@inproceedings{ŁawrowskiPrommesbergerLangeretal., author = {Ławrowski, Robert Damian and Prommesberger, Christian and Langer, Christoph and Dams, Florian and Schreiner, Rupert}, title = {Influence of reactive ion etching parameters on the geometry of silicon tip cathodes for field emission}, series = {Applied Research Conference 2013, ARC 2013 : 17th and 18th October 2013, Deggendorf}, booktitle = {Applied Research Conference 2013, ARC 2013 : 17th and 18th October 2013, Deggendorf}, publisher = {Shaker}, address = {Aachen}, isbn = {978-3-8440-2274-2}, pages = {67 -- 69}, language = {en} } @incollection{ŁawrowskiPrommesbergerLangeretal., author = {Ławrowski, Robert Damian and Prommesberger, Christian and Langer, Christoph and Dams, Florian and Schreiner, Rupert}, title = {Feldemissionselektronenquellen basierend auf Siliziumemittern mit hohen Aspektverh{\"a}ltnis}, series = {Forschungsbericht der OTH Regensburg 2013}, booktitle = {Forschungsbericht der OTH Regensburg 2013}, address = {Regensburg}, pages = {47 -- 48}, language = {de} } @misc{WeberDendorferSuessetal., author = {Weber, Karsten and Dendorfer, Sebastian and S{\"u}ß, Franz and Kubowitsch, Simone and Schratzenstaller, Thomas and Haug, Sonja and Mohr, Christa and Kiesl, Hans and Drechsler, J{\"o}rg and Westner, Markus and Kobus, J{\"o}rn and Schubert, Martin J. W. and Zenger, Stefan and Pietsch, Alexander and Weiß, Josef and Hinterseer, Sebastian and Schieck, Roland and Scherzinger, Stefanie and Klettke, Meike and Ringlstetter, Andreas and St{\"o}rl, Uta and Bissyand{\´e}, Tegawend{\´e} F. and Seeburger, Achim and Schindler, Timo and Ramsauer, Ralf and Kiszka, Jan and K{\"o}lbl, Andreas and Lohmann, Daniel and Mauerer, Wolfgang and Maier, Johannes and Scorna, Ulrike and Palm, Christoph and Soska, Alexander and Mottok, J{\"u}rgen and Ellermeier, Andreas and V{\"o}gele, Daniel and Hierl, Stefan and Briem, Ulrich and Buschmann, Knut and Ehrlich, Ingo and Pongratz, Christian and Pielmeier, Benjamin and Tyroller, Quirin and Monkman, Gareth J. and Gut, Franz and Roth, Carina and Hausler, Peter and Bierl, Rudolf and Prommesberger, Christian and Ławrowski, Robert Damian and Langer, Christoph and Schreiner, Rupert and Huang, Yifeng and She, Juncong and Ottl, Andreas and Rieger, Walter and Kraml, Agnes and Poxleitner, Thomas and Hofer, Simon and Heisterkamp, Benjamin and Lerch, Maximilian and Sammer, Nike and Golde, Olivia and Wellnitz, Felix and Schmid, Sandra and Muntschick, Claudia and Kusterle, Wolfgang and Paric, Ivan and Br{\"u}ckl, Oliver and Haslbeck, Matthias and Schmidt, Ottfried and Schwanzer, Peter and Rabl, Hans-Peter and Sterner, Michael and Bauer, Franz and Steinmann, Sven and Eckert, Fabian and Hofrichter, Andreas}, title = {Forschungsbericht 2017}, editor = {Baier, Wolfgang}, address = {Regensburg}, organization = {Ostbayerische Technische Hochschule Regensburg}, isbn = {978-3-9818209-3-5}, doi = {10.35096/othr/pub-1383}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:898-opus4-13835}, subject = {Forschung}, language = {de} } @inproceedings{BachmannDamsDuesbergetal., author = {Bachmann, Michael and Dams, Florian and D{\"u}sberg, F. and Hofmann, Martin and Pahlke, Andreas and Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Schreiner, Rupert}, title = {Stability investigation of high aspect ratio n-type silicon field emitter arrays}, series = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, booktitle = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, publisher = {IEEE}, doi = {10.1109/IVNC.2015.7225584}, pages = {204 -- 205}, abstract = {Electron sources based on silicon field emitter arrays, produced in processes based on semiconductor technology, are good candidates for a miniaturized X-ray source. A key parameter for this application is the stability of the X-ray photon flux and, thus, the emission current. In the present work we have investigated the influence of the residual gas pressure and a resistor in series on the emission stability of a high aspect ratio n-type silicon emitter array with hybrid extraction electrode. An increase of current fluctuations was found for pressures above 10-6 mbar. High resistances in series to the emitter array alter the emission characteristics, but greatly suppress spikes in the emission current and improve its stability. This, however, strongly depends on the bias point. The field enhancement factor is not affected by the resistance. In a long term measurement the emission current was found to be constant after an initial phase of degradation.