Ingenieurwissenschaften und zugeordnete Tätigkeiten
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A comparative analysis is performed by XPS, HAXPES and SEM of industrial functionalised graphene powder of different morphology. The chemical analysis carried out by XPS, which probing depth is around 10nm, and HAXPES, which can reach up to 30nm probing depth. By combining these two techniques is possible to get a rough, non-destructive depth profiling of the sample's surface. The results show a higher concentration of the functionlisation elements on the surface of the sample and the influence of the morphology on the functionalisation process and the C/O ratio.
In order to bridge the gap between lab-scale and industrial-scale production of graphene it is necessary to develop processes, equipment and measurement procedures to control the material features. One of the crucial reasons of graphene’s limited commercialization is the lack of standard procedures to properly characterize and define the material chemical and structural properties down to the nanometer level. This leads to many issues regarding material synthesis repeatability, inappropriateness choice of measurands and measurement reproducibility which heavily affect the consistency of the material performance.
In our study, a comparative analysis is performed on two different series (G5 and G6) of industrial graphene powders, each series produced with four types of functionalization: raw graphene, oxygen-functionalized, nitrogen-functionalized and fluorine-functionalized. All the 8 sample variants were analyzed from a chemical and morphological point of view in the form of powders prepared as slightly pressed in metallic sample holders.
The results of the comparative chemical analyses XPS and EDS show a good agreement in the concentration values for all the elements present in the samples, despite the different analysis volumes addressed by the two techniques. For this reason, the samples can be considered homogeneous in both lateral and vertical direction.
A clear influence of the morphology on the composition is evident. Therefore, such correlative measurements of morphology and composition are necessary for a comprehensive characterization of industrial graphene flakes.
Nanosafety is becoming increasingly important as nanomaterials are widely used in industrial processes and consumer products. For nanotoxicity measurements prior sterilization of the samples is necessary, but as structure activity relationships are made with properties of pristine particles, the question arises, if the sterilization process has an impact on the physico-chemical properties of nanoparticles and thus on the biological behavior.
This question will be addressed in this talk. For this purpose, results from SEM and EDS measurements are combined with those of a novel lab-based HAXPES spectrometer in order to obtain a more complete picture. At the end, an influence of sterilization will be evident, which indicates a restructuring of the nanoparticles owing to sterilization.
Nanosafety is becoming increasingly important as nanomaterials are widely used in industrial processes and consumer products. For nanotoxicity measurements prior sterilization of the samples is necessary, but as structure activity relationships are made with properties of pristine particles, the question arises, if the sterilization process has an impact on the physico-chemical properties of nanoparticles and thus on the biological behavior.
This question will be addressed in this talk. For this purpose, results from SEM and EDS measurements are combined with those of a novel lab-based HAXPES spectrometer in order to obtain a more complete picture. At the end, an influence of sterilization will be evident, which indicates a restructuring of the nanoparticles owing to sterilization.
The novel lab-based HAXPES spectrometer (ULVAC-PHI Quantes) gives us the possibility to measure XPS at 1486.6 eV (monochromatic Al Kα source) and HAXPES at 5414.9 eV (monochromatic Cr Kα source) on a sample at the same position. The surface analysis with this spectrometer leads to an information depth of about 10 nm for XPS and in comparison, to an analysis of deeper regions of about 30 nm for HAXPES measurements. This method provides a nondestructive way to distinguish between the near-surface region of the nanoparticles and the whole nanoparticle. Additionally, HAXPES gives access to deeper core levels at higher energy.
An application of this technique is presented using nanoparticles. The results shown were obtained with nanoparticles, that were treated differently by means of sterilization for nanosafety (i.e., before studying their toxicity it is important to establish whether nanomaterials are sterile and, if not, to be treated either via microwave or autoclave sterilisation). As a complementary method, the data is compared with SEM and EDX measurements. All methods demonstrate the influence of sterilization. More specifically, these results show that the sterilization step must be considered in the physical-chemical description of the particles for establishing reliable (quantitative structure-activity) relationships.
This talk was part of the inauguration event for the new x-ray photoelectron spectrometer with the possibility to measure HAXPES (hard energy x-ray photoelectron spectroscopy). With HAXPES detailed chemical information can now be gained not only from the first outermost nanometres of the sample surface, but also from deeper regions. In this talk first results and experiences handling the spectrometer are shown.
The Competence Centre nano@BAM is presenting a new X-ray Photoelectron Spectrometer – the HAXPES (XPS at hard energy) – for researching advanced materials at the nanoscale. With HAXPES detailed chemical information can now be gained not only from the first outermost nanometres of the sample surface, but also from deeper regions.
Top international experts will share their knowledge and key findings on how to utilise HAXPES for exploring the surface of various advanced materials. Following the lectures, we will show you a short demo of the new instrument and answer your questions.