@inproceedings{HechtBauereiβSellmairetal., author = {Hecht, Fabian and Bauereiβ, Florian and Sellmair, Josef and Buchner, Philipp and Hausladen, Matthias and Schreiner, Rupert}, title = {Electron Beam Induced Growth of Carbon Nanotips on Tungsten and Silicon Fieldemitters}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188960}, pages = {160 -- 162}, abstract = {In our experiments we grew electron emitting carbon nanostructures on tungsten tips. Subsequently, we transferred the growth process to pre-structured phosphorus-doped n-type silicon and obtained emitting carbon nanostructures directly grown on silicon. After growth of the nanostructures, the silicon field emitters showed increased emission currents of 76 nA at 1.1 kV (compared to 6 nA under the same conditions before growth).}, language = {en} } @inproceedings{EilerHoeglLindneretal., author = {Eiler, Julian and H{\"o}gl, Christina and Lindner, Matthias and Bachmann, Michael and Schreiner, Rupert}, title = {Miniaturized Surface Dielectric Barrier Discharge Plasma Actuators for Application in Chemical Analysis Systems}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188884}, pages = {40 -- 42}, abstract = {A new concept for a miniaturized planar ion source based on a surface dielectric barrier discharge (SDBD) is presented. A fabrication method based on a stamping process is described, and the plasma actuators are characterized based on their power in dependence of the applied voltage. The voltage for plasma ignition is approx. 1 kV with a maximum plasma power of 40 W/m at 3,4 kV.}, language = {en} } @article{PirkerŁawrowskiSchreineretal., author = {Pirker, Luka and Ławrowski, Robert Damian and Schreiner, Rupert and Remškar, Maja and Višić, Bojana}, title = {MoₓWₓ₋₁S₂ Nanotubes for Advanced Field Emission Application}, series = {Advanced Functional Materials}, journal = {Advanced Functional Materials}, publisher = {Wiley}, issn = {1616-3028}, doi = {10.1002/adfm.202213869}, pages = {1 -- 8}, abstract = {Transition metal dichalcogenide (TMDC) nanotubes complement the field of low-dimensional materials with their quasi-1D morphology and a wide set of intriguing properties. By introducing different transition metals into the crystal structure, their properties can be tailored for specific purpose and applications. Herein, the characterization and a subsequent preparation of single-nanotube field emission devices of MoxWx-1S2 nanotubes prepared via the chemical vapor transport reaction is presented. Energy-dispersive X-ray spectroscopy, Raman spectroscopy, and X-ray diffraction indicate that the molybdenum and tungsten atoms are randomly distributed within the crystal structure and that the material is highly crystalline. High resolution transmission electron microscopy and electron diffraction (ED) patterns further corroborate these findings. A detailed analysis of the ED patterns from an eight-layer nanotube reveal that the nanotubes grow in the 2H structure, with each shell consists of one bilayer. The work function of the nanotubes is comparable to that of pure MoS2 and lower of pure WS2 NTs, making them ideal candidates for field emission applications. Two devices with different geometrical setup are prepared and tested as field emitters, showing promising results for single nanotube field emission applications.}, language = {en} } @article{SchelsHerdlHausladenetal., author = {Schels, Andreas and Herdl, Florian and Hausladen, Matthias and Wohlfartsst{\"a}tter, Dominik and Edler, Simon and Bachmann, Michael and Pahlke, Andreas and Schreiner, Rupert and Hansch, Walter}, title = {Quantitative Field Emission Imaging for Studying the Doping-Dependent Emission Behavior of Silicon Field Emitter Arrays}, series = {Micromachines}, volume = {14}, journal = {Micromachines}, number = {11}, publisher = {MDPI}, doi = {10.3390/mi14112008}, abstract = {Field emitter arrays (FEAs) are a promising component for novel vacuum micro- and nanoelectronic devices, such as microwave power amplifiers or fast-switching X-ray sources. However, the interrelated mechanisms responsible for FEA degradation and failure are not fully understood. Therefore, we present a measurement method for quantitative observation of individual emission sites during integral operation using a low-cost, commercially available CMOS imaging sensor. The emission and degradation behavior of three differently doped FEAs is investigated in current-regulated operation. The measurements reveal that the limited current of the p-doped emitters leads to an activation of up to 55\% of the individual tips in the array, while the activation of the n-type FEA stopped at around 30\%. This enhanced activation results in a more continuous and uniform current distribution for the p-type FEA. An analysis of the individual emitter characteristics before and after a constant current measurement provides novel perspectives on degradation behavior. A burn-in process that trims the emitting tips to an integral current-specific ideal field enhancement factor is observed. In this process, blunt tips are sharpened while sharp tips are dulled, resulting in homogenization within the FEA. The methodology is described in detail, making it easily adaptable for other groups to apply in the further development of promising FEAs.