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Bittner, Boris
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Schneider, R.
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Projection exposure apparatus with optimized adjustment possibility
(2010)
Bittner, Boris
;
Walter, H.
;
Rösch, M.
System correction from long timescales
(2014)
Bittner, Boris
;
Wabra, N.
;
von Hodenberg, M.
;
Schneider, S.
;
Schneider, R.
;
Mack, R.
Projection objective of a mcrolithographic projection exposure apparatus
(2013)
Bittner, Boris
;
Zellner, J.
;
Wabra, N.
;
von Hodenberg, M.
;
Schneider, S.
;
Schneider, R.
;
Schob, A.
;
Rudolph, G.
;
Gratzke, A.
;
Moffat, A.
Projektionsobjektiv für EUV-Mikrolithographie
(2013)
Bittner, Boris
;
Wabra, N.
;
Schneider, S.
;
Schneider, R.
;
Wagner, H.
;
Wald, C.
;
Iliew, R.
;
Schicketanz, T.
;
Gruner, T.
Reflective optical element for the EUV wavelength range, method for producing and correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens
(2013)
Bittner, Boris
;
Weiß, M.
;
Kerwien, N.
;
Weiser, M.
;
Wabra, N.
;
Schlichenmaier, Chr.
;
Clauss, W.
Method of operating a microlithographic projection apparatus
(2015)
Bittner, Boris
;
Wabra, N.
;
Schneider, S.
;
Schneider, R.
Projection exposure apparatus with optimized adjustment capability
(2012)
Bittner, Boris
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7
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