@inproceedings{HerdlKueddelsmannSchelsetal., author = {Herdl, Florian and Kueddelsmann, Maximillian J. and Schels, Andreas and Bachmann, Michael and Edler, Simon and Wohlfartsst{\"a}tter, Dominik and D{\"u}sberg, Felix and Prugger, Alexander and Dillig, Michael and Dams, Florian and Schreiner, Rupert and Coile{\´a}in, Cormac {\´O}. and Zimmermann, Stefan and Pahlke, Andreas and Duesberg, Georg S.}, title = {Characterization and Operation of Graphene-Oxide-Semiconductor Emitters at Atmospheric Pressure Levels}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188974}, pages = {14 -- 16}, abstract = {In recent years Graphene-Oxide-Semiconductor (GOS) electron emitters have attracted a lot of interest due to their outstanding durability in modest vacuum conditions. However, the performance at ambient pressure remains largely unexplored. In this study GOS-emitters are characterized in nitrogen and air at atmospheric pressure, and compared with their vacuum characteristics. For this purpose, lifetime and IV-characteristics measurements are shown. Furthermore, the GOS-emitter was operated as an ionization source for ion mobility spectrometry (IMS) at ambient conditions.}, language = {en} } @article{SchelsEdlerHerdletal., author = {Schels, Andreas and Edler, Simon and Herdl, Florian and Hansch, Walter and Bachmann, Michael and Ritter, Daniela and Dudeck, Markus and Duesberg, Felix and Meyer, Manuel and Pahlke, Andreas and Hausladen, Matthias and Buchner, Philipp and Schreiner, Rupert}, title = {In situ quantitative field emission imaging using a low-cost CMOS imaging sensor}, series = {Journal of Vacuum Science \& Technology B}, volume = {40}, journal = {Journal of Vacuum Science \& Technology B}, number = {1}, publisher = {AIP Publishing}, doi = {10.1116/6.0001551}, abstract = {Spatially resolved field emission measurements represent an important factor in further development of existing field emitter concepts. In this work, we present a novel approach that allows quantitative analysis of individual emission spots from integral current-voltage measurements using a low-cost and commercially available CMOS camera. By combining different exposure times to extrapolate oversaturated and underexposed pixels, a near congruence of integral current and image brightness is shown. The extrapolation also allows parallel investigation of all individual tips participating in the total current with currents ranging from a few nanoampere to one microampere per tip. The sensitivity, which is determined by the integral brightness-to-current ratio, remains unchanged within the measurement accuracy even after ten full measurement cycles. Using a point detection algorithm, the proportional current load of each individual tip of the field emitter array is analyzed and compared at different times during the initial measurement cycle. Together with the extracted I-V curves of single emission spots from the integral measurement, the results indicate the effect of premature burnout of particularly sharp tips during conditioning of the emitter.}, language = {en} } @article{EdlerSchelsHerdletal., author = {Edler, Simon and Schels, Andreas and Herdl, Florian and Hansch, Walter and Bachmann, Michael and Dudeck, Markus and Duesberg, Felix and Pahlke, Andreas and Hausladen, Matthias and Buchner Philipp, and Schreiner, Rupert}, title = {Origin of the current saturation level of p-doped silicon field emitters}, series = {Journal of Vacuum Science \& Technology B}, volume = {40}, journal = {Journal of Vacuum Science \& Technology B}, number = {1}, publisher = {AIP Publishing}, doi = {10.1116/6.0001554}, abstract = {Using p-type semiconductors for field emitters is one simple way to realize an integrated current limiter to improve the lifetime of the cathode. In this work, the origin of the current saturation of p-type silicon emitters is investigated in detail. Single emitters are electrically characterized and compared to simulation results. With a simulation model considering a high surface generation rate and elevated tip temperature, a good agreement to the measured data is found. This observation is supported further by alteration of the surface experimentally. Electrical measurements after different treatments in hydrofluoric acid as well as heated and subsequent operation at room temperature are well explained by the influence of surface generation. Furthermore, it is shown that the field penetration leads to a small voltage drop and a strong geometry-dependent reduction of the field enhancement factor.