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A layer of Sb atoms, implanted with an energy of 400 keV and a nominal dose of 5×1016 atoms/cm2 into a high purity silicon wafer, was certified for its areal density (atoms/cm2) using Rutherford backscattering spectrometry (RBS), instrumental neutron activation analysis (INAA) and inductively coupled plasma isotope dilution mass spectrometry (ICP-IDMS) and for its isotope ratio using INAA and ICP-IDMS. Excellent agreement between the results of the different independent methods was found. In the present work, the measurements of the homogeneity of the areal density of Sb, previously determined with RBS in spots having 1 mm diameter, are improved with synchrotron X-ray fluorescence analysis: Higher precision in even smaller sample spots allows to estimate a reduced inhomogeneity of the whole batch of samples of the order of only 0.4%. Thus the uncertainty of the certified value can further be reduced. Down to fractions of a chip with 0.3×0.4 mm2 area, the areal density is now certified as (4.81±0.06)×1016 Sb atoms/cm2, where the expanded uncertainty 0.06 (coverage factor k=2) corresponds to only 1.2%. The relative merits of the different analytical methods are discussed.
Electron probe microanalysis (EPMA) measurement of thin-film thickness in the nanometre range
(2002)
The thickness of thin films of platinum and nickel on fused silica and silicon substrates has been determined by EPMA using the commercial software STRATAGEM for calculation of film thickness. Film thickness ranged in the order 10 nm. An attempt was made to estimate the confidence range of the method by comparison with results from other methods of analysis. The data show that in addition to the uncertainty of the spectral intensity measurement and the complicated fitting routine, systematic deviation caused by the underlying model should be added. The scattering in the results from other methods does not enable specification of a range of uncertainty, but deviations from the real thickness are estimated to be less than 20%.
This Report describes the certification of the reference material antimony implanted in Si/SiO2 intended to be used for calibration of surface and near surface analytical methods. It describes the preparation, homogeneity measurements and the analytical work performed for the certification of both Areal density of antimony Atoms (retained dose) and the isotope amount Ratio as well as giving considerations on the stability of the material.
Pilot studies have been carried out at the BAMline at BESSY II in collaboration with the Bundesanstalt
für Materialforschung und -prüfung (BAM) on metal- and metalloid-containing compounds in biological
samples after electrophoretic protein separation. After sodium dodecylsulfate polyacrylamide gel
electrophoresis (SDS-PAGE) and transfer onto a blotting membrane the distribution of selenium among
the proteins of testis homogenate of a rat and a wallaby was determined. The comparison with the
autoradiogram of 75Se-labeled proteins separated in the same way showed that of nine seleniumcontaining
proteins found in rat testis homogenate by autoradiography four could be detected by
synchrotron radiation X-ray fluorescence analysis (SRXRF).
Orientierende Versuche zur Schwefelbestimmung in Kraftstoffen haben gezeigt, dass die Röntgenbeamline der BAM bei BESSY II geeignet ist, Schwefel auch in kleinen Konzentrationen zu bestimmen. Da das Verfahren der synchrotronstrahlungsinduzierten Röntgenfluoreszenzanalyse (SYRFA) für den Vor-Ort-Einsatz nicht geeignet ist, ist das Ziel der Untersuchungen, durch Variation von Anregungsenergie und -geometrie mögliche Quellen für systematische Fehler zu untersuchen. Durch geeignete Korrekturfaktoren kann dann die Richtigkeit der Analyseergebnisse gewährleistet werden. Das Verfahren soll dann als Alternative bzw. Ergänzung zu zerstörenden Verfahren der Schwefelanalyse Anwendung finden. Damit wird ein Beitrag zur künftigen Herstellung zertifizierter Referenzmaterialien (ZRM) geleistet.