<?xml version="1.0" encoding="utf-8"?>
<export-example>
  <doc>
    <id>4659</id>
    <completedYear/>
    <publishedYear>2017</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst>747</pageFirst>
    <pageLast>750</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>bookpart</type>
    <publisherName>VDE-Verlag</publisherName>
    <publisherPlace>München</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Sprayganik - Spraytool für organische Halbleiter</title>
    <abstract language="deu">Sprühbeschichtung stellt einen kostengünstigen und materialeffizienten aber komplexen Prozess dar. Um diese Vorteile für die Abscheidung teurer organischer Halbleiter zu nutzen, wurde ein Sprühbeschichter entwickelt, der neueste Anforderungen an den Prozess erfüllt. Zudem konnten selbstansaugende Mikrosprühdüsen mikrotechnologisch in Silizium realisiert werden, welche bereits eine bis zu vierfache Materialeffizienz im Vergleich zu herkömmlichen airbrush-Düsen nachweisen konnten. Die neueste Düsengeneration zeigt nun eine weiter verbesserte Zerstäubung, was bei gesprühten OPDs zu einer reduzierten Dunkelstromdichte von 9,1×10-6 mA·cm-2 (-5 V) und erhöhten externen Quanteneffizienz von 78,5% (530 nm, -5 V) führt.</abstract>
    <abstract language="eng">Generally, spray coating is a cheap and material efficient but complex process. To exploit those advantages for deposition of expensive organic semiconductors, we developed a spray coater to fulfil latest requirements. Furthermore, it was possible to realize venturi micro nozzles that already showed up to 4-fold material efficiency when compared to conventional airbrush-nozzles. The latest nozzle layout shows an even better atomization resulting in photodiodes with a reduced dark current density of 9,1×10-6 mA·cm-2 (-5 V) and increased external quantum efficiency of 78,5% (530 nm, -5 V).</abstract>
    <parentTitle language="deu">7. MikroSystemTechnik Kongress "MEMS, Mikroelektronik, Systeme", 23.-25. Oktober 2017, München</parentTitle>
    <identifier type="isbn">978-3-8007-4491-6</identifier>
    <enrichment key="opus.import.date">2022-07-03T14:30:54+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Michael A. Betz</author>
    <author>Alfred Lechner</author>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Dunkelstrom</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>organischer Halbleiter</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Photodiode</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Silicium</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Spritzbeschichten</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Spritzschicht</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Sprühdüse</value>
    </subject>
    <subject>
      <language>deu</language>
      <type>uncontrolled</type>
      <value>Zerstäubung</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>3207</id>
    <completedYear/>
    <publishedYear>2017</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>1</issue>
    <volume>27</volume>
    <type>article</type>
    <publisherName>IOP Publishing</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Silicon micro venturi nozzles for cost-efficient spray coating of thin organic P3HT/PCBM layers</title>
    <abstract language="eng">Improvements on spray coating are of particular interest to different fields of technology as it is a scalable deposition method and processing from solutions offer various application possibilities outside of typical facilities. When it comes to the deposition of expensive and film-forming media such as organic semiconductors, consumption and nozzle cleaning issues are of particular importance. We demonstrate the simple steps to design and fabricate micro venturi nozzles for economical spray coating with a consumption as low as 30-50 mu l.min(-1). For spray coating an active area of 25 cm(2) a 2.45-4.01 fold coating efficiency is observed compared to a conventional airbrush nozzle set. The electrical characterization of first diodes sprayed with an active layer thickness of similar to 750 nm using a single micronozzle at a coating speed of 1.7 cm(2).min(-1) reveals a good external quantum efficiency of 72.9% at 532 nm and a dark current of similar to 7.4.10(-5) mA.cm(-2), both measured at -2 V. Furthermore, the high resistance of the micronozzles against solvents and most acids is provided through realization in a silicon wafer with silicon dioxide encapsulation, therefore allowing easy and effective cleaning.</abstract>
    <parentTitle language="eng">Journal of micromechanics and microengineering</parentTitle>
    <identifier type="doi">10.1088/0960-1317/27/1/015019</identifier>
    <enrichment key="opus.import.date">2022-03-17T07:14:43+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="BegutachtungStatus">peer-reviewed</enrichment>
    <author>Michael A. Betz</author>
    <author>Patric Büchele</author>
    <author>Manfred Brünnler</author>
    <author>Sonja Deml</author>