}, language = {en} } @misc{DuesbergBachmannEdleretal., author = {D{\"u}sberg, Felix and Bachmann, Michael and Edler, Simon and Pahlke, Andreas and Langer, Christoph and Prommesberger, Christian and Schreiner, Rupert and Bunert, Erik and Wendt, Cornelius and Zimmermann, Stefan}, title = {Novel Non-Radiative Electron Source}, series = {43rd International Symposium of Capillary Chromatography \& 16h GC x GC Symposium 2019}, journal = {43rd International Symposium of Capillary Chromatography \& 16h GC x GC Symposium 2019}, abstract = {Recently a non-radioactive electron capture detector based on a thermionic electron emitter has been demonstrated [1]. Using field emitter arrays (FEAs) would yield non-radioactive portable low power devices with fast switching capability. By combining FEAs with a vacuum-sealed housing and an electron transparent membrane window, such electron sources can be operated in an ambient pressure environment.}, language = {en} } @inproceedings{BuchnerKaiserHausladenetal., author = {Buchner, Philipp and Kaiser, Alexander and Hausladen, Matthias and Bartl, Mathias and Bachmann, Michael and Schreiner, Rupert}, title = {Silicon Nanowire Field Emitters with Integrated Extraction Gates Using Benzocyclobutene as an Insulator}, series = {37th International Vacuum Nanoelectronics Conference (IVNC), 15-19 July 2024, Brno, Czech Republic}, booktitle = {37th International Vacuum Nanoelectronics Conference (IVNC), 15-19 July 2024, Brno, Czech Republic}, publisher = {IEEE}, doi = {10.1109/IVNC63480.2024.10652314}, pages = {1 -- 2}, abstract = {We are continuously improving the performance of our field emission electron sources. In this work a geometrically optimized design of electron sources with silicon nanowire field emitters on pillars was fabricated. This new design increased the packing density of the emitters by using a hexagonal arrangement of the pillars and a pillar spacing of 40 µm. Benzocyclobutene was used as the insulator material for an integrated (Cr/Ni) extraction gate. A modified fabrication process for the field emitters further improved reproducibility and reliability. An emission current of about 0.4 mA was measured for 30 minutes at an extraction voltage of 250 V and an anode voltage of 500 V. Electron transmission through the gate reached almost 100\%.}, language = {en} } @inproceedings{HausladenBomkeBuchneretal., author = {Hausladen, Matthias and Bomke, Vitali and Buchner, Philipp and Bachmann, Michael and Knapek, Alexandr and Schreiner, Rupert}, title = {Influence of Geometrical Arrangements of Si Tip Arrays Fabricated by Laser Micromachining on their Emission Behaviour}, series = {2021 34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, booktitle = {2021 34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, publisher = {IEEE}, address = {Piscataway, N.J.}, isbn = {978-1-6654-2589-6}, issn = {2380-6311}, doi = {10.1109/IVNC52431.2021.9600717}, abstract = {ensely packed emitters on a field emission array lead typically to mutual shielding. Taking biology as a role model for geometric arrangements could be a way to reduce this effect. For comparison, two electron sources, one with a spiral and a second with conventional rectangular (orthogonal) arranged emitters, were fabricated and investigated. Emission currents of 6 µA in the spiral ordered array and 120 µA in the rectangular array were reached with an extraction voltage of 400 V. From a mid-term measurement over 1 h a current stability of ±8.8 \% (spiral) respectively ±5.7 \% (rectangular) with a mean degradation of -3.0 µA/h (spiral) and -0.12 µA/h (rectangular) could be observed.}, language = {en} } @inproceedings{BuchnerBomkeHausladenetal., author = {Buchner, Philipp and Bomke, Vitali and Hausladen, Matthias and Edler, Simon and Bachmann, Michael and Schreiner, Rupert}, title = {Investigation on the Emission Behaviour of p-doped Silicon Field Emission Arrays with Individually Controllable Single Tips}, series = {2021 34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, booktitle = {2021 34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, publisher = {IEEE}, isbn = {978-1-6654-2589-6}, doi = {10.1109/IVNC52431.2021.9600756}, pages = {1 -- 2}, abstract = {Four individually controllable emission tips consisting of <111> p-Type silicon, were structured on a glass substrate by laser ablation. A matching extraction grid was manufactured in the same manner and aligned with the emitters. The resulting samples were characterized in ultra-high vacuum. As expected, the individual currents show a strong saturation and in the saturation region a considerably lower current fluctuation than n-type silicon due to charge carrier depletion. The individual tips behave completely independent behaviour from each other and the overall emission can be deduced from the sum of the currents through the individual tips.