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Electrical and optical applications based on micro- and nanoparticles have specific demands on their interfacial properties. These properties are strongly related to atmospheric conditions to which the particles were exposed during their formation. In this study, metallic In microparticles are synthesized by solidification of In droplets on an amorphous Mo substrate at normal pressure and under vacuum conditions. The influence of ambient pressure on the interface and surface shape is investigated. While solidification at atmospheric pressure leads to collapsed particles with undisturbed contact to the substrate, low pressures result in smooth spherical particles but with cavities inside. Numerical simulations with COMSOL Multiphysics reveal different temperature profiles and heat flux in particles during solidification for both cases. This indicates different starting conditions of the solidification, which leads to the described phenomenon eventually. The investigation of the varying process conditions on the particle shape in combination with the calculated and measured temperature curves over time gives valuable insights into new approaches to synthesize micro- and nanoparticles with defined interfacial properties. Both ambient pressure and cooling rate provide well-controllable and reliable parameters for the realization of different interfacial shapes.
MISTRAL-Müller-Matrix-basierte Identifizierung von Inhomogenitäten und strukturellen Anomalien
(2020)
Mit abbildender Ellipsometrie (imaging ellipsometry: IE) können Nanometer-Beschichtungen/ Degradationen visualisiert und bezüglich Brechungsindex n, Extinktionskoeffizient k und Schichtdicke d charakterisiert werden. Materialseitig werden lokal Homogenität und Isotropie innerhalb eines/mehrerer Bildpunkte (field of analysis: FOA) und messtechnisch global die Ebenheit der Proben bezüglich aller Bildpunkte des Messfeldes vorausgesetzt. Für die Müller-Matrix-basierte abbildende Ellipsometrie (MM-IE), die den optischen Response anisotroper Materialien in jedem Bildpunkt über die bis zu 16 Müller-Matrix-Elemente erfasst, ist dies von besonderer Relevanz. Reale Substrate sind aber oft nicht eben, können lokal Noppen/Mulden (im FOA) aufweisen oder sind global konvex/ konkav im möglichen Messfeld (field of view: FOV) gekrümmt. Diese lokalen/globalen strukturellen Anomalien des Substrats werden schon für die IE messtechnisch/modellseitig oft nicht beherrscht und sind für die MM-IE in der Wirkung auf die MM-Elemente unbekannt. Diese Defizite sollen messtechnisch bzw. modellmäßig behoben und somit die Messung lokal/global gekrümmter Oberflächen ermöglicht werden (MM-CSIE, CS curved surface).
For the vast majority of ellipsometric measurements, the application of planar substrates is mandatory and requires a proper sample alignment prior to the measurement. Here, the authors present a generalized approach of how to extract the isotropic ellipsometric sample parameters from an imaging Mueller-matrix measurement even if the sample is significantly misaligned. They validate the method by layer-thickness calculations based on imaging Mueller-matrix measurements of flat crystalline silicon samples that were misaligned on purpose. Furthermore, they also exploit this method’s capabilities to perform spatially resolved layer-thickness measurements of a single-layer indium-tin-oxide coating on a fused-silica microlens without the need of realignment or repositioning of the sample during the measurement.
In the last years, the implementation of imaging ellipsometry in the variety of optical characterization techniques has shown tremendous potential to analyze the topology of surfaces in the lateral dimension. In the later studies, this contrast-rich surface images were affiliated with changes of the refraction indices, Absorption bands or layer thicknesses. However, it was realized that additional factors like curvature or scattering can have a great Impact on the ellipsometric readout of the analyzed system. In this study, we focus on the systematic evaluation of structural anomalies and inhomogenities of several Basic systems. This includes spherical particles as a model for microscopic curved surfaces in a range of 0.25 to 25 μm in diameter. In the macroscopic regime several conventional convex lenses were analyzed. Additional affords were made to generate microscopic concave model systems by applying nanoindentation with a spherical indentation unit. With this method calottes with a depth of 0.04 to 2 μm and radius of 2.5 μm were made. The macroscopic counterpart is delivered by conventional concave lens systems. For all systems, a variety of different bulk materials was investigated. This includes metal oxides, metals and polymers as well as combinations of each by applying coatings on the bulk materials with different layer thicknesses.
