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    <publishedYear>2013</publishedYear>
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    <language>eng</language>
    <pageFirst>67</pageFirst>
    <pageLast>69</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>conferenceobject</type>
    <publisherName>Shaker</publisherName>
    <publisherPlace>Aachen</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation>Organizer: Hochschule Amberg-Weiden</contributingCorporation>
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    <title language="eng">Influence of reactive ion etching parameters on the geometry of silicon tip cathodes for field emission</title>
    <parentTitle language="eng">Applied Research Conference 2013, ARC 2013 : 17th and 18th October 2013, Deggendorf</parentTitle>
    <identifier type="isbn">978-3-8440-2274-2</identifier>
    <enrichment key="opus.import.date">2022-08-24T10:21:08+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="OtherSeries">Konferenz im Forschungsmaster - Master of Applied Research, MAPRby</enrichment>
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    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Robert Damian Ławrowski</author>
    <author>Christian Prommesberger</author>
    <author>Christoph Langer</author>
    <author>Florian Dams</author>
    <author>Rupert Schreiner</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="persons" number="schreinerlmconf">Schreiner, Rupert (Prof. Dr.), Konferenzbeiträge - Labor für Mikrosensorik</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Mikrosensorik</collection>
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