@misc{BeimlerLeisslEbneretal., author = {Beimler, Josef and Leißl, Caroline and Ebner, Lena and Elsner, Michael and M{\"u}hlbauer, Gerhard and Kohlert, Dieter and Schubert, Martin J. W. and Weiß, Andreas P. and Sterner, Michael and Raith, Thomas and Afranseder, Martin and Krapf, Tobias and Mottok, J{\"u}rgen and Siemers, Christian and Großmann, Benjamin and H{\"o}cherl, Johannes and Schlegl, Thomas and Schneider, Ralph and Milaev, Johannes and Rampelt, Christina and Roduner, Christian and Glowa, Christoph and Bachl, Christoph and Schliekmann, Claus and Gnan, Alfons and Grill, Martin and Ruhland, Karl and Piehler, Thomas and Friers, Daniel and Wels, Harald and Pflug, Kenny and Kucera, Markus and Waas, Thomas and Schlachetzki, Felix and Boy, Sandra and Pemmerl, Josef and Leis, Alexander and Welsch, Andreas F.X. and Graf, Franz and Zenger, Gerhard and Volbert, Klaus and Waas, Thomas and Scherzinger, Stefanie and Klettke, Meike and St{\"o}rl, Uta and Heyl, C. and Boldenko, A. and Monkman, Gareth J. and Kujat, Richard and Briem, Ulrich and Hierl, Stefan and Talbot, Sebastian and Schmailzl, Anton and Ławrowski, Robert Damian and Prommesberger, Christian and Langer, Christoph and Dams, Florian and Schreiner, Rupert and Valentino, Piergiorgio and Romano, Marco and Ehrlich, Ingo and Furgiuele, Franco and Gebbeken, Norbert and Eisenried, Michael and Jungbauer, Bastian and Hutterer, Albert and Bauhuber, Michael and Mikrievskij, Andreas and Argauer, Monika and Hummel, Helmut and Lechner, Alfred and Liebetruth, Thomas and Schumm, Michael and Joseph, Saskia and Reschke, Michael and Soska, Alexander and Schroll-Decker, Irmgard and Putzer, Michael and Rasmussen, John and Dendorfer, Sebastian and Weber, Tim and Al-Munajjed, Amir Andreas and Verkerke, Gijsbertus Jacob and Renkawitz, Tobias and Haug, Sonja and Rudolph, Clarissa and Zeitler, Annika and Schaubeck, Simon and Steffens, Oliver and Rechenauer, Christian and Schulz-Brize, Thekla and Fleischmann, Florian and Kusterle, Wolfgang and Beer, Anne and Wagner, Bernd and Neidhart, Thomas}, title = {Forschungsbericht 2013}, editor = {Baier, Wolfgang}, address = {Regensburg}, organization = {Ostbayerische Technische Hochschule Regensburg}, doi = {10.35096/othr/pub-799}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:898-opus4-7990}, pages = {80}, language = {de} } @inproceedings{SchubertBloedelConradietal., author = {Schubert, Martin J. W. and Bl{\"o}del, J. and Conradi, P. and Lafosse, P. and Nebel, W. and Neusser, S. and Ryba, M. and Schr{\"o}der, D.}, title = {Extending EDIF for Technology Data}, series = {EDIF World Conference, 1989, San Jose, CA, USA, 11.-14. September}, booktitle = {EDIF World Conference, 1989, San Jose, CA, USA, 11.-14. September}, language = {en} } @misc{WeberDendorferSuessetal., author = {Weber, Karsten and Dendorfer, Sebastian and S{\"u}ß, Franz and Kubowitsch, Simone and Schratzenstaller, Thomas and Haug, Sonja and Mohr, Christa and Kiesl, Hans and Drechsler, J{\"o}rg and Westner, Markus and Kobus, J{\"o}rn and Schubert, Martin J. W. and Zenger, Stefan and Pietsch, Alexander and Weiß, Josef and Hinterseer, Sebastian and Schieck, Roland and Scherzinger, Stefanie and Klettke, Meike and Ringlstetter, Andreas and St{\"o}rl, Uta and Bissyand{\´e}, Tegawend{\´e} F. and Seeburger, Achim and Schindler, Timo and Ramsauer, Ralf and Kiszka, Jan and K{\"o}lbl, Andreas and Lohmann, Daniel and Mauerer, Wolfgang and Maier, Johannes and Scorna, Ulrike and Palm, Christoph and Soska, Alexander and Mottok, J{\"u}rgen and Ellermeier, Andreas and V{\"o}gele, Daniel and Hierl, Stefan and Briem, Ulrich and Buschmann, Knut and Ehrlich, Ingo and Pongratz, Christian and Pielmeier, Benjamin and Tyroller, Quirin and Monkman, Gareth J. and Gut, Franz and Roth, Carina and Hausler, Peter and Bierl, Rudolf and Prommesberger, Christian and Ławrowski, Robert Damian and Langer, Christoph and Schreiner, Rupert and Huang, Yifeng and She, Juncong and Ottl, Andreas and Rieger, Walter and Kraml, Agnes and Poxleitner, Thomas and Hofer, Simon and Heisterkamp, Benjamin and Lerch, Maximilian and Sammer, Nike and Golde, Olivia and Wellnitz, Felix and Schmid, Sandra and Muntschick, Claudia and Kusterle, Wolfgang and Paric, Ivan and Br{\"u}ckl, Oliver and Haslbeck, Matthias and Schmidt, Ottfried and Schwanzer, Peter and Rabl, Hans-Peter and Sterner, Michael and Bauer, Franz and Steinmann, Sven and Eckert, Fabian and Hofrichter, Andreas}, title = {Forschungsbericht 2017}, editor = {Baier, Wolfgang}, address = {Regensburg}, organization = {Ostbayerische Technische Hochschule Regensburg}, isbn = {978-3-9818209-3-5}, doi = {10.35096/othr/pub-1383}, url = {http://nbn-resolving.de/urn:nbn:de:bvb:898-opus4-13835}, subject = {Forschung}, language = {de} } @inproceedings{OoiLeeSchubertetal., author = {Ooi, Boon Yaik and Lee, Wai-Kong and Schubert, Martin J. W. and Ooi, Yu-Wei and Chin, Chee-Yang and Woo, Wing-Hon}, title = {A Flexible and Reliable Internet-of-Things Solution for Real-Time Production Tracking}, series = {IEEE Industrial Electronics and Applications Conference (IEACon): 22.11.2021 - 23.11.2021, Penang, Malaysia}, booktitle = {IEEE Industrial Electronics and Applications Conference (IEACon): 22.11.2021 - 23.11.2021, Penang, Malaysia}, publisher = {IEEE}, isbn = {978-1-7281-9253-6}, doi = {10.1109/IEACon51066.2021.9654672}, pages = {270 -- 275}, abstract = {The concept of Industrial Revolution 4.0 (IR4.0) has sparked the urgency of many manufacturers to revisit their manufacturing processes and search for opportunities to further improved their production output. Unfortunately, it is difficult to improve a process with inadequate data. Many of the SMEs in developing countries are still using manufacturing machines from the yesteryears which do not have computational and connectivity capabilities. Therefore, we developed an end-to-end Internet-of-Things (IoT) solution, which reliably tracks the production performance of manufacturing machines. This paper elaborates on the designs and the rationale behind it. As of the writing of this paper, our IoT system has been deployed in real manufacturing environment and has been running for approximately 90 days on a 24/7 basis without data lost.}, language = {en} } @article{SchubertHoefflingerZingg, author = {Schubert, Martin J. W. and H{\"o}fflinger, Bernd and Zingg, Ren{\´e} P.}, title = {An Analytical Model for Strongly Inverted and Accumulated Silicon Films}, series = {Solid-State Electronics}, volume = {33}, journal = {Solid-State Electronics}, number = {12}, publisher = {Elsevier}, doi = {10.1016/0038-1101(90)90136-3}, pages = {1553 -- 1567}, abstract = {An analytical model for the spatial distribution of potential, electric field and carrier densities is presented, assuming uniform doping density and constant quasi-Fermi potentials in the direction of modeling. Starting from the current relations a differential equation respecting two-dimensional effects is developed and solved approximately by decomposition in three regions with different preconditions: (a) flatband region, (b) constant spacecharge density and (c) strong inversion or accumulation. Inaccuracies arise mainly from violated preconditions at the interfaces between the different regions. Two-dimensional effects are respected in the analytical model of (b) only but they influence region (c) by means of boundary conditions at the interface of (b) and (c). The investigations of this paper are focused to region (c). This part of our model is identical to the model of Hauser and Littlejohn[1]. They integrated a simplified form of the semiconductor-Poisson equation twice but were restricted to one-dimensional applications and thermal equilibrium. Our derivation allows for large electric fields and current densities perpendicular to the direction of modeling. From analytical considerations confirmed by numerical experiments we suggest preference to the gradual channel condition, with x and y defined according to Fig. 1. This definition allows the potentials to vary significantly with respect to y. We found that this holds for the quasi-Fermi potentials also. Furthermore an empirical model for the maximum width of strong-inversion layers in uniformly doped silicon films is presented in eqn (46).}, language = {en} } @inproceedings{DeclerqClementSchubertetal., author = {Declerq, Michel and Cl{\´e}ment, F. and Schubert, Martin J. W. and Harb, Adnan and Dutoit, Michel}, title = {Design and Optimization of High-Voltage CMOS Devices Compatible wih a Standard 5V CMOS Technology}, series = {Proceedings of IEEE Custom Integrated Circuits Conference, May 9-12 1993, San Diego, CA, USA}, booktitle = {Proceedings of IEEE Custom Integrated Circuits Conference, May 9-12 1993, San Diego, CA, USA}, isbn = {0-7803-0826-3}, doi = {10.1109/CICC.1993.590766}, pages = {24.6.1 -- 24.6.4}, abstract = {High-voltage n- and p-MOSFETs fully compatible with a standard 5 V CMOS technology have been designed, optimized, and fabricated. No process changes are required. By modifying the logical equations generating one of the physical masks from the design masks, a p-type buffer region for the high-voltage p-MOS was easily implemented. This modification does not affect the low-voltage part of the circuits. These high-voltage devices have been used successfully as output drivers in semicustom arrays, and as building blocks for custom low- to high-voltage output interfaces. Aspects of reliability, device protection, and circuit design techniques are addressed.