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Under the assumption of local thermal equilibrium, a numerical algorithm is proposed to find the equation of state for laser-induced plasmas (LIPs) in which chemical reactions are permitted in addition to ionization processes. The Coulomb interaction in plasma is accounted for by the Debye–Hückel method. The algorithm is used to calculate the equation of state for LIPs containing carbon, silicon, calcium, chlorine, nitrogen, and argon. The equilibrium reaction constants are calculated using the latest experimental and ab initio data of spectroscopic constants for the molecules N2, C2, Si2, CN, Cl2, SiN, SiC, CaCl, CaCl2 and their positive and (if existed) negative ions. The algorithm is incorporated into a fluid dynamic numerical model based on the Navier–Stokes equations describing an expansion of LIP plumes into an ambient gas. The dynamics of LIP plumes obtained by the ablation of SiC, CaCl2, solid silicon, or solid carbon in an ambient gas containing N2 and Ar is simulated to study formation of molecules and molecular ions. A particular attention is paid to formation of anions Cl−, Cl2−, Si2−, C2−, CN−, and SiN− in LIPs.
A collisional-dominated model of a laser induced plasma will be presented which includes the coupled Navier-Stokes, state, radiative transfer, and material transport equations and incorporates plasma chemistry through the equilibrium approach based on the use of atomic and molecular partition functions. Simple chemical systems are modeled including ablation of Si, C, SiC, CaCl2 in N2 or Ar atmospheres with the formation of molecules N2, C2, Si2, CN, Cl2, SiN, SiC, CaCl, CaCl2 and their corresponding positive and negative ions. The model is used to study evolution of number densities of atomic and molecular species in the expanding plasma plume. The distribution is compared to experimental observations obtained by optical imaging and tomography. The model and experiment serve to elucidate mechanisms of molecular formation in LIPs, the topic which has recently received much attention in the LIBS community.
Two topics will be addressed: (1) calibration-free LIBS based on Monte Carlo spectral optimization and (2) insight into the possibility of simultaneous elemental and molecular analysis by LIBS. Both topics heavily rely on modeling of laser induced plasma and are closely connected to experiment. In Monte Carlo LIBS (MC LIBS), concentrations are found by fitting model-generated synthetic spectra to experimental spectra. The model of a static uniform isothermal plasma in local thermodynamic equilibrium is employed. Many configurations of plasma parameters and their corresponding spectra are simultaneously generated using a graphic processing unit (GPU). Using the GPU allows for the reduction of computational time down to several minutes for one experimental spectrum that presents the significant progress in comparison with earlier versions of MC LIBS. The method is tested by analyzing industrial oxides containing various concentrations of CaO, Fe2O3, MgO, and TiO2. The agreement within several percent between found and certified concentrations is achieved. Next, a newly developed collisional-dominated model of a laser induced plasma is introduced. The model includes the coupled Navier-Stokes, state, radiative transfer, and material transport equations and incorporates plasma chemistry through the equilibrium approach based on the use of atomic and molecular partition functions. Simple chemical systems are modeled including ablation of Si and C in N2 and Ar atmospheres.The model is used to study evolution of number densities of atomic and molecular species in the expanding plasma plume. The distribution is compared to experimental observations obtained by optical imaging and tomography. To further verify the model, dynamic plasma
A collisional-dominated model of a laser induced plasma will be presented which includes the coupled Navier-Stokes, state, radiative transfer, and material transport equations and incorporates plasma chemistry through the equilibrium approach based on the use of atomic and molecular partition functions. Simple chemical systems are modeled including ablation of Si, C, SiC, CaCl2 in N2 or Ar atmospheres with the formation of molecules N2, C2, Si2, CN, Cl2, SiN, SiC, CaCl, CaCl2 and their corresponding positive and negative ions1,2. The initial conditions are specially chosen to emulate the plasma state on the onset of expansion just after the laser pulse had ended.
The model is used to study evolution of number densities of atomic and molecular species in the expanding plasma plume. The distribution is compared to experimental observations obtained by optical imaging and tomography. The model and experiment serve to elucidate mechanisms of molecular formation in LIPs, the topic which has recently received much attention in the LIBS community.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basis of plasma computer modeling will be presented.
