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  <doc>
    <id>799</id>
    <completedYear/>
    <publishedYear>2014</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst/>
    <pageLast/>
    <pageNumber>80</pageNumber>
    <edition/>
    <issue/>
    <volume/>
    <type>periodicalpart</type>
    <publisherName/>
    <publisherPlace>Regensburg</publisherPlace>
    <creatingCorporation>Ostbayerische Technische Hochschule Regensburg</creatingCorporation>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Forschungsbericht 2013</title>
    <identifier type="urn">urn:nbn:de:bvb:898-opus4-7990</identifier>
    <identifier type="doi">10.35096/othr/pub-799</identifier>
    <author>Josef Beimler</author>
    <author>Caroline Leißl</author>
    <author>Lena Ebner</author>
    <author>Michael Elsner</author>
    <author>Gerhard Mühlbauer</author>
    <author>Dieter Kohlert</author>
    <author>Martin J. W. Schubert</author>
    <author>Andreas P. Weiß</author>
    <author>Michael Sterner</author>
    <author>Thomas Raith</author>
    <author>Martin Afranseder</author>
    <author>Tobias Krapf</author>
    <author>Jürgen Mottok</author>
    <author>Christian Siemers</author>
    <author>Benjamin Großmann</author>
    <author>Johannes Höcherl</author>
    <author>Thomas Schlegl</author>
    <author>Ralph Schneider</author>
    <author>Johannes Milaev</author>
    <author>Christina Rampelt</author>
    <author>Christian Roduner</author>
    <author>Christoph Glowa</author>
    <author>Christoph Bachl</author>
    <author>Claus Schliekmann</author>
    <author>Alfons Gnan</author>
    <author>Martin Grill</author>
    <author>Karl Ruhland</author>
    <author>Thomas Piehler</author>
    <author>Daniel Friers</author>
    <author>Harald Wels</author>
    <author>Kenny Pflug</author>
    <author>Markus Kucera</author>
    <author>Thomas Waas</author>
    <author>Felix Schlachetzki</author>
    <author>Sandra Boy</author>
    <author>Josef Pemmerl</author>
    <author>Alexander Leis</author>
    <author>Andreas F.X. Welsch</author>
    <author>Franz Graf</author>
    <author>Gerhard Zenger</author>
    <author>Klaus Volbert</author>
    <author>Thomas Waas</author>
    <author>Stefanie Scherzinger</author>
    <author>Meike Klettke</author>
    <author>Uta Störl</author>
    <author>C. Heyl</author>
    <author>A. Boldenko</author>
    <author>Gareth J. Monkman</author>
    <author>Richard Kujat</author>
    <author>Ulrich Briem</author>
    <author>Stefan Hierl</author>
    <author>Sebastian Talbot</author>
    <author>Anton Schmailzl</author>
    <author>Robert Damian Ławrowski</author>
    <author>Christian Prommesberger</author>
    <author>Christoph Langer</author>
    <author>Florian Dams</author>
    <author>Rupert Schreiner</author>
    <author>Piergiorgio Valentino</author>
    <author>Marco Romano</author>
    <author>Ingo Ehrlich</author>
    <author>Franco Furgiuele</author>
    <author>Norbert Gebbeken</author>
    <author>Michael Eisenried</author>
    <author>Bastian Jungbauer</author>
    <author>Albert Hutterer</author>
    <author>Michael Bauhuber</author>
    <author>Andreas Mikrievskij</author>
    <author>Monika Argauer</author>
    <author>Helmut Hummel</author>
    <author>Alfred Lechner</author>
    <author>Thomas Liebetruth</author>
    <author>Michael Schumm</author>
    <author>Saskia Joseph</author>
    <author>Michael Reschke</author>
    <author>Alexander Soska</author>
    <author>Irmgard Schroll-Decker</author>
    <author>Michael Putzer</author>
    <author>John Rasmussen</author>
    <author>Sebastian Dendorfer</author>
    <author>Tim Weber</author>
    <author>Amir Andreas Al-Munajjed</author>
    <author>Gijsbertus Jacob Verkerke</author>
    <author>Tobias Renkawitz</author>
    <author>Sonja Haug</author>
    <author>Clarissa Rudolph</author>
    <author>Annika Zeitler</author>
    <author>Simon Schaubeck</author>
    <author>Oliver Steffens</author>
    <author>Christian Rechenauer</author>
    <author>Thekla Schulz-Brize</author>
    <author>Florian Fleischmann</author>
    <author>Wolfgang Kusterle</author>
    <author>Anne Beer</author>
    <author>Bernd Wagner</author>
    <author>Thomas Neidhart</author>
    <series>
      <title>Forschungsberichte der OTH Regensburg</title>
      <number>2013</number>
    </series>
    <collection role="institutes" number="HL">Hochschulleitung/Hochschulverwaltung</collection>
    <collection role="othpublikationsherkunft" number="">Von der OTH Regensburg herausgegeben</collection>
    <collection role="institutes" number="IAFW">Zentrum für Forschung und Transfer (ZFT ab 2024; vorher: IAFW)</collection>
    <collection role="persons" number="sternerfenes">Sterner, Michael (Prof. Dr.) - FENES / Forschungsgruppe Energiespeicher</collection>
    <thesisPublisher>Ostbayerische Technische Hochschule Regensburg</thesisPublisher>
    <file>https://opus4.kobv.de/opus4-oth-regensburg/files/799/Forschungsbericht_2013.pdf</file>
  </doc>
  <doc>
    <id>5206</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>deu</language>
    <pageFirst>1428</pageFirst>
    <pageLast>1433</pageLast>
    <pageNumber/>
    <edition/>
    <issue>6</issue>
    <volume>16</volume>
    <type>article</type>
