TY - JOUR A1 - Schmidt, Oliver G. A1 - Denker, Ullrich A1 - Dashiell, Michael W. A1 - Jin-Phillipp, Neng Yun A1 - Eberl, Karl A1 - Schreiner, Rupert A1 - Gräbeldinger, Hedwig A1 - Schweizer, Heinz C. A1 - Christiansen, Silke H. A1 - Ernst, Frank T1 - Laterally aligned Ge/Si islands: a new concept for faster field-effect transistors T2 - Materials Science and Engineering B N2 - Self-assembled and coherently strained Ge dots were grown on a Si/SiGe superlattice, which was deposited on a flat Si(001) substrate surface patterned with a regular array of straight trenches. The superlattice translates the surface modulation of the substrate into a strain-field modulation, which causes the Ge dots on its surface to form along straight lines above the buried trenches. This approach provides self-assembled Ge dots with excellent lateral periodicity, which might be useful for fabricating dot-based field-effect-transistors (DotFETs). Here, we propose the concept of a modulation-doped p-channel DotFET (p-MOD-DotFET). The p-MOD-DotFET relies on embedded Ge-rich nanostructures, which provide p-channels through the Ge-rich dots. A high Ge concentration in the dots is desirable in order to exploit the high hole mobility of Ge-rich material. We show that the commonly observed Si–Ge intermixing during Si capping of Ge dots can be suppressed by overgrowing the islands at low temperature. KW - Field-effect transistor KW - Self-assembly islands KW - CMOS KW - MOSFET KW - MOFDET alignment KW - Modulation Y1 - 2023 UR - https://opus4.kobv.de/opus4-oth-regensburg/frontdoor/index/index/docId/5936 SN - 1873-4944 SN - 0921-5107 VL - 89 IS - 1-3 SP - 101 EP - 105 PB - Elsevier CY - New York, NY ER -