}, language = {en} } @article{ŁawrowskiPirkerKanekoetal., author = {Ławrowski, Robert Damian and Pirker, Luka and Kaneko, Keita and Kokubo, Hiroki and Bachmann, Michael and Ikuno, Takashi and Remskar, Maja and Schreiner, Rupert}, title = {Field emission from nanotubes and flakes of transition metal dichalcogenides}, series = {Journal of Vacuum Science and Technology B}, volume = {38}, journal = {Journal of Vacuum Science and Technology B}, number = {3}, publisher = {AIP Publishing}, doi = {10.1116/1.5140474}, pages = {032801}, abstract = {Transition metal dichalcogenides such as MoS2 and WS2 are low-dimensional semiconductor materials. MoS2 and WS2 nanotubes and flakes were grown by a chemical transport reaction under a temperature gradient. I2 was used as a transport agent for previously synthesized MoS2 and WS2, respectively. These multilayered nanotubes are indirect bandgap semiconductors with a bandgap depending on their diameter. WS2 flakes were prepared by the sulfurization of thin WOx flakes. To increase the field enhancement of such low-dimensional structures by a higher aspect ratio, two approaches were examined: (a) the MoS2 and WS2 nanotubes were attached individually by a focused ion beam with Pt on dry etched n-type Si pillars and (b) the WS2 flakes were grown directly on the surface of the (n-type and p-type) Si pillars. Integral field emission measurements were performed in a diode configuration with a 50 μm mica spacer in a vacuum chamber at pressures of about 10-9 mbar. At a voltage of 900 V (18 MV/m), the integral emission current from the nanotubes is up to 11 μA for the lateral mounted MoS2 and about 1.3 μA (1.0 μA) for the upright mounted WS2 (MoS2). The onset voltage for a current of 1 nA is about 550 V for MoS2 and 500 V for WS2, respectively. The voltage conversion factor is in the range of 6 × 104-8 × 104 cm-1 for the nanotubes. The mounted MoS2 flakes show a field emission current of about 6 μA at 18 MV/m in contrast to the directly grown WS2 flakes, which show a pronounced saturation regime and, therefore, a lower emission current of about 0.5 μA is reached at 1500 V (25 MV/m). The WS2 flakes show a two times higher (1 × 105 cm-1) voltage conversion factor in comparison to the MoS2 flakes (5 × 104 cm-1). The extracted characteristics of the current-limiting part show a difference in the behavior of the extracted current-limiting characteristics between the lateral (linear) and upright mounted (exponential) nanotubes and the MoS2 flakes. In contrast, the WS2 flakes show charge carrier depletion effects.}, language = {en} } @inproceedings{SerbunPorshynMuelleretal., author = {Serbun, Pavel and Porshyn, Vitali and M{\"u}ller, G{\"u}nter and L{\"u}tzenkirchen-Hecht, Dirk and Prommesberger, Christian and Langer, Christoph and Ławrowski, Robert Damian and Schreiner, Rupert}, title = {Field emission behavior of single n- and p-type black Si pillar structures}, series = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, booktitle = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, publisher = {IEEE}, doi = {10.1109/IVNC.2018.8520292}, pages = {1-2}, abstract = {We have investigated the properties of single n- and p-type black silicon (b-Si) pillars with a height of 20 μ m under strong electric field and halogen lamp or laser illumination. For both type of b-Si pillar structures, I-V measurements revealed strong activation effects, which consisted in sudden current increases during the first up/down voltage sweeps. The maximum reproducible emission current from a single n-type b-Si pillar structure was about 15 μ A. A pronounced saturation region at 240 nA was observed for a single p-type b-Si pillar. The current fluctuation over time showed a standard deviation of 28\% and 2.5\% for n- and p-type single b-Si pillar structures, respectively. Optical switching under halogen lamp illumination resulted in at least 3 times higher saturation currents and showed a linear dependence of the FE current on the laser power.}, language = {en} } @inproceedings{SerbunPorshynMuelleretal., author = {Serbun, Pavel and Porshyn, Vitali and M{\"u}ller, G{\"u}nter and Mingels, Stephan and L{\"u}tzenkirchen-Hecht, Dirk and Bachmann, Michael and D{\"u}sberg, Felix and Dams, Florian and Hofmann, Martin and Pahlke, Andreas and Prommesberger, Christian and Langer, Christoph and Ławrowski, Robert Damian and Schreiner, Rupert}, title = {Field emission behavior of Au-tip-coated p-type Si pillar structures}, series = {29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada}, booktitle = {29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada}, publisher = {IEEE}, issn = {2380-6311}, doi = {10.1109/IVNC.2016.7551516}, pages = {181 -- 182}, abstract = {Precisely aligned high-aspect-ratio (HAR) silicon tip arrays were fabricated using enhanced reactive ion etching with an inductively-coupled-plasma followed by a sharpening oxidation. A gold thin film was then sputtered only on the tips of the HAR structures. Field-emission (FE) properties from Au-coated HAR p-Si tip array cathodes have been systematically investigated by means of field emission scanning microscopy (FESM). A rather high efficiency of the HAR Si structures (71\% at 550 V), but limited homogeneous FE with currents of 1-600 nA might be correlated with the varying geometry of the tips and the presence of oxides. I-V measurements of single Au-coated HAR emitters revealed activation effects and the saturation current region at 3 nA. An increase of the saturation current by 4 orders of magnitude was observed during 20 hours of conditioning at constant voltage, which finally resulted in nearly reproducible FN curves with a ß-factor of 473. An excellent stability of the emission current of less than 1 \% was obtained during the additional long-time conditioning at constant voltage. Optical switching under halogen lamp illumination resulted in at least 2 times higher saturation currents and showed a linear dependence of the FE current on the light color temperature.