TY - JOUR A1 - Döhring, Thorsten A1 - Pribulla, Theodor A1 - Komzik, Richard A1 - Mann, Michael A1 - Sivanic, Peter A1 - Stollenwerk, Manfred T1 - Slovak-Bavarian collaboration on the development of telescope instrumentation JF - Contributions of the Astronomical Observatory Skalnate Pleso N2 - Within the project SLOBATCO (Slovak-Bavarian Telescope Collaboration) the Astronomical Institute of the Slovak Academy of Sciences and Aschaffenburg University of Applied Sciences collaborate in the development and commissioning of scientific instrumentation for the new Ø1.3 m astronomical telescope at the Skalnaté Pleso observatory. The joint project is funded by the Bavarian Academic Center for Central, Eastern and Southeastern Europe (BAYHOST). Planned technical work packages are targeting the filter wheel software for the VIS camera, additional IR filters, and an upgrade of the mirror coating facility by additional sputtering equipment. KW - telescope KW - instrumentation KW - filter KW - camera KW - coating KW - Spiegelteleskop Y1 - 2019 UR - https://www.ta3.sk/caosp/Eedition/FullTexts/vol49no2/pp154-158.pdf VL - 2019 IS - 49 / 2 SP - 154 EP - 158 ER - TY - GEN A1 - Mann, Michael A1 - Döhring, Thorsten A1 - Pribulla, Theodor A1 - Komzik, Richard A1 - Sivanic, Peter A1 - Stollenwerk, Manfred ED - Skopal, Augustin T1 - Power quality evaluation for observatories N2 - Within the project SLOBATCO the question did arise, to what extend observatories have to rely on adequate power quality, e.g. the perfect sinusoidal shape of supply voltage and current, in order to ensure safe operation and accurate measurement results. International power quality standards are put in perspective with requirement specifications. Telescope operators indicate partial or total loss of function of measurement instruments. Measurements conducted during SLOBATCO project substantiate the need for power quality measurement campaigns. N2 - Poster KW - instrumentation KW - site testing KW - telescope KW - Sternwarte KW - Elektrizitätsversorgung Y1 - 2019 ER - TY - CHAP A1 - Stollenwerk, Manfred T1 - The Energy Market within the next 20 years T2 - 6 MEAI, Wien KW - Energiemarkt Y1 - 2006 ER - TY - JOUR A1 - Stollenwerk, Manfred A1 - Gattinger, P. T1 - Process challenges of high Speed DVD/R manufacturing JF - One to One magazine KW - DVD-R KW - Herstellung Y1 - 2005 VL - 2005 IS - March SP - 55 EP - 58 ER - TY - CHAP A1 - Stollenwerk, Manfred T1 - Efficient DVD/R Production T2 - Optical Disc Seminar Asia ODSA, Teipei KW - DVD-R KW - Produktion Y1 - 2005 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - Die optische Datenspeicherung auf CD und DVD T2 - Übersichtsvortrag auf der Fachtagung „Die Kunststoffoberfläche“ des Süddeutschen Kunststoffzentrums Würzburg N2 - Vortrag KW - Optischer Speicher Y1 - 2005 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - Basics of Recordable Media Production T2 - Vortrag auf dem “International Recordable Media Technology Seminar”, Dubai N2 - Vortrag KW - CD-R KW - DVD-R Y1 - 2003 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - Correlation of DVD-Recordable Disc Performance and Process Parameters T2 - Vortrag auf der „Replication EXPO 2003“, Shanghai, China N2 - Vortrag KW - DVD-R Y1 - 2003 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - CD-Recordable CD-Rewriteable T2 - Vortrag auf der REPLItech Summit (Conference) São Paulo, Brazil N2 - Vortrag KW - CD-R Y1 - 1998 ER - TY - JOUR A1 - Stollenwerk, Manfred A1 - Alexander, Morgan A1 - Short, Robert A1 - Jones, Frank A1 - Zabold, Jochen A1 - Michaeli, Walter T1 - An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas JF - Journal of Materials Science N2 - The effect of oxygen addition to microwave-sustained plasmas of hexamethyldisiloxane (HMDSO) has been investigated. Attention was directed to the solid products formed on aluminium substrates (plasma deposits). To enable a quantitative analysis of these, X-ray photoelectron spectroscopy (XPS) of standard silicon-containing materials was carried out. When suitable charge correction is applied to the XP spectra of HMDSO/O2 plasma deposits, a number of very clear trends emerge. From changes in elemental composition, core line binding energies (Si2p, C 1s, and O 1s) and