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Paper des Monats
- ja (3)
Damage experiments of absorbing filters (Schott BG18 and BG36) were performed with Ti:sapphire laser pulses with durations from 30 fs to 340 fs (800 nm, 1 kHz) in air. The direct focusing technique was employed under single- and multi-pulse irradiation conditions. Ablation threshold fluences were determined from a semi-logarithmic plot of the ablation crater diameter vs. laser fluence. The damage threshold fluence decreases for shorter pulse durations. In the investigated pulse duration range, the measured multi-pulse ablation threshold fluences are practically similar to those of undoped glass material (~1 Jcm-2). That means that the multi-pulse ablation threshold is independent on the doping level of the filters. For more than 100 pulses per spot and all pulse durations applied, the threshold fluence saturates. This leads to technically relevant damage threshold values in the femtosecond laser pulse duration domain.
Zusammenfassung
The surface chemical modification of polyurethane (PU) films was performed by an UV laser-induced chemical reaction in a polysaccharide solution. This process may be applicable as hydrophilic packaging of implantable medical devices and in vivo sensors. When a PU film in contact with an aqueous alginic acid (AAC) solution was irradiated with a XeCl laser, the PU film turned hydrophilic. Contact angles of water on the film were reduced from 110° to 60°. Since light absorption of the AAC solution at 308 nm was negligibly small, reactive sites were generated solely on the PU surface. There, AAC could be immobilized by chemical bonds thus allowing for a nanometer-scaled grafting of this biomolecule. The mechanism was investigated by surface analyses with Fourier-transform infrared spectroscopy (FT-IR), dye staining, ultraviolet-visible (UV-VIS) spectroscopy, and scanning electron microscopy (SEM) techniques. A one-photon photochemical process could beidentified.
Femtosecond-pulse laser ablation of dental hydroxyapatite and single-crystalline fluoroapatite
(1999)
Laser microdrilling of healthy human enamel and dentine using 300 fs pulses at a wavelength of 615 nm and 3 Hz repetition rate leads to an enhanced structuring quality in comparison with nanosecond-laser results. Microcracking and damage to neighboring tissue can be reduced. Ablation threshold fluences for 100 laser pulses of 0.3 J cm-2 (human dentine), 0.6 J cm-2 (human enamel) and 0.8 J cm-2 (single crystalline fluoroapatite) could be determined. Ablation depths per pulse below 1 7m were observed.
Structuring of dielectric and metallic materials with ultrashort laser pulses between 20 fs and 3 ps
(1997)
Laser-micromachining of barium aluminum borosilicate glass, fused silica and stainless steel has been extended down to a pulse duration of 20 fs generated by a Ti:sapphire laser system at a wavelength of 0.8 micrometer. A systematic study shows that, below 100 fs, an enhanced precision and a substantial decrease of the ablation threshold fluence in comparison to pulse laser processing with pulses in the picosecond and nanosecond range could be achieved. The physical mechanism and the technical relevance of this novel microtechnology is discussed.
Zusammenfassung
Laser pulses in the 10-fs domain provide a quality of micromachining of fused silica and borosilicate glass that is unobtainable with longer pulses in the range of several 100 femtoseconds up to picoseconds. The shortening of the pulses reduces the statistical behavior of the material removal and the ablation process thus attains a more deterministic and reproducible character. The improved reproducibility of ablation is accompanied by significantly smoother morphology. This offers the potential for lateral and vertical machining precision of the order of 100 nm and 10 nm, respectively.
Zusammenfassung
The threshold fluences for laser-induced damage of fused silica with single 5-fs pulses from a Ti:sapphire laser system were determined by extrapolating the ablated volume to zero. These thresholds are about 4 times as high as the values previously obtained from multi-shot experiments. This result is interpreted in terms of an irreversible modification of the original material below the single-shot threshold (incubation).
Ablation experiments in several glasses with single and multishot irradiation by laser pulses in the 10-fs pulse duration domain are presented; physical and technological implications are discussed. We demonstrate that these short pulses offer the potential for lateral and vertical machining precision of the order of 100 nm.
Abstract Femtosecond laser micromachining has excited vivid attention in various industri-
al fields and in medicine owing to the advantages of ultrashort laser pulses compared to
long-pulse treatment.These are mainly the reduction of the laser fluence needed to induce
ablation and the improvement of the contour sharpness of the laser-generated structures.