}, language = {en} } @inproceedings{EilerHoeglLindneretal., author = {Eiler, Julian and H{\"o}gl, Christina and Lindner, Matthias and Bachmann, Michael and Schreiner, Rupert}, title = {Miniaturized Surface Dielectric Barrier Discharge Plasma Actuators for Application in Chemical Analysis Systems}, series = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, booktitle = {2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC), 10-13 July 2023, Cambridge, MA, USA}, publisher = {IEEE}, isbn = {979-8-3503-0143-4}, doi = {10.1109/IVNC57695.2023.10188884}, pages = {40 -- 42}, abstract = {A new concept for a miniaturized planar ion source based on a surface dielectric barrier discharge (SDBD) is presented. A fabrication method based on a stamping process is described, and the plasma actuators are characterized based on their power in dependence of the applied voltage. The voltage for plasma ignition is approx. 1 kV with a maximum plasma power of 40 W/m at 3,4 kV.}, language = {en} } @inproceedings{BartlBuchnerHausladenetal., author = {Bartl, Mathias and Buchner, Philipp and Hausladen, Matthias and Asgharzadehkhorasani, Ali and Bachmann, Michael and Schreiner, Rupert}, title = {Simulations and Investigations of Silicon Nanowire Field Emitters}, series = {37th International Vacuum Nanoelectronics Conference (IVNC), 15-19 July 2024, Brno, Czech Republic}, booktitle = {37th International Vacuum Nanoelectronics Conference (IVNC), 15-19 July 2024, Brno, Czech Republic}, publisher = {IEEE}, doi = {10.1109/IVNC63480.2024.10652355}, pages = {1 -- 2}, abstract = {The emission behavior of field emission electron sources consisting of a silicon nanowire cathode, an extraction grid electrode and a planar anode was investigated based on a particle tracing simulation using FEM. The focus was on the influence of the grid geometry as well as the positioning of the grid relative to the emitters on the electron transmission. The highest transmission can be achieved with the emitter tips protruding 10 µm trough the extraction grid openings. The transmission decreases more rapidly with increasing distance between the tip and the grid the thicker the grid is.}, language = {en} } @article{HausladenBuchnerBartletal., author = {Hausladen, Matthias and Buchner, Philipp and Bartl, Mathias and Bachmann, Michael and Schreiner, Rupert}, title = {Integrated multichip field emission electron source fabricated by laser-micromachining and MEMS technology}, series = {Journal of Vacuum Science \& Technology B}, volume = {42}, journal = {Journal of Vacuum Science \& Technology B}, number = {1}, publisher = {AIP Publishing}, doi = {10.1116/6.0003233}, abstract = {In this work, high-current field emission electron source chips were fabricated using laser-micromachining and MEMS technology. The resulting chips were combined with commercially available printed circuit boards (PCBs) to obtain a multichip electron source. By controlling the separate electron sources using an external current control circuit, we were able to divide the desired total current evenly across the individual chips deployed in the PCB-carrier. In consequence, we were able to show a decreased degradation due to the reduced current load per chip. First, a single electron source chip was measured without current regulation. A steady-state emission current of 1 mA with a high stability of ±1.3\% at an extraction voltage of 250 V was observed. At this current level, a mean degradation slope of -0.7 μA/min with a nearly perfect transmission ratio of 99\% ± 0.4\% was determined. The measurements of a fully assembled multichip PCB-carrier electron source, using a current control circuit for regulation, showed that an even distribution of the desired total current led to a decreased degradation. This was determined by the increase in the required extraction voltage over time. For this purpose, two current levels were applied to the electron source chips of the PCB-carrier using an external current control circuit. First, 300 μA total current was evenly distributed among the individual electron source chips followed by the emission of 300 μA per electron source chip. This allows the observation of the influence of a distributed and nondistributed total current, carried by the electron source chips. Thereby, we obtained an increase in the mean degradation slope from +0.011 V/min (300 μA distributed) to +0.239 V/min (300 μA per chip), which is approximately 21 times higher. Moreover, our current control circuit improved the current stability to under 0.1\% for both current levels, 300 μA distributed and 300 μA per chip.