@inproceedings{SokolowskiTintenBlomeBlumsetal., author = {Sokolowski-Tinten, Klaus and Blome, Christian and Blums, Juris and Shymanovich, Uladzimir and Nicoul, Matthieu and Cavalleri, Andrea and Tarasevitch, A. and Horn-von Hoegen, Michael and Kammler, Martin and von der Linde, Dietrich}, title = {Ultrafast X-ray diffraction}, series = {Ultrafast Phenomena XIV}, volume = {79}, booktitle = {Ultrafast Phenomena XIV}, editor = {Kobayashi, Tetsuro}, publisher = {Springer}, address = {Berlin, Heidelberg}, isbn = {978-3-540-27213-7}, doi = {10.1007/3-540-27213-5_53}, pages = {170 -- 174}, abstract = {In the last few years the generation of femtosecond pulses in the X-ray regime has become possible. These ultrashort X-ray pulses have enabled femtosecond time- resolution to be extended to X-rays.}, language = {en} } @unpublished{TringidesConradMenzeletal.2002, author = {Tringides, Michael C. and Conrad, E. H. and Menzel, Andreas and Voss, Neil R. and Kammler, Martin and Horn-von Hoegen, Michael}, title = {Dynamics of atomic steps on Si(001) studied by temporal LEED spectroscopy [Poster]}, year = {2002}, abstract = {While surface kinetics measurements for single atom diffusion have proliferated, little work exists attempting to measure surface dynamics under equilibrium conditions. We will present our recent work on developing Temporal LEED Spectroscopy (TLS) as a dynamic probe of surfaces capable of kinetics measurements at both high temperatures and surface coverages. By tuning the diffraction to specific structural entities such as steps, islands, etc., and monitoring the diffracted signal as a function of time, dynamics information about these structures can be obtained. As an example we will present TLS results for the dynamics of step fluctuations on Si(001) [1]. We have measured activation energies and identified step-edge diffusion as the rate limiting process for 950K < T < 1130K. Although this result is in apparent disagreement with earlier work, a careful analysis, considering crossover temperatures between different microscopic processes, can reconcile the differences. 1. M. Kammler, et al., Phys. Rev. B (in press).}, language = {en} } @article{KammlerHornvonHoegen, author = {Kammler, Martin and Horn-von Hoegen, Michael}, title = {Transition in growth mode by competing strain relaxation mechanisms}, series = {Applied Physics Letters}, volume = {85}, journal = {Applied Physics Letters}, number = {15}, publisher = {American Institute of Physics}, doi = {10.1063/1.1803914}, pages = {3056 -- 3058}, abstract = {Surfactant mediated epitaxy of Si(1-x)Gex alloys on Si(111) can, besides technological importance, clarify the influence of the lattice mismatch during surfactant mediated heteroepitaxial growth. For low Ge concentration we find an immediate layer-by-layer growth, whereas at high Ge concentration a roughening transition followed by relaxation of the lattice mismatch in a periodic dislocation network is preferred. This behavior can be explained by comparing the dislocation nucleation rate on a smooth surface with the island nucleation rate on a pseudomorphic film.}, language = {en} } @article{WallKrenzerWippermannetal., author = {Wall, Simone and Krenzer, Boris and Wippermann, Stefan and Sanna, Simone and Klasing, Friedrich and Hanisch-Blicharski, Anja and Kammler, Martin and Schmidt, Wolf Gero and Horn-von Hoegen, Michael}, title = {Atomistic picture of charge density wave formation at surfaces}, series = {Physical review letters}, volume = {109}, journal = {Physical review letters}, number = {18}, publisher = {APS}, doi = {10.1103/PhysRevLett.109.186101}, abstract = {We used ultrafast electron diffraction and density-functional theory calculations to gain insight into the charge density wave (CDW) formation on In/Si(111). Weak excitation by a femtosecond-laser pulse results in the melting of the CDW. The immediate freezing is hindered by a barrier for the motion of atoms during the phase transition: The melted CDW constitutes a long-lived, supercooled phase and is strong evidence for a first-order transition. The freezing into the CDW is triggered by preexisting adsorbates. Starting at these condensation nuclei, the CDW expands one dimensionally on the In/Si(111) surface, with a constant velocity of more than 80 m/s.