    <author>Alfred Lechner</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>deep reactive ion etching</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>microfluidics</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>organic photodiodes</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>organic semiconductors</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>spray coating</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>venturi nozzles</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="oaweg" number="">Hybrid Open Access - OA-Veröffentlichung in einer Subskriptionszeitschrift/-medium</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>3227</id>
    <completedYear/>
    <publishedYear>2015</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>7443</pageFirst>
    <pageLast>7452</pageLast>
    <pageNumber/>
    <edition/>
    <issue>24</issue>
    <volume>407</volume>
    <type>article</type>
    <publisherName>Springer</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Three-in-one enzyme assay based on single molecule detection in femtoliter arrays</title>
    <abstract language="eng">Large arrays of femtoliter-sized chambers are important tools for single molecule research as well as bioanalytical applications. We have optimized the design and fabrication of two array types consisting of 250 × 250 (62 500) femtoliter chambers either by surface etching of fused silica slides or by polydimethylsiloxane (PDMS) molding. Highly diluted solutions of β-galactosidase were enclosed in such arrays to monitor the fluorogenic reactions of hundreds of individual enzyme molecules in parallel by wide-field fluorescence microscopy. An efficient mechanical sealing procedure was developed to prevent diffusion of the fluorescent reaction product out of the chambers. Different approaches for minimizing non-specific surface adsorption were explored. The signal acquisition was optimized to grant both a large field of view and an efficient signal acquisition from each femtoliter chamber. The optimized femtoliter array has enabled a three-in-one enzyme assay system: First, the concentration of active enzyme can be determined in a digital way by counting fluorescent chambers in the array. Second, the activity of the enzyme bulk solution is given by averaging many individual substrate turnover rates without the need for knowing the exact enzyme concentration. Third-unlike conventional enzyme assays-the distribution of individual substrate turnover rates yields insight into the conformational heterogeneity in an enzyme population. The substrate turnover rates of single β-galactosidase molecules were found to be broadly distributed and independent of the type of femtoliter array. In general, both types of femtoliter arrays are highly sensitive platforms for enzyme analysis at the single molecule level and yield consistent results.</abstract>
    <parentTitle language="eng">Analytical and bioanalytical chemistry</parentTitle>
    <identifier type="doi">10.1007/s00216-015-8910-0</identifier>
    <enrichment key="opus.import.date">2022-03-17T07:14:43+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="BegutachtungStatus">peer-reviewed</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Raphaela B. Liebherr</author>
    <author>Albert Hutterer</author>
    <author>Matthias J. Mickert</author>
    <author>Franziska C. Vogl</author>
    <author>Andrea Beutner</author>
    <author>Alfred Lechner</author>
    <author>Helmut Hummel</author>
    <author>Hans H. Gorris</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>ARRAYS</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Digital concentration readout</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Enzyme kinetics</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Fluorescence microscopy</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Single molecule detection</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5206</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst>1428</pageFirst>
    <pageLast>1433</pageLast>
    <pageNumber/>
    <edition/>
    <issue>6</issue>
    <volume>16</volume>
    <type>article</type>
    <publisherName>Elsevier</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions</title>
    <abstract language="eng">Online trace analysis based on UV/Vis spectroscopy requires long detection paths. Therefore an isotropic wet etch process in silicon is developed to fabricate a 300 µm deep channel with low channel wall roughness for desired light guidance application. Four etchant compositions were compared in terms of etching rate, surface roughness and selectivity in a beaker process. The best fitting mixture was selected. To further increase the surface quality (bubble issue) a spin etcher tool is used for producing the channels. The dependence of homogeneity and defect density on media flux, and rotation velocity was investigated. Results show that high rotation velocity and high media flux lead to great defects in the channel wall. Through rotation of the wafer during etching, the etching rate of silicon rises compared to the beaker process due to the rapid removal of etch products and simultaneous supply of fresh etchant. After 38 min of etching, 300 µm deep semi-circular channels with high optical quality (Rq=10 nm±2 nm) over 3 m were produced.</abstract>
