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  <doc>
    <id>4074</id>
    <completedYear/>
    <publishedYear>2004</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>3056</pageFirst>
    <pageLast>3058</pageLast>
    <pageNumber>3</pageNumber>
    <edition/>
    <issue>15</issue>
    <volume>85</volume>
    <type>article</type>
    <publisherName>American Institute of Physics</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Transition in growth mode by competing strain relaxation mechanisms</title>
    <abstract language="eng">Surfactant mediated epitaxy of Si(1−x)Gex alloys on Si(111) can, besides technological importance, clarify the influence of the lattice mismatch during surfactant mediated heteroepitaxial growth. For low Ge concentration we find an immediate layer-by-layer growth, whereas at high Ge concentration a roughening transition followed by relaxation of the lattice mismatch in a periodic dislocation network is preferred. This behavior can be explained by comparing the dislocation nucleation rate on a smooth surface with the island nucleation rate on a pseudomorphic film.</abstract>
    <parentTitle language="eng">Applied Physics Letters</parentTitle>
    <subTitle language="eng">surfactant mediated epitaxy of SiGe alloys on Si</subTitle>
    <identifier type="doi">10.1063/1.1803914</identifier>
    <enrichment key="BegutachtungStatus">peer-reviewed</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Martin Kammler</author>
    <author>Michael Horn-von Hoegen</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othpublikationsherkunft" number="">Externe Publikationen</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>4105</id>
    <completedYear/>
    <publishedYear>2004</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>170</pageFirst>
    <pageLast>174</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>79</volume>
    <type>conferenceobject</type>
    <publisherName>Springer</publisherName>
    <publisherPlace>Berlin, Heidelberg</publisherPlace>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Ultrafast X-ray diffraction</title>
    <abstract language="eng">In the last few years the generation of femtosecond pulses in the X-ray regime has become possible. These ultrashort X-ray pulses have enabled femtosecond time- resolution to be extended to X-rays.</abstract>
    <parentTitle language="eng">Ultrafast Phenomena XIV</parentTitle>
    <identifier type="isbn">978-3-540-27213-7</identifier>
    <identifier type="doi">10.1007/3-540-27213-5_53</identifier>
    <enrichment key="opus.import.date">2022-06-07T14:31:45+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <enrichment key="OtherSeries">Springer Series in Chemical Physics ; 79</enrichment>
    <enrichment key="ConferenceStatement">Proceedings of the 14th International Conference, Niigata, Japan, July 25--30, 2004</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Klaus Sokolowski-Tinten</author>
    <author>Christian Blome</author>
    <author>Juris Blums</author>
    <author>Uladzimir Shymanovich</author>
    <author>Matthieu Nicoul</author>
    <author>Andrea Cavalleri</author>
    <author>A. Tarasevitch</author>
    <author>Michael Horn-von Hoegen</author>
    <author>Martin Kammler</author>
    <author>Dietrich von der Linde</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othpublikationsherkunft" number="">Externe Publikationen</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
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