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Silicon surface passivation with atomic layer deposited (ALD) thin films has gained more and more interest in the PV community in recent years. With ALD good film quality, accurate thickness control and conformity are reached. Furthermore, ALD is capable of coating difficult substrates such as nanostructured surfaces with the same accuracy as flat surfaces. A variety of materials such as Al2O3, TiO2 and HfO2 demonstrate good surface passivation quality both for front and rear surface of silicon solar cells. In addition of providing good surface passivation, thin films with high refractive index e.g. HfO2, TiO2 and AlN can act simultaneously as antireflection coatings when applied on the front surface of the device. Hence, ALD thin films can reduce both electrical and reflective losses in solar cells.
Thorough investigation of the optical properties of these layers is crucial for several reasons related to their production and use. Optical measurements provide a fast, easy, non-destructive, and in situ capable approach to quality assurance for photovoltaic devices. As the function of the final device is optical, optimisation of the device performance relies strongly on the knowledge of the wide-range dielectric function of the thin layers. In this contribution, we determined the optical constants of ALD generated layers of AlN, Al2O3, TiO2, and HfO2 in a wide spectral range covering the near ultraviolet and the mid-infrared regions by means of spectroscopic ellipsometry. By combining data from a UV-Vis-NIR ellipsometer (Woollam M2000DI) and an FTIR ellipsometer (Sentech Sendira), we can determine the optical constants alongside with the layer thicknesses from one large set of spectroscopic measurements. We consider this a contribution to the metrological treatment of stratified and structured thin films in the optical range by polarisation-sensitive measurement methods.
Die Reibeigenschaften von PEEK-Materialien gegen Stahlscheiben wurden in Luft, Vakuum und Wasserstoffumgebung untersucht. PEEK-Verbundwerkstoffe wurden mit Graphit, CNT oder TiO2-Partikeln gefüllt. Die Ergebnisse zeigen, dass reines PEEK umgebungsabhängig ist und die Desorption von Gasen im Vakuum zur hohen Verschleißraten führt. Durch Zusatz von Graphit bzw. CNT wird eine sehr geringe Reibung in Wasserstoff erreicht (0,04), während mit TiO2-Partikeln die niedrigste Verschleißrate sowohl in Vakuum als auch in Wasserstoffumgebung erzielt wird. Chemische Prozesse treten in den Materialien und im Tribokontakt auf und interagieren miteinander. Insbesondere die Bildung und die Adhäsion eines dünnen und homogenen Transferfilms sind stark von den Umgebungen abhängig.
The polymer chemical structure of the polyimide has a major influence on the tribological behaviour. The addition of graphite in PI2 has a beneficial effect in hydrogen on the friction and wear. The low friction of graphite is associated with a lubricant film in hydrogen. The influence of hydrogen on graphite is more effective than humidity. CNTs have a similar effect to that of graphite in PEEK composites. TiO2 particles improve significantly the wear rate both in vacuum and hydrogen environment. In LH2 friction and wear decrease for unfilled polymers. Friction of graphite filled composites increases slightly and wear rate is stable.