@article{HornvonHoegenMeyerzuHeringdorfKammleretal., author = {Horn-von Hoegen, Michael and Meyer zu Heringdorf, Frank-Joachim and Kammler, Martin and Schaeffer, C. and Reinking, D. and Hofmann, K. R.}, title = {Bi surfactant mediated epitaxy of Ge on Si(111)}, series = {Thin Solid Films}, volume = {343-344}, journal = {Thin Solid Films}, publisher = {Elsevier}, doi = {10.1016/S0040-6090(98)01659-9}, pages = {579 -- 582}, abstract = {We have tested Bi for the surfactant mediated epitaxy of Ge on Si(111). Islanding of Ge is prevented and a 2D layer growth of smooth and continuous Ge films is observed. The lattice mismatch is accommodated by a periodic array of dislocations confined to the Si/Ge interface. The large covalent radius of Bi reduces the binding energy, allowing Very efficient segregation and low doping levels even at low growth temperatures. Unfortunately, this results also in a high Bi desorption flux limiting the possible growth temperatures below 600 degrees C. Consequently the Ge films show a high defect density in the order of 10(8) cm(-2) for stacking faults and 10(9) cm(-2) for dislocations which limit electron Hall mobility to values below 700 cm(2)/V s at room temperature.}, language = {en} } @article{ReinkingKammlerHoffmannetal., author = {Reinking, D. and Kammler, Martin and Hoffmann, N. and Horn-von Hoegen, Michael and Hofmann, K. R.}, title = {Fabrication of high-mobility Ge p-channel MOSFETs on Si substrates}, series = {Electronics Letters}, volume = {35}, journal = {Electronics Letters}, number = {6}, publisher = {IET}, doi = {10.1049/el:19990349}, pages = {503 -- 504}, abstract = {The first fabrication of Ge p-channel MOSFETs (p-MOSFETs) on Si substrates is reported. A CMOS compatible process based on relaxed Ge layers grown on Si(111) substrates by surfactant mediated epitaxy (SME) was used. The non-optimised low temperature process yielded normally-off Ge p-MOSFETs with record channel drift mobilities of 430 cm2/Vs}, language = {en} }