}, language = {en} } @article{PrommesbergerBachmannDuesbergetal., author = {Prommesberger, Christian and Bachmann, Michael and D{\"u}sberg, Felix and Langer, Christoph and Ławrowski, Robert Damian and Hofmann, Martin and Pahlke, Andreas and Schreiner, Rupert}, title = {Regulation of the Transmitted Electron Flux in a Field-Emission Electron Source Demonstrated on Si Nanowhisker Cathodes}, series = {IEEE Transactions on Electron Devices}, volume = {64}, journal = {IEEE Transactions on Electron Devices}, number = {12}, publisher = {IEEE}, issn = {5128-5133}, doi = {10.1109/TED.2017.2763239}, abstract = {We report on a method to stabilize the transmitted electron flux in a field-emission electron source using an external regulation circuit. The electron source was realized with an array of silicon (Si) nanowhiskers on the top of elongated pillar structures, a mica spacer, and an extraction grid made of Si. As for most applications, the emitted electron current from the cathode is not as crucial as the transmitted electron flux through the extraction grid toward the anode. We investigated a method which allows the regulation directly by the emitted electron flux and not merely on the cathode current. By using this method, we were able to stabilize the emitted electron flux of our electron source down to values below 1\%. Simultaneously, it was shown that there is the possibility to stabilize the influencing value in the real application as well. The effectiveness of this method was demonstrated successfully with an X-ray source setup. The measured X-ray photon count rate was stabilized to a standard deviation of 0.30\% at a pressure of 1 × 10 -7 mbar. Even in harsh environment of 2 × 10 -5 mbar, a stabilization of the X-ray photon count rate down to a value of 0.63\% was achieved.}, language = {en} } @article{LangerBomkeHausladenetal., author = {Langer, Christoph and Bomke, Vitali and Hausladen, Matthias and Ławrowski, Robert Damian and Prommesberger, Christian and Bachmann, Michael and Schreiner, Rupert}, title = {Silicon Chip Field Emission Electron Source Fabricated by Laser Micromachining}, series = {Journal of Vacuum Science \& Technology B}, volume = {38}, journal = {Journal of Vacuum Science \& Technology B}, number = {1}, publisher = {AIP Publishing}, doi = {10.1116/1.5134872}, abstract = {The components for a silicon chip electron source were fabricated by laser micromachining using pulsed laser ablation and wet chemical cleaning and etching dips. The field emission electron source consists of a silicon field emission cathode with 4 × 4 conical shaped emitters with a height of 250 μm and a tip radius of about 50 nm, a 50 μm thick laser-structured mica spacer, and a silicon grid electrode with a grid periodicity of 200 μm and a bar width of 50 μm. These three components are combined to a single chip with the size of 14 × 10 mm2 and the thickness of 1 mm to form the electron source. Several of these devices were characterized in ultrahigh vacuum. Onset voltages of about 165 V and cathode currents of about 15 μA for voltages lower than 350 V were observed. Operating the electron source with an anode voltage of 500 V and an extraction grid voltage of 300 V yielded a cathode current of 4.5 μA ± 8.9\%, an anode current of 4.0 μA ± 9.6\%, and a corresponding grid transmittance of 89\%. Regulating the anode current by the extraction grid voltage, an extremely stable anode current of 5.0 μA ± 0.017\% was observed. A long-term measurement over 120 h was performed, and no significant degradation or failure was observed.