@inproceedings{NickHockEmmerichetal.2015, author = {Nick, Christoph and Hock, Christina and Emmerich, Florian and Belle, Stefan and Thielemann, Christiane and Asmus, Tim and Loose, Thomas and Wienand, Karlheinz}, title = {Ultrathin gold as sensor platform for biomolecules}, series = {2015 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), Changchun, China}, booktitle = {2015 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale (3M-NANO), Changchun, China}, doi = {10.1109/3M-NANO.2015.7425462}, year = {2015}, abstract = {Due to the increasing number of diabetes patients worldwide there is an enormous need for accurate, fast and someday also continuous or even closed loop monitoring of blood glucose level. More than 50 years after Clark and Lyons proposed the first glucose enzyme electrodes this concept is still widely in use today. Most concepts use the enzyme glucose oxidase (GOx) that reacts with glucose. These reactions cause a current that is proportional to the amount of glucose present at the sensor. Thus, if the sample volume is known, the blood sugar level can be measured. Although these electrodes have been in use for so long they have the disadvantage of a limited shelf time. In this work we present an enzyme free approach for glucose detection applying ultrathin gold films. According to the basic Fuchs-Sondheimer-theory and other more sophisticated models the resistivity of ultrathin metal films is dominated by scattering effects at their surface. Chemical reactions at the metallic surface are expected to change the conductivity properties and thus these changes can be used to detect molecules. This can be done by creating a self-assembled monolayer at the gold surface. When molecules such as glucose bind to the end groups of this layer the electron scattering and thus the conductivity of the film is expected to change. Ultrathin gold films with a thickness of 6 nm show the largest relative change in resistivity and are thus the preferred film thickness for this application. These gold films show a significant change in resistance when model molecules sodium sulfide and dextran are present, whereas the resistance of a platinum reference electrode does not change significantly.}, subject = {Biosensor}, language = {en} } @article{BuettnerProbstEmmerichetal.2018, author = {B{\"u}ttner, Andre and Probst, Anne-Catherine and Emmerich, Florian and Damm, Christine and Rellinghaus, Bernd and D{\"o}hring, Thorsten and Stollenwerk, Manfred}, title = {Influence of Sputtering Pressure on the Microstructure and Layer Properties of Iridium Thin Films}, series = {Thin Solid Films}, volume = {2018}, journal = {Thin Solid Films}, number = {662}, issn = {0040-6090}, pages = {41 -- 46}, year = {2018}, abstract = {Iridium layers with low stress, high density, and low surface roughness find widespread use in different high-technology applications. This paper presents a study of the influence of the sputtering pressure on the properties of iridium thin films and of its effect on the substrate surface microstructure. We analysed the dependence of the microstructure, crystalline structure, electrical resistivity, and deposition rate on the sputtering pressure and surface defects of the substrate. For the latter, plasma etching of the substrate was performed for different processing times and its effect on the surface roughness of substrates and, subsequently, on the grown iridium films, was examined. The sputtering pressure and the substrate plasma etching time both had a strong influence on the microstructure and surface roughness. These microstructural changes are in good agreement with the tendency described in the Thornton Structure-Zone Model for different sputtering pressures and the microstructure phase map of Alvarez. The electrical resistivity, deposition rate, and crystalline structure were highly dependent on the sputtering pressure.}, subject = {Iridium}, language = {en} }