widths, we show how oxygen addition to the plasma affects the chemical nature of the plasma deposit. The data reported also provide (some limited) information on the reactions taking place in the plasma. KW - Photoelektronenspektroskopie Y1 - 1996 VL - 31 IS - 7 SP - 1879 EP - 1885 ER - TY - JOUR A1 - Alexander, Morgan A1 - Short, Robert A1 - Jones, Frank A1 - Stollenwerk, Manfred A1 - Mathar, Gerd A1 - Zabold, Jochen A1 - Michaeli, Walter T1 - The heterogeneous nature of deposits from hexamethyldisiloxane/oxygen plasmas JF - Ceramic films and coatings KW - Hexamethyldisiloxan KW - Sauerstoff KW - Plasma Y1 - 1995 VL - 1995 IS - 54 SP - 87 EP - 99 ER - TY - BOOK A1 - Wolters, Leo A1 - Stollenwerk, Manfred A1 - Berthold, J. T1 - Die Plasmatechnologie und ihre Einsatzmöglichkeiten KW - Plasmatechnik Y1 - 1994 N1 - Lehrbuch des Technologie-Transfer-Rings Handwerk Nordrhein-Westfalen CY - Aachen ER - TY - GEN A1 - Michaeli, Walter A1 - Stollenwerk, Manfred A1 - Zell, Harald T1 - Variation der Oberflächenspannung bei flächigen Substraten und Verstärkungsfasern sowie der Einfluß auf die Faser/Matrix-Haftung bei faserverstärkten Kunststoffen KW - Faserverstärkter Kunststoff Y1 - 1994 N1 - Beitrag zum Seminar “Ausgewählte Anwendungen der Plasmapolymerisation“ der Plasmatechnologieinitiative NRW, Aachen, Oktober 1994 ER - TY - CHAP A1 - Michaeli, Walter A1 - Stollenwerk, Manfred A1 - Steinkamp, F. A1 - Zell, Harald T1 - Plasmabehandlung von Glasfasern für faserverstärkte Kunststoffe T2 - 6. Bundesdeutsche Fachtagung Plasmatechnologie, Wuppertal KW - Faserverstärkter Kunststoff KW - Glasfaserverstärkter Kunststoff Y1 - 1994 ER - TY - GEN A1 - Stollenwerk, Manfred A1 - Zell, Harald T1 - Veredeln von Kunststoffoberflächen mittels Mikrowellenplasmapolymerisation KW - Plasmapolymerisation KW - Mikrowellentechnik Y1 - 1994 N1 - Seminar zur FAKUMA der Firma Schall Kongress GmbH, Friedrichshafen, Oktober 1994 ER - TY - JOUR A1 - Michaeli, Walter A1 - Telgenbüscher, Klaus A1 - Stollenwerk, Manfred A1 - Mathar, Gerd A1 - Zell, Harald T1 - Plasmapolymerisierte Schichten: Neue Vielfalt der Funktionen JF - Schweizer Maschinenbau KW - Plasmapolymerisation Y1 - 1994 VL - 1994 IS - 41 SP - 90 EP - 93 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - Das Abscheiden von kratzfesten, hydrophilen und hydrophoben Schichten mittels Plasmapolymerisation KW - Plasmapolymerisation Y1 - 1993 N1 - Beitrag zum Seminar “Plasmapolymerisation“ der Firma CP-Tec, München, November 1993 ER - TY - JOUR A1 - Leiber, Jörn A1 - Michaeli, Walter A1 - Telgenbüscher, Klaus A1 - Stollenwerk, Manfred T1 - UV protecting layers on PVC made by plasma polymerization JF - Journal of Vinyl Technology KW - Plasmapolymerisation Y1 - 1993 VL - 15 IS - 2 SP - 57 EP - 61 ER - TY - JOUR A1 - Michaeli, Walter A1 - Stollenwerk, Manfred A1 - Telgenbüscher, Klaus T1 - Plasmabehandlung - Ein umweltfreundliches Verfahren zur Oberflächenvorbehandlung und -reinigung JF - Scope-Journal Special KW - Plasmatechnik KW - Oberflächenbehandlung Y1 - 1993 VL - 1993 IS - 16 SP - 21 EP - 23 ER - TY - GEN A1 - Zell, Harald A1 - Telgenbüscher, Klaus A1 - Stollenwerk, Manfred T1 - Kratzfeste Beschichtungen von Kunststoffen mittels Plasmapolymerisation KW - Plasmapolymerisation Y1 - 1993 N1 - Seminar “Hartstoffbeschichtungen“, Haus der Technik, Essen, 28./29. September 1993 ER - TY - CHAP A1 - Michaeli, Walter A1 - Leiber, Jörn A1 - Telgenbüscher, Klaus A1 - Stollenwerk, Manfred T1 - Plasma polymerization in automotive industries - A possibility for the reduction of permeation in plastic fuel tanks T2 - 26th intern. Symposium on Automotive Technology and Automation, Aachen Tagungsband KW - Plasmapolymerisation KW - Kraftfahrzeugindustrie Y1 - 1993 SP - 469 EP - 476 ER - TY - GEN A1 - Stollenwerk, Manfred T1 - Oberflächenmodifikation mittels Plasmatechnik KW - Plasmatechnik KW - Oberflächenbehandlung Y1 - 1993 N1 - VDI-Werkstoff-Forum auf der Hannovermesse, April 1993 ER - TY - JOUR A1 - Meyer, R. A1 - Hardtdegen, Hilde A1 - Grützmacher, Detlev A1 - Carius, R. A1 - Stollenwerk, Manfred A1 - Balk, Peter T1 - Optical and structural properties of MOVPE grown GaxIn1-xAs/InP strained multiple quantum well structures JF - Journal of Electronic Materials N2 - This paper presents