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Laser-induced periodic surface structures: from nanoscaled light localization to applications
(2019)
In this contribution the current state in the field of Laser-Induced Periodic Surface Structures (LIPSS) is reviewed. This includes the mechanisms of formation and current applications, particularly the colorization of technical surfaces, the control of surface wetting properties, the tailoring of surface colonization by bacterial biofilms, and the improvement of the tribological performance of nanostructured metal surfaces.
Laser-induced periodic surface structures (LIPSS, ripples) are a universal phenomenon that can be observed on almost any material after the irradiation by linearly polarized laser beams, particularly when using ultrashort laser pulses with durations in the femtosecond to picosecond range. During the past years significantly increasing industrial and research activities have been reported in the field of LIPSS, since their generation in a single-step process provides a simple way of nanostructuring and surface functionalization towards the control of optical, mechanical, biological, or chemical surface properties. In this contribution the mechanisms of formation and current trends and applications of LIPSS are reviewed, including the colorization of technical surfaces, the control of surface wetting properties, the mimicry of the natural texture of animals, the tailoring of surface colonization by bacterial biofilms, the advancement of leadless medical pacemakers, and the improvement of the tribological performance of nanostructured metal surfaces.
This presentation reviews the current state in the field of Laser-induced Periodic Surface Structures (LIPSS). These surface nanostructures are a universal phenomenon and can be generated on almost any material by irradiation with intense linearly polarized laser radiation. LIPSS are formed in a “self-ordered” way and are often accompanying material processing applications. They can be produced following a single-step process and enable surface functionalization through the adaption of optical, mechanical and chemical surface properties. Their structural sizes typically range from several micrometers down to less than 100 nanometers exhibiting a clear correlation with the polarization direction of the laser radiation. Various types of surface structures are classified, relevant control parameters are identified, and their material specific formation mechanisms are analyzed for different types of inorganic solids, i.e., metals, semiconductors, and dielectrics, through time-resolved optical experiments and theoretical simulations. Finally, technological applications featuring surface functionalization in the fields of optics, fluidics, medicine, and tribology are discussed.
Der Vortrag gibt einen Überblick über die vielfältigen Möglichkeiten der Oberflächenfunktionalisierung mittels Mikro- und Nanostrukturierung durch Ultrakurzpuls-Lasermaterialbeabeitung. Dies schließt eine Diskussion des Phänomens der Laser-induzierten periodischen Oberflächenstrukturen (LIPSS, engl.: Laser-induced Periodic Surface Structures, Ripples), sowie deren Klassifikation und Bildungsmechanismen mit ein. Ein Schwerpunkt der Präsentation liegt auf der Diskussion verschiedener Anwendungsmöglichkeiten der LIPSS in Bereichen der Optik, Fluidik, Tribologie und Medizin, sowie auf einem Ausblick auf die industrielle Skalierbarkeit der LIPSS-Technologie.
Laser-induced Periodic Surface Structures (LIPSS, ripples) are a universal phenomenon and can be generated in a contactless, single-step process on almost any type of solid upon irradiation with intense laser pulses. They represent a (quasi-)periodic modulation of the surface topography in the form of a linear grating and are typically formed in a “self-ordered” way in the focus of a laser beam. Thus, they are often accompanying laser material processing applications. The structural sizes of LIPSS typically range from several micrometers down to less than 100 nanometers – far beyond the optical diffraction limit – while their orientations exhibit a clear correlation with the local polarization direction of the laser radiation.
From a theoretical point of view, a controversial debate has emerged during the last decades, whether LIPSS originate from electromagnetic effects (seeded already during the laser irradiation) – or whether they emerge from matter-reorganization processes (distinctly after the laser irradiation). From a practical point of view, however, LIPSS represent a simple and robust way for the nanostructuring of solids that allows creating a wide range of different surface functionalities featuring applications in optics, tribology, medicine, energy technologies, etc.
This presentation reviews the currently existent theories of LIPSS. A focus is laid on the historic development of the fundamental ideas behind the LIPSS, their corresponding mathematical descriptions and numerical implementations, along with a comparison and critical assessment of the different approaches.
Fourth generation light sources, namely short wavelength, short pulse free electron lasers (FELs) are offering new and fascinating possibilities to resolve laser-induced structure formation at surfaces on the sub-micrometer to nanometer length scale and in temporal regimes ranging from picoseconds to several nanoseconds with sub-picosecond resolution. This unique spatio-temporal resolution allows to reveal early signatures of coherent/plasmonic electromagnetic scattering effects followed by the excitation of hydrodynamic capillary waves – providing new insights to the above-mentioned debate.
Finally, some unsolved scientific problems related to LIPSS are identified and the pending technological limitations are discussed. While the currently available laser and scanner technology already allows large area surface processing with rates at the m2/min level, industrial applications of LIPSS are sometimes limited by the complex interplay between the nanoscale surface topography and the specific surface chemistry. This typically manifests in difficulties to control the processing of LIPSS and in limitations to ensure the long-term stability of the created surface functions. Strategies for overcoming such limitations are outlined.
Irradiation of solid surfaces with intense ultrashort laser pulses represents a unique way of depositing energy into materials. It allows to realize states of extreme electronic excitation and/or very high temperature and pressure and to drive materials close to and beyond fundamental stability limits. As a consequence, structural changes and phase transitions often occur along unusual pathways and under strongly nonequilibrium conditions. Due to the inherent multiscale nature — both temporally and spatially—of these irreversible processes, their direct experimental observation requires techniques that combine high temporal resolution with the appropriate spatial resolution and the capability to obtain good quality data on a single pulse/event basis. In this respect, fourth-generation light sources, namely, short wavelength and short pulse free electron lasers (FELs), are offering new and fascinating possibilities. As an example, this talk will discuss the results of scattering experiments carried out at the FLASH free electron laser at DESY (Hamburg, Germany), which allowed us to resolve laser-induced structure formation at surfaces on the nanometer to submicron length scale and in temporal regimes ranging from picoseconds to several nanoseconds with sub-picosecond resolution. The current status and future perspectives in this field via exploiting the unique possibilities of these 4th-generation light sources will be discussed.
