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Influence of sputtering pressure on the nanostructure and the X-ray reflectivity of iridium coatings
(2017)
Reflective mirror coatings made of iridium are used in X-ray telescopes of the Chandra X-ray Observatory (CXO) launched in 1999 by the National Aeronautics and Space Administration (NASA) to investigate astronomical sources at photon energies below 10. keV. These coatings were produced in a DC magnetron sputtering process and have so far proven their suitability for space-based applications. We are considering in the present paper the processing of thin iridium films for lightweight telescopes using the radio frequency magnetron sputtering technique with an oblique angle deposition. The coating development presented here is focused on the influence of total sputtering pressure on film properties as well as on its impact on the mirror's performance. Characterisation methods such as X-ray diffractometry, X-ray reflectometry, atomic force microscopy and transmission electron microscopy have been used. Correlations between morphology, density, surface micro-roughness, crystal structure of the iridium layer and the expected reflectivity of the X-ray mirror are described and discussed.
Iridium-based coatings for mirrors of x-ray telescopes are studied. In particular, stress-induced deformation is characterized and shown to be compressive and equal to −1786 MPa. Two methods for stress compensation are then studied. One relies on the deposition of silica on the back surface of the substrate and a second one relies on the deposition of a chromium sublayer. Advantages and drawbacks of each of these techniques are presented.