To analyze these structural anomalies and inhomogenities properly, Mueller-Matrix imaging ellipsometry is the method of choice to address cross- and depolarization effects that occur due to the curved surfaces.
Supplementary methods were used for an independent characterization of the topological properties of all structural anomalies and inhomogenities. This includes AFM and SEM for the microscopic samples (microparticles and nanoindented holes) and white light interferometry for the macroscopic lenses.
This study results in a systematic screening of different coated and uncoated material systems with a topology that does not fit into conventional ellipsometry and thus is analyzed by Muller-Matrix imaging ellipsometry. This will help in quality control and is a contribution to the understanding of the polarizing effects of non-ideal Systems analyzed by ellipsometry.
Visualisierung von mikro- und nanoskalierten Oberflächenstrukturen mittels abbildender Ellipsometry
(2019)
In den letzten Jahren hat die Einbindung der abbildenden Ellipsometrie in die Gruppe der optischen Verfahren zur Oberflächencharakterisierung ein enormes Potential bei der Analyse von topologischen Strukturänderungen gezeigt. Der dabei abgebildete Kon-trast wurde typischerweise auf Änderungen im Brechungsindex, Absorptionseffekte oder Schichtdickenänderungen zurückgeführt. In späteren Studien wurde festgestellt, dass auch andere Faktoren, wie etwa die Krümmung der Oberfläche oder Kanten von Struktu-ren einen signifikanten Einfluss auf die Messung der ellipsometrischen Paramater haben. Um diese Effekte aus der ellipsometrischen Messung extrahieren zu können, wird auf die Analyse der Müller-Matrix zurückgegriffen.
In dem hier vorliegenden Beitrag wird gezeigt, wie die Müller-Matrix-Imaging Ellipsomet-rie (MM-IE) zur Charakterisierung von Oberflächenstrukturen verwendet werden kann. Dazu werden mikro- und nanoskaliert gekrümmte Oberflächen zunächst mit verschiede-nen Referenzmethoden, wie Rasterelektronenmikroskopie (SEM), Lichtmikroskopie (OM), Weißlichtinterferenzmikroskopie (WLIM) und Rasterkraftmikroskopie (AFM) vali-diert erfasst. Der anschließende Vergleich mit den Ergebnissen der Müller-Matrix-Ima-ging-Ellipsometrie ermöglicht eine Korrelation der zugrunde liegenden Strukturphäno-mene mit den ellipsometrischen Daten. In diesem Artikel wird das Prinzip an drei industriell relevanten Strukturgruppen demonstriert: Sub-Mikropartikel, Mikropartikel und sub-mikroskalierte Vertiefungen.
Visualisierung von mikro- und nanoskalierten Oberflächenstrukturen mittels abbildender Ellipsometrie
(2019)
In den letzten Jahren hat die Einbindung der abbildenden Ellipsometrie in die Gruppe der optischen Verfahren zur Oberflächencharakterisierung ein enormes Potential bei der Analyse von topologischen Strukturänderungen gezeigt. Der dabei abgebildete Kon-trast wurde typischerweise auf Änderungen im Brechungsindex, Absorptionseffekte oder Schichtdickenänderungen zurückgeführt. In späteren Studien wurde festgestellt, dass auch andere Faktoren, wie etwa die Krümmung der Oberfläche oder Kanten von Struktu-ren einen signifikanten Einfluss auf die Messung der ellipsometrischen Paramater haben. Um diese Effekte aus der ellipsometrischen Messung extrahieren zu können, wird auf die Analyse der Müller-Matrix zurückgegriffen.
In dem hier vorliegenden Beitrag wird gezeigt, wie die Müller-Matrix-Imaging Ellipsomet-rie (MM-IE) zur Charakterisierung von Oberflächenstrukturen verwendet werden kann. Dazu werden mikro- und nanoskaliert gekrümmte Oberflächen zunächst mit verschiede-nen Referenzmethoden, wie Rasterelektronenmikroskopie (SEM), Lichtmikroskopie (OM), Weißlichtinterferenzmikroskopie (WLIM) und Rasterkraftmikroskopie (AFM) vali-diert erfasst. Der anschließende Vergleich mit den Ergebnissen der Müller-Matrix-Ima-ging-Ellipsometrie ermöglicht eine Korrelation der zugrunde liegenden Strukturphäno-mene mit den ellipsometrischen Daten. In diesem Artikel wird das Prinzip an drei industriell relevanten Strukturgruppen demonstriert: Sub-Mikropartikel, Mikropartikel und sub-mikroskalierte Vertiefungen.