Der Vortrag gibt einen Überblick über die Erzeugung und Charakterisierung anisotroper Nanostrukturen mittels ultrakurzgepulster Laserstrahlung. Besonderes Augenmerk liegt dabei auf dem Phänomen der sogenannten Laser-induzierten periodischen Oberflächen-Nanostrukturen auf dielektrischen Werkstoffen und ihrer zeitlichen Dynamik. Weitere Beispiele von Volumen-Nanostrukturen aus der Literatur werden diskutiert.
Laser-induced periodic surface structures (LIPSS) have gained remarkable attention as they represent a universal phenomenon that is often accompanying laser-processing. Such LIPSS enable a plethora of different surface functionalizations for applications in the fields of optics, fluidics, tribology, or medicine. Due to the inherent multiscale nature of processes involved in LIPSS formation, their in-situ observation requires experimental techniques that combine high temporal resolution with the appropriate spatial resolution. In this respect fourth generation light sources, namely short wavelength, short pulse free electron lasers (FELs) are offering new and fascinating possibilities. This work contribution will discuss the results of scattering experiments carried at the FLASH free electron laser at DESY (Hamburg, Germany), which allowed us to resolve laser-induced structure formation at surfaces on the nm to sub-µm length scale and in temporal regimes ranging from ps to several ns with sub-ps resolution. A ps-optical pump / fs-XUV scattering probe scheme was employed to 100 nm thick laser-excited silicon films, while recording snapshots of the transmitted XUV scattering patterns at various delay times after the laser pulse impact. On timescales ranging from hundred ps until several ns almost quantitative agreement was observed between certain features of the recorded scattering patterns and predictions of the first-principles theory of J.E. Sipe and coworkers. Other scattering features appearing with a delay of ~100 ps and lasting for ~1 ns are attributed to capillary surface waves being excited at the laser-melted film material while ablation proceeds. Our superior spatio-temporal resolution experiments allow to uniquely reveal and distinguish early signatures of coherent/plasmonic electromagnetic scattering effects, separately followed by hydrodynamic matter reorganization.
Advances in ultrafast laser manufacturing: nanostructures, thin films, and scaling perspectives
(2024)
Advanced ultrafast laser technology is a rapidly growing field that currently enables many new industrial and scientific applications. During the last decades, this has been significantly driven by the availability of high-repetition-rate laser sources and novel beam delivery concepts. At the laser side, Moore’s law equally manifests for ultrafast laser technologies, since the average output power of such lasers doubles approximately every two years. This development is mainly driven by the increase of the pulse repetition rates of energetic laser pulses, currently enforcing the development of smart beam control and novel scanning strategies for preventing heat-accumulation and plasma-shielding effects during laser-based materials processing. This keynote presentation addresses the advantages, recent developments, and perspectives of laser processing with ultrashort laser pulses. A special focus is laid on the tailored structuring of thin films as well as the manufacturing and probing of sub-diffraction surface nanostructures – an ongoing race to extreme scales. Current limitations are identified and an outlook to future scaling perspectives will be provided.
Laser-induced periodic surface structures (LIPSS) and their combination with self-ordered microstructures forming hierarchical Spikes enable a large variety of different surface functionalizations for applications in the fields of optics, fluidics, tribology, or medicine. Moreover, high spatial frequency LIPSS (HSFL) provide an appealing and straightforward way for surface nanostructuring featuring spatial periods even below 100 nm – far beyond the optical diffraction limit. However, the imposed surface functionalities are usually caused by both, topographic and chemical surface alterations. For exploring these effects in detail, multi-method characterizations were performed here for HSFL and hierarchical Spikes processed on Ti-6Al-4V alloy upon irradiation with near-infrared ps-laser pulses (1030 nm wavelength, ~1 ps pulse duration, 1 – 400 kHz pulse repetition rate) under different laser and scan processing conditions. The following sample characterization involved morphological and topographical investigations by scanning electron microscopy (SEM), atomic force microscopy (AFM), stylus profilometry (SP), and white light interference microscopy (WLIM), as well as near-surface chemical analyses by X-ray photoelectron spectroscopy (XPS), hard X-ray photoelectron spectroscopy (HAXPES) and depth-profiling time-of-flight secondary ion mass spectrometry (TOF-SIMS). The results allow to qualify the laser ablation depth, the geometrical HSFL/Spikes characteristics and provide detailed insights into the depth extent and the nature of the ps-laser-induced near-surface oxidation arising from the laser-processing in ambient air and into the relevance of heat-accumulation effects at high pulse repetition rates. Moreover, the direct comparison of the HAXPES and XPS data reveals the role of surface-covering organic contaminants adsorbed from the ambient atmosphere without the uncertainties and potential sputter reduction potentially caused by ion-sputter depth profiling.
Bakterielle Biofilme stellen in medizinischen und industriellen Bereichen ein ernsthaftes Problem dar. Eine der größten gesellschaftlichen Herausforderungen liegt in der zunehmenden Resistenz von Bakterien gegen Biozide, die bei antimikrobiellen Behandlungen eingesetzt werden, z.B. durch übermäßigen Einsatz in Medizin, Industrie und Landwirtschaft oder durch Reinigung und Desinfektion in Privathaushalten. Daher sind neue effiziente bakterienabweisende Strategien, die den Einsatz von Bioziden vermeiden, dringend erforderlich.
Ein vielversprechender Weg zur Erzielung bakterienabweisender Oberflächen liegt in der berührungslosen und aseptischen großflächigen Laserbearbeitung von technischen Oberflächen. Maßgeschneiderte Oberflächentexturen, ermöglicht durch verschiedene Laserbearbeitungsstrategien, die zu topographischen Skalen im Bereich von Nanometern bis Mikrometern führen, können eine Lösung für diese Herausforderung darstellen.
In dem Vortrag wird ein Überblick über den aktuellen Stand der Technik bei der subtraktiven Texturierung von Laseroberflächen zur Kontrolle der Biofilmbildung bei verschiedenen Bakterienstämmen und in unterschiedlichen Umgebungen gegeben. Auf der Grundlage spezifischer Eigenschaften von Bakterien und laserbearbeiteten Oberflächen werden die Herausforderungen antimikrobieller Oberflächendesigns erörtert und zukünftige Richtungen aufgezeigt.
