@article{PeterDalmerLechneretal., author = {Peter, Daniel and Dalmer, Michael and Lechner, Alfred and Gigler, Alexander M. and Stark, Robert W. and Bensch, Wolfgang}, title = {Measurement of the mechanical stability of semiconductor line structures in drying liquids with application to pattern collapse}, series = {Journal of Micromechanics and Microengineering}, volume = {21}, journal = {Journal of Micromechanics and Microengineering}, number = {2}, publisher = {IOP Science}, doi = {10.1088/0960-1317/21/2/025001}, abstract = {Enhanced particle removal processes in wet cleaning as well as drying processes of semiconductor wafers can cause significant lateral forces on surface structures. These forces, however, must not exceed the mechanical stability of structures on the wafer. Thus, a mechanical fracture test was used to assess the lateral mechanical stability of polysilicon line structures in relevant process liquids. The mechanical test was based on nanomanipulation with an atomic force microscope. Compared to fracture tests in air, data acquired in liquid isopropanol revealed a stabilizing effect. The differences in fracture forces can be attributed to a stress corrosion process on the surface. The size of the generated damage was influenced by the viscosity of the surrounding media.}, language = {en} } @inproceedings{PeterDalmerLotnyketal., author = {Peter, Daniel and Dalmer, Michael and Lotnyk, Andriy and Kienle, Lorenz and Lechner, Alfred and Bensch, Wolfgang}, title = {Solid bridging during pattern collapse (stiction) studied on silicon nanoparticles}, series = {MRS Online Proceedings Library}, volume = {1299}, booktitle = {MRS Online Proceedings Library}, publisher = {Springer Nature}, doi = {10.1557/opl.2011.397}, pages = {191 -- 196}, abstract = {The high surface to volume ratio of nanoparticles allows a detailed experimental study of the surface phenomena associated with solid bridging. Besides bulk analyses, the local view on the structure and composition via HRTEM is particularly essential. 50 nm core shell particles consisting of a silicon (Si) core and a SiO2 shell were used as model system to understand surface phenomena appearing for Si-based nanostructures. Evaporative drying from de-ionized water shows the most significant bridging effect based on SiO2. There is only a localized deposition of oxides between the particles during the drying process and no overall oxidation. For the deposition material, silicates are the most likely candidates.}, language = {en} } @article{PeterHolsteynsDalmeretal., author = {Peter, Daniel and Holsteyns, Frank and Dalmer, Michael and Kruwinus, Hans and Lechner, Alfred and Bensch, Wolfgang}, title = {A Study on the Structure Collapse Mechanisms for High Aspect Ratio Structures with Application to Clean Processing}, series = {ECS Meeting Abstracts}, volume = {MA2009-02}, journal = {ECS Meeting Abstracts}, number = {24}, publisher = {IOP Science}, doi = {10.1149/MA2009-02/24/2084}, language = {en} } @article{PeterDalmerLechneretal., author = {Peter, Daniel and Dalmer, Michael and Lechner, Alfred and Gigler, Alexander M. and Stark, Robert W. and Bensch, Wolfgang}, title = {The influence of liquid media on the fracture strength of polysilicon nanostructures}, series = {Solid State Phenomena}, volume = {187}, journal = {Solid State Phenomena}, publisher = {Trans Tech Publications}, doi = {10.4028/www.scientific.net/SSP.187.127}, pages = {127 -- 130}, abstract = {The mechanical stability of nanostructures depends on the surrounding medium. Their stability was probed by lateral force microscopy in liquid media. Previously reported data on water and isopropanol showed an increase in the fracture strength for the latter. Further tests with other alcohols (ethanol, 1-butanol) also showed an increasing strength. The interface between the liquid and the surface is the decisive factor for the influence of the media. When altering the interface with a cationic surfactant or a self-assembled monolayer, an increase of the fracture force by 100 \% compared to de-ionized water could be measured.}, language = {en} }