}, language = {en} } @article{FriggeKalusKlasingetal., author = {Frigge, Tim and Kalus, Annika and Klasing, Friedrich and Kammler, Martin and Hanisch-Blicharski, Anja and Horn-von Hoegen, Michael}, title = {Nanoscale Heat Transport in Self-Organized Ge Clusters on Si(001)}, series = {MRS Online Proceedings Library}, journal = {MRS Online Proceedings Library}, publisher = {Springer}, doi = {10.1557/opl.2013.148}, pages = {45 -- 50}, abstract = {Ultrafast time resolved transmission electron diffraction (TED) in a reflection geometry was used to study the cooling behavior of self-organized, well defined nanoscale germanium hut and dome clusters on Si(001). The clusters were heated in a pump-probe scheme by fs-laser pulses. The resulting transient temperature rise was then determined from the drop in diffraction intensity caused by the Debye-Waller effect. From a cooling time of τ=177 ps we estimated a strongly reduced heat transfer compared with homogeneous films of equivalent thickness.}, language = {en} } @article{MoellenbeckHanischBlicharskiSchneideretal., author = {M{\"o}llenbeck, Simone and Hanisch-Blicharski, Anja and Schneider, Paul and Ligges, Manuel and Zhou, Ping and Kammler, Martin and Krenzer, Boris and Horn-von Hoegen, Michael}, title = {Ultra-fast Time-Resolved Electron Diffraction of Strongly Driven Phase Transitions on Silicon Surfaces}, series = {MRS Online Proceedings Library}, journal = {MRS Online Proceedings Library}, publisher = {Springer}, doi = {10.1557/PROC-1230-MM03-09}, abstract = {The dynamics of strongly driven phase transitions at surfaces are studied by ultra-fast time-resolved reflection high energy electron diffraction. The surfaces are excited by an intense fs-laser pulse (pump) and probed by an ultra-short electron pulse with variable time delay. The order-disorder phase transition from a c(4 {\~A}— 2) to a(2 {\~A}— 1) of the bare Si(001) surface shows a transient decrease of the intensity of the c(4 {\~A}— 2) spots which recovers on a time scale of a few hundred picoseconds indicating the excitation of the phase transition. On Si(111) a monolayer of Indium induces a (4 {\~A}— 1) reconstruction which undergoes a Peierls like phase transition to a (8 {\~A}— "2") reconstruction below 100 K. Upon laser excitation with a fluence of 3.4 mJ/cm 2 at a temperature of 72 K the phase transition was strongly driven. The (8 {\~A}— "2")-diffraction spots instantaneously disappears, while the intensity of the (4 {\~A}— 1)-spots increases. This increase of the (4 {\~A}— 1) spot intensity excludes an explanation by the Debye-Waller-Effect and is evidence for a true structural phase transition at a surface. {\^A}© 2010 Materials Research Society.}, language = {en} } @article{HanischBlicharskiKrenzerMoellenbecketal., author = {Hanisch-Blicharski, Anja and Krenzer, Boris and M{\"o}llenbeck, Simone and Ligges, Manuel and Zhou, Ping and Kammler, Martin and Horn-von Hoegen, Michael}, title = {Transient Cooling of Ultrathin Epitaxial Bi(111)-Films on Si(111) Upon Femtosecond Laser Excitation Studied by Ultrafast Reflection High Energy Electron Diffraction}, series = {MRS Online Proceedings Library}, journal = {MRS Online Proceedings Library}, publisher = {Springer}, doi = {10.1557/PROC-1172-T04-08}, pages = {1 -- 6}, abstract = {With time resolved ultrafast electron diffraction the cooling process across the interface between a thin film and the underlying substrate was studied after excitation with short laser pulses. From the exponential decay of the surface temperature evolution a thermal boundary conductance of 1430 W/(cm2K) is determined for a 9.7 nm thin Bi(111) film on Si(111). A linear dependence between laser fluence and initial temperature rise was measured for film-thicknesses between 2.5 nm and 34.5 nm. The ratio of initial temperature rise and laser fluence for different film-thicknesses is compared to a model taking multilayer optics into account. The data agree well with this model.