In 1981 the OECD published the Test Guideline on Particle size and size distribution. This TG is still a valid document for the measurement of particles all over the world.
When nanomaterials gained importance, ISO set up a technical commitee for Nanotechnologies in 2005 and the OECD followed this step in 2006 with the Working Party on Manufactured Nanomaterials.
In the following years ISO and OECD published several documents about nanomaterials and the systematisation developed.
In 2017 it was finally clear that nanomaterials need to be adressed in another way than chemicals and in 2020 ECHA revised the REACH-Annexes accordingly and included nanomaterials.
Unfortunately there is a little problem with this: Only a few applicable test guidelines exit for the measurement of the nanomaterials. Several test guidelines date from 1981 and do not address nanomaterials.
The logical next step for the OECD would be to publish a series of test guidelines which are indeed currently prepared and will be shown in this talk.
Finally there is an additional need for the future of NM standardisation: Digitalisation.
Vorstellung der Ergebnisse bei der Entwicklung einer neuen OECD Prüfrichtlinie zur Bestimmung der Partikelgröße und Anzahlgrößenverteilung von Nanomaterialien.
Ergebnisse:
Ideal sphärische Partikel sind gut und verlässlich mit vielen Methoden charakterisierbar.
Reale (Nicht ideale) Materialien sind gut charakterisierbar, wenn eine gewisse Homogenität und Stabilität vorliegt.
Stark inhomogene und stark agglomerierende Partikel liefern deutlich unterschiedliche Ergebnisse für verschiedene Methoden.
Partikel mit geringen Größenunterschieden lassen sich mit allen Methoden gut charakterisieren.
Partikel mit sehr deutlichen Größenunterschieden führen häufig zu einer Unterbewertung der kleineren Partikel.
Vollautomatische Partikeldetektion bei elektronenmikroskopischen Aufnahmen ist z.Zt. noch stark fehleranfällig und kann daher nicht empfohlen werden.
Es hat sich gezeigt, dass alle Methoden zur Bestimmung der Partikelgrößenverteilung Vor- und Nachteile haben. Es ist dringend zu empfehlen Größenverteilungen immer mit mindestens zwei unterschiedlichen Methoden zu bestimmen: Bildgebend und mit gute Anzahlstatistik.
Verschiedene Durchmesser wurden in der TG-PSD mit einem Indexsystem versehen, welches zukünftig Verwechslungen zwischen unterschiedlichen Durchmessern vermeiden soll.
Wird ein bestimmter Durchmesser benötigt (z.B. hydrodynamisch, aerodynamisch), muss die Methode passend gewählt werden. Eine Umrechnung von einem Durchmesser in einen anderen ist in der Regel fehlerbehaftet.
Es wurde ein einheitliches Reporting-System in der TG-PSD eingeführt.
OECD Prüfrichtlinie zur Bestimmung der Partikelgröße und Anzahlgrößenverteilung von Nanomaterialien
(2021)
Abschlusspräsentation des Projektes "OECD Prüfrichtlinie zur Bestimmung der Partikelgröße und Anzahlgrößenverteilung von Nanomaterialien" - Projektteil Nanopartikel.
Es hat sich gezeigt, dass alle Methoden zur Bestimmung der Partikelgrößenverteilung Vor- und Nachteile haben. Es wird dringend empfohlen Größenverteilungen immer mit mindestens zwei unterschiedlichen Methoden zu bestimmen: Bildgebend und mit gute Anzahlstatistik.
Verschiedene Durchmesser wurden in der TG-PSD mit einem Indexsystem versehen, welches zukünftig Verwechslungen zwischen unterschiedlichen Durchmessern vermeiden soll.
Wird ein bestimmter Durchmesser benötigt (z.B. hydrodynamisch, aerodynamisch), muss die Methode passend gewählt werden. Eine Umrechnung von einem Durchmesser in einen anderen ist in der Regel fehlerbehaftet.
Es wurde ein einheitliches Reporting-System in der TG-PSD eingeführt.
Tour de table - BAM
(2021)
The intention of the presentation is to inspire a discussion on the needs and challenges for the digitalisation of SOPs. SOPs are available for the disciplines of physical-chemical characterisation, for toxicology, for environmental applications and for exposure applications. Furthermore the SOPs need to be integrated in the regulatory framework and need to be detailed enough for the digital processing. This is highlighted in this presentation.
OECD Prüfrichtlinie 125
(2023)
Diese Präsentation ist eine Einführung in die OECD TG 125 zur Bestimmung der Partikelgrößen von Nanomaterialien. Es wird auf die verchiedenen Probleme der Partikelgrößenbestimmung eingegangen wie z.B. verschiedene Oberflächenschichten, Äquivalenzdurchmesser und Verteilungsfunktionen. Gleichzeitig werden die neuen Begrifflichkeiten eingeführt, die in der TG 125 definiert neu werden.
Die Bestimmung der Nanopartikelgrößen- und -formverteilung nach OECD TG 125 mit einem Differentiellen Mobilitäts Analyse System (DMAS), auch bekannt als SMPS, wird vorgestellt:
- Generelles Messprinzip
- Welchen Durchmesser misst die Methode?
- Welche Partikel kann diese Methode messen?
- Welche Informationen kann diese Methode liefern?
- Wo stößt die Methode an ihre Grenzen?
- Implementierung und Datenauswertung,
- Reporting.
Anschließend wurde eine Q&A-Session für DMAS/SMPS organisiert.
Die gemeinsame Forschungsstrategie der Bundesoberbehörden zur Nanotechnologie wurde 2016 veröffentlicht. Die darin enthaltenen Aufgaben wurden von den Bundesoberbehörden vielfältig bearbeitet. Diese Präsentation gibt einen Überblick über die Projekte, die von der BAM bis 2019 bearbeitet wurden/werden und sich in den Rahmen der Forschungsstrategie einordnen.
Anhand der Wirksumme ist eine Abschätzung des legierungsabhängigen Einflusses auf den Korrosionswiderstand gegen chloridhaltige Medien möglich. Die berechneten Werte sind nur bei optimaler Wärmebehandlung und Verarbeitung zutreffend.
