@article{MoralesGertigKotetal.2025, author = {Morales, Carlos and Gertig, Max and Kot, Małgorzata and Alvarado, Carlos and Schubert, Markus Andreas and Zoellner, Marvin Hartwig and Wenger, Christian and Henkel, Karsten and Flege, Jan Ingo}, title = {In situ X-ray photoelectron spectroscopy study of atomic layer deposited ceria on SiO₂ : substrate influence on the reaction mechanism during the early stages of growth}, series = {Advanced Materials Interfaces}, volume = {12}, journal = {Advanced Materials Interfaces}, number = {5}, publisher = {Wiley}, address = {Weinheim}, issn = {2196-7350}, doi = {10.1002/admi.202400537}, year = {2025}, abstract = {Thermal atomic layer deposition (ALD) of cerium oxide using commercial Ce(thd)4 precursor and O₃ on SiO₂ substrates is studied employing in-situ X-ray photoelectron spectroscopy (XPS). The system presents a complex growth behavior determined by the change in the reaction mechanism when the precursor interacts with the substrate or the cerium oxide surface. During the first growth stage, non-ALD side reactions promoted by the substrate affect the growth per cycle, the amount of carbon residue on the surface, and the oxidation degree of cerium oxide. On the contrary, the second growth stage is characterized by a constant growth per cycle in good agreement with the literature, low carbon residues, and almost fully oxidized cerium oxide films. This distinction between two growth regimes is not unique to the CeOx/SiO₂ system but can be generalized to other metal oxide substrates. Furthermore, the film growth deviates from the ideal layer-by-layer mode, forming micrometric inhomogeneous and defective flakes that eventually coalesce for deposit thicknesses above 10 nm. The ALD-cerium oxide films present less order and a higher density of defects than films grown by physical vapor deposition techniques, likely affecting their reactivity in oxidizing and reducing conditions.}, subject = {ALD; Cerium oxide; Growth model; In-situ; XPS}, language = {en} } @article{KotGawlińskaNęcekPożarowskaetal.2025, author = {Kot, Małgorzata and Gawlińska-Nęcek, Katarzyna and Pożarowska, Emilia and Henkel, Karsten and Schmeißer, Dieter}, title = {Photosensitivity and carrier densities of perovskite solar absorbers}, series = {Advanced Science}, volume = {12}, journal = {Advanced Science}, number = {16}, publisher = {Wiley}, address = {Weinheim}, issn = {2198-3844}, doi = {10.1002/advs.202412711}, year = {2025}, abstract = {Dark and light current-voltage characteristics of perovskite solar absorbers are analyzed in terms of their carrier densities. The analysis reveals p-type large polarons as a dominant carrier type in the investigated perovskite solar cells. The mechanism causing photosensitivity is attributed to the dissociation (and pairing) of bipolarons to large polarons (and vice versa) that are controlled by the internal potential Γ. As an example, the polaron concept is tested for a formamidinium lead triiodide perovskite solar cell. The individual steps of the data analysis are demonstrated and determine the ionicity factor of this perovskite film, quantify the density of the large polarons, and predict the gain and loss of photo-induced carriers. It is deduced that a reversible light-on/off operation can only occur when the bias voltage never exceeds a critical value of the internal potential. The results gained in this study suggest that the novel analysis can be successively applied on different hybrid perovskite materials, too.}, subject = {Bipolarons; Ionicity factor; Large polarons; Perovskite solar cells}, language = {en} }