TY - JOUR A1 - Stollenwerk, Manfred A1 - Alexander, Morgan A1 - Short, Robert A1 - Jones, Frank A1 - Zabold, Jochen A1 - Michaeli, Walter T1 - An X-ray photoelectron spectroscopic investigation into the chemical structure of deposits formed from hexamethyldisiloxane/ oxygen plasmas JF - Journal of Materials Science N2 - The effect of oxygen addition to microwave-sustained plasmas of hexamethyldisiloxane (HMDSO) has been investigated. Attention was directed to the solid products formed on aluminium substrates (plasma deposits). To enable a quantitative analysis of these, X-ray photoelectron spectroscopy (XPS) of standard silicon-containing materials was carried out. When suitable charge correction is applied to the XP spectra of HMDSO/O2 plasma deposits, a number of very clear trends emerge. From changes in elemental composition, core line binding energies (Si2p, C 1s, and O 1s) and widths, we show how oxygen addition to the plasma affects the chemical nature of the plasma deposit. The data reported also provide (some limited) information on the reactions taking place in the plasma. KW - Photoelektronenspektroskopie Y1 - 1996 VL - 31 IS - 7 SP - 1879 EP - 1885 ER - TY - JOUR A1 - Alexander, Morgan A1 - Short, Robert A1 - Jones, Frank A1 - Stollenwerk, Manfred A1 - Mathar, Gerd A1 - Zabold, Jochen A1 - Michaeli, Walter T1 - The heterogeneous nature of deposits from hexamethyldisiloxane/oxygen plasmas JF - Ceramic films and coatings KW - Hexamethyldisiloxan KW - Sauerstoff KW - Plasma Y1 - 1995 VL - 1995 IS - 54 SP - 87 EP - 99 ER - TY - JOUR A1 - Alexander, Morgan A1 - Short, Robert A1 - Jones, Frank A1 - Stollenwerk, Manfred A1 - Mathar, Gerd A1 - Zabold, Jochen A1 - Michaeli, Walter T1 - An XPS investigation into the chemical structure of deposits formed from hexamethyldisiloxane/oxgen plasmas JF - Journal of Materials Science KW - Hexamethyldisiloxan KW - Plasma Y1 - 1996 VL - 31 SP - 1879 EP - 1885 ER -