Background: Gas sensors are very important in several fields like gas monitoring, safety and environmental applications. In this approach, a new gas sensing concept is investigated which combines the powerful adsorption probability of metal oxide conductive sensors (MOS) with an optical ellipsometric readout. This concept Shows promising results to solve the problems of cross sensitivity of the MOS concept.
Results: Undoped tin oxide (SnOx) and iron doped tin oxide (Fe:SnOx) thin add-on films were prepared by magnetron sputtering on the top of the actual surface plasmon resonance (SPR) sensing gold layer. The films were tested for their sensitivity to several gas species in the surface plasmon resonance enhanced (SPREE) gas measurement. It was found that the undoped tin oxide (SnOx) shows higher sensitivities to propane (C3H8) then to carbon monoxide (CO). By using Fe:SnOx, this relation is inverted. This behavior was explained by a change of the amount of binding sites for CO in the layer due to this iron doping. For hydrogen (H2) no such relation was found but the sensing ability was identical for both layer materials. This observation was related to a different sensing mechanism for H2 which is driven by the Diffusion into the layer instead of adsorption on the surface.
Conclusion: The gas sensing selectivity can be enhanced by tuning the properties of the thin film overcoating. A relation of the binding sites in the doped and undoped SnOx films and the gas sensing abilities for CO and C3H8 was found. This could open the path for optimized gas sensing devices with different coated SPREE sensors.
In this study, thickness related changes of the optical properties of doped tin oxide were studied. Two different sets of samples were prepared. The first set was doped with iron or nickel on silicon substrate with thicknesses of 29–56 nm, the second was iron doped on gold/glass substrate with 1.6–6.3 nm. The optical constants were determined by using spectral ellipsometry (SE) followed by modelling of the dielectric function with an oscillator model using Gaussian peaks. The analysis of the optical constants shows a dependence of the refraction and the absorption on the thickness of the doped tin oxide coating. In addition to the tin oxide absorption in the UV, one additional absorption peak was found in the near-IR/red which is related to plasmonic effects due to the doping. This peak shifts from the near-IR to the red part of the visible spectrum and becomes stronger by reducing the thickness, probably due to the formation of metal nanoparticles in this layer. These results were found for two different sets of samples by using the same optical model. Afterwards the second sample set was tested in the Surface Plasmon Resonance Enhanced Ellipsometric (SPREE) gas measurement with CO gas. It was found that the thickness has significant influence on the sensitivity and thus the adsorption of the CO gas. By increasing the thickness from 1.6 nm to 5.1 nm, the sensing ability is enhanced due to a higher coverage of the surface with the over coating. This is explained by the high affinity of CO molecules to the incorporated Fe-nanoparticles in the tin oxide coating. By increasing the thickness further to 6.3 nm, the sensing ability drops because the layer disturbs the SPR sensing effect too much.
Gas sensors are an important tool in various areas for example in industrial process control as well as Gas sensors are an important tool in various areas for example in industrial process control as well as safety applications or in research. A useful gas detector should be selective, precise, stable and cost-effective. In the present research a surface based gas detection technique is investigated using the SPR effect with ellipsometric readout. This technique is called surface plasmon resonance enhanced ellipsometry (SPREE).
The sensor consists of a gold layer (40 nm) top-coated with a doped metal-oxide (M:SnOₓ,
5 nm). The coating is added by magnetron sputtering with doped targets with different doping concentrations. It could be shown that, without the top-coating, these type of sensors can detect various gases, e.g. CO, H2, O2, O3, He, N2, with sensitivities down to the ppm range (in air).
The goal of the present study is to characterize the additional coating materials in dependence of the coating conditions. With the help of the doped-metal oxide, the sensitivity increases dramatically by a factor of 100. Additionally, a selectivity for specific gases is observed which depends on the doping conditions of the coating. Changing the properties of the plasma coating process and the doping metal gives access to a variety of different layers and enables us to find the best conditions.