@article{SchmidtDenkerDashielletal., author = {Schmidt, Oliver G. and Denker, Ullrich and Dashiell, Michael W. and Jin-Phillipp, Neng Yun and Eberl, Karl and Schreiner, Rupert and Gr{\"a}beldinger, Hedwig and Schweizer, Heinz C. and Christiansen, Silke H. and Ernst, Frank}, title = {Laterally aligned Ge/Si islands: a new concept for faster field-effect transistors}, series = {Materials Science and Engineering B}, volume = {89}, journal = {Materials Science and Engineering B}, number = {1-3}, publisher = {Elsevier}, address = {New York, NY}, issn = {1873-4944}, doi = {10.1016/S0921-5107(01)00810-8}, pages = {101 -- 105}, abstract = {Self-assembled and coherently strained Ge dots were grown on a Si/SiGe superlattice, which was deposited on a flat Si(001) substrate surface patterned with a regular array of straight trenches. The superlattice translates the surface modulation of the substrate into a strain-field modulation, which causes the Ge dots on its surface to form along straight lines above the buried trenches. This approach provides self-assembled Ge dots with excellent lateral periodicity, which might be useful for fabricating dot-based field-effect-transistors (DotFETs). Here, we propose the concept of a modulation-doped p-channel DotFET (p-MOD-DotFET). The p-MOD-DotFET relies on embedded Ge-rich nanostructures, which provide p-channels through the Ge-rich dots. A high Ge concentration in the dots is desirable in order to exploit the high hole mobility of Ge-rich material. We show that the commonly observed Si-Ge intermixing during Si capping of Ge dots can be suppressed by overgrowing the islands at low temperature.}, language = {en} }