Recently,special attention was paid to femtosecond laser experiments on nonabsorbing in-
organic dielectrics.This is due to the fact that optical damage in dielectric optical elements
limits the performance of high-power laser systems.Despite the fact that a large variety of
organic polymers can be machined with excimer lasers successfully,the involvement of
thermal processes can lead to an unsatisfactory quality of the structures.Ultrashort,fs-laser
pulses might be an alternative for the treatment of polymers.Therefore,femtosecond laser
machining investigations of dielectrics and polymers are reviewed in this paper.Similarities
and differences of the ablation behavior of both material classes are discussed.The influ-
ence of the bandgap on the ablation threshold in dependence on the pulse duration,the en-
hancement of the machining precision with a shortening of the pulse duration,incubation
phenomena,and morphological features appearing on the surface after femtosecond laser
treatment are mentioned.Possible applications,e.g.,in medicine and biosensors,are de-
scribed.
A first investigation on the ablation of composite materials like carbon and silicon-carbide reinforced alumo- and borosilicate glasses by 300 fs laser pulses (620 nm) in comparison to experiments with 17 ns pulse excimer laser (308 nm) treatment is presented. In all composites, femtosecond laser scans with a fluence of less than 2 J cm-2 produce well defined cuts with smooth side walls in contrast to the nanosecond laser result where extremely incongruent ablation is observed. Visible lasers should not be applicable because SiC and the glasses are practically transparent. Visible subpicosecond pulses of high intensity in the TW cm-2 range allow multi-photon absorption accompanied by incubation phenomena. The morphology of the groove edges reveal the contrasting ablation thresholds and rates of the fibre and glass materials. The ablation thresholds of the transparent components, i.e. the glass matrices and SiC, are about one order of magnitude greater than that of carbon which is ~ 0.15 J cm-2. Incubation effects are important for the absorption mechanisms in the transparent materials. When a critical number of pulses has not been reached at the SiC-glass composites, only the glass is preferentially ablated, and the fibres remain intact. This is in contrast to the C-glass composites where the ablation behaviour is opposite.
High-power lasers in industrial and R & D applications raise the general problem of reliability and degradation of optical components. A systematic study of nonlinear interaction of various transparent dielectric materials as e.g. glasses, fused silica, and polymers, with laser-pulses in the intensity range of up to 1013 W cm-2 is presented. On the other hand, femtosecond-pulse laser processing in the visible spectral range (300 fs; 620 nm, ~ 2 eV) allows precise microstructuring of transparent dielectrics without disruption of the remnant material. Damage and ablation threshold fluences occur above 1.2 J cm-2 at both silicate glasses and fused silica. Two different photon absorption mechanisms have been observed. The first occurs during the initial laser pulses in the incubation range. There, multiphoton absorption results in moderate energy volume densities. These are sufficient to generate morphological changes and optically active defect sites (colour centres) which provide a much higher absorptivity relevant for the second mechanism. It results in gasification without participation of melt.
Single- and multi-shot ablation thresholds of gold films in the thickness range of 311400 nm were determined employing a Ti:sapphire laser delivering pulses of 28 fs duration, 793 nm center wavelength at 1 kHz repetition rate. The gold layers were deposited on BK7 glass by an electron beam evaporation process and characterized by atomic force microscopy and ellipsometry. A linear dependence of the ablation threshold fluence Fth on the layer thickness d was found for d ≤ 180 nm. If a film thickness of about 180 nm was reached, the damage threshold remained constant at its bulk value. For different numbers of pulses per spot (N-on-1), bulk damage thresholds of ~0.7 J cm-2 (1-on-1), 0.5 J cm-2 (10-on-1), 0.4 J cm-2 (100-on-1), 0.25 J cm-2 (1000-on-1), and 0.2 J cm-2 (10000-on-1) were obtained experimentally indicating an incubation behavior. A characteristic layer thickness of Lc 180 nm can be defined which is a measure for the heat penetration depth within the electron gas before electronphonon relaxation occurs. Lc is by more than an order of magnitude larger than the optical absorption length of α-1 12 nm at 793 nm wavelength.
Physical and chemical phenomena resulting from irradiation of silicon and indium phosphide with ultrashort laser pulses (~100fs) were investigated
with respect to the difference between single- and multiple-pulse treatment. In the single-pulse case, several processes were identified: modification,
recrystallization and ablation. All processes exhibit a distinct treshold behaviour. A two photon-absorption coefficient can be determined from a single
spatial ablation profile. Accumulation effects were observed for multi-pulse illumination. Different morphological features like bubbles, rippels and
microcolumns were found.
