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Characterization of Nanoparticles: Measurement Processes for Nanoparticles surveys this fast growing field, including established methods for the physical and chemical characterization of nanoparticles. The book focuses on sample preparation issues (including potential pitfalls), with measurement procedures described in detail. In addition, the book explores data reduction, including the quantitative evaluation of the final result and its uncertainty of measurement. The results of published inter-laboratory comparisons are referred to, along with the availability of reference materials necessary for instrument calibration and method validation. The application of these methods are illustrated with practical examples on what is routine and what remains a challenge.
In addition, this book summarizes promising methods still under development and analyzes the need for complementary methods to enhance the quality of nanoparticle characterization with solutions already in operation.
This Report describes an inter-laboratory comparison aiming on the establishment of the used method (BET) as a reference method. Another purpose was the certification of the porous reference material #15 BAM Titania as CRM BAM-P110 (cf. D 5.41/42). The certified values determined by nitrogen ad-sorption at 77.3 K according to the international standards ISO 15901-2 and ISO 9277 are summarized in the Table below.
An inter-laboratory comparison on the particle size, expressed as mean diameter d, of nanoscaled SiO2 (#14 BAM Silica (see NanoValid DoW, D.5.41/5.42)) has been performed. The majority of participants used Dynamic Light Scattering (DLS). A few used Electron Microscopy as method. Following methods had been applied by only one partner, respectively: Small Angle X-ray Scattering, Analytical Ultracentrifugation, Atomic Force Microscopy and Atomizer with electric mobility spectrometer.
There are different ways how to prove the quality of the results obtained by electron microscopy and related microanalysis techniques, e.g. use of validated standard operation procedures, participation in proficiency testing exercises, use of certified reference materials, etc. International standards are able to provide requirements, specifications, guidelines or characteristics of methods, instruments or samples with the final goal that these can be used consistently in accredited laboratories. In the field of electron microscopy and microbeam analysis standardization and metrology are terms which are encountered rather seldom at major conferences and scientific publications. Nevertheless, spectra formats like EMSA/MSA for spectral-data exchange or tagged image file format (TIFF) for SEM, guidelines for performing quality assurance procedures or for the specification of X-ray spectrometers as well as of certified reference materials (CRMs) in EPMA, or measurement of average grain size by electron backscatter diffraction (EBSD), or guidelines for calibrating image magnification in SEM or TEM are ISO standards already published and used successfully by a large part of the electron microscopy and microbeam analysis community. A main and continuous task of ISO/TC 202 and its subcommittees is to identify and evaluate feasible projects/proposals needed to be developed into new international standards, particularly in respect to recent but established technology, such the silicon drift detector (SDD) EDS one.
Another international platform in the frame of which pre-standardization work can be organized is VAMAS (Versailles Project on Advanced Materials and Standards). International collaborative projects involving aim at providing the technical basis for harmonized measurements, testing, specifications, and standards to be further developed at ISO level. One key point of VAMAS activities is constituted by inter-laboratory comparisons for high-quality data. In the field of microbeam analysis, the technical working area (TWA) 37 Quantitative Microstructural Analysis deals with corresponding projects. Good ideas, e.g. on analysis of low-Z materials/elements and at low energies are particularly encouraged by directly contacting the author. Support and already available guidance will be supplied.