}, language = {en} } @article{BreuerBachmannDuesbergetal., author = {Breuer, Janis and Bachmann, Michael and D{\"u}sberg, Felix and Pahlke, Andreas and Edler, Simon and Langer, Christoph and Prommesberger, Christian and Ławrowski, Robert Damian and Schreiner, Rupert and Serbun, Pavel and L{\"u}tzenkirchen-Hecht, Dirk}, title = {Extraction of the current distribution out of saturated integral measurement data of p-type silicon field emitter arrays}, series = {Journal of Vacuum Science and Technology B}, volume = {36}, journal = {Journal of Vacuum Science and Technology B}, number = {5}, publisher = {AIP Publishing}, doi = {10.1116/1.5035189}, abstract = {At the moment, only complicated techniques are known for the determination of array properties of field emitter arrays such as the number of active tips, the current distribution, or the individual tip radii. In this work, a method for extracting these parameters from integral measurement data is presented. A model describing the characteristics of a single emitter, including the saturation as a function of the applied voltage and the emitter radius, is developed. It is shown that experimental data of field emitter arrays can be represented as the sum of these functions and the characteristic parameters can be fitted to field emission data of an array. Using this method, the values of the radii as well as the parameters of distribution models can be determined directly. Analysis of experimental data from p-type Si emitter arrays shows that only 1-2\% of the tips contribute significantly.}, language = {en} } @article{EdlerBachmannBreueretal., author = {Edler, Simon and Bachmann, Michael and Breuer, Janis and Dams, Florian and D{\"u}sberg, Felix and Hofmann, Martin and Jakšič, Jasna and Pahlke, Andreas and Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Schreiner, Rupert}, title = {Influence of adsorbates on the performance of a field emitter array in a high voltage triode setup}, series = {Journal of Applied Physics}, volume = {122}, journal = {Journal of Applied Physics}, doi = {10.1063/1.4987134}, abstract = {In the present work, black-silicon field emitter arrays (FEAs) are investigated regarding the influence of residual gas pressure on the characteristics and lifetime in the high voltage triode setup. Current-voltage-characteristics at different pressure levels are recorded and show a decreasing emission current with rising pressure. This decrease can be explained by an increase of the work function and charging of the emitter surface caused by adsorbates. The emission current can be restored to its initial value by heating of the FEA up to 110 °C during active emission. With this regeneration procedure, an extended lifetime from about 20 h to 440 h at a residual gas pressure of 10-5 mbar is achieved.}, language = {en} } @article{LangerPrommesbergerŁawrowskietal., author = {Langer, Christoph and Prommesberger, Christian and Ławrowski, Robert Damian and Schreiner, Rupert and Serbun, Pavel and M{\"u}ller, G{\"u}nter and D{\"u}sberg, Felix and Hofmann, Martin and Bachmann, Michael and Pahlke, Andreas}, title = {Field emission properties of p-type black silicon on pillar structures}, series = {Journal of Vacuum Science \& Technology B}, volume = {34}, journal = {Journal of Vacuum Science \& Technology B}, number = {2}, doi = {10.1116/1.4943919}, abstract = {Arrays of black silicon field emission pillar structures were fabricated on p-type silicon substrates. Two types of samples with the same number of pillars (arrays of 10 × 10) but different pillar heights (8 and 20 μm) were prepared as well as a black silicon reference sample without pillars. The field emission properties of these cathodes were investigated both by means of integral current-voltage measurements and by field emission scanning microscopy. Samples with a pillar height of 20 μm revealed onset fields as low as 6.4 V/μm, field enhancement factors up to 800, and emission currents up to 8 μA at an applied field of 20 V/μm. Due to the p-type material, a saturation of the emission current for fields above 11 V/μm was observed. This saturation leads to a stable operation with a current fluctuation of less than ±8\%. It was found that samples with a pillar height of 20 μm showed improved emission characteristics compared to samples with a pillar height of 8 μm or without pillars. The voltage maps revealed an increased emission homogeneity after a "burn-in" sequence of the sample. The current map showed that a few of the pillars dominate the emission. Integral current stability measurements were performed under different vacuum pressures, in order to investigate altered emission behavior and a potential degradation of the emitters. At pressures above 10-6 mbar, the sample starts to degrade irreversibly. Nevertheless, even after a harsh treatment over 30 min at 5 × 10-5 mbar and at an applied field of 23 V/μm, the cathode was still operating, and did not fail during further operation over 20 h at 5 × 10-8 mbar and at an applied field of 28 V/μm.