Laser induced plasma (LIP) is a dynamic, short living event which presents significant difficulty for modeling. In this report, a collisional-dominated chemical model developed earlier* is expanded by the inclusion of a new method for calculation of chemical reactions. The model consists of the coupled Navier-Stokes, state, radiative transfer, material transport, and chemical equations. The latter are written in terms of atomic and molecular partition functions rather than reaction rates. Typically, a solution of such the system of chemical equations is difficult for the entire range of plasma temperatures and densities because reaction constants may vary by hundreds orders of magnitude owing to extreme plasma conditions. No numerical solver of non-linear systems of equations handles this situation with ease. We resolve the problem by using a hierarchical approach. First, we rank the reactions according to their ascendancy. Second, we exploit either the contraction or Newton-Raphson algorithms to solve the system of chemical equations. We illustrate the approach by performing a series of calculations for reacting species Si, C, N, Ca, Cl and their molecules in laser induced plasmas.
An improved algorithm for calibration-free laser induced breakdown spectroscopy (CF LIBS) is presented which includes several novel features in comparison with previously proposed similar algorithms. In particular, it allows using spectral lines with arbitrary optical thickness for the construction of Saha-Boltzmann plots, retrieves the absorption path length (plasma diameter) directly from a spectrum, replaces the Lorentzian line profile function by the Voigt function, and allows for self-absorption correction using pre-calculated and tabulated data rather than approximating functions. The tabulated data embody the solutions of the radiative transfer equation for numerous combinations of optical thicknesses and line widths. The algorithm is thoroughly verified with synthetic spectra.
Laser-induced plasmas are widely used in many areas of science and technology; examples include spectrochemical analysis, thin film deposition, material processing, and even jet propulsion. Several topics will be addressed. First, general phenomenology of laser-induced plasmas will be discussed. Then, a chemical model will be presented based on a coupled solution of Navier-Stokes, state, radiative transfer, material transport, and chemical (Guldberg-Waage) equations. Results of computer simulations for several chemical systems will be shown and compared to experimental observations obtained by optical imaging, spectroscopy, and tomography. The latter diagnostic tools will also be briefly discussed. Finally, a prospective application of laser-induced plasma and plasma modeling will be illustrated on the example of calibration-free MC LIBS (Monte Carlo Laser Induced Breakdown Spectroscopy), in which concentrations of elements in materials are found by fitting model-generated and experimental spectra.
An improved algorithm for calibration-free laser induced breakdown spectroscopy (CF LIBS) will be presented which includes several novel features in comparison with previously proposed similar algorithms. In particular, it allows using spectral lines with arbitrary optical thickness for the construction of Saha-Boltzmann plots, retrieves the absorption path length (plasma diameter) directly from a spectrum, replaces the Lorentzian line profile function by the Voigt function, and allows for self-absorption correction using pre-calculated and tabulated data rather than approximating functions. The tabulated data embody the solutions of the radiative transfer equation for numerous combinations of optical thicknesses and line widths. The algorithm is thoroughly verified using synthetic spectra.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basics of plasma computer modeling will be presented.
Laser induced plasma (LIP) is a highly dynamic, short living event which presents significant difficulty for both diagnostics and modeling. The former requires precise spatially- and time-resolved measurements on a micron-nanosecond scale while the latter needs numerous descriptive parameters; many of them can only be obtained from experiment. Diagnostics and modeling should always complement each other for obtaining a truthful picture of LIP.
In this presentation, a newly developed collisional-dominated model will be presented. The model is based on the coupled Navier-Stokes, state, radiative transfer, material transport, and chemical equations. The model incorporates plasma chemistry through the equilibrium approach that relies on atomic and molecular partition functions. Several chemical systems are modeled including Si-C-Cl-N and B-H-Cl systems.
The model is used to study the equilibrium states of the systems as functions of the concentrations of plasma species and plasma temperature. The model also predicts the evolution of number densities of atomic and molecular species in the expanding plasma plume.
