@phdthesis{Schlipf2024, author = {Schlipf, J{\´o}n Benedikt}, title = {Enhancement of group-IV optoelectronic sensing devices through materials engineering and nanostructuring}, doi = {10.26127/BTUOpen-6797}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus4-67979}, school = {BTU Cottbus - Senftenberg}, year = {2024}, abstract = {Driven by the continuous research progress in integrated electronics towards increasing complexity and miniaturization, semiconductor technology has not only yielded very powerful electronic devices, but also provided the necessary tools for miniaturization of mechanical, optical and other functions into micro- and nanoscale devices. While transistor scaling approaches the physical limits mainly governed by heat dissipation, further advances are predicted to stem from the integration of additional functionality into integrated circuits instead. For the case of photonics and optoelectronics, which have plenty of applications in computing, communications and sensing, silicon devices have been applied commercially for several years. While being compatible with mainstream electronics, silicon does not offer the optimum properties for mediation between optics and electronics compared to, for example, III-V materials. To alleviate this, properties can be improved both through wavelength-scale structuring and exploitation of resonances, and through alloying with other group-IV materials like germanium and tin. Both of these avenues are studied within this work. On one hand, nanophotonic structures, most notably metasurfaces, and corresponding simulation and optimization algorithms, are developed for selective filtering and enhancement of light-matter interactions. On the other hand, group-IV materials are studied, most notably their non-destructive characterization with optical methods.}, subject = {Metasurface; Group-IV; Plasmonics; Photodetector; Nanophotonik; Plasmonik; Gruppe-IV-Materialien; Integrierte Schaltung; Nanophotonik; Plasmonik; Silicium; Germanium}, language = {en} } @phdthesis{Akhtar2022, author = {Akhtar, Fatima}, title = {Graphene synthesis under Si-CMOS compatible conditions}, doi = {10.26127/BTUOpen-5927}, url = {http://nbn-resolving.de/urn:nbn:de:kobv:co1-opus4-59270}, school = {BTU Cottbus - Senftenberg}, year = {2022}, abstract = {Due to the unique electronic band structure, graphene has opened the great potential to extend the functionality of a large variety of graphene-based devices in health and environment, energy storage, or various microelectronic applications, to mention a few. At this point, the implementation of graphene into Silicon (Si) semiconductor technology is strongly dependent on several key challenges. Among them, high-quality and wafer-scale graphene synthesis on CMOS compatible substrates is of the highest importance. Though large-area graphene can be achieved on substrates like copper, platinum, silicon carbide, or single-crystal Ni, however, high growth temperatures, unavailability of large scale, or contamination issues are the main drawbacks of their usage. In this PhD work, 8-inch scale graphene synthesis is attempted on alternative substrates such as epitaxial Germanium on Si and polycrystalline Nickel on Si. To achieve the growth of the highest quality of graphene, this work focuses on the investigations of various nucleation and growth mechanisms, substrate-graphene interfaces, effects of different substrate orientations, and detailed microscopic and macroscopic characterization of the grown films. Finally, it should also be stressed that the experiments in this work were carried out in a standard BiCMOS pilot-line, making this study unique, as its results might directly pave the way to further graphene integration and graphene-based device prototyping in mainstream Si technologies.}, subject = {Graphene; Chemical vapor deposition; Growth; Oxidation; Germanium; Nickel; Graphen; CVD; Wachstum; Oxidation; Graphen; Keimbildung; Wachstum; CVD-Verfahren; Nickel; Germanium}, language = {en} }