}, language = {en} } @article{BachmannDamsDuesbergetal., author = {Bachmann, Michael and Dams, Florian and D{\"u}sberg, Felix and Hofmann, Martin and Pahlke, Andreas and Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Schreiner, Rupert and Serbun, Pavel and L{\"u}tzenkirchen-Hecht, Dirk and M{\"u}ller, G{\"u}nter}, title = {Extraction of the characteristics of current-limiting elements from field emission measurement data}, series = {Journal of Vacuum Science \& Technology B}, volume = {35}, journal = {Journal of Vacuum Science \& Technology B}, number = {2}, doi = {10.1116/1.4971768}, abstract = {In this contribution, the authors will present an algorithm to extract the characteristics of nonideal field emission circuit elements from saturation-limited field emission measurement data. The method for calculating the voltage drop on current-limiting circuit elements is based on circuit theory as well as Newton's method. Since the only assumption the authors make on the current-limiting circuit is a connection in series, this method is applicable to most field emission data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters as well as the parameter correlations are fully taken into account throughout the algorithm. N-type silicon samples with varying external serial resistors are analyzed. All results show a good agreement to the nominal resistor values. Additionally, several p-type samples are analyzed, showing a diodelike behavior. The extracted current-limiting characteristics of the p-type samples are in good agreement with a pn-junction model. The stability of the emission current of the p-type samples is measured by constant voltage measurements and compared to the extracted current-limiting characteristics. The application of the algorithm to measurement data shows that the given algorithm is a valuable tool to analyze field emission measurement data influenced by nonemissive processes.}, language = {en} } @inproceedings{LangerHausladenPrommesbergeretal., author = {Langer, Christoph and Hausladen, Matthias and Prommesberger, Christian and Ławrowski, Robert Damian and Bachmann, Michael and D{\"u}sberg, Felix and Pahlke, Andreas and Shamonin (Chamonine), Mikhail and Schreiner, Rupert}, title = {Field emission current investigation of p-type and metallized silicon emitters in the frequency domain}, series = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, booktitle = {International Vacuum Nanoelectronics Conference (IVNC), 31st, 2018, Kyoto, Japan}, publisher = {IEEE}, doi = {10.1109/IVNC.2018.8520127}, pages = {1-2}, abstract = {We investigated two different field emitter arrays consisting of 10×10 p-type and 10×10 undoped Au-coated high aspect ratio silicon tips. The I-V characterization of the p-type sample showed a pronounced saturation for voltages higher than 500 V and a maximum emission current of 39 nA. The metallized sample revealed a FN-like emission up to several μA. The metallized and the p-type sample operating below the saturation region showed high current fluctuations of ±16\%. Whereas, the metallized sample with current regulation and the p-type sample in the saturation yielded a current stability of ±0.4\% and ±0.3\%, respectively. Investigations in the frequency domain revealed the for field emission typical 1/f-noise. By operating in the saturation region (p-type sample) or using an emission current regulation (metallized sample) the noise level was reduced by at least 20 dB. Finally, the p-type sample was illuminated by a light emitting diode to increase and modulate the emission current in the saturation region. The emission current was increased by a factor of 3.7 to 145 nA. With this configuration we emulated an unstable emission behavior and evaluated the performance of our emission current regulation circuit.}, language = {en} } @inproceedings{BachmannDamsDuesbergetal., author = {Bachmann, Michael and Dams, Florian and D{\"u}sberg, Felix and Hofmann, Martin and Pahlke, Andreas and Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Schreiner, Rupert}, title = {Extraction of the characteristics of limiting elements from field emission measurement data}, series = {29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada}, booktitle = {29th International Vacuum Nanoelectronics Conference (IVNC), 2016, 11-15 July, Vancouver, BC, Canada}, publisher = {IEEE}, issn = {2380-6311}, doi = {10.1109/IVNC.2016.7551474}, pages = {81 -- 82}, abstract = {In this contribution we will present an algorithm to extract the characteristics of non-Fowler-Nordheim (FN) circuit elements from saturation limited field emission (FE) measurement data. The method for calculating the voltage drop on limiting circuit elements is based on circuit theory as well as Newton's method. Since no assumption on the limiting circuit is made, this method is applicable to any FE data showing saturation. To be able to determine the significance of any parameter output, the uncertainties of data and extracted parameters are fully taken into account throughout the algorithm. External serial resistors and a limiting p-doped substrate are analyzed, where the latter shows a diode-like behavior.