@article{BittnerWalterRoesch, author = {Bittner, Boris and Walter, H. and R{\"o}sch, M.}, title = {Projection exposure apparatus with optimized adjustment possibility}, language = {en} } @article{BittnerWabravonHodenbergetal., author = {Bittner, Boris and Wabra, N. and von Hodenberg, M. and Schneider, S. and Schneider, R. and Mack, R.}, title = {System correction from long timescales}, language = {en} } @article{BittnerZellnerWabraetal., author = {Bittner, Boris and Zellner, J. and Wabra, N. and von Hodenberg, M. and Schneider, S. and Schneider, R. and Schob, A. and Rudolph, G. and Gratzke, A. and Moffat, A.}, title = {Projection objective of a mcrolithographic projection exposure apparatus}, language = {en} } @article{BittnerWabraSchneideretal., author = {Bittner, Boris and Wabra, N. and Schneider, S. and Schneider, R. and Wagner, H. and Wald, C. and Iliew, R. and Schicketanz, T. and Gruner, T.}, title = {Projektionsobjektiv f{\"u}r EUV-Mikrolithographie}, language = {de} } @article{BittnerWeissKerwienetal., author = {Bittner, Boris and Weiß, M. and Kerwien, N. and Weiser, M. and Wabra, N. and Schlichenmaier, Chr. and Clauss, W.}, title = {Reflective optical element for the EUV wavelength range, method for producing and correcting such an element, projection lens for microlithography comprising such an element, and projection exposure apparatus for microlithography comprising such a projection lens}, language = {en} } @article{BittnerWabraSchneideretal., author = {Bittner, Boris and Wabra, N. and Schneider, S. and Schneider, R.}, title = {Method of operating a microlithographic projection apparatus}, language = {en} } @article{Bittner, author = {Bittner, Boris}, title = {Projection exposure apparatus with optimized adjustment capability}, language = {en} }