6 Materialchemie
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The paper addresses the “Functional coatings for mechanical applications: characterization and standardization” and the following points are discussed in more detail:
1. Mechanic alapplications (coatings for tools and components, system features vs. material parameters)
2. Mechanical characterization (instrumented indentation testing (IIT), centrifugal adhesion testing (CAT), state of standardization)
3. Topometric characterization (white light interference microscopy (WLIM, 3D), mechanical stylus (MS, 2D), state of standardization)
4. Optical characterization (spectroscopic ellipsometry (SE), inter-laboratory comparison, state of standardization)
The European legislation has responded to the wide use of nanomaterials in our daily life and defined the term “nanoform” in the Annexes to the REACH (Registration, Evaluation, Authorization of Chemicals) Regulation. Now specific information of the nanomaterials is required from the companies when registering the appropriate materials in a dossier.
In the context of REACH eleven physicochemical properties were considered as relevant, of which the following six are essential for registration of nanoforms (priority properties): chemical composition, crystallinity, particle size, particle shape, chemical nature of the surface (“surface chemistry”), and specific surface area (SSA). A key role is the reliable, reproduceable and traceable character of the data of these priority properties.
In this context, we want to discuss which ‘analytical’ information is exactly required to fulfill these conditions. Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and X-ray Photoelectron Spectroscopy (XPS) were chosen as the most popular surface analytical methods. Both methods allow a detailed understanding of the surface chemistry with an information depth below ten nanometers. As a rather bulk method for the analysis of nanoforms, Electron Probe Microanalysis (EPMA) in the version with energy dispersive X-ray spectroscopy (EDS) is considered for the quick identification of the main chemical elements present in the sample. Furthermore, Scanning Electron Microscopy (SEM) results are discussed which provide results on particle size and shape. Thus, four of the six priority properties can be obtained with these methods.
The Scope of the Workshop was to provide a forum for discussion on progress in development, characterisation and application of reference nanomaterials. Results of recently finsihed national and international research projects have been presented. Moreover, the need for future developments have been addressed.
Attendees of teh Workshop were expected to be experts from academia, research institutes, regulatory bodies and industry working or interested in the area of reference nanomaterials.
The following structure of Workshop was planned: the main focus of the first day was on reference material needs and development, while teh second day was focussed on reference materials characterisation and standardisation.
Over 111 participants frm 13 countries and teh European Joint Research Centre have regsitered for the Workshop with 16 platform presentations and 42 poster contributions grouped in 2 sessions and 10 topical areas.
A summary of the observations, analysis and conclusions of the Workshop is made including an overview table of links to information on existing reference nanomaterials.
Ellipsometry is well known as a highly sensitive and reproducible surface analysis technique. However, in a context of metrological applications, the most important property of a measurement process is accuracy, relying on statistical precision, (reproducibility) and trueness (in an absolute sense versus a given standard). The latter is much more difficult to achieve. In this presentation, we discuss the possibility of establishing ellipsometry in a diverse metrological landscape by means of defining standard procedures and best practice methodologies for the measurement and for calibration purposes. The most important task of this approach is to determine the model-inherent uncertainty, originating from parameter coupling. We achieve this by means of sensitivity analysis of the parameters resulting from the fit process. We discuss the definition of reference materials by which accuracy can be made available for ellipsometry, passed along between ellipsometry laboratories and for other measurement techniques. The determination of uncertainty is presented in this work for a number of examples involving difficult analysis models employed for samples from different production environments. We present a standardization initiative with the goal to disseminate this work into an international standard alongside an inter-laboratory study comparing the results for complex samples gained by laboratories with different instrumentation. We also present the results gained within EURAMET projects focused on the metrology of materials with strong non-idealities used in photovoltaics and other energy technology.
The overall objective of project Improved traceability chain of nanoparticle size measurements is to improve the traceability chain for nanoparticle size measurements. The main impact will be achieved by manifold contributions to standard documents for CEN/TC 352 “Nanotechnologies”, which directly addresses the research needs of CEN, CENELEC and ETSI mandated by EC to develop standards for methods and reference materials to accurately measure the size and size distribution of nanoparticles. This will take place in collaboration with ISO/TC229 ‘Nanotechnologies’, ISO/TC24/SC4 ‘Particle characterization’ and ISO/TC201 ‘Surface analysis’/ SC9 ‘Scanning probe microscopy’.
The talk addresses the STANDARDIZATION OF ELLIPSOMETRY and the following points are discussed in more detail: historical background of ellipsometry, history of International Conferences on Ellipsometry, Workshops Ellipsometry in Germany and Europe, information on German/European Working Group Ellipsometry, technical/industrial importance of ellipsometry, applications on non-ideal material systems and standardization activities on ellipsometry.