Open Access

Organosilanes are used routinely to functionalize various support materials for further modifications. Nevertheless, reliable quantitative information about surface functional group densities after layer formation is rarely available. Here, we present the analysis of thin organic nanolayers made from nitrogen containing silane molecules on naturally oxidized silicon wafers with reference-free total reflection X-ray fluorescence (TXRF) and X-ray photoelectron spectroscopy (XPS). An areic density of 2−4 silane molecules per nm2 was calculated from the layer’s nitrogen mass deposition per area unit obtained by reference-free TXRF. Complementary energy and angle-resolved XPS (ER/ARXPS) in the Si 2p core-level region was used to analyze the outermost surface region of the organic (silane layer)−inorganic (silicon wafer) interface. Different coexisting silicon species as silicon, native silicon oxide, and silane were identified and quantified. As a result of the presented proof-of-concept, absolute and traceable values for the areic density of silanes containing nitrogen as intrinsic marker are obtained by calibration of the XPS methods with reference-free TXRF. Furthermore, ER/AR-XPS is shown to facilitate the determination of areic densities in (mono)layers made from silanes having no heteroatomic marker other than silicon. After calibration with reference-free TXRF, these areic densities of silane molecules can be determined when using the XPS component intensity of the silane’s silicon atom.

The analysis of chemical and elemental in-depth variations in ultra-thin organic layers with thicknesses below 5 nm is very challenging. Energy- and angle-resolved XPS (ER/AR-XPS) opens up the possibility for non-destructive chemical ultra-shallow depth profiling of the outermost surface layer of ultra-thin organic films due to its exceptional surface sensitivity. For common organic materials a reliable chemical in-depth analysis with a lower limit of the XPS information depth z95 of about 1 nm can be performed. As a proof-of-principle example with relevance for industrial applications the ER/AR-XPS analysis of different organic monolayers made of amino- or benzamidosilane molecules on silicon oxide surfaces is presented. It is demonstrated how to use the Si 2p core-level region to non-destructively depth-profile the organic (silane monolayer) – inorganic (SiO2/Si) interface and how to quantify Si species, ranging from elemental silicon over native silicon oxide to the silane itself. The main advantage of the applied ER/AR-XPS method is the improved specification of organic from inorganic silicon components in Si 2p core-level spectra with exceptional low uncertainties compared to conventional laboratory XPS.

In this study, epoxy-terminated silicon oxide surfaces were chemically derivatized with trifluoroacetic anhydride (TFAA) and 4-(trifluoromethyl)-benzylamine (TFMBA) and analyzed by X-ray photoelectron spectroscopy, near-edge X-ray absorption fine structure spectroscopy and water contact angle measurements. TFAA was used for quantitative derivatization to determine the amount of reactive epoxy groups on these surfaces. Furthermore, epoxy-terminated surfaces were derivatized with TFMBA (a model compound for biomolecules with an amino linker) yielding secondary amines because of formation of covalent C–N bonds between TFMBA and the epoxy films. Fluorine being part of TFAA and TFMBA composition was used to follow the progress of the chemical derivatization reaction. Both derivatization agents – TFAA and TFMBA – gave comparable reaction yields of ~60% on epoxy silicon surfaces, whereas on epoxy glass slides, the derivatization yields were considerably lower (30–40%).The protocol for attachment of TFMBA (model compound) on epoxy-modified surfaces was adapted to (bio)molecules with an amino linker, e.g. carbohydrates to prepare carbohydrate-functionalized biointerfaces.

In this study, a new direct functionalization method of silicon nitride (Si3N4) using azidation and click chemistry is presented. First, amino groups (NHx) were created on a Si3N4 substrate by fluoride etching. These NHx-terminated Si3N4 surfaces were analyzed by chemical derivatization X-ray photoelectron spectroscopy (CD-XPS) with 4-trifluoromethylbenzaldehyde (TFBA) and a derivatization yield of 20% was concluded. In the second step freshly prepared NHx surfaces were transformed into azides which were used immediately in a click reaction with halogenated alkynes. The presented combination of amination, azidation and click reaction is a promising alternative for common silane-based Si3N4 functionalization methods.

ISO/TR 19693:2018—Surface chemical analysis—Characterization of functional glass substrates for biosensing applications gives an overview of methods, strategies, and guidance to identify possible sources of problems related to substrates, device production steps (cleaning, activation, and chemical modification), and shelf life (storage conditions and aging). It is particularly relevant for surface chemical analysts characterizing glass‐based biosensors, and developers or quality managers in the biosensing device production community. Based on quantitative and qualitative surface chemical analysis, strategies for identifying the cause of poor Performance during device manufacturing can be developed and implemented. A review of measurement capabilities of surface analytical methods is given to assist readers from the biosensing community.