TY - JOUR A1 - Emmerich, Florian A1 - Thielemann, Christiane T1 - Real-space measurement of potential distribution in PECVD ONO electrets by Kelvin probe force microscopy T2 - Nanotechnology N2 - Multilayers of silicon oxide/silicon nitride/silicon oxide (ONO) are known for their good electret properties due to deep energy traps near the material interfaces, facilitating charge storage. However, measurement of the space charge distribution in such multilayers is a challenge for conventional methods if layer thickness dimensions shrink below 1 μm. In this paper, we propose an atomic force microscope based method to determine charge distributions in ONO layers with spatial resolution below 100 nm. By applying Kelvin probe force microscopy (KPFM) on freshly cleaved, corona-charged multilayers, the surface potential is measured directly along the z-axis and across the interfaces. This new method gives insights into charge distribution and charge movement in inorganic electrets with a high spatial resolution. KW - electret, multilayer, charge distribution, Kelvin probe force microscopy KW - Kelvin-Sonde KW - Rasterkraftmikroskopie Y1 - 2016 UR - https://opus4.kobv.de/opus4-h-ab/frontdoor/index/index/docId/755 VL - 2016 IS - 27 SP - 1 EP - 10 ER -