Filtern
Dokumenttyp
- Zeitschriftenartikel (2) (entfernen)
Sprache
- Englisch (2)
Referierte Publikation
- ja (2)
Schlagworte
- Synchrotron radiation (2)
- EDXRF (1)
- Interfacial charge (1)
- Material analysis (1)
- Micro analysis (1)
- Solid/liquid interfaces (1)
- Standing waves (1)
- Streaming current (1)
- Surface analysis (1)
- Surface functionalization (1)
Synchrotron radiation (SR) has been used in recent years as an excellent excitation source for X-ray fluorescence spectrometry. SR offers, in contrast to conventional X-ray sources, highly brilliant polychromatic, polarized radiation with which micro-domain X-ray fluorescence spectrometry becomes possible. A feasibility study of utility, conducted at BESSY (Berlin) and at DELTA (Dortmund), both synchrotron facilities of the third generation, to evaluate the use of wavelength dispersive X-ray fluorescence spectrometry in combination with synchrotron radiation is presented. First results for material analysis, obtained by combining the synchrotron radiation and a commercially available spectrometer commonly attached to a scanning electron microscope, are presented. The spectrometer, of the linear type, uses curved focusing Bragg-crystals of the Johann type which leads to a high spectral resolution up to 3 eV. Examples of micro-domain analyses are presented and compared with those obtained by synchrotron radiation induced energy dispersive X-ray fluorescence.
Measurements of ion distributions at a charged solid–liquid interface using X-ray standing waves (XSW) are presented. High energy synchrotron radiation (17.48 keV) is used to produce an XSW pattern inside a thin water film on a silicon wafer. The liquid phase is an aqueous solution containing Br and Rb ions. The surface charge is adjusted by titration. Measurements are performed over a pH range from 2.2–9, using the native Si oxide layer and functional (amine) groups as surface charge. The Debye length, indicating the extension of the diffuse layer, could be measured with values varying between 1–4 nm. For functionalized wafers, the pH dependent change from attraction to repulsion of an ion species could be detected, indicating the isoelectric point. In combination with the measurement of the streaming current, the surface charge of the sample could be quantified.