Laser-induced plasmas are widely used in many areas of science and technology; examples include spectrochemical analysis, thin film deposition, material processing, and even jet propulsion. Several topics will be addressed. First, general phenomenology of laser-induced plasmas will be discussed. Then, a chemical model will be presented based on a coupled solution of Navier-Stokes, state, radiative transfer, material transport, and chemical (Guldberg-Waage) equations. Results of computer simulations for several chemical systems will be shown and compared to experimental observations obtained by optical imaging, spectroscopy, and tomography. The latter diagnostic tools will also be briefly discussed.
Stimulated emission observed experimentally in aluminum laser induced plasma is modeled via a kinetic approach. The simulated emission at several cascade transitions is created by a pump laser guided through the plasma at several microseconds after its creation and tuned in resonance with the strong transition at 266 nm. A two-dimensional space-time collisional radiative plasma model explains the creation of the population inversion and lasing at wavelengths 2.1 μm and 396.1 nm. The population inversion for lasing at 2.1 μm is created by depopulation of the ground state and population of the upper state via absorption of resonant radiation at 266 nm. The population inversion for lasing at 396.1 nm occurs during the laser pulse via the decay of the population of the pumped upper state to the lasing state via cascade transitions driven optically and by collisions. The model predicts that the population inversion and corresponding gain may reach high values even at moderate pump energies of several μJ per pulse. The efficiency of lasing at 2.1 μm and 396.1 nm is estimated to be on the order of a percent of laser pump energy. The polarization effect that the pump radiation at 266 nm imposes on the stimulated emission at 396.1 nm is discussed. The calculated results are favorably compared to experiment.
An improved algorithm for calibration-free laser induced breakdown spectroscopy (CF LIBS) is presented which includes several novel features in comparison with previously proposed similar algorithms. In particular, it allows using spectral lines with arbitrary optical thickness for the construction of Saha-Boltzmann plots, retrieves the absorption path length (plasma diameter) directly from a spectrum, replaces the Lorentzian line profile function by the Voigt function, and allows for self-absorption correction using pre-calculated and tabulated data rather than approximating functions. The tabulated data embody the solutions of the radiative transfer equation for numerous combinations of optical thicknesses and line widths. The algorithm is used to analyze 100 low alloy steel spectra.
A goal of this work is to apply the model, which was initially developed for laser induced plasmas, to plasmas used in chemical reactors, in particular, the inductively-coupled-RF discharge plasma. The model predicts equilibrium chemical compositions of reaction mixtures as functions of plasma temperature and stoichiometry of reactants. The mixtures investigated are BCl3/H2/Ar and BF3/H2/Ar where Ar serves as the plasma-forming gas and H2 as a binding agent which binds the active species Cl and F and Cl- and F-containing intermediates to produce gaseous B and its condensate. An additional goal is to obtain information about intermediate reaction products for different ratios of BCl3/H2 and BF3/H2 and at different temperatures and different Ar flow rates. Also, chemical reactions in laser induced plasmas (LIPs) created on calcium hydrate and calcium carbonate targets in argon are modeled. The results are compared with those obtained by means of the equilibrium model based on the minimization of Gibbs free energy.
Molecule formation in calcium carbonate and calcium hydroxide libs plasmas: model and experiment
(2019)
Analysis of calcium hydrate and calcium carbonate samples and their mixtures is important for archeology, anthropology, and geology. Laser-induced plasma spectroscopy (LIBS) is a suitable tool for such the analysis as it allows for in- and on-line real time chemical assays. LIBS is inherently a technique for atomic analysis; however, since recently, it is also used for molecular analysis. The information attained by the latter is mainly related to “secondary” chemistry that deals with re-association of atoms and ions into molecules at long delay times (≥10 μs) after the initial breakdown. Even though the direct information about the initial molecular content in the target may be lost, the molecular analysis by LIBS can still be useful to assess the composition of samples.
In this work, chemical reactions in laser induced plasmas (LIPs) created on calcium hydrate and calcium carbonate targets in argon are modeled and compared to experiment. The model is based on the assumption that all ionization processes and chemical reactions are at local thermodynamic equilibrium. A chemical composition of argon-calcium-oxygen and argon-calcium-hydrogen plasmas is studied as a function of plasma temperature and pressure. It is established that more than twenty simple and composite molecules and ions can be formed in the course of chemical reactions. The results are compared with those obtained by means of the equilibrium model based on the minimization of Gibbs free energy.