Summary form only given. Machining investigations of crystalline silicon have been performed with laser pulses at a wavelength of 780 nm in the range between 5 fs and 400 fs. Applying 100 pulses per spot, surface damage thresholds were determined by the measurement of the damage diameter. In this pulse duration regime, the threshold fluences were nearly constant. Single-pulse investigations with 5 fs pulses yielded a value of about 0.15 J cm-2 identical to the multi-pulse experiment. This is in contradiction to the behaviour of dielectrics where incubation effects alter the optical properties down to the 5 fs pulse regime. Employing laser pulses with a duration of 130 fs at a wavelength of 800 nm, single-pulse ablation thresholds of 0.23 J cm-2 and 0.16 J cm-2 were determined for Si and InP in air, respectively. The threshold fluence was calculated from the linear relation between the square of the diameters versus the logarithm of the laser fluences.
Laser-induced damage threshold (LIDT) testing of oxide and metal coatings with sub-30 fs pulses
(2007)
Laser-induzierte Zerstörung von optischen Komponenten bei Anwendung von Femtosekunden-Impulsen
(2008)
Mikromaterialbearbeitung mit ultrakurzen Laserimpulsen: Vorzüge, Probleme, Sicherheitsaspekte
(2005)
Cleaning of artifically soled paper using nanosecond, picosecond and femtosecond laser pulses
(2009)
Ultrashort pulse laser micromachining at repetition rates of several hundreds of kHz allows a cost-effective high precision manufacturing, which makes this method attractive for many industrial applications. Upon exceeding a critical laser intensity, hard X-ray radiation is generated as a side effect. Even if the emitted X-ray dose per laser pulse is low, for currently available high-repetition-rate laser systems the accumulated X-ray dose becomes significant and radiation safety must be considered. Influences of the processing parameters are discussed and radiation protection aspects will be outlined
The use of ultrashort laser pulses for material processing in air has many advantages. Due to the progressive development in the laser sector, average powers in the kW range with pulse repetition rates exceeding the MHz-level are available. The machining with high-intensity laser pulses can be accompanied by the generation of a near-surface electron plasma due to absorption and ionization of the material, a subsequent plasma heating by the laser pulse, and finally an interaction of “hot” plasma electrons with the workpiece leading to continuous and characteristic X-ray radiation. The amount of this unwanted X-ray radiation is determined by the laser parameters (pulse duration, intensity, wavelength, polarization), the workpiece (atomic number, surface preparation), and the laser process management (scanning or stationary regime, laser turning). The use of laser intensities above 10^13 W/cm^2 in combination with laser pulse repetition rates in the few 100 kHz-range can lead to X-ray dose rates exceeding the permitted X-ray limits for members of the public. Especially the materials tungsten and steel show significant X-ray emission. Recently, the current state of the art in the field of undesired generation of X-ray radiation during ultrashort pulse laser processing in air was reviewed. In this presentation, important aspects of the measured X-ray doses, X-ray spectra, and practical issues of radiation protection are discussed.
Ultrashort laser pulses have found their way into industrial material processing. They take advantage of the fact that moderate laser fluences can produce high quality material removal without significant thermal influence. The growing availability of powerful, highly repeating laser sources and an advanced laser beam control have favored these developments. However, the laser-matter interaction can be accompanied by the production of X-rays. Small doses per laser pulse can accumulate to significant dose rates at high laser pulse repetition rates which may exceed the permitted X-ray limits for human exposure. Consequently, a proper radiation shielding must be considered in laser material processing. The paper summarizes the current state of the art in the field of undesired generation of X-ray radiation during ultrashort pulse laser material processing in air.
Ultrakurzpuls-Lasertechnik ist heute der Schlüssel für eine Vielzahl von Anwendungen in der industriellen Lasermaterialbearbeitung. Beim Einsatz hoher Laser-Intensitäten kann allerdings unerwünschte Röntgenstrahlung erzeugt werden. Die Röntgendosis und Energieverteilung ist von Laser-, Material- und Prozessparametern abhängig. Es können Röntgendosen über den erlaubten Grenzwerten für die Exposition des Menschen erreicht werden.
