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Maintaining a consistent product quality is critical for the thin film industry. Therefore, the development of highly accurate protocols able to detect variations and nonidealities in manufactured thin film devices is essential and helps improve production quality and decrease manufacturing costs. The present work will discuss the accuracy and reproducibility in the determination of the thickness of thin films relevant for optoelectronic industry using spectroscopic ellipsometry, starting with the importance of set-up calibration, the need for very well defined calibration standards suitable for real devices and not least, the importance of accurate data analysis. As ellipsometry is an indirect method and theoretical modelling is needed to obtain the desired information regarding the investigated samples (e.g. thickness, roughness, optical constants), the model uncertainty has to be discussed and taken into account. If for ideal samples consisting of single layers with well-known optical constants the determination of thickness and roughness is straight forward and pretty accurate, for real samples, more complex theoretical models are needed and extracting accurate information regarding the samples can be very challenging. With careful calibration and a multidisciplinary approach, a combined measurement methodology can be developed enabling reliability, comparability, and accuracy. For production-relevant operation, maintaining the ease of use and scalability of ellipsometry as a technique can also be retained.
In this study, thickness related changes of the optical properties of doped tin oxide were studied. Two different sets of samples were prepared. The first set was doped with iron or nickel on silicon substrate with thicknesses of 29–56 nm, the second was iron doped on gold/glass substrate with 1.6–6.3 nm. The optical constants were determined by using spectral ellipsometry (SE) followed by modelling of the dielectric function with an oscillator model using Gaussian peaks. The analysis of the optical constants shows a dependence of the refraction and the absorption on the thickness of the doped tin oxide coating. In addition to the tin oxide absorption in the UV, one additional absorption peak was found in the near-IR/red which is related to plasmonic effects due to the doping. This peak shifts from the near-IR to the red part of the visible spectrum and becomes stronger by reducing the thickness, probably due to the formation of metal nanoparticles in this layer. These results were found for two different sets of samples by using the same optical model. Afterwards the second sample set was tested in the Surface Plasmon Resonance Enhanced Ellipsometric (SPREE) gas measurement with CO gas. It was found that the thickness has significant influence on the sensitivity and thus the adsorption of the CO gas. By increasing the thickness from 1.6 nm to 5.1 nm, the sensing ability is enhanced due to a higher coverage of the surface with the over coating. This is explained by the high affinity of CO molecules to the incorporated Fe-nanoparticles in the tin oxide coating. By increasing the thickness further to 6.3 nm, the sensing ability drops because the layer disturbs the SPR sensing effect too much.
The practical performance of surface coatings in applications like catalysis, water splitting or batteries depends critically on the coating materials’ porosity. Determining the porosity in a fast and nondestructive way is still an unsolved problem for industrial thin-films technology. As a contribution to calibrated, non-destructive, optical layer characterisation, we present a multi-method comparison study on porous TiO2 films deposited by sol-gel synthesis on Si wafers. The ellipsometric data were collected on a range of samples with different TiO2 layer thickness and different porosity values. These samples were produced by templated sol-gel synthesis resulting in layers with a well-defined pore size and pore density. The ellipsometry measurement data were analysed by means of a Bruggeman effective medium approximation (BEMA), with the aim to determine the mixture ratio of void and matrix material by a multi-sample analysis strategy. This analysis yielded porosities and layer thicknesses for all samples as well as the dielectric function for the matrix material. Following the idea of multi-method techniques in metrology, the data was referenced to imaging by electron microscopy (SEM) and to a new EPMA (electron probe microanalysis) porosity approach for thin film analysis. This work might lead to a better metrological understanding of optical porosimetry and also to better-qualified characterisation methods for nano-porous layer systems.