    <parentTitle language="deu">Materials Science in Semiconductor Processing</parentTitle>
    <identifier type="url">https://www.scopus.com/authid/detail.uri?authorId=22980567700#disabled</identifier>
    <identifier type="doi">10.1016/j.mssp.2013.05.017</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Michael Bauhuber</author>
    <author>Andreas Mikrievskij</author>
    <author>Alfred Lechner</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5226</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>269</pageFirst>
    <pageLast>273</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>195</volume>
    <type>article</type>
    <publisherName>Trans Tech Publications</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Real-time analyses of metal contaminations in the ppb-range</title>
    <abstract language="eng">In high-tech processing even smallest concentrations of metal ions in process media are of the utmost significance because they cause expensive production failures. Currently, cost-intensive equipment, special trained staff and time consuming analyses are necessary to detect these contaminations in order to avoid failures. The Centers of Excellence Nanochem and Sensorics at the University of Applied Sciences Regensburg (owner of patent PCT/EP2010/064833) and their industrial partner Micro-Epsilon GmbH are developing a new miniaturized measurement device which allows cost-effective real-time analysis of fluidic media for the first time. The system is fully automated and can be directly connected to wet-etch benches. Hence it allows continuous real-time surveillance of metal contaminations in the ppb-range through absorption spectroscopy in process media. For this purpose a very small sample amount of the process medium and a specific complexing agent are mixed together. This leads to an increase in the molar extinction coefficients and though even smallest contaminations become visible. The main parts of our development are the simulation of the different system components, their production and chemical analyses with the evaluation model.</abstract>
    <parentTitle language="eng">Solid State Phenomena</parentTitle>
    <identifier type="doi">10.4028/www.scientific.net/SSP.195</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Albert Hutterer</author>
    <author>Michael Bauhuber</author>
    <author>Helmut Hummel</author>
    <author>Alfred Lechner</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Absorption</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Complexing Agent</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Light Guidance</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Liquid-Core Waveguide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Metal Ions</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Online Measurement</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Real-Time</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Total Internal Reflection</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5253</id>
    <completedYear/>
    <publishedYear>2011</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>2</issue>
    <volume>21</volume>
    <type>article</type>
    <publisherName>IOP Science</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Measurement of the mechanical stability of semiconductor line structures in drying liquids with application to pattern collapse</title>
    <abstract language="eng">Enhanced particle removal processes in wet cleaning as well as drying processes of semiconductor wafers can cause significant lateral forces on surface structures. These forces, however, must not exceed the mechanical stability of structures on the wafer. Thus, a mechanical fracture test was used to assess the lateral mechanical stability of polysilicon line structures in relevant process liquids. The mechanical test was based on nanomanipulation with an atomic force microscope. Compared to fracture tests in air, data acquired in liquid isopropanol revealed a stabilizing effect. The differences in fracture forces can be attributed to a stress corrosion process on the surface. The size of the generated damage was influenced by the viscosity of the surrounding media.</abstract>
    <parentTitle language="eng">Journal of Micromechanics and Microengineering</parentTitle>
    <identifier type="doi">10.1088/0960-1317/21/2/025001</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="BegutachtungStatus">peer-reviewed</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Daniel Peter</author>
    <author>Michael Dalmer</author>
    <author>Alfred Lechner</author>
    <author>Alexander M. Gigler</author>
    <author>Robert W. Stark</author>
    <author>Wolfgang Bensch</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5254</id>
    <completedYear/>
    <publishedYear>2011</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>191</pageFirst>
