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A case study on the TEM analysis of the size and shape distribution of TiO2 bipyramidal nanoparticles prepared on TEM grids was included in the recently published ISO standard ISO 21363. It was agreed to organize at a later stage a second inter-lab comparison with the nanoparticles distributed to the participants as a liquid suspension. Protocols for uniform nanoparticle deposition on suited supports developed and optimized within the EMPIR nPSize project are also prepared to be distributed. For this, we have chosen the VAMAS platform (www.vamas.org) which offers an excellent international infrastructure of laboratories with high competence in nanoparticle measurement. The VAMAS technical working area dedicated to nanoparticle measurement is TWA 34 ‘Nanoparticle populations’. For this type of nanoparticles, the size and shape distributions are the primary parameters to be reported. Due to the good deposition protocols developed, an automated image analysis is enabled (in contrast to the manual analysis of irregular TiO2 nanoparticles.
In parallel with the TiO2 nanoparticle exercise, two spherical SiO2 nanoparticle samples with bi-modal size distributions (nominal relative number concentrations of 1:1 and 10:1) are prepared for a second VAMAS inter-lab comparison. Here, the nanoparticle concentration is the primary parameter to be measured. For the imaging methods it is targeted to measure the relative nanoparticle concentrations of the two modes. For the absolute nanoparticle concentration to be measured by imaging methods it is necessary to control the volume of the liquid suspension deposited on the substrate and to obtain such a homogeneous nanoparticle deposition on the substrate which allows to count (or extrapolate) all the deposited particles.
The status of standardization related to x-ray photoelectron spectroscopy (XPS, ESCA) at ASTM International (Subcommittee E42.03) and ISO (TC 201) is presented and commented upon in a structured manner. The survey also identifies other active bodies, here VAMAS Technical Working Area 2 and the Surface Analysis Working Group at the International Meter Convention, contributing to prestandardization Research and metrology of XPS and reports their specific activities. It is concluded that existing standardization is delivering good practices in the use of XPS and has a high potential to avoid the recently observed erroneous use, misapplications, and misinterpretation by new and inexperienced users of the method—which seems to be the main reason for the “reproducibility crisis” in the field of XPS applications. A need for a more proactive publicizing of international documentary standards by experienced XPS users, specifically those who are involved in standardization, is identified. Because the existing portfolio of standards addressing the use of XPS is not complete, future standardization projects planned or already ongoing are mentioned. The way the standardization bodies are identifying future needs is shortly explained.