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The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too.
BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013.
CCQM key comparison K-129 for the quantitative analysis of Cu(In,Ga)Se2 (CIGS) films has been performed by the Surface Analysis Working Group (SAWG) of the Consultative Committee for Amount of Substance (CCQM). The objective of this key comparison is to compare the equivalency of the National Metrology Institutes (NMIs) and Designated Institutes (DIs) for the measurement of mole fractions of Cu, In, Ga and Se in a thin CIGS film. The measurand of this key comparison is the average mole fractions of Cu, In, Ga and Se of a test CIGS alloy film in the unit of mole fraction (mol/mol). Mole fraction with the metrological unit of mol/mol can be practically converted to atomic fraction with the unit of at%.
In this key comparison, a CIGS film with certified mole fractions was supplied as a reference specimen to determine the relative sensitivity factors (RSFs) of Cu, In, Ga and Se. The mole fractions of the reference specimen were certified by isotope dilution - inductively coupled plasma/mass spectrometry (ID-ICP/MS) and are traceable to the SI. A total number counting (TNC) method was recommended as a method to determine the signal intensities of the constituent elements acquired in the depth profiles by Secondary Ion Mass Spectrometry (SIMS), X-ray Photoelectron Spectroscopy (XPS) and Auger Electron Spectroscopy (AES). Seven NMIs and one DI participated in this key comparison. The mole fractions of the CIGS films were measured by depth profiling based-SIMS, AES and XPS. The mole fractions were also measured by non-destructive X-Ray Fluorescence (XRF) Analysis and Electron Probe Micro Analysis (EPMA) with Energy Dispersive X-ray Spectrometry (EDX).
In this key comparison, the average degrees of equivalence uncertainties for Cu, In, Ga and Se are 0.0093 mol/mol, 0.0123 mol/mol, 0.0047 mol/mol and 0.0228 mol/mol, respectively. These values are much smaller than that of Fe in a Fe-Ni alloy film in CCQM K-67 (0.0330 mol/mol). This means that the quantification of multi-element alloy films is possible by depth profiling analysis using the TNC method.
The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1-xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too.
BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013. Fundamental approaches to determination of lateral resolution and sharpness in beam-based methods
The discovery and design of high performance Pd-alloys is of great interest for the use of hydrogen as a future energy carrier. Therefore hydrogen has to be detected, separated from other gases and stored. In this respect this thesis presents the combinatorial synthesis and characterization of the ternary Pd-Ni-Co alloy System over a wide composition range based on so-called thin film alloy libraries. Those libraries are model systems to characterize a large number of alloy compositions at the same time. The sputter-deposition process is optimized for the gradient of the Pd concentration on the surface of the alloy library by the use of electron-excited Auger electron spectroscopy. The scientific goal of this work is the experimental Investigation of adsorbate-induced surface segregation phenomena on alloy libraries.
The surface and bulk compositions of an alloy library are studied after deposition, H2 exposure and H2S poisoning. The co-segregation of Ni and Co to the surface is observed. The segregation process is influenced by the oxidation of Ni and Co due to the contact with ambient air, by H2 and by H2S poisoning. Also at very high Pd concentrations in the range of 87 at.% to 97 at.%, which is interesting for the detection of very low H2-Concentrations in air, the co-segregation of Ni and Co takes place. The poisoning effects were investigated in detail on a pre-selected Pd-Ni-Co alloy by photoelectron spectroscopy (XPS, HAXPES) in addition to AES and EDX. The composition profile of the alloy on the nm scale is acquired and the surface and bulk chemistry is discussed before and after poisoning. The composition of the alloy only changed within the first 3 nm due to H2S exposure. In the ternary Pd-Ni-Co alloy system Pd is present in its metallic state, while Ni and Co show several oxidation states. The presented concepts of ternary alloy development pave the way for the systematic synthesis and characterization of new ternary transition metal alloy systems.
The synthesis of TiO2 nanoplatelets with fluorine-containing reactants is carried out using titanium (IV) butoxide as precursor and concentrated HF as shape controller, the final product requires a working up in order to eliminate or at least to reduce the amount of residual fluorides, which is realized here by well-defined thermal treatment of the samples. Bulk and surface sensitive methods namely scanning electron microscopy with energydispersive X-ray spectroscopy (SEM-EDX), Auger electron spectroscopy (AES) and time-of-flight secondary ion mass spectrometry (ToF-SIMS) have been applied to trace the presence of any fluorides in dependence on different information depths and measurement sensitivities of these methods.
The certified reference material BAM-L200, a nanoscale stripe pattern for length calibration and specification of lateral resolution, is described. BAM-L200 is prepared from a cross-sectioned epitaxially grown layer stack of AlxGa1-xAs and InxGa1 xAs on a GaAs substrate. The surface of BAM-L200 provides a flat pattern with stripe widths ranging down to 1 nm. Calibration distances, grating periods and stripe widths have been certified by TEM with traceability to the length unit. The combination of gratings, isolated narrow stripes and sharp edges of wide stripes offers a plenty of options for the determination of lateral resolution, sharpness and calibration of length scale at selected settings of imaging surface analytical instruments. The feasibility of the reference material for an analysis of the lateral resolution is demonstrated in detail by evaluation of ToF-SIMS, AES and EDX images. Other applications developed in the community are summarized, too. BAM-L200 fully supports the implementation of the revised International Standard ISO 18516 (in preparation) which is based on knowledge outlined in the Technical Report ISO/TR 19319:2013.
Micropatterns and nanopatterns of gold embedded in silver and titanium embedded in gold have been prepared by combining either photolithography or electron-beam lithography with a glue-free template-stripping procedure. The obtained patterned surfaces have been topographically characterized using atomic force microscopy and scanning electron microscopy, showing a very low root-mean-square roughness (<0.5 nm), high coplanarity between the two metals (maximum height difference ≈ 2 nm), and topographical continuity at the bimetallic interface. Spectroscopic characterization using X-ray photoelectron spectroscopy (XPS), time-of-flight secondary-ion mass spectrometry (ToF-SIMS), and Auger electron spectroscopy (AES) has shown a sharp chemical contrast between the two metals at the interface for titanium patterns embedded in gold, whereas diffusion of silver into gold was observed for gold patterns embedded in silver. Surface flatness combined with a high chemical contrast makes the obtained surfaces suitable for applications involving functionalization with molecules by orthogonal adsorption chemistries or for instrumental calibration. The latter possibility has been tested by determining the image sharpness and the analyzed area on circular patterns of different sizes for each of the spectroscopic techniques applied for characterization.This is the first study in which the analyzed area has been determined using XPS and AES on a flat surface, and the first example of a method for determining the analyzed area using ToF-SIMS.
This presentation explains the outline and scientific content of the ISO technical report 23173 "Measurement of the thickness and nature of nanoparticle coatings using electron spectroscopies". This technical report deals with those electron spectroscopy methods that are able to determine the coating thickness of nanoparticles. This specifically includes X-ray photoelectron spectroscopy (XPS), energy-resolved X-Ray photoelectron spectroscopy (ERXPS) using synchrotron radiation, near abient pressure photoelectron spectroscopy (NAPXPS) and Auger electron spectroscopy (AES).