    <pageLast>196</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>1299</volume>
    <type>conferenceobject</type>
    <publisherName>Springer Nature</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Solid bridging during pattern collapse (stiction) studied on silicon nanoparticles</title>
    <abstract language="eng">The high surface to volume ratio of nanoparticles allows a detailed experimental study of the surface phenomena associated with solid bridging. Besides bulk analyses, the local view on the structure and composition via HRTEM is particularly essential. 50 nm core shell particles consisting of a silicon (Si) core and a SiO2 shell were used as model system to understand surface phenomena appearing for Si-based nanostructures. Evaporative drying from de-ionized water shows the most significant bridging effect based on SiO2. There is only a localized deposition of oxides between the particles during the drying process and no overall oxidation. For the deposition material, silicates are the most likely candidates.</abstract>
    <parentTitle language="eng">MRS Online Proceedings Library</parentTitle>
    <identifier type="doi">10.1557/opl.2011.397</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="ConferenceStatement">Materials Research Society Symposium</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Daniel Peter</author>
    <author>Michael Dalmer</author>
    <author>Andriy Lotnyk</author>
    <author>Lorenz Kienle</author>
    <author>Alfred Lechner</author>
    <author>Wolfgang Bensch</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5537</id>
    <completedYear/>
    <publishedYear>2009</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>24</issue>
    <volume>MA2009-02</volume>
    <type>article</type>
    <publisherName>IOP Science</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">A Study on the Structure Collapse Mechanisms for High Aspect Ratio Structures with Application to Clean Processing</title>
    <parentTitle language="eng">ECS Meeting Abstracts</parentTitle>
    <identifier type="doi">10.1149/MA2009-02/24/2084</identifier>
    <enrichment key="opus.import.date">2022-10-29T17:49:03+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="opus.doi.autoCreate">false</enrichment>
    <enrichment key="opus.urn.autoCreate">true</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Daniel Peter</author>
    <author>Frank Holsteyns</author>
    <author>Michael Dalmer</author>
    <author>Hans Kruwinus</author>
    <author>Alfred Lechner</author>
    <author>Wolfgang Bensch</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>7432</id>
    <completedYear/>
    <publishedYear>2024</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>preprint</type>
    <publisherName>Elsevier</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Effect of Temperature on the Growth of Cu(I)O Nanocubes: The Impact of the Copper Precursor Species</title>
    <abstract language="eng">Cuprous oxide (Cu2O) nanoparticles were synthesized using a wet chemical surfactant free method at different synthesis temperatures from 25 ◦C to 60 ◦C. Morphology, size, and chemical composition of the prepared Cu2O nanoparticles were analyzed by SEM, PXRD, and ATR-IR. We discovered that the chemical composition of the Cu2O nanoparticles remained unaffected by the synthesis temperature. However, morphology and size of the nanoparticles showed a strong temperature dependency. This could be attributed to the temperature induced formation of cupric oxide (CuO) species from the copper hydroxide (Cu(OH)2 ) precursor which also functions as copper precursor for the Cu2O nanoparticle growth. The cupric oxide species was determined to be the main cause for the formation of micrometer sized particles, whereas with the Cu(OH)2 precursor species for the Cu2O nanoparticles nanocubes with smaller edge lengths as well as octahedrons were obtained.</abstract>
    <parentTitle language="eng">SSRN</parentTitle>
    <identifier type="doi">10.2139/ssrn.4909639</identifier>
    <enrichment key="opus.import.date">2024-08-24T04:08:29+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
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    <enrichment key="opus.urn.autoCreate">false</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Tobias Schwarz</author>
    <author>Angelina Pastötter</author>
    <author>Trung Tran</author>
    <author>Marc Schlosser</author>
    <author>Corinna Kaulen</author>
    <author>Alfred Lechner</author>
    <author>Martin Kammler</author>
    <author>Adam Slabon</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>nanoparticle</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Copper oxide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>crystal growth</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Crystal structure</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5255</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>127</pageFirst>
    <pageLast>130</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>187</volume>
    <type>article</type>