Die Anwendung einer einfachen Formel unter Berücksichtigung von Chrom, Molybdän und Stickstoff ist in der Regel völlig ausreichend. Das daraus abgeleitete Ranking von Werkstoffen ist für diverse technische Regelwerke und zur Unterstützung der Werkstoffauswahl geeignet.
Für die Warenein-/Ausgangskontrolle ist die alleinige Feststellung der Wirksumme unzureichend. Ergänzende Korrosionsuntersuchungen/-prüfungen zur Beschreibung des Korrosionswiderstandes sind dafür notwendig. Gleiches gilt für die Beurteilung von Schadensfällen. Hier sind Verarbeitung, Einsatzbedingungen und die Konstruktion von ausschlaggebender Bedeutung.
A summery of previous research regarding surface crystallization is given as well as results regarding thecurrent DFG project are presented.
Before industrial grade graphene could reach comparable quality to the controlled laboratory scale material, many challenges must be overcome. In order to bridge the gap between lab-scale and industrial-scale production is necessary to develop processes, equipment and measurement procedures to control the material features. One of the most crucial reasons of graphene’s limited commercialization is the lack of standard procedures to properly characterize and define the material chemical and structural properties down to the nanometer level. This leads to many issues regarding material synthesis repeatability, inappropriateness choice of measurands and measurement reproducibility which heavily affect the consistency of the material performance. For example, among all the different industrially produced real-world graphene, it is crucial to determine how many layers of graphene build the material. Products that are built by more than 10 layers should be more correctly referred as nanosized graphite, a problem that is often regarded as the “fake graphene” issue.
In our study, a comparative analysis is performed on two different series (G5 and G6) of industrial graphene powders, each series produced with four types of functionalization: raw graphene, oxygen-functionalized, nitrogen-functionalized and fluorine-functionalized. All the 8 sample variants were analyzed from a chemical and morphological point of view in the form of powders prepared as slightly pressed in metallic sample holders.
The results of the comparative chemical analyses XPS and EDS show a good agreement in the concentration values for all the elements present in the samples, despite the different analysis volumes addressed by the two techniques. For this reason, the samples can be considered homogeneous in both lateral and vertical direction.
A clear influence of the morphology on the composition is evident. Therefore, such correlative measurements of morphology and composition are necessary for a comprehensive characterization of industrial graphene flakes. Protocols for reliable characterization of industrial graphene flakes are in progress.
Since its discovery, graphene has got growing attention in the industrial and application research due to its unique properties . However, graphene has not been yet implemented into the industrial market, in particularly due to the difficulty of properly characterizing this challenging material. As most of other nanomaterials, graphene’s properties are closely linked to its chemical and structural properties, such as number of layers, flake thickness, degree of functionalisation and C/O ratio. For the commercialization, suitable procedures for the measurement and characterization of the ultrathin flakes, of lateral dimensions in the range from µm to tens of µm, are essential.Surface chemical methods, especially XPS, have an outstanding role of providing chemical information on the composition. Thereby, one well-known problem for surface analytical methods is the influence of contamination on the composition as in the case of adventitious carbon. The differentiation between carbon originated from the contamination or from the graphene sample itself is often not obvious, which can lead to altered results in the determination of the composition. To overcome this problem, Hard Energy X-ray Photoelectron Spectroscopy (HAXPES) offers new possibilities due to its higher information depth. Therefore, XPS measurement obtained with Al Kα radiation (E = 1486. 6 eV) were compared with analyses performed with a Cr Kα (E = 5414. 8 eV) excitation on functionalized graphene samples. Differences are discussed in terms of potential carbon contamination, but also of oxygen on the composition of the samples. Measurements are performed on O-, N- and F-functionalized graphene. Different preparation procedures (powder, pellet, drop cast from liquid suspension) will be also discussed, correlation of the results with the flakes morphology as well as their validation with other independent methods are in progress.
A comparative analysis is performed by XPS, HAXPES and SEM of industrial functionalised graphene powder of different morphology. The chemical analysis carried out by XPS, which probing depth is around 10nm, and HAXPES, which can reach up to 30nm probing depth. By combining these two techniques is possible to get a rough, non-destructive depth profiling of the sample's surface. The results show a higher concentration of the functionlisation elements on the surface of the sample and the influence of the morphology on the functionalisation process and the C/O ratio.
The presentation shows the results of the mini-interlaboratory comparison focused on the measurement of the morphology of graphene oxide flakes using scanning electron microscopy. In this work, a route for the sample preparation, SEM measurement and image analysis is proposed. The results of the image analysis, performed on 200+ flakes per sample, are presented by comparing the distributions of the size and shape descriptors calculated according to two different approaches. The influences of a different SEM measurement operator, analysis approach and analysis operator on the final size and shape distributions are highlighted.
Nanomaterials bring various benefits and have become a part of our daily lives. However, the risks emerging from nanotechnology need to be minimized and controlled at the regulatory level and therefore, there is a need for nanorisk governance. One of the prerequisites for successful nanorisk governance is the availability of high-quality data on nanomaterials and their impact with the human body and the environment. In recent decades, a countless number of publications and studies on nanomaterials and their properties have been produced due to the fast development of nanotechnology. Despite such a vast amount of data and information, there are certain knowledge gaps hindering an efficient nanorisk governance process. Knowing the state of the available data and information is an important requirement for any decision maker in dealing with risks. In the specific case of nanotechnology, where most of the risks are complex, ambiguous, and uncertain in nature, it is essential to obtain complete data and metadata, to fill knowledge gaps, and to transform the available knowledge into functional knowledge. This can become possible using a novel approach developed within the NANORIGO project (Grant agreement No. 814530) – the Knowledge Readiness Level (KaRL). In analogy to NASA’s Technology Readiness Levels (TRLs), we define KaRLs as a categorization system of data, information, and knowledge which enables transformation of data and information into functional knowledge for nanorisk governance. Our approach goes beyond the technical curation of data and metadata and involves quality and completeness filters, regulatory compliance requirements, nanorisk-related tools, and most importantly, human input (inclusion of all stakeholder groups). With the KaRL approach we also address key issues in nanotechnology such as societal and ethical concerns, circular economies and sustainability, the Green Deal, and the traceability of data, knowledge, and decisions. The KaRL approach could be used for nanorisk governance by a nanorisk governance council (NRGC), which is currently under development by three EU projects (NANORIGO, GOV4NANO, and RISKGONE).