    <publisherName>Elsevier</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="deu">Isotropic wet chemical etching of deep channels with optical surface quality in silicon with HNA based etching solutions</title>
    <abstract language="eng">Online trace analysis based on UV/Vis spectroscopy requires long detection paths. Therefore an isotropic wet etch process in silicon is developed to fabricate a 300 µm deep channel with low channel wall roughness for desired light guidance application. Four etchant compositions were compared in terms of etching rate, surface roughness and selectivity in a beaker process. The best fitting mixture was selected. To further increase the surface quality (bubble issue) a spin etcher tool is used for producing the channels. The dependence of homogeneity and defect density on media flux, and rotation velocity was investigated. Results show that high rotation velocity and high media flux lead to great defects in the channel wall. Through rotation of the wafer during etching, the etching rate of silicon rises compared to the beaker process due to the rapid removal of etch products and simultaneous supply of fresh etchant. After 38 min of etching, 300 µm deep semi-circular channels with high optical quality (Rq=10 nm±2 nm) over 3 m were produced.</abstract>
    <parentTitle language="deu">Materials Science in Semiconductor Processing</parentTitle>
    <identifier type="url">https://www.scopus.com/authid/detail.uri?authorId=22980567700#disabled</identifier>
    <identifier type="doi">10.1016/j.mssp.2013.05.017</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Michael Bauhuber</author>
    <author>Andreas Mikrievskij</author>
    <author>Alfred Lechner</author>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
  <doc>
    <id>5226</id>
    <completedYear/>
    <publishedYear>2013</publishedYear>
    <thesisYearAccepted/>
    <language>eng</language>
    <pageFirst>269</pageFirst>
    <pageLast>273</pageLast>
    <pageNumber/>
    <edition/>
    <issue/>
    <volume>195</volume>
    <type>article</type>
    <publisherName>Trans Tech Publications</publisherName>
    <publisherPlace/>
    <creatingCorporation/>
    <contributingCorporation/>
    <belongsToBibliography>0</belongsToBibliography>
    <completedDate>--</completedDate>
    <publishedDate>--</publishedDate>
    <thesisDateAccepted>--</thesisDateAccepted>
    <title language="eng">Real-time analyses of metal contaminations in the ppb-range</title>
    <abstract language="eng">In high-tech processing even smallest concentrations of metal ions in process media are of the utmost significance because they cause expensive production failures. Currently, cost-intensive equipment, special trained staff and time consuming analyses are necessary to detect these contaminations in order to avoid failures. The Centers of Excellence Nanochem and Sensorics at the University of Applied Sciences Regensburg (owner of patent PCT/EP2010/064833) and their industrial partner Micro-Epsilon GmbH are developing a new miniaturized measurement device which allows cost-effective real-time analysis of fluidic media for the first time. The system is fully automated and can be directly connected to wet-etch benches. Hence it allows continuous real-time surveillance of metal contaminations in the ppb-range through absorption spectroscopy in process media. For this purpose a very small sample amount of the process medium and a specific complexing agent are mixed together. This leads to an increase in the molar extinction coefficients and though even smallest contaminations become visible. The main parts of our development are the simulation of the different system components, their production and chemical analyses with the evaluation model.</abstract>
    <parentTitle language="eng">Solid State Phenomena</parentTitle>
    <identifier type="doi">10.4028/www.scientific.net/SSP.195</identifier>
    <enrichment key="opus.import.date">2022-08-20T07:06:56+00:00</enrichment>
    <enrichment key="opus.source">sword</enrichment>
    <enrichment key="opus.import.user">importuser</enrichment>
    <licence>Keine Lizenz - Es gilt das deutsche Urheberrecht: § 53 UrhG</licence>
    <author>Albert Hutterer</author>
    <author>Michael Bauhuber</author>
    <author>Helmut Hummel</author>
    <author>Alfred Lechner</author>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Absorption</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Analysis</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Complexing Agent</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Light Guidance</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Liquid-Core Waveguide</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Metal Ions</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Online Measurement</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Real-Time</value>
    </subject>
    <subject>
      <language>eng</language>
      <type>uncontrolled</type>
      <value>Total Internal Reflection</value>
    </subject>
    <collection role="institutes" number="FakANK">Fakultät Angewandte Natur- und Kulturwissenschaften</collection>
    <collection role="othforschungsschwerpunkt" number="16316">Produktion und Systeme</collection>
    <collection role="institutes" number="">Labor Nanoanalytik und Halbleiterchemie (Nanochem)</collection>
  </doc>
</export-example>
