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Influence of Sputtering Pressure on the Microstructure and Layer Properties of Iridium Thin Films
(2018)
Iridium layers with low stress, high density, and low surface roughness find widespread use in different high-technology applications. This paper presents a study of the influence of the sputtering pressure on the properties of iridium thin films and of its effect on the substrate surface microstructure. We analysed the dependence of the microstructure, crystalline structure, electrical resistivity, and deposition rate on the sputtering pressure and surface defects of the substrate. For the latter, plasma etching of the substrate was performed for different processing times and its effect on the surface roughness of substrates and, subsequently, on the grown iridium films, was examined. The sputtering pressure and the substrate plasma etching time both had a strong influence on the microstructure and surface roughness. These microstructural changes are in good agreement with the tendency described in the Thornton Structure-Zone Model for different sputtering pressures and the microstructure phase map of Alvarez. The electrical resistivity, deposition rate, and crystalline structure were highly dependent on the sputtering pressure.
Piezoelectrets fabricated from fluoroethylenepropylene (FEP)-foils have shown drastic increase of their piezoelectric
properties during the last decade. This led to the development of FEP-based energy harvesters, which are about to evolve
into a technology with a power-generation-capacity of milliwatt per square-centimeter at their resonance frequency. Recent
studies focus on piezoelectrets with solely negative charges, as they have a better charge stability and a better suitability for
implementation in rising technologies, like the internet of things (IOT) or portable electronics. With these developments
heading towards applications of piezoelectrets in the near future, there is an urgent need to also address the fabrication
process in terms of scalability, reproducibility and miniaturization. In this study, we firstly present a comprehensive review
of the literature for a deep insight into the research that has been done in the field of FEP-based piezoelectrets. For the first
time, we propose the employment of microsystem-technology and present a process for the fabrication of thermoformed
FEP piezoelectrets based on thermoforming SU-8 templates. Following this process, unipolar piezoelectrets were fabricated with air void dimensions in the range of 300–1000 lm in width and approx. 90 lm in height. For samples with a void
size of 1000 lm, a d33-coefficient up to 26,508 pC/N has been achieved, depending on the applied seismic mass. Finally,
the properties as energy harvester were characterized. At the best, an electrical power output of 0.51 mW was achieved for
an acceleration of 1 g with a seismic mass of 101 g. Such piezoelectrets with highly defined dimensions show good
energy output in relation to volume, with high potential for widespread applications.
Future space-based X-ray observatories need to be very lightweight for launcher mass constraints. Therefore they will
use a reduced mirror thickness, which results in the additional requirement of low coating stress to avoid deformation of
the initial precisely shaped mirror substrates. Due to their excellent reflection properties iridium coatings are sometimes
applied for grazing incidence mirrors in astronomical X-ray telescopes. At Aschaffenburg University of Applied
Sciences the coating of thin iridium films by an RF-magnetron sputtering technique is under development. The work is
embedded in collaborations with the Max-Planck-Institute for Extraterrestrial Physics in Germany, the Czech Technical
University in Prague, the Osservatorio Astronomico di Brera in Italy, the German Leibniz Institute for Solid State and
Materials Research in Dresden, and the French Institute Fresnel. Sputtering with different parameters leads to iridium
films with different properties. The current work is focused on the microstructure of the iridium coatings to study the
influence of the substrate and of the argon gas pressure on the thin film growing process. Correlations between coating
density, surface micro-roughness, the crystalline structure of the iridium layers, and the expected reflectivity of the X-ray
mirror as well as coating stress effects are presented and discussed. The final goal of the project is to integrate the
produced prototype mirrors into an X-ray telescope module. On a longer timescale measurements of the mirror modules
optical performance are planned at the X-ray test facility PANTER.
Iridium-based coatings for mirrors of x-ray telescopes are studied. In particular, stress-induced deformation is characterized and shown to be compressive and equal to −1786 MPa. Two methods for stress compensation are then studied. One relies on the deposition of silica on the back surface of the substrate and a second one relies on the deposition of a chromium sublayer. Advantages and drawbacks of each of these techniques are presented.