}, language = {en} } @inproceedings{SchelsHerdlHausladenetal., author = {Schels, Andreas and Herdl, Florian and Hausladen, Matthias and Wohlfartsst{\"a}tter, Dominik and Bachmann, Michael and Edler, Simon and D{\"u}sberg, Felix and Pahlke, Andreas and Buchner, Philipp and Schreiner, Rupert and Hansch, Walter}, title = {Beta Factor Mapping of Individual Emitting Tips During Integral Operation of Field Emission Arrays}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188957}, pages = {224 -- 226}, abstract = {Emission uniformity mappings of field emitter arrays provide important insight into degradation mechanisms, but are often laborious, non-integral, costly, or not quantifiable. Here, a low-cost Raspberry Pi HQ camera is used as an extraction anode to quantify the emission distribution in field emitter arrays. A verification measurement using controlled SEM electron beams proves, that current-voltage characteristics of individual emission sites can be determined by combining the integral electrical data with the image data. The characteristics are used to quantify the field enhancement factors of an 30x30 silicon field emitter array during integral operation. Comparison of the field enhancement factor distributions before and after a one-hour constant current operation at 1 µA shows an increase from 50 actively emitting tips before to 156 after the measurement. It is shown, that the distribution of field enhancement factors shifts towards lower values, due to the increasing degradation for high field enhancement tips, especially above 1500.}, language = {en} } @inproceedings{HerdlKueddelsmannSchelsetal., author = {Herdl, Florian and Kueddelsmann, Maximillian J. and Schels, Andreas and Bachmann, Michael and Edler, Simon and Wohlfartsst{\"a}tter, Dominik and D{\"u}sberg, Felix and Prugger, Alexander and Dillig, Michael and Dams, Florian and Schreiner, Rupert and Coile{\´a}in, Cormac {\´O}. and Zimmermann, Stefan and Pahlke, Andreas and Duesberg, Georg S.}, title = {Characterization and Operation of Graphene-Oxide-Semiconductor Emitters at Atmospheric Pressure Levels}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188974}, pages = {14 -- 16}, abstract = {In recent years Graphene-Oxide-Semiconductor (GOS) electron emitters have attracted a lot of interest due to their outstanding durability in modest vacuum conditions. However, the performance at ambient pressure remains largely unexplored. In this study GOS-emitters are characterized in nitrogen and air at atmospheric pressure, and compared with their vacuum characteristics. For this purpose, lifetime and IV-characteristics measurements are shown. Furthermore, the GOS-emitter was operated as an ionization source for ion mobility spectrometry (IMS) at ambient conditions.}, language = {en} } @inproceedings{HausladenBuchnerSchelsetal., author = {Hausladen, Matthias and Buchner, Philipp and Schels, Andreas and Edler, Simon and Bachmann, Michael and Schreiner, Rupert}, title = {An Integrated Field Emission Electron Source on a Chip Fabricated by Laser-Micromachining and Mems Technology}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10189001}, pages = {115 -- 116}, abstract = {A silicon field emission electron source consisting of a cathode and a grid electrode has been fabricated by laser micromachining. The cathode features 21×21 tips on an area of 4×4 mm 2 , With a self-aligning MEMS technology for the aperture grid, a high electron transmission (99 \%) was achieved. Onset voltages of 50…70 V were observed for an emission current of 1 nA. A stable emission current of 1 mA ± 1.3 \% at an extraction voltage of 250 V was observed during a 30-min operation.}, language = {en} } @inproceedings{BuchnerHausladenSchelsetal., author = {Buchner, Philipp and Hausladen, Matthias and Schels, Andreas and Herdl, Florian and Edler, Simon and Bachmann, Michael and Schreiner, Rupert}, title = {An Integrated Silicon Nanowire Field Emission Electron Source on a Chip with High Electron Transmission}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188878}, pages = {6 -- 8}, abstract = {Silicon nanowire field emission arrays (50 × 50 pillars) were fabricated on a silicon glass hybrid wafer. The glass acts both as the support for the whole structure and insulator between cathode and extraction grid. The extraction grid matches the emitter structures and is optically aligned and adhered to the emitter chip by a vacuum compatible epoxide adhesive. These chips exhibit an emission current of about 600 μA at an extraction voltage of 300 V. The electron transmission through the grid is above 80 \%. 58-hour longtime measurements were conducted showing low degradation of the emission current and high stability of electron transmission.}, language = {en} } @article{BachmannDuesbergPahlkeetal., author = {Bachmann, Michael and D{\"u}sberg, Felix and Pahlke, Andreas and Edler, Simon and Schels, Andreas and Herdl, Florian and Hausladen, Matthias and Buchner, Philipp and Schreiner, Rupert}, title = {The "LED-version" of the electron gun: An electron source for operation in ambient pressure environments based on silicon field emitter arrays}, series = {Vakuum in Forschung und Praxis}, volume = {35}, journal = {Vakuum in Forschung und Praxis}, number = {3}, publisher = {Wiley}, doi = {10.1002/vipr.202300801}, pages = {32 -- 37}, abstract = {We report on our progress to develop and optimize electron sources for practical applications. A simple fabrication process is introduced based on a wafer dicing saw and a wet chemical etch step without the need for a clean room. Due to the formation of crystal facets the samples show a homogeneous geometry throughout the array. Characterization techniques are developed to systematically compare various arrays. A very defined measurement procedure based on current controlled IV-sweeps as well as lifetime measurements at various currents is proposed. To investigate the current distribution in the array a commercial CMOS detector is used and shows the potential for in depth analysis of the arrays. Finally, a compact hermetically sealed housing is presented enabling electron generation in atmospheric pressure environments.}, language = {en} }