Nanomaterials bring various benefits and have become a part of our daily lives. However, the risks emerging from nanotechnology need to be minimized and controlled at the regulatory level and therefore, there is a need for nanorisk governance. One of the prerequisites for successful nanorisk governance is the availability of high-quality data on nanomaterials and their impact with the human body and the environment. In recent decades, a countless number of publications and studies on nanomaterials and their properties have been produced due to the fast development of nanotechnology. Despite such a vast amount of data and information, there are certain knowledge gaps hindering an efficient nanorisk governance process. Knowing the state of the available data and information is an important requirement for any decision maker in dealing with risks. In the specific case of nanotechnology, where most of the risks are complex, ambiguous, and uncertain in nature, it is essential to obtain complete data and metadata, to fill knowledge gaps, and to transform the available knowledge into functional knowledge. This can become possible using a novel approach developed within the NANORIGO project (Grant agreement No. 814530) – the Knowledge Readiness Level (KaRL). In analogy to NASA’s Technology Readiness Levels (TRLs), we define KaRLs as a categorization system of data, information, and knowledge which enables transformation of data and information into functional knowledge for nanorisk governance. Our approach goes beyond the technical curation of data and metadata and involves quality and completeness filters, regulatory compliance requirements, nanorisk-related tools, and most importantly, human input (inclusion of all stakeholder groups). With the KaRL approach we also address key issues in nanotechnology such as societal and ethical concerns, circular economies and sustainability, the Green Deal, and the traceability of data, knowledge, and decisions. The KaRL approach could be used for nanorisk governance by a nanorisk governance council (NRGC), which is currently under development by three EU projects (NANORIGO, GOV4NANO, and RISKGONE).
Data quality is a vast term, which comprises the completeness, relevance (adequacy), and reliability of data. So far, many attempts to assure data quality have been pursued, and evaluation criteria for data quality have been established. One relatively novel but already well-known aspect of data quality refers to the concept of data FAIRness, which states that data should be: findable, accessible, interoperable and re-usable. In order to find, use, and access data, a user has to be guided properly. Such guidelines already exist for regulators and the scientific community. However, a ‘simple’ non-academic user from general society is very unlikely to be able to access or understand such data. Our objective in the H2020 project NANORIGO is to help and guide all types of users (i.e., scientists, regulators, industry workers, citizens, etc.) to access and make use of high-quality data and information from available and suitable data repositories in order to increase the transparency of and trust in nanotechnology.
Nanomaterials may have brought many beneficial innovations with them in our daily lives and and have become indispensable for the society. However, one needs to be concerned of the risks which are still unknown and not sufficietly studied and therefore there is a need for a nanorisk governance. At the core of nanorisk governance is gathering, processing and analysing reliable data which will be used for decision making. The challenge is to assure data reliability and transform it into knowledge. To address this challenge, we used analogy to technology readiness level (TRL) approach (developed by NASA), and elaborated knowledge readiness level (KaRL). KaRL is a nine-scale system to categorize data and knowledge (documents) into levels of readiness for particular purposes and to enhance readiness level by using quality and completeness filters, compliance requirements, nanorisk-related tools, stakeholders’ input. By our approach we addressed key issues in nanotechnology such as societal and ethical concerns, circular economy and sustainability, traceability of data, knowledge and decisions.
There is an urgent demand for reliable data on microplastic analysis, particularly on its physico-chemical properties as well as validated methodology to obtain such data. Through interlaboratory comparisons (ILCs) it becomes possible to assess accuracy and precision of methods by involving many laboratories around the world. At BAM, my tasks focused around organisation of an ILC on physico-chemical characterisation of microplastic detection methods under the international pre-standardisation platform VAMAS (www.vamas.org/twa45/) as Project 2 “Development of standardized methodologies for characterisation of microplastics with microscopy and spectroscopy methods” under the Technical Working Area TWA 45 “Micro and Nano Plastics in the Environment”.
With a proud number of 84 participants this ILC is able to provide superior statistical results. Thermoanalytical (Py-GC/MS and TED-GC/MS) and vibrational (µ-IR and µ-Raman) methods were asked for identification and quantification of microplastic test samples according to mass or particle number. Preliminary results indicate which methods show a higher accuracy and precision and reveal some sample preparation ideas which work best for microplastics characterisation. At the end of the ILC an overall plausibility of the results will be assessed.
To obtain reliable data on micro- and nanoplastics (MPs, NPs) BAM (Federal Institute for Materials Research and Testing) is organizing interlaboratory comparisons (ILCs). Main focus is detection and physico-chemical characterisation. The accuracy and precision of the results of different laboratories and comparability of the results among the participants are addressed. The ILCs will be performed in the following order: i) ILC #1: Detection and Characterisation of MPs (1-1000 µm) and ii) ILC #2: Detection and Characterisation of NPs (< 1 µm).
For the ILC #1 the parameters to be analysed are: particle size distribution, shape, mass content, particle concentration, with thermoanalytic (Py-GC/MS, TED-GC/MS) and spectroscopy (µ-Raman, µ-FTIR) methods. For the ILC #2 the parameters are: particle size distribution, shape, particle concentration, with methods such as spectroscopical (Raman), Electron Microscopies (SEM, AFM), etc. Exact measurands and methods are still under discussion. BAM will provide test materials of well-known stability and homogeneity. ILC participants will include partners of the CUSP (the European research cluster to understand the health impacts of micro- and nanoplastics), and any other institutions over the world. The ILCs will take place under the international pre-standardisation platform VAMAS, new Technical Working Area 35 “Micro and Nano Plastics in the Environment” (http://www.vamas.org/twa45/).