}, language = {en} } @article{AlFalouKammlerHornvonHoegen, author = {Al-Falou, A. A. and Kammler, Martin and Horn-von Hoegen, Michael}, title = {Strain state analysis of hetero-epitaxial systems}, series = {Europhysics Letters}, volume = {69}, journal = {Europhysics Letters}, number = {4}, publisher = {IOP}, doi = {10.1209/epl/i2004-10399-6}, pages = {570 -- 576}, abstract = {We present a new method to analyze the strain state of epitaxial hetero structures by high-resolution spot profile analysis low-energy electron diffraction. From the variation of the spot profiles with the vertical scattering vector we determine the hetero film roughness, the change of interlayer spacing due to tetragonal distortion, and the variation of the interlayer distance due to partial relaxation of the strained rough film. The practical implementation of this method is simple and can be used to determine the onset of strain-relieving defects during the growth process.}, language = {en} } @article{KammlerHornvonHoegen, author = {Kammler, Martin and Horn-von Hoegen, Michael}, title = {Low energy electron diffraction of epitaxial growth of bismuth on Si(111)}, series = {Surface Science}, volume = {576}, journal = {Surface Science}, number = {1-3}, publisher = {Elsevier}, doi = {10.1016/j.susc.2004.11.033}, pages = {56 -- 60}, abstract = {The epitaxial growth of Bi on Si(1 1 1) studied by spot profile analyzing low energy electron diffraction shows for low coverage rotationally disordered Bi cluster with preferred orientations following the threefold symmetry of the Si substrate. With further deposition the Bi cluster coalesces and the surface orientation changes from the pseudo cubic Bi(1 1 0) surface orientation of the Bi cluster into the hexagonal Bi(1 1 1) surface of the resulting Bi film.}, language = {en} } @article{HildSeifertKammleretal., author = {Hild, R. and Seifert, C. and Kammler, Martin and Meyer zu Heringdorf, Frank-Joachim and Horn-von Hoegen, Michael and Zhachuk, R.A and Olshanetsky, B.Z}, title = {Kinetics of Au induced faceting of vicinal Si(111)}, series = {Surface Science}, volume = {512}, journal = {Surface Science}, number = {1-2}, publisher = {Elsevier}, doi = {10.1016/S0039-6028(02)01666-7}, pages = {117 -- 127}, abstract = {Au induced faceting of vicinal Si(1 1 1) has been studied during adsorption at elevated temperature by spot profile analyzing of low energy electron diffraction and after quenching to room temperature by scanning tunneling microscopy. On the surfaces inclined towards five different types of facets form with increasing Au coverage at adsorption temperatures Tads below 800 °C. They are (4 4 3), (7 7 5), (5 5 3), a stepped (2 2 1), and the (3 3 1) facets. Atomic models for the (5 5 3) and (7 7 5) facet planes are proposed on the basis of high resolution STM images. At C we found the formation of an ordered step train which covers the entire surface. With further increasing Au coverage the stepped surface decomposes again into (1 1 1) terraces and step bunches. Driving force is the formation of the Si(1 1 1)-(5×2)-Au reconstruction.}, language = {en} } @article{HornvonHoegenMeyerzuHeringdorfKammleretal., author = {Horn-von Hoegen, Michael and Meyer zu Heringdorf, Frank-Joachim and Kammler, Martin and Schaeffer, C. and Reinking, D. and Hofmann, K. R.}, title = {Bi surfactant mediated epitaxy of Ge on Si(111)}, series = {Thin Solid Films}, volume = {343-344}, journal = {Thin Solid Films}, publisher = {Elsevier}, doi = {10.1016/S0040-6090(98)01659-9}, pages = {579 -- 582}, abstract = {We have tested Bi for the surfactant mediated epitaxy of Ge on Si(111). Islanding of Ge is prevented and a 2D layer growth of smooth and continuous Ge films is observed. The lattice mismatch is accommodated by a periodic array of dislocations confined to the Si/Ge interface. The large covalent radius of Bi reduces the binding energy, allowing Very efficient segregation and low doping levels even at low growth temperatures. Unfortunately, this results also in a high Bi desorption flux limiting the possible growth temperatures below 600 degrees C. Consequently the Ge films show a high defect density in the order of 10(8) cm(-2) for stacking faults and 10(9) cm(-2) for dislocations which limit electron Hall mobility to values below 700 cm(2)/V s at room temperature.}, language = {en} } @article{ReinkingKammlerHoffmannetal., author = {Reinking, D. and Kammler, Martin and Hoffmann, N. and Horn-von Hoegen, Michael and Hofmann, K. R.