Refine
Year of publication
- 2006 (2)
Language
- English (2)
Keywords
Project
- D9 (1)
Application Area
- D (1)
We present a domain decomposition approach for the computation of the
electromagnetic field within periodic structures. We use a
Schwarz method with transparent boundary conditions at the interfaces of
the domains. Transparent boundary conditions are approximated by the
perfectly matched layer method (PML). To cope with Wood anomalies
appearing in periodic structures an adaptive strategy to determine
optimal PML parameters is developed. \\ We focus on the application to
typical EUV lithography line masks. Light propagation within the
multi-layer stack of the EUV mask is treated analytically. This results
in a drastic reduction of the computational costs and allows for the
simulation of next generation lithography masks
on a standard personal computer.
In this paper we propose a new finite element realization of the Perfectly Matched
Layer method (PML-method). Our approach allows to deal with a wide class of
polygonal domains and with certain types of inhomogeneous exterior domains.
Among the covered inhomogeneities are open waveguide structures playing an essential
role in integrated optics. We give a detailed insight into implementation
aspects. Numerical examples show exponential convergence behavior to the exact
solution with the thickness of the PML sponge layer.