In this presentation we demonstrate the importance of physico-chemical properties (pc) of micro- and nanoplastic particles (MNPs). These properties determine interaction between MNPs and cells or living organisms. To perform accurate experiments for acquiring pc information it is essential to develop well-characterized and understood plastic reference materials. Such reference materials can be used in interlaboratory comparisons (ILCs). BAM is organizing under VAMAS two ILCs, on micro- and nanoplastics to obtain reliable results and methodologies for pc characterization of MNPs. By gaining profound knowledge on pc properties it becomes possible to estimate the impact of MNPs on the humans and environment and therefore to translate the knowledge to the level of regulation.
The research carried out at the Laboratory of Spectroscopy of Functional Materials at IFSC/USP, in Brazil, is focused on the synthesis and structural-property correlation of luminescent materials including rare-earth (RE) doped glasses, ceramics and hybrid host-guest materials. For the past five years, we have been particularly interested in the development of single- and multifunctional nanosystems based on core-shell upconversion nanoparticles (UCNP) associated with dyes, organometallic complexes and other organic molecules, for biophotonic and sensing applications. In these systems, we take advantage of energy transfer between the UCNPs and the molecules to either supress or enhance luminescent response. Examples include the possibility of bioimaging and photodynamic therapy of bacteria and cancer cells, simultaneous magnetothermia and thermometry, localized O2 sensing, fast detection and quantification of biological markers (e.g. kidney disease) and microorganisms. On what concerns the development of luminescent sensors - a recently started project, our aim is to develop paper-based platforms for point-of-care devices. In this presentation, an overview of our contributions for the past years and our future aims will be presented with several examples.
Es werden erzielte Ergebnisse des ultraschallunterstützen Schlichtfräsens einer schwer spanbaren FeNi-Legierung vorgestellt. Dabei wird der Einfluss der Amplitude der Ultraschallunterstützung auf die Zerspankraft sowie die Oberflächenintegrität untersucht, wobei ein besonderer Fokus auf die Passivkraft gelegt wird. Die Ultraschallunterstützung bedingt beim Schlichtfräsen der Alloy 36 im Vergleich zum konventionellen Fräsprozess eine signifikante Reduzierung der resultierenden Zerspankraft sowie der Rauheit. Außerdem werden oberflächennahen Druckeigenspannungen induziert. Eine Angehobene Osziallations-Amplitude beim ultraschallunterstützten Fräsen bewirkt eine Erhöhung des Anteils der Passivkraft an der resultierenden Zerspankraft sowie eine Erhöhung der oberflächennahen Druckeigenspannungen und eine Verringerung von Oberflächendefekten und Rauheitskennwerten.
The presentation demonstrates an application of multi-scale optical imaging methods such as spectroscopic imaging ellipsometry and white light interference microscopy for the investigation of wide-bandgap semiconductors for power electronics. The capabilities of these methods for the development of new reference calibration samples for scanning microwave microscopes (SMM) and conductive atomic force microscopes (C AFM) are discussed.
Ellipsometry is a very powerful tool used for accurate material investigation in a wide wavelength range. It is a non-destructive and fast method. Imaging ellipsometry as a combination of optical microscopy and ellipsometry enables spatially resolved measurements when determining the layer thickness and dielectric properties of thin layers. It is known for its high polarisation sensitivity and high contrast for the surface structures. In this contribution we show the application of the imaging ellipsometry for detection of defects in energy materials and quality validation of possible reference materials for nano-electronics.
Defects in wide bandgap semiconductors, in homoepitaxial SiC and heteroepitaxial GaN layers on transparent SiC substrates, can be successfully detected and classified by means of imaging ellipsometry. Correlation of imaging ellipsometry results with results from complementary techniques such as white light interference microscopy as well as atomic force microscopy contribute to understanding of surface topography and defect formation mechanisms. We discuss the potential of different methods for analysing ellipsometric map data for monitoring the defect densities.
Electric properties of materials at the nanoscale can be investigated by means of scanning probe microscopy methods such as scanning microwave microscopy and conductive atomic force microscopy. However, development of new robust and easy-to-use calibration methods and calibration standards is essential to increase the traceability of these methods and allow their broad application in industry. We show how imaging spectroscopic ellipsometry can be used for development and monitoring of processing quality of patterned reference samples based on indium tin oxide (ITO) layer with different thickness and conductivity.
Ellipsometry as optical metrology method for analysis of reference materials for nanoelectronics
(2024)
Electrical properties of materials at the nanoscale can be characterized using scanning microwave microscopes (SMM) and conductive atomic force microscopes (C AFM). However, the measurement results are difficult to compare since different setups and different reference standards are used. The development of new “out-of-lab” reference standards can contribute to the traceability and reliability of these scanning probe microscopy methods (SPM) and facilitate their broader industrial application.
In this study, we discuss the capability of optical methods such as ellipsometry for the characterization of existing and the development of new reference calibration samples for scanning microwave microscopy. Ellipsometry is a fast and non-destructive method, which enables very accurate determination of the layer thickness and the dielectric functions of the materials. Imaging ellipsometry is suitable for spatially resolved measurements when analyzing thin layers in microstructured samples.
We show how the electrical resistivity of indium tin oxide (ITO) layers in newly designed resistive calibration samples can be obtained from spectroscopic ellipsometric measurements. The extension of the measurement range into the mid-infrared region was necessary when analyzing ITO layers with low conductivity. This parameter was obtained by fitting a Drude function describing the absorption of the free carriers. The impact of the coating process conditions on the layer properties is discussed.
Imaging ellipsometry was applied for the characterisation of thin ITO and SiO2 layers in microstructured resistive and capacitance calibration kits. The uncertainties of determined layer thicknesses were specified according to standardized practice guides used in ellipsometry. We show how statistical fingerprint analysis of the measured ellipsometric transfer quantities can be used to validate the quality of potential reference materials for nano-electronics and to monitor the processing of structured samples.
