@article{MotzekJanderDesyatnikovetal., author = {Motzek, Christian and Jander, P. and Desyatnikov, A. and Belic, M. and Denz, C. and Kaiser, F.}, title = {Dynamic counterpropagating vector solitons in saturable self-focusing media}, series = {Physical Review E}, volume = {68}, journal = {Physical Review E}, number = {6}, doi = {10.1103/PhysRevE.68.066611}, abstract = {We display rich spatial and temporal dynamics of light fields counterpropagating in a saturable self-focusing medium numerically, and analyze instabilities that counterpropagating solitons experience. An expression for the maximum length that the medium must not exceed for the solitons to be stable is derived and connected to the coupling strength of beam interaction. The instability can lead to periodic or irregular temporal dynamics of the light beams. By considering mutually incoherent counterpropagating beams, we show that differences to the copropagating case are due to the different boundary conditions.}, language = {en} } @article{MotzekPartelBramatietal., author = {Motzek, Christian and Partel, S. and Bramati, A. and Hofmann, U. and {\"U}nal, N. and Hennemeyer, M. and Hornung, M. and Heindl, A. and Ruhland, M. and Erdmann, A. and Hudek, P.}, title = {Mask aligner lithography simulation-From lithography simulation to process validation}, series = {Microelectronic Engineering}, volume = {98}, journal = {Microelectronic Engineering}, doi = {10.1016/j.mee.2012.07.076}, pages = {121 -- 124}, abstract = {Based on the comparison between simulated and experimental results, we investigate the predictive qualities of mask aligner lithography simulation. Using a properly calibrated photoresist development model, it is possible to predict photoresist profiles with good quantitative accuracy. Dissolution rate monitors are shown to be an excellent tool to calibrate the development models for many of the photoresists typically used in mask aligner lithography. The accurate description of the photoresist in the simulations closes the gap between process control in the clean room (which is based on the evaluation of photoresist profiles) and recent efforts to use numerical methods to optimize the optical parameters of the lithography process.}, language = {en} }