}, language = {en} } @inproceedings{SerbunPorshynLuetzenkirchenHechtetal., author = {Serbun, Pavel and Porshyn, Vitali and L{\"u}tzenkirchen-Hecht, Dirk and Prommesberger, Christian and Langer, Christoph and Ławrowski, Robert Damian and Schreiner, Rupert}, title = {Photosensitivity of single silicon high-aspect-ratio tips with different doping levels}, series = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, booktitle = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, publisher = {IEEE}, doi = {10.1109/IVNC.2018.8520288}, pages = {1-2}, abstract = {Photosensitivity of single lightly p-doped, highly p-doped, with an integrated p/n junction and intrinsic high-aspect-ratio (HAR) silicon tips was investigated in an ultra-high vacuum environment. The current-voltage characteristics (I-V) of the lightly doped p-type HAR tips showed a characteristic current saturation at around 10-12 nA, whereas the HAR Si tips with p/n junction showed similar saturation phenomena, however, at much smaller current values starting at ~20-30 pA. Optical switching under a halogen lamp illumination resulted in at least 2-4 times higher saturation currents and showed a linear dependence between the illumination power and the FE current, for both types of structures. In case of the highly p-doped HAR tips optical current switching effects, i. e. current saturation, were observed at rather low current levels 1-2 pA. Intrinsic HAR Si-tips showed relative unstable field emission behavior without a clear evidence of the photosensitivity.}, language = {en} } @inproceedings{SchreinerLangerPrommesbergeretal., author = {Schreiner, Rupert and Langer, Christoph and Prommesberger, Christian and Ławrowski, Robert Damian and Dams, Florian and Bachmann, Michael and D{\"u}sberg, F. and Hofmann, Martin and Pahlke, Andreas and Serbun, Pavel and Mingels, Stephan and M{\"u}ller, G{\"u}nter}, title = {Semiconductor field emission electron sources using a modular system concept for application in sensors and x-ray-sources}, series = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, booktitle = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, publisher = {IEEE}, doi = {10.1109/IVNC.2015.7225572}, pages = {178 -- 179}, abstract = {Semiconductor field emitters are suitable candidates for applications, which require a very stable field emission (FE) current and a high emission uniformity over the entire emission area. By using different materials and geometries, we are able to vary the FE characteristics within a wide range. Each specific application requires its own optimized design for the cathode as well as for the other parts of the FE electron source. To meet as many of these requirements as possible while using only a limited number of different prefabricated components, we established a modular system concept for our FE electron source. This allows the implementation of almost every cathode material. For first characterizations, we used gated p-type Si cathodes with 16 tips. We obtained stable FE currents of 0.4 μA for a grid-potential of 400 V and a gate potential of 100 V. Almost 100\% of the electrons are emitted towards the grid-electrode. Parasitic leakage paths, as well as the electron emission towards the gate-electrode can be neglected. Approximately 10\% of the electrons are transmitted through the grid and reach the external anode. This is in good agreement with the optical transmission through the grid-mesh.}, language = {en} } @inproceedings{ŁawrowskiLangerPrommesbergeretal., author = {Ławrowski, Robert Damian and Langer, Christoph and Prommesberger, Christian and Schreiner, Rupert and Mingels, Stephan and Porshyn, Vitali and Serbun, Pavel and M{\"u}ller, G{\"u}nter}, title = {Field emission from surface textured GaN with buried double-heterostructures}, series = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, booktitle = {2015 28th International Vacuum Nanoelectronics Conference (IVNC), 13-17 July 2015, Guangzhou, China}, publisher = {IEEE}, doi = {10.1109/IVNC.2015.7225548}, pages = {106 -- 107}, abstract = {In this contribution we report on field emission (FE) cathodes based on thin-film LED-technology and surface texturing. The FE cathode can be used both as an n-GaN cathode with an electrical contact at the top side metallization as well as a pn-GaN diode contacting only the p-GaN layer at the bottom side of the structure. The local and integral FE properties of the textured surface of the LED structure were investigated. For n-GaN an integral emission current up to 1.0 μA at an electric field of 19 V/μm was achieved. The pn-GaN diode measurements showed an integral current saturation behavior with two orders of magnitude lower FE currents. Regulated voltage scans obtained by FE scanning microscopy revealed a well-distributed emission over the whole cathode area. Measurements under pulsed tunable laser illumination and moderate electric fields indicated charge carrier generation in the buried double-heterostructures at photon energies below 3.5 eV besides normal photoemission above 4.1 eV.}, language = {en} }