Advanced Manufacturing and Advanced Materials have been identified by the European Commission as one of six Key Enabling Technologies (KETs), the full exploitation of which will create advanced and sustainable economies. Metrology is a key enabler for progress of these KETs. EURAMET, which is the association of metrology institutes in Europe, has addressed the vital importance of Metrology for these KETs through the support for the creation of a European Metrology Network for Advanced Manufacturing. The EMN for Advanced Manufacturing (AdvanceManu) was approved in June 2021 and held the formal kick-of meeting in October 2022. The EMN comprises both National Metrology Institutes (NMIs) from across Europe and other designated Institutes (Dis). The EMN is organized in three sections; Advanced Materials, Smart Manufacturing Systems and Manufactured components and products. The aim of the EMN is to engage with stakeholders in the field of Advanced Manufacturing and Advanced Materials (Large & SMEs, industry organisations, existing networks and academia) with the aim to prepare a Strategic Research Agenda (SRA) for Metrology for Advanced Manufacturing. In the shorter term, an orientation paper is aimed to be produce to in the context of the European Partnership for Metrology. In addition to the SRA, the EMN will establish knowledge and technology transfer and promotion plan. This includes leveraging the existing research results from the completed and running EMPIR JRP projects funded through EURAMET.
This presentation will outline the EMN for Advanced Manufacturing, describing the structures and goals, the route to the production of the SRA and the progress made to date identifying the key metrology challenges across the related Key Industrial Sectors (KICs). In particular, the presentation aims to inform the community on how to be involved in the shaping of the strategic research agenda for the future of Metrology for Advanced Manufacturing and Advanced Materials.
The progress of Advanced Manufacturing, which has been identified by the European Commission as a Key Enabling Technology (KET) for future economic and societal progress is strongly reliant on the development of metrology capabilities. EURAMET, the association of metrology institutes in Europe, has established metrology research programs to address the metrology requirements across a spectrum of different thematic areas. In order to leverage the benefits of these developments on the wider industrial landscape, a high-level coordination of the metrology community supporting the Advanced Manufacturing landscape is required. This coordination is aimed to be achieved by the establishment of European Metrology Networks (EMNs), which are intended by EURAMET to provide a sustainable structure for stakeholder engagement and support. The joint networking project 19NET01 AdvManuNet funded by EMPIR for 4 years, started in June 2020 and aims to accelerate the process of establishing an EMN to strengthen Europe’s position in Advanced Manufacturing. The AdvManuNet project aims to support the establishment of an EMN on Advanced Manufacturing via the following specific aims:
1. Creation of a single hub for stakeholder engagement across the landscape of various industrial sectors including relevant societies and standardization bodies.
2. Development of a Strategic Research Agenda (SRA) and roadmaps for Advanced Manufacturing metrology based on the stakeholder engagement activities, considering current gaps in metrological capabilities existing networks and roadmaps.
3. Establish a knowledge-sharing program for Advanced Manufacturing stakeholders, promoting the dissemination and exploitation of the results of the project, including those from previous EU funded research projects.
4. Development of a sustainable web-based platform and service desk for Advanced Manufacturing stakeholders to allow for easy access to European metrology capabilities and support the wider advanced manufacturing community with metrology-based requirements.
5. Develop a plan for a coordinated and sustainable European metrology infrastructure for Advanced Manufacturing via a European Metrology Network.
The project concept followed by the scope and definition of Advanced Manufacturing will be described. The analysis of the current capability of metrology for Advanced Manufacturing and the preliminary concepts for the strategic research agenda will be presented with a focus on dimensional metrology.
In this work, Mie resonances in single Si nanoparticles (NPs) of different sizes have been systematically studied, using dark field (DF) and cathodoluminescence (CL) spectroscopy. An analytical method has been developed to compare experiment with theory.
Experimental CL spectra are averaged over entire Si NPs, allowing for direct comparison to DF spectra of identical NPs. Theoretical spectra clarify the assignment of Mie resonances within the NP which contribute with different intensity in DF and CL, resulting in an apparent spectral shift. Furthermore, a substrate effect appears. A 100 nm-Si NP on 15 nm SiN results in a broad peak, spectrally in between that of the calculated electric and magnetic dipole, a NP on 50 nm SiN exhibits two separated peaks as theoretically predicted. High spatial resolution of electron beam excitation allows to study the spectral CL changes at varying beam impact parameters. Theory and experiment agree that depending on beam position within a small Si NP, relative intensity of electric and magnetic dipole change; electric dipole vanishing in the center of the NP. Similar results are found for larger (d = 210 nm) Si NPs although the mode assignment is challenging as higher order modes appear and overlap with others.
In conclusion, comparison of CL and DF spectra is not trivial, in fact, excitation/radiation of distinct Mie resonances within a single Si NP are dependent on beam placement. However, substrate effects need to be considered in CL.
Cathodoluminescence (CL) spectroscopy has become a powerful tool to study nanostructures due to its high spectral and spatial resolution down to sub-nanometer. More recently, CL technique has also been used for second order auto-correlation measurements (g(2)(t)) to identify different single photon emitters and photon bunching in different materials [1-2].
In this work, tungsten disulfide (WS2) monolayers encapsulated in hexagonal boron nitride (hBN) with and without monocrystalline Au nanodisks (NDs) have been studied, using CL and PL spectroscopy as well as g(2)-CL- and PL-measurements.
CL and PL maps of different WS2 monolayers before/after Au ND deposition show a narrow peak at ~625 nm without any background emission. In CL, the hBN not only protects WS2 from the electron beam but also acts as a charge carrier sink which substantially increases the CL signal [3]. A further CL enhancement is achieved by Au ND deposition, exhibiting the maximum at the center of the NDs without any size dependence. The PL intensity is unaffected. This indicates that Purcell enhancement cannot be the underlying mechanism.
Furthermore, a giant CL-photon bunching of the hBN-encapsulated WS2 monolayers is found which is independent of the applied voltage but highly dependent on the electron beam current. At the lowest current of ~2 pA, a CL bunching factor of up to 160 is observed. Varying thicknesses of the surrounding hBN increases the overall CL signal but does not affect the bunching factor, though it exhibits small local changes within the same flake. In contrast, there is no PL correlation (g(2)(0) = 1).
Interestingly, this photon bunching can be further increased by Au NDs, resulting in the highest ever observed bunching factor of close to 2200. Once again, this enhancement is independent of the Au ND’s diameter although some disks show higher bunching factors than others. Most likely, the Au acts as shield for the incoming primary electrons, resulting in an even further decreased current, and thereby, increased bunching.