}, title = {Fabrication of high-mobility Ge p-channel MOSFETs on Si substrates}, series = {Electronics Letters}, volume = {35}, journal = {Electronics Letters}, number = {6}, publisher = {IET}, doi = {10.1049/el:19990349}, pages = {503 -- 504}, abstract = {The first fabrication of Ge p-channel MOSFETs (p-MOSFETs) on Si substrates is reported. A CMOS compatible process based on relaxed Ge layers grown on Si(111) substrates by surfactant mediated epitaxy (SME) was used. The non-optimised low temperature process yielded normally-off Ge p-MOSFETs with record channel drift mobilities of 430 cm2/Vs}, language = {en} } @article{SchmidtKroegerFlegeetal., author = {Schmidt, Thomas and Kr{\"o}ger, Roland and Flege, Jan Ingo and Horn-von Hoegen, Michael and Clausen, T. and Falta, J. and Janzen, Andreas and Zahl, P. and Kury, P. and Kammler, Martin}, title = {Less strain energy despite fewer misfit dislocations: the impact of ordering}, series = {Physical review letters}, volume = {96}, journal = {Physical review letters}, number = {6}, publisher = {APS}, doi = {10.1103/PhysRevLett.96.066101}, abstract = {The average strain state of Ge films grown on Si(111) by surfactant mediated epitaxy has been compared to the ordering of the interfacial misfit dislocation network. Surprisingly, a smaller degree of average lattice relaxation was found in films grown at higher temperature. On the other hand, these films exhibit a better ordered dislocation network. This effect energetically compensates the higher strain at higher growth temperature, leading to the conclusion that, apart from the formation of misfit dislocations, their ordering represents an important channel for lattice-strain energy relaxation.}, language = {en} } @article{HanischBlicharskiJanzenKrenzeretal., author = {Hanisch-Blicharski, Anja and Janzen, Andreas and Krenzer, Boris and Wall, S. and Klasing, Friedrich and Kalus, Annika and Frigge, Tim and Kammler, Martin and Horn-von Hoegen, Michael}, title = {Ultra-fast electron diffraction at surfaces: from nanoscale heat transport to driven phase transitions}, series = {Ultramicroscopy}, volume = {127}, journal = {Ultramicroscopy}, publisher = {Elsevier}, doi = {10.1016/j.ultramic.2012.07.017}, pages = {2 -- 8}, abstract = {Many fundamental processes of structural changes at surfaces occur on a pico- or femtosecond time scale. In order to study such ultra-fast processes, we have combined modern surface science techniques with fs-laser pulses in a pump-probe scheme. Reflection high energy electron diffraction (RHEED) with grazing incident electrons ensures surface sensitivity for the probing electron pulses. Utilizing the Debye-Waller effect, we studied the cooling of vibrational excitations in monolayer adsorbate systems or the nanoscale heat transport from an ultra-thin film through a hetero-interface on the lower ps-time scale. The relaxation dynamics of a driven phase transition far away from thermal equilibrium is demonstrated with the In-induced (8×2) reconstruction on Si(111). This surface exhibits a Peierls-like phase transition at 100K from a (8×2) ground state to (4×1) excited state. Upon excitation by a fs-laser pulse, this structural phase transition is driven into an excited (4×1) state at a sample temperature of 20K. Relaxation into the (8×2) ground state occurs after more than 150 ps.}, language = {en} } @article{PayerKleinAcetetal., author = {Payer, Thomas and Klein, C. and Acet, M. and Ney, V. and Kammler, Martin and Meyer zu Heringdorf, Frank-Joachim and Horn-von Hoegen, Michael}, title = {High-quality epitaxial Bi(111) films on Si(111) by isochronal annealing}, series = {Thin Solid Films}, volume = {520}, journal = {Thin Solid Films}, number = {23}, publisher = {Elsevier}, doi = {10.1016/j.tsf.2012.06.004}, pages = {6905 -- 6908}, abstract = {Bi(111) films grown on Si(111) at room temperature show a significantly higher roughness compared to Bi films grown on Si(100) utilizing a kinetic pathway based on a low-temperature process. Isochronal annealing steps of 3 min duration each with temperatures up to 200 °C cause a relaxation of the Bi films' lattice parameter toward the Bi bulk value and yield an atomically flat Bi surface. Driving force for the relaxation and surface reordering is the magic mismatch of 11 Bi atoms to 13 Si atoms that emerges at annealing temperatures above 150 °C and reduces the remaining strain to less than 0.2\%.}, language = {en} }