A goal of this work is to apply the model, which was initially developed for laser induced plasmas, to plasmas used in chemical reactors, in particular, the inductively-coupled-RF discharge plasma. The model predicts equilibrium chemical compositions of reaction mixtures as functions of plasma temperature and stoichiometry of reactants. The mixtures investigated are BCl3/H2/Ar and BF3/H2/Ar where Ar serves as the plasma-forming gas and H2 as a binding agent which binds the active species Cl and F and Cl- and F-containing intermediates to produce gaseous B and its condensate. An additional goal is to obtain information about intermediate reaction products for different ratios of BCl3/H2 and BF3/H2 and at different temperatures and different Ar flow rates. Also, chemical reactions in laser induced plasmas (LIPs) created on calcium hydrate and calcium carbonate targets in argon are modeled. The results are compared with those obtained by means of the equilibrium model based on the minimization of Gibbs free energy.
High purity halides of III-VI group elements, especially chloride and fluorides, are used in gas phase technologies for obtaining high purity materials and coatings. The reduction of halides in hydrogen-halide mixtures can be achieved in various discharge plasmas, e.g. inductively coupled, ark, and even laser-induced plasmas. Existing models of such plasmas are not sufficiently accurate to predict a yield of the targeted compounds and to describe the plasma processes involved in formation of these compounds. Besides, a construction of costly plasma-chemical reactors can be alleviated by the prior modeling of plasma processes that may occur in such reactors.
A goal of this work is to extend the model, which was initially developed for laser induced Plasmas, to plasmas used in chemical reactors, in particular, the inductively-coupled-RF discharge Plasma. The model predicts equilibrium chemical compositions of reaction mixtures as functions of plasma temperature and stoichiometry of reactants. The mixtures investigated are BCl3/H2/Ar and BF3/H2/Ar where Ar serves as the plasma-forming gas and H2 as a binding agent which binds the active species Cl and F and Cl- and F-containing intermediates to produce gaseous B and its condensate. An additional goal is to obtain information about intermediate reaction products for different ratios of BCl3/H2 and BF3/H2 and at different temperatures and different Ar flow rates.
It is found that the desired components B and B2 appear at appreciable concentrations of >0.1% and ~0.01% respectively only at temperatures above 3000 K. It is also established that the effect of charged species on the reaction products is miniscule for temperatures below 5000 K. The expected yield of boron as a function of the original mole fraction H2/BCl3 and H2/BF3 is calculated. The mole fractions are varied in the range 0.1-1000 and the temperature in the range 1000-10000 K. It is shown that the yield of boron increases with increasing the molar ratio H2/BCl3 and H2/BF3 up to ~100 in the temperature range 2000-5000 K. At higher temperatures, T>5000 K, the boron concentration reaches its maximum and does not depend on the concentration of hydrogen; all molecules dissociate and chemical reactions proceed only between charged particles (mostly elemental ions) and electrons. The calculated plasma parameters and composition are compared with experimental data obtained by optical emission spectroscopy. The calculated plasma temperature and electron density are shown to be in good agreement with the measured ones.
A goal of this work is to extend the model, which was initially developed for laser induced plasmas, to plasmas used in chemical reactors, in particular, the inductively-coupled-RF discharge plasma. The model predicts equilibrium chemical compositions of reaction mixtures as functions of plasma temperature and stoichiometry of reactants. The mixtures investigated are BCl3/H2/Ar and BF3/H2/Ar where Ar serves as the plasma-forming gas and H2 as a binding agent which binds the active species Cl and F and Cl- and F-containing intermediates to produce gaseous B and its condensate. An additional goal is to obtain information about intermediate reaction products for different ratios of BCl3/H2 and BF3/H2 and at different temperatures and different Ar flow rates.
