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Since its discovery, graphene has got growing attention in the industrial and application research due to its unique properties . However, graphene has not been yet implemented into the industrial market, in particularly due to the difficulty of properly characterizing this challenging material. As most of other nanomaterials, graphene’s properties are closely linked to its chemical and structural properties, such as number of layers, flake thickness, degree of functionalisation and C/O ratio. For the commercialization, suitable procedures for the measurement and characterization of the ultrathin flakes, of lateral dimensions in the range from µm to tens of µm, are essential.Surface chemical methods, especially XPS, have an outstanding role of providing chemical information on the composition. Thereby, one well-known problem for surface analytical methods is the influence of contamination on the composition as in the case of adventitious carbon. The differentiation between carbon originated from the contamination or from the graphene sample itself is often not obvious, which can lead to altered results in the determination of the composition. To overcome this problem, Hard Energy X-ray Photoelectron Spectroscopy (HAXPES) offers new possibilities due to its higher information depth. Therefore, XPS measurement obtained with Al Kα radiation (E = 1486. 6 eV) were compared with analyses performed with a Cr Kα (E = 5414. 8 eV) excitation on functionalized graphene samples. Differences are discussed in terms of potential carbon contamination, but also of oxygen on the composition of the samples. Measurements are performed on O-, N- and F-functionalized graphene. Different preparation procedures (powder, pellet, drop cast from liquid suspension) will be also discussed, correlation of the results with the flakes morphology as well as their validation with other independent methods are in progress.
Analytical routines for a comprehensive in-depth morphological, structural, and chemical characterization of functionalized TiO2 films by using different state-of-the-art analytical techniques are presented and discussed with the main objective to identify potential reference TiO2 coating parameters able to be certified at a later stage. TiO2 films fabricated by two different synthetic procedures as representative for two main large-scale applications were selected: (i) pulsed d.c. magnetron sputtering for photocatalytic applications and (ii) screen printing from preformed anatase nanoparticles. The screen-printed films were further loaded with a sensitizing dye for application as a dye-sensitized solar cell. Film properties such as microstructure and crystallographic texture of pulsed d.c. magnetron sputtering synthesized films were systematically studied by means of scanning nanobeam electron diffraction in a transmission electron microscope and the surface and inner morphology by scanning electron microscopy. The dye distribution over the depth of screen-printed TiO2 layers was analyzed before and after dye-loading by means of energy dispersive X-ray spectroscopy at scanning electronmicroscope, Auger electron spectroscopy and time-of-flight secondary ion mass spectrometry. The long-term goal of the present study is the improvement of quality of the TiO2 film parameters as measured by using different types of reference TiO2 coatings having specific parameters certified.