}, language = {en} } @misc{DeclerqSchubert, author = {Declerq, Michel and Schubert, Martin J. W.}, title = {Circuit Interm{\´e}diaire entre un Circuit Logique {\`a} Basse-Tension et un Etage de Sortie {\`a} Haute-Tension R{\´e}alis{\´e}s dans une Technologie CMOS Standard}, abstract = {La pr{\´e}sente invention concerne un circuit interm{\´e}diaire entre un circuit logique a basse tension et un {\´e}tage de sortie {\`a} haute tension r{\´e}alis{\´e}s dans une technologie CMOS standard. L'{\´e}tage de sortie (20) comporte deux transistors respectivement {\`a} canal N et {\`a} canal P, r{\´e}alis{\´e}s selon une technologie CMOS standard. Le circuit interm{\´e}diaire comporte un translateur de niveau de tension (21) coupl{\´e} entre un circuit logique d'entr{\´e}e SL et ledit {\´e}tage de sortie (20). Ce translateur de niveau de tension (21) est r{\´e}alis{\´e} selon une technologie CMOS standard et est constitu{\´e} d'au moins deux blocs de base identiques formant des miroirs de tension interconnect{\´e}s de fa{\c{c}}on crois{\´e}e. Ce circuit est utilis{\´e} pour commander des transducteurs, des {\´e}crans plasma et des actionneurs {\´e}lectrom{\´e}caniques.}, language = {fr} } @article{SchubertHoefflingerZingg, author = {Schubert, Martin J. W. and H{\"o}fflinger, Bernd and Zingg, Ren{\´e} P.}, title = {A One-Dimensional Analytical Model for the Dual-Gate-Controlled Thin-Film SOI MOSFET}, series = {IEEE Electron Device Letters}, volume = {12}, journal = {IEEE Electron Device Letters}, number = {9}, doi = {10.1109/55.116927}, pages = {489 -- 491}, abstract = {A one-dimensional analytical model for dual-gate-controlled SOI MOSFETs is presented and applied to a stacked p-channel MOSFET fabricated by epitaxial lateral overgrowth (ELO). The authors found and modeled a nonlinear dependence of front-gate threshold voltage on back-gate voltage if threshold is defined by a constant current instead of a constant silicon-surface potential. It is demonstrated by comparison of subthreshold slopes that surface potentials are not pinned to the onset of strong inversion or accumulation. Accurate one-dimensional modeling is a necessity for device characterization and a precondition for general SOI models for circuit simulation.< >}, language = {en} } @inproceedings{SchubertHoefflingerZingg, author = {Schubert, Martin J. W. and H{\"o}fflinger, Bernd and Zingg, Ren{\´e} P.}, title = {A New Analytical Charge Model for the Dual-Gate-Controlled Thin-Film SOI MOSFET}, series = {Superlattices and Microstructures}, volume = {7}, booktitle = {Superlattices and Microstructures}, number = {4}, publisher = {Elsevier}, doi = {10.1016/0749-6036(90)90218-V}, pages = {323 -- 326}, abstract = {An analytical model for dual-gate-controlled SOI MOSFETs is presented, assuming uniformly doped p-silicon films. It is restricted to electron inversion layers and depletion regions, neglecting hole densities. It allows to account for the spatial description of electronic quantities in the silicon film. Due to the non-linearities of the semiconductor equations the model parameters must be extracted iteratively. Some applications are presented to demonstrate the usefulness of the model.}, language = {en} } @phdthesis{Schubert, author = {Schubert, Martin J. W.}, title = {Eindimensionale Modellierung von SOI MOSFETs}, address = {Hamburg}, language = {de} } @inproceedings{Schubert, author = {Schubert, Martin J. W.}, title = {Mixed-Signal Event-Driven Simulation of a Phase-Locked Loop}, series = {IEEE/VIUF International Workshops on Behavioral Modeling and Simulation (BMAS'99), October 4-6 1999, Orlando, Florida, USA}, booktitle = {IEEE/VIUF International Workshops on Behavioral Modeling and Simulation (BMAS'99), October 4-6 1999, Orlando, Florida, USA}, abstract = {The mixed-signal event-driven (MixED) simulationalgorithm using standard VHDL is capable of modelinga number of analog and mixed-signal problems in digital circuits, e.g. RCL networks representing pads or wires, charge pumps, dynamic logic, voltage-controlledoscillators, phase-locked loops, etc. Important featuresare single-kernel simulation as well as rapid A/D andD/A interfacing. This paper demonstrates the simulation of a phase-locked loop (PLL), which is one of the most interesting applications of the MixED method. Many digital designs contain a PLL as only mixed-signal building block. The MixED method allows to simulate such designs with standard VHDL.}, language = {en} }