For pulse laser materials processing often optical step index and gradient index multimode fibers with core diameters ranging from 100 to 600 μm are used. The design of a high power fiber transmission system must take into account limitations resulting from both surface and volume damage effects. Especially, breakdown at the fiber end faces and self-focusing in the fiber volume critically influence the fiber performance. At least operation charts are desirable to select the appropriate fiber type for given laser parameters.
In industry-relevant studies the influence of fiber core diameter and end face preparation on laser-induced (surface) damage thresholds (LIDT) was investigated for frequently used all-silica fiber types (manufacturer LEONI). Experiments on preform material (initial fiber material) and compact specimens (models of the cladding and coating material) accompanied the tests performed in accordance with the relevant LIDT standards ISO 11254-1 and ISO 11254-2 for 1-on-1 and S-on-1 illumination conditions, respectively. The relation beam diameter vs. LIDT was investigated for fused silica fibers and preforms. Additionally, the laser-induced (bulk) damage threshold of fused silica preform material F300 (manufacturer Heraeus) in dependence on external mechanical stress simulating fiber bending was measured. All experiments were performed with 10-ns laser pulses at 1064 and 532 nm wavelength with a Gaussian beam profile.
Die Verleihung des Deutschen Zukunftspreises an ein Team zum Thema "Ultrakurzpulslaser für die industrielle Massenfertigung - Produzieren mit Lichtblitzen" im Jahr 2013 belegt die industrielle Relevanz des Ultrakurzpulslasereinsatzes in der Materialbearbeitung. Zunehmend werden weitere Anwendungen z.B. in der Mess- und Medizintechnik erschlossen. Femtosekunden-Laserpulse weisen prinzipbedingt ein breites Spektrum auf und besitzen bereits bei moderaten Pulsenergien extreme Pulsspitzenleistungen, womit über „konventionelle“ Laserquellen hinausgehende Herausforderungen an den Laserschutz entstehen. Die in entsprechenden Laserschutzbrillen verwendeten Laserschutzfilter müssen eine große spektrale Absorptionsbandbreite aufweisen und dürfen nicht aufschalten, d.h. keine induzierte Transmission zeigen. Im Vortrag soll dargestellt werden, dass Laserschutzfilter auf Glasbasis, die über ein breites Absorptionsspektrum verfügen, einen ausreichenden Schutz gegenüber fs-Laserstrahlung bieten, wohingegen Laserschutzfilter auf Polymerbasis eine induzierte spektrale Transmission bei steigender Energiedichte aufweisen können, was zu einem drastischen Verlust der Schutzfunktion führt.
The influence of paper type and state of degradation on laser cleaning of artifically soiled paper
(2009)
Der Vortrag gibt einen Überblick zu aktuellen Projektaktivitäten im BAM-Fachbereich 6.4 Technologien mit Nanowerkstoffen. Der Einsatz von Femtosekunden-Laserpulsen zur Mikro- und Nanostrukturierung, für Prozessschritte in der Photovoltaik und zur Reinigung und Dekontamination von Oberflächen wird beschrieben. Darüber hinaus werden Laser-Zerstörschwellenmessungen erläutert.
A bottom-up approach to produce arrays of indium islands on a molybdenum layer on glass using 30-fs laser pulses at 790 nm wavelength is presented. These islands can serve as micro-sized precursors for indium compounds such as copper-indium-gallium-diselenide (CIGSe) used in photovoltaics. Molybdenum is the standard back contact material of CIGSe solar cells. Femtosecond laser ablation of glass and a subsequent deposition of a molybdenum film or direct laser processing of the molybdenum film both allow the preferential nucleation and growth of indium islands at the predefined locations in a following indium-based physical vapor deposition (PVD) process. A proper choice of laser and deposition parameters ensures the controlled growth of indium islands exclusively at the laser ablated spots. Based on a statistical analysis, these results are compared to the non-structured molybdenum surface, leading to randomly grown indium islands after PVD.
A promising technology in photovoltaics is based on micro-concentrator solar cells, where the photovoltaic active area is realized as an array of sub-millimeter sized thin-film solar cells. For copper-indium-gallium-diselenide (CIGSe), the solar cells can be arranged in the foci of a regular arrangement of micro-lenses to enhance their efficiency by light concentration, to allow a better heat dissipation and to save expensive raw material (indium). Different approaches to produce micro-sized precursors of CIGSe absorbers on molybdenum are presented using 30-fs laser pulses at 790 nm wavelength. On the one hand, a multi pulse surface structuring of the molybdenum or the underlying glass substrate and a subsequent physical vapor deposition (PVD) process were used for a site-selective aggregation of indium droplets. On the other hand, a single pulse laser-induced forward transfer (LIFT) was utilized to selectively deposit combined copper/indium/gallium precursor pixels on the molybdenum back contact of the solar cell. It was demonstrated that a postprocessing (selenization, isolation, contacting) of the laser-generated micro-sized precursors results in an array of working CIGSe solar cells with an efficiency of 2.8% for 1 sun illumination.
