6.1 Oberflächen- und Dünnschichtanalyse
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The presentation demonstrates an application of multi-scale optical imaging methods such as spectroscopic imaging ellipsometry and white light interference microscopy for the investigation of wide-bandgap semiconductors for power electronics. The capabilities of these methods for the development of new reference calibration samples for scanning microwave microscopes (SMM) and conductive atomic force microscopes (C AFM) are discussed.
Dr Martin Seah, NPL, was the initiator, founder, and first chairman of the Surface Analysis Working Group (SAWG) at the Consultative Committee for Amount of Substance, Metrology in Chemistry and Biology (CCQM) at the Bureau International des Poids et Mesures (BIPM), the international organization established by the Metre Convention. This tribute letter summarizes his achievements during his chairmanship and his long-running impact on the successful work of the group after his retirement.
This presentation is structured in two parts: i) Hybrid metrology by combining SEM with AFM (N. Feltin) and ii) hybridization and corelative microscopy by SEM, STEM-in-SEM, TEM, EDS, Auger Electron Microscopy, TKD and more (D. Hodoroaba).
The first part is focused on the metrological part of the hybrid measurement SEM-AFM, the second part offers some further possibilities of correlative microscopy of nanoparticles based on practical examples.
The status of standardization related to x-ray photoelectron spectroscopy (XPS, ESCA) at ASTM International (Subcommittee E42.03) and ISO (TC 201) is presented and commented upon in a structured manner. The survey also identifies other active bodies, here VAMAS Technical Working Area 2 and the Surface Analysis Working Group at the International Meter Convention, contributing to prestandardization Research and metrology of XPS and reports their specific activities. It is concluded that existing standardization is delivering good practices in the use of XPS and has a high potential to avoid the recently observed erroneous use, misapplications, and misinterpretation by new and inexperienced users of the method—which seems to be the main reason for the “reproducibility crisis” in the field of XPS applications. A need for a more proactive publicizing of international documentary standards by experienced XPS users, specifically those who are involved in standardization, is identified. Because the existing portfolio of standards addressing the use of XPS is not complete, future standardization projects planned or already ongoing are mentioned. The way the standardization bodies are identifying future needs is shortly explained.
The SAWG was established as an ad-hoc working group in 2003 before being established as a permanent working group. The first comparison was in 2007. Dr Unger recalled the terms of reference for the group, which paralleled those of the CCQM itself, with a focus on spatially resolved chemical surface analysis at the micro- and nano-scale. The group also had a remit to act as a forum for exchange of information on research and development of surface analysis, establish contact with relevant stakeholders and promote the development of SI traceable chemical surface measurements. The group currently had participants from 18 institutes, although five had not sent participants to recent meetings.
Reporting progress on studies, Dr Unger said that P-190CCQM-K-157 (measurement of HfO2 in thin film) had been completed, and the subsequent K-157 approved is ongoing and that for CCQM-K153 (Measurement of Specific Adsorption of N2 and Kr on nonporous SiO2 at liquid nitrogen temperature by BET) was at the draft B was completed stageand distributed to CCQM WG chairpersons for approval.
Dr Unger reported that CCQM-K-153 had covered measurement of specific absorption of nitrogen or krypton on nonporous silica at liquid nitrogen [ambient] temperature. This included an application of the BET method, a standard method for determination of surface area. This fitted into the ‘nonporous’ region of the SAWG measurement space, which included microporous, mesoporous and microporous regions. Of these regions, CCQM-K136 and CCQM-K153 demonstrated capability in meso- and microporous media respectively. CCQM-K153 involved two measurands; amount of absorbed gas at liquid nitrogen temperature, expressed as specific absorption, and the BET surface area. Specific absorption could in principle be traceable to the SI; BET was operationally defined. Five institutes participated. A detailed uncertainty budget was available for both measurands. Results had been excellent, with all laboratories agreeing well within their uncertainties and all in agreement with the reference value.
Reporting on CCQM P190, Dr Unger described the study objective measurand (amount of substance of HfO2 in a thin film), samples and methods. After showing transmission electron microscope images obtained in the study, he briefly reviewed the conclusions. The study identified a need to handle carbon contamination, harmonise the XPS measurement protocol, determine emission angle and identify a consensus value for attenuation length. These conclusions had informed the design of the proposed ongoing K157 study approved at the 24th Meeting of te CCQM.
The group planned a number of comparisons for the next three years:
2019: A pilot study on the amount of substance in a thin organic layer (previously approved).
2020: CCQMK-157, Measurement of the amount of substance of HfO2; A Key comparison on specific gas adsorption on microporous samples and a Pilot study on Homogeneous surface composition of an ionic liquid.
2021: A key comparison measuring the amount of substance in a thin organic layer.
Dr Unger additionally described a recently proposed pilot study to examine chemical composition in a deep nanoscale layer. This was important for the electronics industry. Four participants had expressed interest. The measurand will be the amount of Ir(ppy)2(acac) in a thin organic layer within an organic layer stack on a silicon substrate. He also reported that SAWG had started work on characterisation of graphene material grown by chemical vapour decomposition (CVD). The work would examine coverage on the substrate, number of layers, level of disorder, uncertainty budgets associated with the measurement, and data analysis. A link to VAMAS Technical Work Area 41 “Graphene and Related 2D Materials“ would also be established.
Looking forward, Dr Unger said the group had established a task group on application of Raman spectroscopy. This had important applications but was currently seen as qualitative. He presented the terms of reference for the task group for approval by the CCQM.
Dr Unger reviewed the SAWG activities that have progressed the state of the art in measurement science. He listed the past and ongoing comparisons that had addressed new and challenging measurement problems, and drew attention to a number of key publications in surface analysis. He additionally described stakeholder engagement activities, including collaboration with VAMAS, input to ISO TC 201, contributions to Euramet projects, and contributions to two recent stakeholder workshops.
Following the 2017 meeting, progress with the Key Comparison CCQM-K153 related to the BET specific surface lead by UNIIM and the Pilot Study P-190 “Thickness Measurement of nm HfO2 Films” lead by KRISS will be discussed.
The 16th meeting of SAWG will focus on
•survey on CMC claims submitted with reference to K-129 and K-136.
•the overall and SAWG specific aspects of the CCQM Strategy process,
•a consideration of comparisons on convention methods as recommended by the CCQM Plenary Meeting 2017,
•the 2019 CCQM Workshop and paper(s) for Metrologia’s Special Issue,
•discussion of future comparisons.