a study of the structural and optical properties of strained GaInAs/ InP multiple quantum well (MQW) structures fabricated by LP-MOVPE. The composition of the Ga x In1−x As films ranged fromx = 0.17 tox = 1.0 and was determined by sputtered neutral mass spectrometry (SNMS) on thick layers. The structures of the MQW samples with well widths from 1.5 to 5 nm were investigated by high resolution x-ray diffraction (HR-XRD). Simulations of the diffraction patterns showed that transition layers of approximately 2 monolayer (ML) thickness with high lattice mismatch exist at the interfaces. Photoluminescence (PL) measurements indicate well widths of a multiple of a monolayer with local variations of one monolayer. The PL peak energies vary smoothly with the Ga concentration. These results were confirmed by optical absorption measurements. KW - Galliumarsenid KW - Indiumarsenid KW - Indiumphosphid Y1 - 1992 VL - 21 IS - 3 SP - 293 EP - 298 ER - TY - JOUR A1 - Oschinowo, John A1 - Forchel, Alfred A1 - Dreybrodt, Jörg A1 - Emmerling, Monika A1 - Gyuro, Imre A1 - Speier, Peter A1 - Grützmacher, Detlev A1 - Stollenwerk, Manfred T1 - Lateral thermal stability modulation for the definition of InGaAs/InP wires JF - Microelectronic Engineering N2 - We have investigated a novel technique for the definition of semiconductor wires. By the selective local removal of the InP top barrier layer wire patterns in which the top material varies between InP and InGaAs are formed from an InGaAs/InP quantum well. In a subsequent annealing step the top InGaAs layer shows substantially stronger interdiffusion than the InP covered regions (wires). By using luminescence spectroscopy we show that this defectfree enhanced interdiffusion can be used to obtain a lateral energy barrier. KW - Indiumarsenid KW - Galliumarsenid Y1 - 1992 VL - 17 IS - 1–4 SP - 505 EP - 508 ER - TY - JOUR A1 - Wolter, Karl A1 - Schwedler, Ralf A1 - Gallmann, B. A1 - Jaekel, Christian A1 - Stollenwerk, Manfred A1 - Camassel, Jean A1 - Laurenti, Jean Pierre T1 - Optical characterization of strained InGaAs/InP quantum well structures JF - Microelectronic Engineering N2 - The effects of strain on the optical properties ofmultiple-quantum well structures grown by low pressure metal organic vapor phase epitaxy have been investigated by photoluminescence spectroscopy. The investigated composition range is varied between 0.17 ≤ xGa ≤ 1.00. Sputtered neutrals mass spectroscopy has been used to calibrate the growth interpolated nominal compositions. Distinct peaks from monolayer variations of well thickness are observed from all samples. The analysis of the PL-spectra leads to the assumption of an intermediate layer of InAs0.65P0.35 at the InP to In1−ϰGaχAs(lower) interface. KW - Indiumarsenid KW - Galliumarsenid Y1 - 1991 VL - 15 IS - 1–4 SP - 593 EP - 596 ER - TY - JOUR A1 - Schwedler, Ralf A1 - Wolter, Karl A1 - Gallmann, B. A1 - Grützmacher, Detlev A1 - Stollenwerk, Manfred A1 - Kurz, H. T1 - Optical characterization of In-rich strained In1-xGaxAs/InP single- and multiple-quantum-wells JF - Materials Science and Engineering: B N2 - We report on the photoluminescence spectroscopy of a large set of strained In1−xGaxAs/InP quantum well structures grown by low pressure metallo-organic vapour phase epitaxy. Distinct peaks from monolayer steps are observed in all samples. For the first time, data on indium-rich In1−xGaxAs/InP structures with complementary gallium contents as low as xGa = 0.07 and xGa = 0.11 are reported. The sample quality appears independent of the number of quantum wells stacked in the structure. With decreasing gallium content, a decrease in luminescence intensity is observed, which is related to an increase in the number of non-radiative recombination centres with respect to lattice-matched samples. KW - Photolumineszenzspektroskopie KW - Indiumarsenid KW - Galliumarsenid KW - Indiumphosphid Y1 - 1991 VL - 9 IS - 1–3 SP - 297 EP - 300 ER - TY - CHAP A1 - Mahlzahn, Erik A1 - Heuken, Michael A1 - Grützmacher, Detlev A1 - Stollenwerk, Manfred A1 - Heime, Klaus T1 - Advanced InGaAs/InP p-type sydomorphic MODFET T2 - Proceedings of the SPIE KW - Indiumarsenid KW - Galliumarsenid KW - Indiumphosphid Y1 - 1991 VL - 1362 SP - 199 EP - 204 ER -