Decontamination of biocidal loaded wooden artworks
using femtosecond and nanosecond laser processing
(2017)
Until the end of the 1980s many wooden artworks underwent surface treatment by liquid preservatives, e.g. Hylotox-59. As a result, DDT (dichlorodiphenyltrichloroethane) crystal structures are formed on the wood surfaces by the "blooming" of chlorine compounds. In addition to an aesthetic disturbance, it is assumed that DDT represents a health risk. Even decades after applying, the toxins in the wood preservatives are still detectable. Contaminated waste wood with natural biocide ageing, gilded and wood carved elements of an old picture frame and wooden samples with paint layers were provided by the Schlossmuseum Sondershausen, Germany.
Laser cleaning of areas of some square millimeters on the surfaces of the objects was done by means of femtosecond and nanosecond laser pulses. For 30-fs laser pulses at 800 nm wavelength a line-wise meandering movement of the object under the focused beam was performed. 10-ns laser pulses at 1064 nm and 7-ns laser pulses at 532 nm wavelength were applied to the sample surface using a scanner. Before laser application, a chlorine measurement was done by X-ray fluorescence analysis (XRF) as reference. After laser processing, the XRF analysis was used again at the same surface position to determine chlorine depletion rates of up to 75% (30 fs, 800 nm), 70% (10 ns, 1064 nm), and 22% (7 ns, 532 nm). For the application of 30-fs laser pulses on waste wood, no crystalline DDT residues remain on the sample surface observed utilizing optical microscopy.
Um Kulturgüter aus organischen Substanzen zu bewahren, wurden besonders in den 70er und 80er Jahren Biozide, wie z.B. das flüssige Holzschutzmittel Hylotox-59, eingesetzt. Es enthält Dichlordiphenyltrichlorethan (DDT), das im Verdacht steht, krebsauslösend zu sein. Durch „Ausblühen“ der Chlorverbindungen entstehen an der Holzoberfläche Kristallstrukturen. Eine Entfernung dieser Kristalle und damit eine Abreicherung von Chlor an der Oberfläche sind sehr erwünscht.
Eine Laserreinigung von ausgewählten Teilen musealer Holzobjekte aus dem Schlossmuseum Sondershausen wurde mit Impulsdauern im Femto- und Nanosekundenbereich durchgeführt. Der Chlornachweis vor und nach dem Lasereinsatz wurde mittels Röntgenfluoreszenzanalytik (RFA) erbracht. Chlorabreicherungen von 55-70% und 75% wurden beim Einsatz von ns-Impulsen bei 1064 nm Wellenlänge bzw. fs-Impulsen bei 800 nm Wellenlänge erreicht. Im fs-Fall verblieben keine kristallinen DDT-Rückstände auf den Probenoberflächen.
A bottom-up approach is presented for the production of arrays of indium islands on a molybdenum layer on glass using 30-fs laser pulses at 790 nm wavelength. The indium islands can serve as micro-sized precursors for indium compounds such as copper-indium-gallium-diselenide (CIGSe) used in photovoltaics. Molybdenum is the standard back contact material of CIGSe solar cells. Femtosecond laser ablation of glass and a subsequent deposition of a molybdenum film or direct laser processing of the molybdenum film both allow the preferential nucleation and growth of indium islands at the predefined locations in a following indium-based physical vapor deposition (PVD) process. A proper choice of laser and deposition parameters ensures the controlled growth of indium islands exclusively at the laser ablated spots. Based on a statistical analysis, these results are compared to the non-structured molybdenum surface, leading to randomly grown indium islands after PVD.