It is found that the desired components B and B2 appear at appreciable concentrations of >0.1% and ~0.01% respectively only at temperatures above 3000 K. It is also established that the effect of charged species on the reaction products is miniscule for temperatures below 5000 K. The expected yield of boron as a function of the original mole fraction H2/BCl3 and H2/BF3 is calculated. The mole fractions are varied in the range 0.1-1000 and the temperature in the range 1000-10000 K. It is shown that the yield of boron increases with increasing the molar ratio H2/BCl3 and H2/BF3 up to ~100 in the temperature range 2000-5000 K. At higher temperatures, T>5000 K, the boron concentration reaches its maximum and does not depend on the concentration of hydrogen; all molecules dissociate and chemical reactions proceed only between charged particles (mostly elemental ions) and electrons. The calculated plasma parameters and composition are compared with experimental data obtained by optical emission spectroscopy. The calculated plasma temperature and electron density are shown to be in good agreement with the measured ones.
A possibility of deposition from laser-induced plasma (LIP) is investigated in search for an economic and simple method to obtain isotopic compounds from enriched gaseous precursors. A breakdown in mixtures of BCl3 and BCl3 with hydrogen, argon, and methane are studied both theoretically and experimentally. Calculations of expanding plasma of different composition are performed with the use of the fluid dynamic code coupled to the equilibrium chemistry solver. Condensed phases of boron, boron carbide, and graphite are predicted showing maximum concentrations in peripheral zones of the plasma.
In experiment LIP is induced in mixtures BCl3, Н2+BCl3, H2+Ar+BCl3, H2+BCl3+CH4, BF3, Н2+BF3, H2+Ar+BF3, and H2+Ar+BF3. The gases are analyzed before, during, and after laser irradiation by optical and mass spectroscopic methods. The composition of reaction products is found to be close to that predicted theoretically. The conversion of precursor gases BCl3 and BF3 into gaseous and condensed products is 100% for BCl3 and 80% for BF3. Solid deposits of up to 30 mg are obtained from all the reaction mixtures. FTIR analysis of BCl3+H2+CH4 deposits points to a presence of condensed boron and boron carbide that are also predicted by the model. Both calculations and preliminary experimental results suggest the chemical vapor deposition by LIP is promising for conversion of gaseous enriched precursors into elemental isotopes and their isotopic compounds.
We run two pilot LIP experiments in reactive gas mixtures. First, LIP is excited in BCl3 or BF3 plus H2 or CH4 to evaluate the efficiency of deposition of solid boron and boron carbide, materials that are largely used for refractory coatings. Second, we investigate a possibility of synthesis of fluorochlorosilanes SiFxCl4-x (x = 1, 2, 3) by LIP induced in SiF4+SiCl4 gas mixtures. Using fluorochlorosilanes with different combinations of F and Cl in the SiFxCly molecule may add flexibility in processes of silicon deposition and etching. The gases used and solid deposits are analyzed by optical emission spectroscopy (OES) and IR and mass spectrometry (MS). We also model the laser induced plasma by performing static equilibrium chemistry calculations to see whether desired reaction products are thermodynamically favorable and dynamic calculations of the expanding plasma plume to see how and where the products form.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basis of plasma computer modeling will be presented.
Formation and detection of molecules in laser induced plasmas (LIP) is a hot topic. In analytical plasmas like LIBS, the detection of molecules is important for identification of geological and other materials, analysis of isotopes and difficult elements (Cl, F, etc.) via molecular emission. In chemical plasmas, like PECVD (plasma enhanced chemical vapor deposition) or PLD (pulsed laser deposition), molecules formed in the plasma determine a composition and a thickness of deposits. Similarly, molecules play an important role in microstructuring and oxidizing metal surfaces by laser ablation. It is unfortunate that different communities, which utilize plasma methods and seek for solutions of similar problems, do not strongly overlap, and do not fully use knowledge accumulated by each other.
In this presentation, mechanisms of formation of molecules will be analyzed on the example of LIPs used for chemical vapor deposition and metal microstructuring. Theoretical analysis includes equilibrium chemistry calculations combined with plasma hydrodynamics. First, LIP excited in a gas mixture of BCl3 or BF3 with H2 or CH4 will be analyzed; this chemical system is used for obtaining deposits of refractory solid boron and boron carbide. Second, a breakdown in the SiF4 + SiCl4 gas mixtures will be described; this method allows synthesis of fluorochlorosilanes SiFxCl4-x (x = 1, 2, 3), the good etching agents (Figure). Third, solid ablation of Mo in BF3+H2 and Ti in air will be considered aimed at obtaining deposits of high hardness MoxBy and films of TixOy on textured Ti surfaces, correspondingly.
