vacuum gauge toward low pressures, a reduction of the parasitic thermal conductance is mandatory for both the constant current and the constant temperature mode. Y1 - 2022 U6 - https://doi.org/10.1116/6.0001964 VL - 40 IS - 5 PB - AIP Publishing ER - TY - JOUR A1 - Appelhans, Marie-Luise A1 - Kampmann, Matthias A1 - Mottok, Jürgen A1 - Riederer, Michael A1 - Nagl, Klaus A1 - Steffens, Oliver A1 - Dünnweber, Jan A1 - Wildgruber, Markus A1 - Roth, Julius A1 - Stadler, Timo A1 - Palm, Christoph A1 - Weiß, Martin Georg A1 - Rochholz, Sandra A1 - Bierl, Rudolf A1 - Gschossmann, Andreas A1 - Haug, Sonja A1 - Schmidbauer, Simon A1 - Koch, Anna A1 - Westner, Markus A1 - Bary, Benedikt von A1 - Ellermeier, Andreas A1 - Vögele, Daniel A1 - Maiwald, Frederik A1 - Hierl, Stefan A1 - Schlamp, Matthias A1 - Ehrlich, Ingo A1 - Siegl, Marco A1 - Hüntelmann, Sven A1 - Wildfeuer, Matthias A1 - Brückl, Oliver A1 - Sterner, Michael A1 - Hofrichter, Andreas A1 - Eckert, Fabian A1 - Bauer, Franz A1 - Dawoud, Belal A1 - Rabl, Hans-Peter A1 - Gamisch, Bernd A1 - Schmidt, Ottfried A1 - Heberl, Michael A1 - Thema, Martin A1 - Mayer, Ulrike A1 - Eller, Johannes A1 - Sippenauer, Thomas A1 - Adelt, Christian A1 - Haslbeck, Matthias A1 - Vogl, Bettina A1 - Mauerer, Wolfgang A1 - Ramsauer, Ralf A1 - Lohmann, Daniel A1 - Sax, Irmengard A1 - Gabor, Thomas A1 - Feld, Sebastian A1 - Linnhoff-Popien, Claudia A1 - Ławrowski, Robert Damian A1 - Langer, Christoph A1 - Schreiner, Rupert A1 - Sellmair, Josef ED - Baier, Wolfgang T1 - Forschung 2019 BT - Thema: Künstliche Intelligenz N2 - Bericht mit Forschungsprojekten aus verschiedenen Bereichen der OTH Regensburg mit dem Schwerpunktthema "Künstliche Intelligenz" und einem Gespräch zur "Medizin der Zukunft" T3 - Forschungsberichte der OTH Regensburg - 2019 KW - Forschung KW - Forschungsbericht KW - Künstliche Intelligenz Y1 - 2019 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-7890 SN - 978-3-9818209-7-3 CY - Regensburg ER - TY - CHAP A1 - Serbun, Pavel A1 - Porshyn, V. A1 - Müller, Günter A1 - Mingels, S. A1 - Lützenkirchen-Hecht, Dirk A1 - Bachmann, Michael A1 - Düsberg, Felix A1 - Dams, Florian A1 - Hofmann, Martin A1 - Pahlke, Andreas A1 - Prommesberger, Christian A1 - Langer, Christoph A1 - Ławrowski, Robert Damian A1 - Schreiner, Rupert T1 - Field emission behavior of Au-tip-coated p-type Si pillar structures T2 - 29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada N2 - Precisely aligned high-aspect-ratio (HAR) silicon tip arrays were fabricated using enhanced reactive ion etching with an inductively-coupled-plasma followed by a sharpening oxidation. A gold thin film was then sputtered only on the tips of the HAR structures. Field-emission (FE) properties from Au-coated HAR p-Si tip array cathodes have been systematically investigated by means of field emission scanning microscopy (FESM). A rather high efficiency of the HAR Si structures (71% at 550 V), but limited homogeneous FE with