The industrial use of ultrashort laser pulses has made considerable progress in recent years. The reasons for this lie in the availability of high average powers at pulse repetition rates in the several 100 kHz range. The advantages of using ultrashort laser pulses in terms of processing precision can thus be fully exploited. However, high laser intensities on the workpiece can also lead to the generation of unwanted X-rays. Even if the emitted X-ray dose per pulse is low, the accumulated X-ray dose can become significant for high-repetition-rate laser systems so that X-ray exposure safety limits must be considered. The X-ray emission during ultrashort pulse laser processing was investigated for a pulse duration of 925 fs at 1030 nm wavelength and 400 kHz repetition rate. Industrially relevant materials such as steel, aluminum and glass were treated. Tungsten served as reference. X-ray spectra were recorded, and X-ray dose measurements were performed for laser treatment in air. For laser intensities > 2 × 10^13 W/cm2, X-ray doses exceeding the regulatory exposure limits for members of the public were found. Suitable X-ray protection strategies are proposed.
Im Überblicksvortrag werden Untersuchungen zur Laser-Mikro- und Nanostrukturierung mit Femtosekunden-Laserimpulsen und ausgewählte Anwendungen, z.B. in der Photovoltaik und Biomedizin, vorgestellt. Aktuelle Fragestellungen zur sicheren Prozessführung, wie die mögliche Erzeugung von Röntgenstrahlung beim Laserbearbeitungsprozess und unerwünschte Partikelemissionen, werden aufgegriffen.
A promising technology in photovoltaics is based on micro-concentrator solar cells, where the photovoltaic active area is realized as an array of sub-millimeter sized thin-film solar cells. Different approaches to produce micro-sized precursors of CIGSe absorbers on molybdenum are presented using 30-fs laser pulses at 790 nm wavelength. On the one hand, a multi pulse surface structuring of the molybdenum or the underlying glass substrate and a subsequent physical vapor deposition (PVD) process were used for a site-selective aggregation of indium droplets. On the other hand, a single pulse laser-induced forward transfer (LIFT) was utilized to selectively deposit combined copper/indium/gallium precursor pixels on the molybdenum back contact of the solar cell. It was demonstrated that a postprocessing of the laser-generated micro-sized precursors results in an array of working CIGSe solar cells with an efficiency of 2.9% for 1 sun Illumination.
Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials
(2023)
Ultrashort laser pulses have become established in many industrial processes. Additionally, they are also an integral part of medical applications especially in ophthalmology and to some extent in dentistry. The availability of highly repetitive powerful laser sources and advanced laser beam control systems have favored these developments. However, the laser processing may be accompanied by the generation of unwanted X-rays. Small doses per laser pulse can accumulate to significant dose levels at high laser pulse repetition rates. Moreover, burst mode processing increases the X-ray dose rates compared to single pulse use and results in X-ray photon energies up to 40 keV for tungsten targets. For laser treatment of human teeth, clearly noticeable X-ray skin dose rates can be found. The paper summarizes the current state of the art in the field of undesired generation of X-ray radiation during ultrashort pulse laser processing in air.
Der Vortrag gibt einen Überblick zu ultrakurzen Laserpulsen, der Ultrakurzpulslaser-Materialbearbeitung und der dabei ggf. auftretenden unerwünschten Röntgenstrahlung. Es wird die Laserbearbeitung von technischen und biologischen Materialien diskutiert. Schutzmöglichkeiten gegenüber der Röntgenstrahlung werden erörtert.
Die Laserbearbeitung von Materialien mit ultrakurzen Laserpulsen kann zu einer sekundären Emission gefährlicher Röntgenstrahlen führen. Dieser Effekt wurde bisher bei der Bearbeitung von technischen Materialien wie Metallen beobachtet. Die Röntgenemission bei der abtragenden Bearbeitung von biologischen Geweben ist noch weitgehend unerforscht. Der Vortrag präsentiert erste Untersuchungen und Ergebnisse des radiologischen Gefährdungspotentials bei der medizinischen Anwendung von Ultrakurzpulslasern am Menschen.
Die Erzeugung unerwünschter Röntgenstrahlung bei der Ultrakurzpulslaser-Bearbeitung von Cornea und Zahnmaterial wurde untersucht. Laser-induzierte Dosisleistungen über dem natürlichen Hintergrund wurden gemessen. Mögliche Strahlenexpositionen in realen Anwendungen am Menschen wurden im Online-Vortrag diskutiert. Im Rahmen des vom BfS geförderten Projektes haben die Hochschule Mittweida und die BAM gemeinsam Untersuchungen durchgeführt.
Subpicosecond Emission from Mercury and Silver into Electrolyte Solution: An Experimental Study
(1997)
X‑ray emission during the ablative processing of biological materials by ultrashort laser pulses
(2023)
The ablative laser processing with ultrashort pulsed laser beams may cause secondary emission of hazardous X-rays. While the effect has recently been proven to be considered in working safety regulations when processing technical materials, such as metals, the X-ray emission rates during the ablative processing of biological tissue materials are widely unexplored yet.