In experiment, reaction gases before and after laser illumination, and solid deposits are analyzed by optical emission spectroscopy (OES), IR and mass spectrometry (MS), SEM, X-ray, and AFM. It will be shown that the hydrodynamic-chemical model adequately predicts the composition of LIPs, zones of molecular formation, dependence on reactant stoichiometry, plasma temperature and pressure.
The presentation will give a brief overview of the processes occurring in laser-induced plasma and methods of modeling these processes. In particular, a chemical-hydrodynamic model will be considered, which is related to the modification of the surface of metallic titanium by laser pulses. The details and simplifications of this model, its shortcomings and the possibilities of their elimination will be discussed. This model is related to the structuring of the surface of dental implants with a laser and the deposition of an oxide film on it.
A brief introduction will be given on modeling chemical reactions in laser induced plasmas using stoichiometric and non-stoichiometric approaches. Several applications will be considered, which can benefit from such modeling. Those include plasma enhanced chemical vapor deposition (PECVD), surface modification and surface coating, and molecular analysis by LIBS. Each application will be illustrated by simulations of relevant chemical systems. For PECVD, chemical systems are BCl3/H2/Ar, BF3/H2/Ar, BCl3/BF3, Mo/BF3/H2; for surface modification/coating it is Ti/air; for molecular LIBS they are CaCO3/Ar, Ca(OH)2/Ar, and CaCl2/Ar. Advantages and shortcomings of equilibrium chemical hydrodynamic models of laser induced plasmas will be discussed.
Plasma-chemical approach is used for synthesis of various gaseous, liquid, and solid substances since 1960th. Nowadays, the method of plasma enhanced chemical vapor deposition (PECVD) is used for production of thin films, protective coatings, carbon-based nanostructures, high purity isotopic materials, biomaterials, and other products. Plasma for PECVD is typically created in various electrical discharges, e.g. DC and AC glow discharges or discharges operated at audio (10-20 kHz), radio (13.56 MHz), and microwave (2.45 GHz) frequencies. Plasma induced by a laser, a laser induced plasma (LIP), is rarely used to deposit materials from the gas phase as in PECVD. This work is aimed at reviving interest to this latter technology and showing its efficiency and potential.
We run several pilot experiments. First, LIP is excited in BCl3 or BF3 plus H2 or CH4 to evaluate the efficiency of deposition of solid boron and boron carbide, the materials, which are largely used for refractory coatings. Second, we investigate a possibility of synthesis of fluorochlorosilanes SiFxCl4-x (x = 1, 2, 3) by LIP induced in SiF4 + SiCl4 gas mixtures. Using fluorochlorosilanes with different combinations of F and Cl in the SiFxCly molecule may add flexibility in processes of silicon deposition and etching. Third, LIP is excited in reactive mixture MoF6+H2+BF3 or on a Mo target ablated into H2/BF3 atmosphere. The goal is obtaining superhard molybdenum borides MoB, Mo2B, or MoB2. The gases used and solid deposits are analyzed by optical emission spectroscopy (OES), IR and mass spectrometry (MS).
We also model the plasma and perform static equilibrium chemistry calculations to see if the desired reaction products are thermodynamically favorable. Dynamic calculations of the expanding plasma plume are performed using a hydrodynamic code combined with the open source chemical software.
Processes of laser induced oxidation of metals are typically studied in the framework of heterogeneous chemical reactions occurring on the irradiated surface, which lead to the formation of dense oxide films deposited on it. Such technology has many applications like color-laser marking technology and laser recording on thin metal films for creation of diffractive optical elements . Under the conditions of strong laser ablation, another oxidation mechanism becomes possible: evaporated atoms react with oxygen in a surrounding atmosphere and the products of such reaction are redeposited back onto the substrate. The chemical and phase composition of such deposited layer, its density, morphology and structure depend on the conditions of laser ablation. By varying these conditions, the main properties of such coating can be controlled that is important for some potential application (for example in biomedicine).