In conclusion, large CL-photon bunching is found in hBN-encapsulated WS2 monolayers which can be substantially enhanced by Au NDs.
References
[1] M.A. Feldmann, E.F. Demitrescu, D. Bridges, M.F. Chisholm, R.B. Davidson, P.G. Evans, J.A. Hachtel, A. Hu, R.C. Pooser, R.F. Haglund, B.J. Lawrie, Phys. Rev. B, 97, 081404(R) (2018)
[2] S. Meuret, L.H.G. Tizei, T. Cazimajou, R. Bourrellier, H.C. Chang, F. Treussartm M. Kociak, Phys. Rev. Letter, 114, 197401 (2015)
[3] S. Zheng, J.-K. So, F. Liu, Z. Liu, N. Zheludev, H.J. Fan, Nano Lett., 17, 6475-6480 (2017)
Influence of oxidation in the formation and performance of laser-induced periodic surface structures
(2022)
The fabrication of laser-induced periodic surface structures (LIPSS) has been reported for metallic, semiconductor and dielectric materials when irradiated with linearly polarized ultrashort laser pulses. Different sets of processing parameters have been identified and extensively studied, allowing the use of LIPSS for applications in medicine, tribology and surface wetting to name a few. One important parameter that is often not considered is the laser-induced oxidation that is produced especially when oxidation prone materials are irradiated in air environment. This surface oxidation can potentially influence the final structures
size, shape and orientation and modify their functionality in some specific applications.
In this work, we first study the influence of the laser-induced oxidation layer on the formation of LIPSS by characterizing the response of the oxidation prone
hard-coating material chromium nitride. Moreover, we employ complementary surface and depth-profiling analytic techniques to reveal morphological, chemical and structural features of different types of surface structures and LIPSS produced on titanium-based substrates. Finite-difference time-domain (FDTD) calculations finally explain how this superficial oxidation layer promotes the formation of a new type of low spatial frequency LIPSS. Also, we measure the depth-extent of the different oxides formed and demonstrate its beneficial influence for friction reduction and wear resistance applications.
Silicon is the material responsible for most of the technological developments during the past century, making it one of the most studied materials along different disciplines. However, there are still unturned stones regarding its superficial re-solidification after femtosecond laser-induced local melting. In this presentation, we report irradiation experiments with single femtosecond pulses (790 nm, 30 fs) with a spatially Gaussian distribution on two different types of silicon with orientations <111> and <100>. The surface modifications were studied in detail via different techniques, including optical microscopy, atomic force microscopy, spectroscopic imaging ellipsometry, energy dispersive X-ray spectroscopy and high-resolution transmission electron microscopy. We quantitatively estimate the resulting radial amorphous layer depth profiles with maximum thicknesses around some tenths of nanometers for fluences in between the melting and ablation thresholds. In particular, spectroscopic imaging ellipsometry (SIE) allowed fast data acquisition using multiple wavelengths to provide experimental measurements for calculating the nanometric radial amorphous layer thickness profiles with micrometric lateral resolution based on a thin-film layer model. SIE proved to be capable of detecting and measuring nanometric structural and chemical modifications (oxidation) on the studied laser spots. The accuracy of the SIE-based calculations is verified experimentally by characterizing an in-depth material lamella via high-resolution transmission electron microscopy (HRTEM) and energy dispersive X-ray spectroscopy (STEM-EDX). For completeness, we present a mathematical modelling for the melt layer thickness considering different optical absorption processes including one photon absorption, two photon absorption and free-carrier absorption, highlighting the relevance of the latter one in the femtosecond laser-induced melting of silicon.
Laser-induced oxide graded layers may contribute to the formation of a new type of embedded low-spatial frequency LIPSS with an anomalous orientation parallel to the laser polarization. In this contribution, we explore this effect experimentally with femtosecond laser pulses and numerically by finite-difference time-domain (FDTD) calculations.
Force-distance curves have been recorded on thin films of lubricants. The lubricants wet the AFM tip, which causes a capillary force. This force depends on the shape of the tip, as well as on physical properties like viscosity and surface tension, which have been determined additionally with other methods. This way, their influence on the shape of the curves could be analyzed.
Nanomaterials are used in many different applications in the material and life sciences. Examples are optical reporters, barcodes, and nanosensors, magnetic and optical contrast agents, and catalysts. Due to their small size and large surface area, there are also concerns about their interaction with and uptake by biological systems. This has initiated an ever increasing number of cyctoxicity studies of nanomaterials of different chemical composition and surface chemistry, but until now, the toxicological results presented by different research groups often do not address or differ regarding a potential genotoxicity of these nanomaterials. This underlines the need for a standardized test procedure to detect genotoxicity.1,2
Aiming at the development of fast, easy to use, and automatable microscopic methods for the determination of the genotoxicity of different types of nanoparticles, we assess the potential of the fluorometric γH2AX assay for this purpose. This assay, which can be run on an automated microscopic detection system, relies on the determination of DNA double strand breaks as a sign for genotoxicity.3 Here, we present first results obtained with broadly used nanomaterials like CdSe/CdS and InP/ZnS quantum dots as well as iron oxide, gold, and polymer particles of different surface chemistry with previously tested colloidal stability. These studies will be also used to establish nanomaterials as positive and negative genotoxicity controls or standards for assay performance validation for users of this fluorometric genotoxicity assay. In the future, after proper validation, this microscopic platform technology will be expanded to other typical toxicity assays.
References. (1) Landsiedel, R.; Kapp, M. D.; Schulz, M.; Wiench, K.; Oesch, F., Reviews in Mutation Research 2009, 681, 241-258. (2) Henriksen-Lacey, M.; Carregal-Romero, S.; Liz-Marzán, L. M., Bioconjugate Chem. 2016, 28, 212-221. (3) Willitzki, A.; Lorenz, S.; Hiemann, R.; Guttek, K.; Goihl, A.; Hartig, R.; Conrad, K.; Feist, E.; Sack, U.; Schierack, P., Cytometry Part A 2013, 83, 1017-1026.