Therefore, biological materials like water, isotonic saline solution, pig eyes, and human teeth were ablated with ultrashort laser pulses of 1030 nm wavelength, 600 fs pulse duration and 5 kHz pulse repetition rate, aiming to mimic typical surgery situations. Simultaneously, in-situ X-ray dose rate measurements were performed at a short distance from the plasma to display potential X-ray emission. For all four studied biological materials, our measurements prove the secondary emission of laser-induced X-rays.
Unwanted X-ray emission in ultrashort pulse laser processing: From metallic to biological materials
(2023)
X-rays can be generated as an unwanted side effect during ultrashort pulse laser material processing of technical work pieces and even biological samples with laser intensities above 10^13 W/cm^2. First studies demonstrate the need to address this effect in industrial as well as in medical applications. This secondary hazard should be considered in work safety and risk assessment.
One of the most important materials presenting and witnessing human culture is paper. The cleaning of paper is often necessary because contamination must be removed so that the fragile organic substrate can be preserved. The conventional cleaning methods are mechanical or involve the application of chemicals. These methods can damage drawings or print layers to some extent or make the original paper substrate brittle. More specifically, the use of a scalpel blade can cause damage to fibers. Chemical cleaning is difficult to perform locally, can dissolve foreign matter that then migrates into the paper substrate, or involves volatile organic compounds that can be harmful to the conservator. There is, therefore, a need for new conservation technologies aimed at the safe cleaning of paper. Lasers have proved to be an appropriate tool for cleaning as the energy dose and penetration depth at the specific point of contamination can be controlled. Additionally, if used properly, laser cleaning is not destructive to the paper.
Hydrogenated amorphous carbon layers were deposited on BK7 glass in a plasma-assisted chemical vapor deposition
process. Low and high refracting films with thicknesses d ranging from 11 nm to 5.8 µm were produced having refractive
indices n between 1.68 and 2.41 and linear absorption coefficients of α~100 cm-1 and α~20000 cm-1 at 800 nm wavelength as a result of different plasma modes. Laser ablation thresholds Fth in dependence on d were determined using 30-fs laser pulses. Low absorbing layers show a constant Fth while Fth increases with rising d up to the optical penetration depth of light α-1 for high absorbing films.
The chemical characteristics of two different types of laser-induced periodic surface structures (LIPSS), so-called high and low spatial frequency LIPSS (HSFL and LSFL), formed upon irradiation of titanium surfaces by multiple femtosecond laser pulses in air (30 fs, 790 nm, 1 kHz), are analyzed by various optical and electron beam based surface analytical techniques, including micro-Raman spectroscopy, energy dispersive X-ray analysis, X-ray photoelectron spectroscopy, and Auger electron spectroscopy. The latter method was employed in a high-resolution mode being capable of spatially resolving even the smallest HSFL structures featuring spatial periods below 100 nm. In combination with an ion sputtering technique, depths-resolved chemical information of superficial oxidation processes was obtained, revealing characteristic differences between the two different types of LIPSS. Our results indicate that a few tens of nanometer shallow HSFL are formed on top of a ∼150 nm thick graded superficial oxide layer without sharp interfaces, consisting of amorphous TiO2 and partially crystallized Ti2O3. The larger LSFL structures with periods close to the irradiation wavelength originate from the laser-interaction with metallic titanium. They are covered by a ∼200 nm thick amorphous oxide layer, which consists mainly of TiO2 (at the surface) and other titanium oxide species of lower oxidation states underneath.
Commercial grade-1 titanium samples (Ti, 99.6%) were treated using three alternative methods, (i) femtosecond laser processing, (ii) thermal heat treatment, and (iii) electrochemical anodization, respectively, resulting in the formation of differently conditioned superficial titanium oxide layers. The laser processing (i) was carried out by a Ti:sapphire laser (pulse duration 30 fs, central wavelength 790 nm, pulse repetition rate 1 kHz) in a regime of generating laser-induced periodic surface structures (LIPSS). The experimental conditions (laser fluence, spatial spot overlap) were optimized in a sample-scanning setup for the processing of several square-millimeters large surface areas covered homogeneously by these nanostructures. The differently oxidized titanium surfaces were characterized by optical microscopy, micro Raman spectroscopy, variable angle spectroscopic ellipsometry, and instrumented indentation testing. The tribological performance was characterized in the regime of mixed friction by reciprocating sliding tests against a sphere of hardened steel in fully formulated engine oil as lubricant. The specific tribological performance of the differently treated surfaces is discussed with respect to possible physical and chemical mechanisms.