In our report we present the study of the processes of redeposition of oxides structure under the conditions of multipulse nanosecond laser ablation of titanium (Grade 2) in air atmosphere at normal conditions. Our experiments show that titanium-implants with such deposited oxide layer have increased biocompatibility.
Modelling of chemical reaction in laser-induced plasma coupled with experimental methods of plasma optical emission spectroscopy allows us to determine the types of main chemical reactions in laser plasma as well as it influences on the plume dynamics and vapor condensation kinetics. As a result, we propose the general physical picture of reverse deposition of oxides structure under the condition of strong nanosecond laser ablation. The formation of the titanium oxide precipitate is explained not only by collisions in the plasma, but also by the chemical interaction of titanium and oxygen, which leads to the formation of а low pressure area near the substrate and additionally stimulates the reverse deposition of oxides. We expect, similar processes are valid not only for titanium but also for other metals and, possibly, semiconductors.
Laser metal deposition is a rapidly evolving method for additive manufacturing that combines high performance and simplified production routine. Quality of production depends on instrumental design and operational parameters that require constant control during the process. In this work, feasibility of using optical spectroscopy as a control method is studied via modeling and experimentally. A simplified thermal model is developed based on the time-dependent diffusion-conduction heat equation and geometrical light collection into detection optics. Intense light emitted by a laser-heated spot moving across a sample surface is collected and processed to yield the temperature and other temperature-related parameters. In a presence of surface defects the temperature field is distorted in a specific manner that depends on a shape and size of the defect. Optical signals produced by such the distorted temperature fields are simulated and verified experimentally using a 3D metal printer and a sample with artificially carved defects. Three quantities are tested as possible metrics for process monitoring: temperature, integral intensity, and correlation coefficient. The shapes of the simulated signals qualitatively agree with the experimental signals; this allows a cautious inference that optical spectroscopy is capable of detecting a defect and, possibly, predicting its character, e.g. inner or protruding.
Laser-induced plasmas are widely used in many areas of science and technology; examples include spectrochemical analysis, thin film deposition, and material processing. Several topics will be addressed. First, general phenomenology of laser-induced plasmas will be discussed. Then, a chemical model will be presented based on a coupled solution of Navier-Stokes, state, radiative transfer, material transport, and chemical equations. Results of computer simulations for several chemical systems will be shown and compared to experimental observations obtained by optical imaging, spectroscopy, and tomography. The latter diagnostic tools will also be briefly discussed. Finally, a prospective application of laser-induced plasma and plasma modeling will be illustrated on the example of chemical vapor deposition of molybdenum borides and micro processing and coating of titanium dental implants.
Laser metal deposition is a rapidly evolving method for additive manufacturing that combines high performance and simplified production routine. Quality of production depends on an instrumental design and operational parameters, which require constant control during the process. In this work, feasibility of using optical spectroscopy as a control method is studied via modeling and experimentally. A simplified thermal model is developed based on the time-dependent diffusion-conduction heat equation and geometrical light collection into detection optics. Intense light emitted by a laser-heated spot moving across a sample surface is collected and processed to yield the temperature and other temperature-related parameters. In the presence of surface defects, the temperature field is distorted in a specific manner that depends on shape and size of the defect. Optical signals produced by such the distorted temperature fields are simulated and verified experimentally using a 3D metal printer and a sample with artificially carved defects. Three quantities are tested as possible metrics for monitoring the process: temperature, integral intensity, and correlation coefficient. The shapes of the simulated signals qualitatively agree with the experimental signals; this allows for a cautious inference that optical spectroscopy can detect surface defects and, possibly, predict their characters, e.g., inner or protruding.
Back Deposition of Titanium Oxides under Laser Ablation of Titanium: Simulation and Experiment
(2022)
Titanium is widely used in medicine for implants and prostheses, thanks to its high biocompatibility, good mechanical properties, and high corrosion resistance. Pure titanium, however, has low wear resistance and may release metallic titanium into surrounding tissues. Structuring and coating its surface with oxide layers are necessary for high wear resistance and improved biocompatibility. In this work, a combination of theoretical and experimental methods was used to study processes responsible for deposition of titanium oxides during ablation of titanium in air.