currents of 1-600 nA might be correlated with the varying geometry of the tips and the presence of oxides. I-V measurements of single Au-coated HAR emitters revealed activation effects and the saturation current region at 3 nA. An increase of the saturation current by 4 orders of magnitude was observed during 20 hours of conditioning at constant voltage, which finally resulted in nearly reproducible FN curves with a ß-factor of 473. An excellent stability of the emission current of less than 1 % was obtained during the additional long-time conditioning at constant voltage. Optical switching under halogen lamp illumination resulted in at least 2 times higher saturation currents and showed a linear dependence of the FE current on the light color temperature. KW - field emission KW - p-type Si-pillar array KW - surface oxide effects KW - photoemission Y1 - 2016 U6 - https://doi.org/10.1109/IVNC.2016.7551516 SN - 2380-6311 SP - 181 EP - 182 PB - IEEE ER - TY - JOUR A1 - Broser, Christian A1 - Falter, Thomas A1 - Ławrowski, Robert Damian A1 - Altenbuchner, Amelie A1 - Vögele, Daniel A1 - Koss, Claus A1 - Schlampp, Matthias A1 - Dunnweber, Jan A1 - Steffens, Oliver A1 - Heckner, Markus A1 - Jaritz, Sabine A1 - Schiegl, Thomas A1 - Corsten, Sabine A1 - Lauer, Norina A1 - Guertler, Katherine A1 - Koenig, Eric A1 - Haug, Sonja A1 - Huber, Dominik A1 - Birkenmaier, Clemens A1 - Krenkel, Lars A1 - Wagner, Thomas A1 - Justus, Xenia A1 - Saßmannshausen, Sean Patrick A1 - Kleine, Nadine A1 - Weber, Karsten A1 - Braun, Carina N. A1 - Giacoppo, Giuliano A1 - Heinrich, Michael A1 - Just, Tobias A1 - Schreck, Thomas A1 - Schnabl, Andreas A1 - Gilmore, Amador Téran A1 - Roeslin, Samuel A1 - Schmid, Sandra A1 - Wellnitz, Felix A1 - Malz, Sebastian A1 - Maurial, Andreas A1 - Hauser, Florian A1 - Mottok, Jürgen A1 - Klettke, Meike A1 - Scherzinger, Stefanie A1 - Störl, Uta A1 - Heckner, Markus A1 - Bazo, Alexander A1 - Wolff, Christian A1 - Kopper, Andreas A1 - Westner, Markus A1 - Pongratz, Christian A1 - Ehrlich, Ingo A1 - Briem, Ulrich A1 - Hederer, Sebastian A1 - Wagner, Marcus A1 - Schillinger, Moritz A1 - Görlach, Julien A1 - Hierl, Stefan A1 - Siegl, Marco A1 - Langer, Christoph A1 - Hausladen, Matthias A1 - Schreiner, Rupert A1 - Haslbeck, Matthias A1 - Kreuzer, Reinhard A1 - Brückl, Oliver A1 - Dawoud, Belal A1 - Rabl, Hans-Peter A1 - Gamisch, Bernd A1 - Schmidt, Ottfried A1 - Heberl, Michael A1 - Gänsbauer, Bianca A1 - Bick, Werner A1 - Ellermeier, Andreas A1 - Monkman, Gareth J. A1 - Prem, Nina A1 - Sindersberger, Dirk A1 - Tschurtschenthaler, Karl A1 - Aurbach, Maximilian A1 - Dendorfer, Sebastian A1 - Betz, Michael A. A1 - Szecsey, Tamara A1 - Mauerer, Wolfgang A1 - Murr, Florian ED - Baier, Wolfgang T1 - Forschung 2018 T3 - Forschungsberichte der OTH Regensburg - 2018 KW - Forschung KW - Forschungsbericht Y1 - 2018 U6 - http://nbn-resolving.de/urn/resolver.pl?urn:nbn:de:bvb:898-opus4-13826 SN - 978-3-9818209-5-9 CY - Regensburg ER -