1. IntroductionPorous materials, especially porous thin films play an importantrole in chemical and physical technology in every case where thecontact area between two media has to be maximised. From cataly-sis to photochemistry and photovoltaics, the applications of porouslayer materials are diverse and numerous [1–6].The accurate and non-destructive characterisation of porousfilms for layered systems poses a challenge. This applies especiallyfor the key parameter of porous films, their porosity, i.e. the mix-ing ratio between the Matrix of the film (host material) and thepore volume which is empty or filled with a fluid medium (inclu-sions). This parameter influences most of the physical and chemicalproperties of a porous thin film and is therefore essential for theunderstanding as well as the optimisation of this class of materials.
The far infrared refractive indices and the extinction coefficients of liquids can be obtained by means of spectroscopic ellipsometry in attenuated total reflection configuration. Such optical constants will contribute to a spectroscopic data base in the far infrared and terahertz spectral regions. The experimental implementation and the calibration procedure of the method are described in detail. The temperature dependency of the optical constants for water over a broad spectral range is exemplarily presented.
The paper addresses “WHITE LIGHT INTERFERENCE MICROSCOPY, ELLIPSOMETRY, AND INSTRUMENTED INDENTATION TESTING AS REFERENCE PROCEDURES“ and is subdivided in the following sections: 1. Measurement vs. testing vs. reference procedures, 2. White light interference microscopy (WLIM) for determination of step height h, 3. Spectroscopic ellipsometry (SE) for determination of layer thickness d and 4. Instrumented indentation testing (IIT) for determination of indentation hardness HIT. The following points are discussed in more detail: methodology of measurement and testing, uncertainty budgets for direct (WLIM), model-based (SE) and formula-based (IIT) reference procedures by means of specific examples. It is shown that standardization efforts are connected to reference procedures.
Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films.
Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA) and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity.
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The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies.
Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films. Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an Iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA) and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity.
... The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies.
Thin mesoporous metal oxide films are versatile and attractive candidates for several energy applications like photovoltaics, electrolysis or batteries. Due to their high surface area and ordered pore structure, mesoporous metal oxides demonstrate higher activities. The performance of the porous films is affected by properties like size and shape of the mesopores as well as the crystallinity of the framework. The exact determination and metrological evaluation of the complex morphology of thin mesoporous films requires a new analytical approach employing to combined data of different analytical methods. In this contribution we present a novel evaluation procedure for spectroscopic ellipsometry (SE) to analyse thin mesoporous iridium oxide films.
Mesoporous iridium oxide films were prepared via dip-coating of a solution containing a triblock-copolymer as structure directing agent and an iridium precursor in ethanol. Deposited films were calcined in air at temperatures between 300 and 600 °C. Their morphology was studied with SEM and an electron probe microanalysis (EPMA)and correlated via SE with a Bruggeman effective medium approximation (BEMA). The developed SE model described the film thickness as well as the porosity.
Figure 1a shows a top-view SEM image of mesoporous IrO2 film calcined at 375 °C. The image reveals that the films exhibit a well-ordered mesopore structure with an average pore diameter of 16 nm and a periodic distance between pore centres of 24 nm (FFT inset). Figure 1b is a parity plot of film thicknesses determined by cross-section SEM versus SE of IrO2 film samples prepared at different calcination temperatures. The porosity from the SE model is in good agreement to the porosity values obtained by EPMA.
The contribution will assess in detail the novel approach to analyse the morphology and porosity of thin metal oxide films with spectroscopic ellipsometry. Moreover, the advantages of the new developed approach will be discussed as well as combination of datasets from multiple measurements to development new methods for innovative energy technologies.
For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material.
Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA).
The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement.
For the determination of porosity of Ir oxide thin films, electron probe microanalysis (EPMA) can be used as part of a combined SEM/EDS/STRATAGem analysis. The mass deposition (in μg cm-2) of films was calculated with the analysis software STRATAGem via k-values measured with EDS. The average density of coated films was obtained from the mass deposition and the film thickness as measured by the cross-section SEM. The porosity was calculated by dividing the average film density by the bulk (theoretical) density of the film material.
Film porosities were counterchecked by spectroscopic ellipsometry (SE) using the Bruggeman effective medium approximation (BEMA).
The results obtained by both analytical approaches/methods used, SEM/EDS/STRATAGem and SE were in good agreement.