The deposition process was modeled via the Navier-Stokes equations that accounted for the material removal and accumulation of the deposit on the ablation surface. The chemical part was based on the equilibrium model embedded into the hydrodynamic code. Simulations showed that the most active zone of production of condensed titanium oxides were at plasma periphery whereas a zone of strong condensation of titanium metal was above the molten pool.
In experiment, a pulsed Yb fiber laser was scanned across a titanium surface. The temperature and composition of the plasma were inferred from plasma emission spectra. The post-ablation surface was analyzed by SEM, TEM, STEM, AFM, and XRD.
The developed model well reproduced the main features of experimental data. It was concluded that the deposition of condensed metal oxides from the plasma is a principal mechanism of formation of nanoporous oxide layer on the metal surface. The method of surface structuring and modification by nanosecond laser ablation can be developed into a useful technology that may find applications in medicine, photonics, and other areas.
A brief introduction will be given on modeling chemical reactions in laser induced plasmas using stoichiometric and non-stoichiometric approaches. Several applications will be considered, which can benefit from such modeling. Those include plasma enhanced chemical vapor deposition (PECVD), surface modification and surface coating, and molecular analysis by LIBS. Each application will be illustrated by simulations of relevant chemical systems. For PECVD, chemical systems are BCl3/H2/Ar, BF3/H2/Ar, BCl3/BF3, Mo/BF3/H2; for surface modification/coating it is Ti/air; for molecular LIBS they are CaCO3/Ar, Ca(OH)2/Ar, and CaCl2/Ar. Advantages and shortcomings of equilibrium chemical hydrodynamic models of laser induced plasmas will be discussed.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures and electron number density). Particular emphasis will be placed on laser induced plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, temporal and spatial resolution.
Surface modification of titanium by laser ablation is investigated theoretically and experimentally. The modification consists in texturing the surface and redeposition of chemically transformed material from the ablation plasma. The redeposition is driven by the hydrodynamic flow in the plasma. Such surface modification improves the biocompatibility of titanium implants.
In this presentation, I will give a brief overview of my personal experience with laser induced plasma (LIP). I will start from my and colleagues’ early works, where we used LIP as an atomic reservoir for laser induced fluorescence (LIP). We applied LIP-LIF for a sensitive detection of trace elements in various materials and demonstrated that under certain conditions the technique can even be used for isotope analysis. Next, I will discuss the application of LIP spectroscopy, i.e., LIBS, to material identification that nowadays constitutes one of the best applications of this technique. In those early days, we used correlation analysis for spectra processing; it is now replaced by more powerful chemometric methods. Further, I will stop on our efforts in modeling LIP that we first intended for the improved quality of spectroscopic analysis and later extended to non-spectroscopic fields such as chemical vapor deposition and surface structuring. We developed a version of calibration-free LIBS, in which we iterated model-generated spectra until a close match was achieved between experimental and synthetic spectra to determine concentrations. Next, I will briefly overview our recent developments in plasma modeling that include plasma chemistry. This was important in view of widening application of LIBS as a molecular technique. I will also address several plasma diagnostics, e.g., Radon transform tomography that we developed to get more insight about LIP that was helpful for both analytic spectroscopy and modeling. Finally, I will mention several exotic applications of LIP such as LIP-based lasers and chemical reactors to illustrate a real multifaceted character of laser induced plasma and usefulness of its study for many science fields.
Modeling is an important tool for understanding a physical phenomenon. It helps to interpret results of experiments and optimize experimental parameters for obtaining a desirable result. Modeling laser induced plasma is beneficial for many scientific and industrial fields, e.g., analytical chemistry, pulsed laser deposition, plasma enhanced chemical vapor deposition, laser welding, additive manufacturing etc. In this presentation, a personal experience in development of a physical model of laser induced plasma will be given in a chronological sequence starting from early 2000th and until now.
Over the time, the model evolved from its simple analytical form that described plasma emission spectra to its current numerical form that describes plasma dynamics, chemistry, and interaction with a substrate surface. Several examples will be given for the application of the model to practical problems such as spectroscopic chemical analysis, plasma enhanced chemical vapor deposition, and surface modification by laser ablation.