Chemie und Prozesstechnik
Filtern
Dokumenttyp
- Vortrag (33) (entfernen)
Sprache
- Englisch (33)
Referierte Publikation
- nein (33)
Schlagworte
- Plasma modeling (17)
- Laser induced plasma (14)
- LIBS (12)
- Plasma diagnostics (11)
- Laser ablation (9)
- Plasma chemistry (9)
- Surface coating (9)
- Emission spectroscopy (7)
- Hydrodynamic model (7)
- Laser induced plasma deposition (7)
Organisationseinheit der BAM
- 1 Analytische Chemie; Referenzmaterialien (33) (entfernen)
Eingeladener Vortrag
- nein (33)
Processes of laser induced oxidation of metals are typically studied in the framework of heterogeneous chemical reactions occurring on the irradiated surface, which lead to the formation of dense oxide films deposited on it. Such technology has many applications like color-laser marking technology and laser recording on thin metal films for creation of diffractive optical elements . Under the conditions of strong laser ablation, another oxidation mechanism becomes possible: evaporated atoms react with oxygen in a surrounding atmosphere and the products of such reaction are redeposited back onto the substrate. The chemical and phase composition of such deposited layer, its density, morphology and structure depend on the conditions of laser ablation. By varying these conditions, the main properties of such coating can be controlled that is important for some potential application (for example in biomedicine).
In our report we present the study of the processes of redeposition of oxides structure under the conditions of multipulse nanosecond laser ablation of titanium (Grade 2) in air atmosphere at normal conditions. Our experiments show that titanium-implants with such deposited oxide layer have increased biocompatibility.
Modelling of chemical reaction in laser-induced plasma coupled with experimental methods of plasma optical emission spectroscopy allows us to determine the types of main chemical reactions in laser plasma as well as it influences on the plume dynamics and vapor condensation kinetics. As a result, we propose the general physical picture of reverse deposition of oxides structure under the condition of strong nanosecond laser ablation. The formation of the titanium oxide precipitate is explained not only by collisions in the plasma, but also by the chemical interaction of titanium and oxygen, which leads to the formation of а low pressure area near the substrate and additionally stimulates the reverse deposition of oxides. We expect, similar processes are valid not only for titanium but also for other metals and, possibly, semiconductors.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures and electron number density). Particular emphasis will be placed on laser induced plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, temporal and spatial resolution.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basis of plasma computer modeling will be presented.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basis of plasma computer modeling will be presented.
This course will provide an introduction to plasma diagnostic techniques. The major focus of the course will be on the discussions of the practical procedures as well as the underlying physical principles for the measurements of plasma fundamental characteristics (e.g., temperatures, thermodynamic properties, and electron number density). Particular emphasis will be placed on inductively coupled plasma–atomic emission spectrometry, but other analytical plasmas will also be used as examples when appropriate. Selected examples on how one can manipulate the operating conditions of the plasma source, based on the results of plasma diagnostic measurements, to improve its performance used for spectrochemical analysis will also be covered. Topics to be covered include thermal equilibrium, line profiles, temperatures, electron densities, excitation processes, microreactions, pump and probe diagnostics, tomography, temporal and spatial resolution. Basics of plasma computer modeling will be presented.
Laser metal deposition is a rapidly evolving method for additive manufacturing that combines high performance and simplified production routine. Quality of production depends on instrumental design and operational parameters that require constant control during the process. In this work, feasibility of using optical spectroscopy as a control method is studied via modeling and experimentally. A simplified thermal model is developed based on the time-dependent diffusion-conduction heat equation and geometrical light collection into detection optics. Intense light emitted by a laser-heated spot moving across a sample surface is collected and processed to yield the temperature and other temperature-related parameters. In a presence of surface defects the temperature field is distorted in a specific manner that depends on a shape and size of the defect. Optical signals produced by such the distorted temperature fields are simulated and verified experimentally using a 3D metal printer and a sample with artificially carved defects. Three quantities are tested as possible metrics for process monitoring: temperature, integral intensity, and correlation coefficient. The shapes of the simulated signals qualitatively agree with the experimental signals; this allows a cautious inference that optical spectroscopy is capable of detecting a defect and, possibly, predicting its character, e.g. inner or protruding.