Ultrashort laser pulses with durations in the fs-to-ps range were used for large area surface processing of steel aimed at mimicking the morphology and extraordinary wetting behaviour of bark bugs (Aradidae) found in nature. The processing was performed by scanning the laser beam over the surface of polished flat sample surfaces. A systematic variation of the laser processing parameters (peak fluence and effective number of pulses per spot diameter) allowed the identification of different regimes associated with characteristic surface morphologies (laser-induced periodic surface structures, i.e., LIPSS, grooves, spikes, etc.). Moreover, different laser processing strategies, varying laser wavelength, pulse duration, angle of incidence, irradiation atmosphere, and repetition rates, allowed to achieve a range of morphologies that resemble specific structures found on bark bugs. For identifying the ideal combination of parameters for mimicking bug-like structures, the surfaces were inspected by scanning electron microscopy. In particular, tilted micrometre-sized spikes are the best match for the structure found on bark bugs. Complementary to the morphology study, the wetting behaviour of the surface structures for water and oil was examined in terms of philic/ phobic nature and fluid transport. These results point out a route towards reproducing complex surface structures inspired by nature and their functional response in technologically relevant materials.
In situ optical second-harmonic generation (SHG) on centrosymmetric crystalline semiconductor electrodes opens up a new field of in situ investigations of hurried solid state interfaces and metal front contacts relevant to electronic and photovoltaic devices, which are rarely accessible by other methods. Photoelectrochemical nanosecond- and femtosecond-pulse laser investigations of silicon (111) electrodes show that in situ SHG is feasible in such complex interfacial systems. In a p-p polarization configuration, the azimuthal dependence of the SHG from oxide-covered and bare n-Si (111) electrodes, with and without Ni contact deposits, have been studied. Etching and regrowth of silicon oxides as well as burried interfacial electric field distributions were monitored. In situ SHG is shown to be extremely sensitive to trapped interfacial charge, crystal misorientations and surface step arrays. An advantage of femtosecond-pulses is the fact that illumination fluences that are well below the damage threshold, but still with sufficient power density, can be applied. (Author)
We present surface micro-modifications of bariumalumoborosilicate glasses with a high transformation temperature near 700 °C. Laser processing of the glass substrate was realized by using ultra-short laser pulses at 800 nm. The morphological conversion of the laser-treated surfaces was characterized by scanning force microscopy and nano-indentation. A hardness increase by at least a factor of six on the laser ablation crater edge relative to illuminated non- ablated areas shows that the material in the crater walls underwent drastic morphological and mechanical changes. In this heat- and shock-affected zone, the material became more elastic as a result of increased stress.
Near-ablation threshold investigations focusing on the generation of periodic nanostructures and their correlation with physico-chemical
properties of the solid phase such as e.g., the material-dependent surface energy, were conducted. Molecular dynamic modelling in the
sub-picosecond time domain was used to consider ultrafast opto-electronic processes triggering surface reorganization reactions.
Fluid containment of solid interfaces showed strong influence on the resulting micro- and nanostructures due to its drastic reduction of the
surface energy. The phenomena are discussed in respect to the minimization of the surface free energy in dependence of material composition
and interfacial structure.
Laser cleaning of delicate biological composite materials such as ancient parchment manuscripts from the 15th and 16th century and printed paper from the 19th century is demonstrated with an ultraviolet excimer pulsed laser at 308 nm. Laser fluence levels must stay below the ablation and destruction threshold of the parchment or paper substrate, and have to surpass the threshold of the contaminant matter. Foreign layers to be removed must exhibit a higher optical density than the artifact substrates. Synthetic carbonaceous dirt modelled by water-soluble black crayons showed a characteristically weak featureless laser-induced plasma spectroscopy spectrum near the noise limit. It turned out that laser-induced plasma spectroscopy is of limited use in monitoring halting points (or etch-stops) because it relies on the destruction not only of the laterally inhomogenously distributed contaminant but also of pigment phases on a microscopically rough parchment substrate. Laser-induced fluorescence spectroscopy, however, promises to be a valuable non-destructive testing technique for etch-stop monitoring.