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This work addressed the challenges of accurate mm-wave characterization of devices fabricated in advanced semiconductor technologies. It developed the in-situ calibration solution that is easy to be implemented for silicon technologies. The new technique was verified up to 110 GHz on three difference processes: high performance SiGe:C BiCMOS from IHP Microelectronics (Germany), BiCMOS9MMW from STMicroelectronics (France), and RF CMOS 8SF from IBM Microelectronics (USA). The measurement frequency was solely limited by the capability of the test equipment. Practical results demonstrated that proposed in-situ calibration significantly outperforms the convention method independently on the process specifics and complexity. Some important aspects of the on-wafer S-parameter measurement assurance were presented as well. The discussion included the analysis of the calibration residual errors caused by the improper boundary conditions of coplanar calibration standards and the impact of the RF probe tip design. In conclusion, some suggestions for further accuracy improvement of the proposed method are given.
Internal gettering based on oxygen precipitates is a technique which is used to remove occasional metal contaminations from the active region of microelectronic devices. In order to obtain efficient internal gettering, the precipitation of oxygen in silicon must be precisely controlled. This can be done by rapid thermal annealing (RTA). RTA offers the possibility to establish well defined vacancy concentrations in silicon wafers. Since vacancies are well known to enhance the precipitation of oxygen in Czochralski silicon, RTA pre-treatments can be used to control the generation of oxygen precipitates. This work provides information about the influence of vacancies, introduced by RTA, in silicon wafers on the nucleation of oxygen precipitates during a subsequent annealing in the temperature range between 400 °C and 1000 °C. Moreover, detailed investigations show morphologies and sizes of oxygen precipitates observed in vacancy supersaturated samples subjected to an annealing in the temperature range between 700 °C and 1000 °C for different annealing times. The morphology of the oxygen precipitates was investigated by scanning transmission electron microscopy (STEM) and Fourier transform infrared (FTIR) spectroscopy. In case of FTIR spectroscopy, the absorption bands were assigned to morphologies of the oxygen precipitates observed by STEM. The final part of investigations presented in this work is dedicated to the gettering efficiency of metal impurities. Special focus is devoted towards the gettering efficiency of Cu in vacancy supersaturated samples. In order to understand the gettering of Cu in samples contaminated with high and low concentrations of Cu, two getter tests were carried out. A haze getter test was used to investigate the getter efficiency of Cu in highly contaminated samples. In this particular case, the concentration of Cu equals the concentration of Cu at its solubility limit at 900 °C. A “7 day storage getter test”, developed in this work, was used for the investigation of the getter efficiency of Cu in samples contaminated with low concentration of Cu amounting to 1×1013 cm-2. It was found that the density of oxygen precipitates increases with increasing concentration of vacancies. The nucleation curves of oxygen precipitates in the vacancy supersaturated samples consist of three maxima wherein the maximum observed at 800 °C can be found only in the vacancy rich samples. These maxima can be explained assuming the nucleation of coherent plate-like nuclei consisting of oxygen mono-layers ((Oi)2-p1) and oxygen double-layers ((Oi)2-p2) for the peaks at 450 °C and at 650 °C, respectively, and VO2 mono layers for the peak at 800 °C. The STEM investigations have shown the change of the morphology of oxygen precipitates in samples subjected to nucleation annealing at various temperatures. It was observed, that different temperatures of the RTA pre-treatment and thus different supersaturations of vacancies did not influence the morphology of oxygen precipitates in samples annealed at 800 °C. After annealing at a temperature of 800 °C three and two dimensional dendritic precipitates were found. This kind of precipitates gave rise to an absorption band at 1040 cm-1 as shown by FTIR investigations. From the results of the getter test it was deduced that secondary defects like dislocations have a strong influence on the getter efficiency in samples contaminated with high concentrations of Cu and Ni. In case of the samples contaminated with low concentration of Cu, gettering at dislocations is less important and oxygen precipitates become the main getter sink for Cu. It was also observed, that Cu aggregates at the edge of plate-like precipitates at the site of tensile strain of the silicon lattice. Moreover, the size and density of oxygen precipitates can strongly influence the getter efficiency of metal impurities. The results and observations presented in this work can be very useful for designing and fabrication of high performance silicon wafers. The results can be used for the development of a gettering simulator based on oxygen precipitation. The results of the analysis of the FTIR spectra can be helpful for the fast characterization of the morphologies of oxygen precipitates by means of FTIR.
The thesis presents the results of the investigations of electronic properties and defect states of dislocation networks (DNs) in silicon produced by wafers direct bonding technique. Practical interest for the investigations in this area issued – first of all – from the potential application of such dislocation networks in microelectronics as all-Si light emitter for on-chip interconnection. Besides, dislocation networks may serve as a perfect model object to get new information about the fundamental properties of dislocations and grain boundaries in Si, what is of particular importance for multicrystalline silicon solar cells performance. Despite of a long story of studying of dislocations in silicon, a new insight into the understanding of their very attractive properties was succeeded due to the usage of a new, recently developed silicon wafer direct bonding technique, allowing to create regular dislocation networks with predefined dislocation types and densities. Samples for the investigations were prepared by hydrophilic bonding of p-type Si (100) wafers with same small misorientation tilt angle (~0,5°), but with four different twist misorientation angles Atw (being of <1°, 3°, 6° and 30°, respectively), thus giving rise to the different DN microstructure on every particular sample. The main experimental approach of this work was the measurements of current and capacitance of Schottky diodes prepared on the samples which contained the dislocation network at a depth that allowed one to realize all capabilities of different methods of space charge region spectroscopy (such as CV/IV, DLTS, ITS, etc.). The key tasks for the investigations were specified as the exploration of the DN-related gap states, their variations with gradually increasing twist angle Atw, investigation of the electrical field impact on the carrier emission from the dislocation-related states, as well as the establishing of the correlation between the electrical (DLTS), optical (photoluminescence PL) and structural (TEM) properties of DNs. The most important conclusions drawn from the experimental investigations and theoretical calculations can be formulated as follows: - DLTS measurements have revealed a great difference in the electronic structure of small-angle (SA) and large-angle (LA) bonded interfaces: dominating shallow level and a set of 6-7 deep levels were found in SA-samples with Atw of 1° and 3°, whereas the prevalent deep levels – in LA-samples with Atw of 6° and 30°. The critical twist misorientation angle separating SA- and LA- interfaces was estimated as Atw*≈ 3,5±0,5°, what agrees quiet well with the results of previous PL and TEM investigations. - For the dominating shallow traps in SA-samples (denoted as ST1/ST3 traps) a new phenomenon – that is ‘giant Poole-Frenkel effect’ of enhanced carrier emission due to dislocations elastic strain field was observed for the first time. Performed theoretical calculations have shown that in the investigated samples such an effect should be ascribed to the row of 60° dislocations rather than to the mesh of screw ones. In this respect, shallow traps ST1/ST3 were identified either with shallow 1D bands (directly or as being coupled with them) or with shallow stacking fault states on splitted 60° dislocation. - From the comparison and correlations of measured DLTS spectra with the results of PL and TEM investigations it was established, that shallow ST1/ST3 traps participate in D1 radiative recombination and that the structural elements, responsible for D1 luminescence of small-angle DNs, are the triple knots (intersections with screw dislocations) along the 60° dislocations. However, the optimal density of 60° dislocations as well as of triple knots, in other words – the optimal tilt and twist misorientation angles for maximal D1 intensity – needs further clarification.