Laser metal deposition is a rapidly evolving method for additive manufacturing that combines high performance and simplified production routine. Quality of production depends on an instrumental design and operational parameters, which require constant control during the process. In this work, feasibility of using optical spectroscopy as a control method is studied via modeling and experimentally. A simplified thermal model is developed based on the time-dependent diffusion-conduction heat equation and geometrical light collection into detection optics. Intense light emitted by a laser-heated spot moving across a sample surface is collected and processed to yield the temperature and other temperature-related parameters. In the presence of surface defects, the temperature field is distorted in a specific manner that depends on shape and size of the defect. Optical signals produced by such the distorted temperature fields are simulated and verified experimentally using a 3D metal printer and a sample with artificially carved defects. Three quantities are tested as possible metrics for monitoring the process: temperature, integral intensity, and correlation coefficient. The shapes of the simulated signals qualitatively agree with the experimental signals; this allows for a cautious inference that optical spectroscopy can detect surface defects and, possibly, predict their characters, e.g., inner or protruding.
In this presentation, I will give a brief overview of my personal experience with laser induced plasma (LIP). I will start from my and colleagues’ early works, where we used LIP as an atomic reservoir for laser induced fluorescence (LIP). We applied LIP-LIF for a sensitive detection of trace elements in various materials and demonstrated that under certain conditions the technique can even be used for isotope analysis. Next, I will discuss the application of LIP spectroscopy, i.e., LIBS, to material identification that nowadays constitutes one of the best applications of this technique. In those early days, we used correlation analysis for spectra processing; it is now replaced by more powerful chemometric methods. Further, I will stop on our efforts in modeling LIP that we first intended for the improved quality of spectroscopic analysis and later extended to non-spectroscopic fields such as chemical vapor deposition and surface structuring. We developed a version of calibration-free LIBS, in which we iterated model-generated spectra until a close match was achieved between experimental and synthetic spectra to determine concentrations. Next, I will briefly overview our recent developments in plasma modeling that include plasma chemistry. This was important in view of widening application of LIBS as a molecular technique. I will also address several plasma diagnostics, e.g., Radon transform tomography that we developed to get more insight about LIP that was helpful for both analytic spectroscopy and modeling. Finally, I will mention several exotic applications of LIP such as LIP-based lasers and chemical reactors to illustrate a real multifaceted character of laser induced plasma and usefulness of its study for many science fields.
Formation and detection of molecules in laser induced plasmas (LIP) is a hot topic. In analytical plasmas like LIBS, the detection of molecules is important for identification of geological and other materials, analysis of isotopes and difficult elements (Cl, F, etc.) via molecular emission. In chemical plasmas, like PECVD (plasma enhanced chemical vapor deposition) or PLD (pulsed laser deposition), molecules formed in the plasma determine a composition and a thickness of deposits. Similarly, molecules play an important role in microstructuring and oxidizing metal surfaces by laser ablation. It is unfortunate that different communities, which utilize plasma methods and seek for solutions of similar problems, do not strongly overlap, and do not fully use knowledge accumulated by each other.
In this presentation, mechanisms of formation of molecules will be analyzed on the example of LIPs used for chemical vapor deposition and metal microstructuring. Theoretical analysis includes equilibrium chemistry calculations combined with plasma hydrodynamics. First, LIP excited in a gas mixture of BCl3 or BF3 with H2 or CH4 will be analyzed; this chemical system is used for obtaining deposits of refractory solid boron and boron carbide. Second, a breakdown in the SiF4 + SiCl4 gas mixtures will be described; this method allows synthesis of fluorochlorosilanes SiFxCl4-x (x = 1, 2, 3), the good etching agents (Figure). Third, solid ablation of Mo in BF3+H2 and Ti in air will be considered aimed at obtaining deposits of high hardness MoxBy and films of TixOy on textured Ti surfaces, correspondingly.
In experiment, reaction gases before and after laser illumination, and solid deposits are analyzed by optical emission spectroscopy (OES), IR and mass spectrometry (MS), SEM, X-ray, and AFM. It will be shown that the hydrodynamic-chemical model adequately predicts the composition of LIPs, zones of molecular formation, dependence on reactant stoichiometry, plasma temperature and pressure.