    <publisherName>Trans Tech Publications</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">The influence of liquid media on the fracture strength of polysilicon nanostructures</title>
    <abstract language="eng">The mechanical stability of nanostructures depends on the surrounding medium. Their stability was probed by lateral force microscopy in liquid media. Previously reported data on water and isopropanol showed an increase in the fracture strength for the latter. Further tests with other alcohols (ethanol, 1-butanol) also showed an increasing strength. The interface between the liquid and the surface is the decisive factor for the influence of the media. When altering the interface with a cationic surfactant or a self-assembled monolayer, an increase of the fracture force by 100 % compared to de-ionized water could be measured.</abstract>
    <parentTitle language="eng">Solid State Phenomena</parentTitle>
    <identifier type="doi">10.4028/www.scientific.net/SSP.187.127</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Daniel Peter</author>
    <author>Michael Dalmer</author>
    <author>Alfred Lechner</author>
    <author>Alexander M. Gigler</author>
    <author>Robert W. Stark</author>
    <author>Wolfgang Bensch</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>pattern collapse</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>fracture strength</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>damage</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>atomic force microscopy</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>4075</id>
    <completedYear/>
    <publishedYear>2003</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume/>
    <type>article</type>
    <publisherName>Optical Society of America</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Femtosecond X-ray Diffraction Study of Large Amplitude Coherent Optical Phonons in Laser-Excited Bismuth</title>
    <abstract language="eng">Femtosecond time-resolved X-ray diffraction was used to directly study optical phonons in laser-excited Bismuth. A periodic modulation of the diffraction efficiency reveals initially coherent lattice distortions with atomic displacements of nearly 10% of the nearest- neighbor-distance.</abstract>
    <parentTitle language="eng">Conference on Lasers and Electro-Optics, 1–6 June 2003, Baltimore, Maryland</parentTitle>
    <identifier type="url">https://opg.optica.org/abstract.cfm?uri=cleo-2003-CMZ6</identifier>
    <enrichment key="opus.import.date">2022-06-07T14:31:45+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Klaus Sokolowski-Tinten</author>
    <author>Christian Blome</author>
    <author>Juris Blums</author>
    <author>Clemens Dietrich</author>
    <author>Alexander Tarsevitch</author>
    <author>Michael Horn-von Hoegen</author>
    <author>Dietrich von der Linde</author>
    <author>Andrea Cavalleri</author>
    <author>Martin Kammler</author>
    <author>Ingo Uschmann</author>
    <author>Eckhart Foerster</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othpublikationsherkunft" number="">Externe Publikationen</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>4053</id>
    <completedYear/>
    <publishedYear>2012</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber/>
    <edition/>
    <issue>18</issue>
    <volume>109</volume>
    <type>article</type>
    <publisherName>APS</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Atomistic picture of charge density wave formation at surfaces</title>
    <abstract language="eng">We used ultrafast electron diffraction and density-functional theory calculations to gain insight into the charge density wave (CDW) formation on In/Si(111). Weak excitation by a femtosecond-laser pulse results in the melting of the CDW. The immediate freezing is hindered by a barrier for the motion of atoms during the phase transition: The melted CDW constitutes a long-lived, supercooled phase and is strong evidence for a first-order transition. The freezing into the CDW is triggered by preexisting adsorbates. Starting at these condensation nuclei, the CDW expands one dimensionally on the In/Si(111) surface, with a constant velocity of more than 80 m/s.</abstract>
    <parentTitle language="eng">Physical review letters</parentTitle>
    <identifier type="doi">10.1103/PhysRevLett.109.186101</identifier>
    <enrichment key="opus.import.date">2022-06-07T14:31:45+00:00</enrichment>
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    <enrichment key="BegutachtungStatus">peer-reviewed</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Simone Wall</author>
    <author>Boris Krenzer</author>
    <author>Stefan Wippermann</author>
    <author>Simone Sanna</author>
    <author>Friedrich Klasing</author>
    <author>Anja Hanisch-Blicharski</author>
    <author>Martin Kammler</author>
    <author>Wolf Gero Schmidt</author>
    <author>Michael Horn-von Hoegen</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othpublikationsherkunft" number="">Externe Publikationen</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
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