}, language = {en} } @inproceedings{BachmannDamsDuesbergetal., author = {Bachmann, Michael and Dams, Florian and D{\"u}sberg, Felix and Hofmann, Martin and Pahlke, Andreas and Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Schreiner, Rupert}, title = {Control of the electron source current}, series = {International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg}, booktitle = {International Vacuum Nanoelectronics Conference (IVNC), 30th, 2017, Regensburg}, publisher = {IEEE}, doi = {10.1109/IVNC.2017.8051550}, pages = {66 -- 67}, abstract = {A control circuit to stabilize the flux of electrons transmitted through an extractor electrode is presented. By controlling the emission current a fluctuation with a standard deviation of 0.015\% is observed. However, the achievable stability of the transmitted electron current is limited due to a variation of the extraction grid current ratio showing a standard deviation of 4.33\%. By regulating the difference of the emission current and the extraction grid current an improved stability of the transmitted electron current down to a standard deviation of 0.280\% is observed. Even with operation at 2 × 10 -5 mbar a standard deviation of 0.558\% is achieved.}, language = {en} } @article{BachmannDuesbergPahlkeetal., author = {Bachmann, Michael and D{\"u}sberg, Felix and Pahlke, Andreas and Edler, Simon and Schels, Andreas and Herdl, Florian and Ławrowski, Robert Damian and Schreiner, Rupert}, title = {High current silicon nanowire field emitter arrays}, series = {Journal of Vacuum Science \& Technology B}, volume = {40}, journal = {Journal of Vacuum Science \& Technology B}, number = {1}, publisher = {AIP Publishing}, doi = {10.1116/6.0001639}, abstract = {Arrays of n-doped silicon nanowire field emitters with a high aspect ratio are realized by a novel dry etching technique. Compared to the high current silicon emitters in the literature, the manufacturing process is much simpler and requires only a single photolithography step and two dry etching steps. The cathodes realized with this method exhibit a total current of 20 mA from an active area of 4×4 mm2, which is significantly higher than that for most known structures made from silicon and also represents good performance in comparison with other emitter types, e.g., carbon nanotubes. In addition to characterization in ultrahigh vacuum, measurements at 10-5 mbar are performed and compared with our recent silicon emitters. Compared to these cathodes, the structures with the nanowires exhibit at least two orders of magnitude higher current-carrying capability.}, language = {en} } @inproceedings{ŁawrowskiBachmannSchreiner, author = {Ławrowski, Robert Damian and Bachmann, Michael and Schreiner, Rupert}, title = {Field Emission Arrays from Graphite Fabricated by Laser Micromachining}, series = {34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, booktitle = {34th International Vacuum Nanoelectronics Conference (IVNC): 7/5/2021 - 7/9/2021, Lyon, France}, publisher = {IEEE}, isbn = {978-1-6654-2589-6}, doi = {10.1109/IVNC52431.2021.9600736}, pages = {1 -- 2}, abstract = {Arrays of 4x4 conical shaped emitters were directly structured by laser micromaching. Assembled as an electron source with a spacer and Si-grid, they were investigated by means of IV-measurement in ultra-high vacuum. The IV-measurements of the sample show integral emission currents up to 10 µA at a voltage of 1000 V (11 MV/m). Initially, an ideal FN-behaviour is noticeable. The deviation for higher voltage values in the FN-plot is caused by the change of the work function, which was proven by numerical calculations.}, language = {en} } @inproceedings{LangerŁawrowskiPrommesbergeretal., author = {Langer, Christoph and Ławrowski, Robert Damian and Prommesberger, Christian and Dams, Florian and Serbun, Pavel and Bachmann, Michael and M{\"u}ller, G{\"u}nter and Schreiner, Rupert}, title = {High aspect ratio silicon tip cathodes for application in field emission electron sources}, series = {2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland}, booktitle = {2014 27th International Vacuum Nanoelectronics Conference (IVNC), 6-10 July 2014, Engelberg, Switzerland}, publisher = {IEEE}, doi = {10.1109/IVNC.2014.6894824}, pages = {222 -- 223}, abstract = {Precisely aligned arrays of sharp tip structures on top of elongated pillars were realized by using an improved fabrication process including an additional inductively-coupled-plasma reactive-ion etching step. Arrays of n-type and p-type silicon with 271 tips have been fabricated and investigated. Those structures have a total height of 5-6 µm and apex radii less than 20nm. Integral field emission measurements of the arrays yielded low onset-fields in the range of 8-12V=µm and field enhancement factors between 300 and 700. The I-E curves of n-type structures showed the usual Fowler-Nordheim behaviour, whereas p-type structures revealed a significant saturation region due to the limited number of electrons in the conduction band and a further carrier depletion effect caused by the pillar. The maximum integral current in the saturation region was 150 nA at fields above 30V=µm. An excellent stability of the emission current of less than ± 2\% fluctuation was observed in the saturation region. For n-type Si a maximum integral current of 10 µA at 24V=µm and an average current stability with a fluctuation of ± 50\% were measured.}, language = {en} } @article{BachmannDuesbergLangeretal., author = {Bachmann, Michael and D{\"u}sberg, Felix and Langer, Christoph and Herdl, Florian and Bergbreiter, Lukas and Dams, Florian and Miyakawa, Natuski and Eggert, Tobias and Pahlke, Andreas and Edler, Simon and Prommesberger, Christian and Ławrowski, Robert Damian and Hausladen, Matthias and Schreiner, Rupert}, title = {Vacuum-sealed field emission electron gun}, series = {Journal of Vacuum Science \& Technology B}, volume = {38}, journal = {Journal of Vacuum Science \& Technology B}, number = {2}, publisher = {AIP Publishing}, doi = {10.1116/1.5139316}, abstract = {A compact vacuum-sealed field emission electron gun with an operation voltage below 5 kV is presented. With a 150 nm thick pyrolytic carbon membrane, a transmission of 40\% at 5 kV is obtained. For more than 2500 h of continuous operation at an emission current of 100 nA, no significant increase (<50V ) and almost no degradation were found. From this measurement, a lifetime of more than 10 000 h at continuous operation with approximately a linear increase of the extraction voltage from about 545 V to about 730 V is predicted. This electron source enables application of field emitter arrays in poor vacuum or even ambient pressure. ACKNOWLEDGMENT This work was supported by the German Federal Ministry for Economic Affairs and Energy under Project No. ZF4081502GM8. C.P., R.L., M.H., and R.S. were supported by Grant No. ZF4562901GM8.}, language = {en} } @article{ŁawrowskiBachmannSchreiner, author = {Ławrowski, Robert Damian and Bachmann, Michael and Schreiner, Rupert}, title = {Field emission arrays from graphite fabricated by laser micromachining}, series = {Journal of Vacuum Science \& Technology B}, volume = {40}, journal = {Journal of Vacuum Science \& Technology B}, number = {2}, publisher = {AIP Publishing}, doi = {10.1116/6.0001547}, abstract = {Laser micro structuring allows the manufacturing of conical shaped emitters on a graphitized carbon substrate without any additional treatment. Integral field emission measurements were performed in a diode configuration with a 50 µm mica spacer and a metalized Si-grid in a vacuum chamber at pressures of about 10-9 mbar. Emission currents up to 10 µA at a voltage of 1000 V (11 MV/m) with a positive current drift were observed for an array of 16 emitters. A strong modification of the emitter tip is noticeable after individual measurements. A comparable alteration of the surface is also achieved by an electrochemical treatment of the samples with a potassium hydroxide solution. However, the IV-measurements of such samples show higher onset voltages, but also higher integral emission currents. For all arrays an ideal FN behaviour is only noticeable at applied voltages below 625 V (7 MV/m). Numerical calculations indicate that the deviation in the FN-plot for higher voltage values is caused by the change of the effective work function.}, language = {en} }